JPH0373961B2 - - Google Patents

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Publication number
JPH0373961B2
JPH0373961B2 JP57173689A JP17368982A JPH0373961B2 JP H0373961 B2 JPH0373961 B2 JP H0373961B2 JP 57173689 A JP57173689 A JP 57173689A JP 17368982 A JP17368982 A JP 17368982A JP H0373961 B2 JPH0373961 B2 JP H0373961B2
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Prior art keywords
tcnq
salt
tcnq salt
substrate
organic semiconductor
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JPS5963604A (en
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    • Y02E60/122

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  • Quinoline Compounds (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
  • Primary Cells (AREA)
  • Secondary Cells (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は有機半導体物質の処理方法に関する。 この物質は、原理的に任意の形状に成形し得る
ので、例えば感温抵抗体材料、固定電解コンデン
サ用固体電解質材料、電池用固体電解質、電導性
フイルム等として、種々の分野への応用が期待さ
れている。 有機半導体のうちで特に高電導度の有機半導体
として有名なものにTCNQ塩がある。こゝに
TCNQとは7,7,8,8テトラシアノキノジ
メタンの略称であり、TCNQやTCNQ塩の性質
についてはJ.Am.Chem.Soc.、Vol.84、PP3374〜
3387(1962)に記載されている。 しかし乍ら、TCNQ塩は通常粉末状の結晶で
あり、その結晶自体高い電導度を示すものの、粉
末状であるがためにその成形に難がある。 従来、提案されたTCNQ塩の成形方法は次の
3つに分類できる。 (1) DMF(ジメチルホルムアミド)などの溶媒に
TCNQ塩を溶かした溶液を所定形状の基板に
塗布し、その後乾燥させて溶媒を飛散除去する
方法。 (2) TCNQ塩をボールミル等により微細化した
結晶をアルコール等に分散せしめ、それを上記
基板に塗布し乾燥する方法。 (3) TCNQ塩を上記基板に真空蒸着する方法。 上記(1)の方法では、TCNQ塩に対する溶解度
の高いDMFを溶媒に用い、斯る溶媒を例えば100
℃に加熱したとしても、その溶解度は10%が限度
である。このことは平坦な基板に必要なだけの厚
みのTCNQ塩を付着したり、あるいは多孔質基
板にTCNQ塩を十分含浸的に付着するには何度
も塗布、乾燥を繰り返す必要のあることを意味し
ている。更に溶液を塗布した基板は上記乾燥の度
に高温中に放置されるが、このとき多かれ少なか
れTCNQ塩の変質が起こり、その電導度劣化を
招く。加えて、この様にして基板に付着形成され
るTCNQ塩は微細結晶からなるため、実際には
塗布溶液中にポリビニルピロリドンなどの凝固用
樹脂が添加されて上記微細結晶の付着強度の強化
が図られるが、斯る凝固用樹脂は電気的絶縁物で
あるため、上記電導度劣化と相俟つてTCNQ塩
の電導度を更に低いものとなす。 上記(2)の方法では、TCNQ塩の微細化にも限
界があり、基板への付着強度が特に弱いので、基
板からTCNQ塩がはがれたりする。この付着強
度の強化は、上に述べた様に凝固用樹脂の採用に
よりある程度改善されるが、同様にTCNQ塩の
電導度の低下を招く。又、TCNQ塩からなる微
細結晶の分散溶液を用いるので、特に多孔質基板
への含浸率が悪く、超音波拡散含浸法を用いたと
してもその含浸率は低い。 上記(3)の方法では、真空蒸着作業の煩雑さはも
とより、特に多孔質基板への付着には全く不向き
である。 本発明は有機半導体物質の全く新規な処理方
法、より具体的には、TCNQ塩のみからなる液
体を作り出し、斯る液体を冷却固化する方法を提
供するもので、上記液体を所定形状の基板に接触
した状態で冷却固化させることにより任意形状の
TCNQ塩からなる半導体物質を得ることができ
る。 TCNQ塩のみからなる液体を得る最も実際的
な方法は、当初の形態である粉末状TCNQ塩を
加熱融解により液化することである。しかし乍ら
単なるTCNQ塩の加熱融解は、TCNQ塩を熱分
解してほとんど電気的絶縁物と化す。 本発明は、ある種のTCNQ塩は加熱融解して
も、熱分解するまでに短時間ではあるが、付着作
業にとつては十分な時間的余裕を呈し、従つて斯
る時間内に冷却固化すれば高い電導度を保持する
TCNQ塩を得られるという全く新しい知見に基
いている。 TCNQ及びその種々の塩、並びにその製法自
体は、例えば、J.Am.Chem.Soc.、Vol.84、
PP3374−3387(1962)に開示されている。TCNQ
塩としては、Mn+(TCNQ−)nで表わされる
単塩と、Mn+(TCNQ−)n(TCNQ)mで表わ
される錯塩とがある。尚上記Mは有機カチオン、
nはカチオンの価、mは1モルの錯塩に含まれる
中性TCNQのモル数に対応する正の数を夫々意
味する。 本発明では、しかし乍ら、錯塩の使用がより好
ましい。そして、錯塩の上記mは0.5〜1.5が好ま
しくは約1である。 本発明で用いられるTCNQ塩の例としては、
N位を置換したキノリン、イソキノリン及びピリ
ジンのTCNQ塩が挙げられる。尚、N位の置換
体は、C2〜C18(炭素数2〜18の)アルキル(例え
ばエチル、プロピル、ブチル、ペンチル、オクチ
ル、デシル、オクタデシル)、C5〜C8シクロアル
キル(例えばシクロペンチル、シクロヘキシル)、
C3〜C18アルケン(例えばアリル)、フエニル又は
フエニル(C1〜C18)アルキル(例えばフエネチ
ル)の様な炭化水素基である。 本発明で用いられるTCNQ塩のより好ましい
例は、N−n−プロピルキノリンのTCNQ塩、
N−エチルイソキノリンのTCNQ塩、N−イソ
プロピルキノリンのTCNQ塩、N−n−ヘキシ
ルキノリンのTCNQ塩、N−n−プロピルイソ
キノリンのTCNQ塩、N−イソプロピルイソキ
ノリンのTCNQ塩、N−n−ブチルイソキノリ
ンのTCNQ塩、N−n−ブチルピリジンの
TCNQ塩)である。 本発明で用いられる各種TCNQ塩の融点を下
にP−1〜P−10として示す9種類の塩について
記す。 P−1…N−n−プロピルキノリン+(TCNQ−)
(TCNQ) P−2…N−イソプロピルキノリン+(TCNQ−)
(TCNQ) P−3…N−n−プロピルイソキノリン+
(TCNQ−)(TCNQ) P−4…N−イソプロピルイソキノリン+
(TCNQ−)(TCNQ) P−5…N−nブチルイソキノリン+(TCNQ−)
(TCNQ) P−6…N−エチルキノリン+(TCNQ−)
(TCNQ) P−7…N−エチルイソキノリン+(TCNQ−)
(TCNQ) P−8…N−n−ヘキシルキノリン+(TCNQ−)
(TCNQ) P−9…N−n−ヘキシルイソキノリン+
The present invention relates to a method for processing organic semiconductor materials. Since this material can in principle be formed into any shape, it is expected to be applied in a variety of fields, such as as a temperature-sensitive resistor material, solid electrolyte material for fixed electrolytic capacitors, solid electrolyte for batteries, and conductive film. has been done. Among organic semiconductors, TCNQ salt is famous as an organic semiconductor with particularly high conductivity. Here
TCNQ is an abbreviation for 7,7,8,8 tetracyanoquinodimethane, and the properties of TCNQ and TCNQ salts can be found in J.Am.Chem.Soc., Vol.84, PP3374~
3387 (1962). However, TCNQ salt is usually a powdery crystal, and although the crystal itself exhibits high electrical conductivity, it is difficult to mold it because of its powdery nature. Conventionally proposed methods for forming TCNQ salt can be classified into the following three types. (1) In solvents such as DMF (dimethylformamide)
A method in which a solution containing TCNQ salt is applied to a substrate of a specified shape, and then dried to remove the solvent by scattering. (2) A method in which fine crystals of TCNQ salt are made using a ball mill or the like and dispersed in alcohol, etc., and then applied to the above substrate and dried. (3) A method of vacuum evaporating TCNQ salt onto the above substrate. In method (1) above, DMF, which has high solubility for TCNQ salt, is used as a solvent, and such a solvent is
Even when heated to ℃, its solubility is limited to 10%. This means that it is necessary to apply and dry the TCNQ salt many times to apply the necessary thickness to a flat substrate, or to apply the TCNQ salt to a porous substrate with sufficient impregnation. are doing. Furthermore, the substrate coated with the solution is left at high temperatures each time it is dried, but at this time the TCNQ salt changes in quality to a greater or lesser extent, leading to deterioration of its conductivity. In addition, since the TCNQ salt deposited on the substrate in this way consists of fine crystals, a coagulating resin such as polyvinylpyrrolidone is actually added to the coating solution to strengthen the adhesion strength of the fine crystals. However, since such a coagulating resin is an electrical insulator, together with the above-mentioned deterioration in conductivity, the conductivity of the TCNQ salt becomes even lower. In method (2) above, there is a limit to the miniaturization of the TCNQ salt, and the adhesion strength to the substrate is particularly weak, so the TCNQ salt may peel off from the substrate. This enhancement of adhesive strength can be improved to some extent by employing a coagulating resin as described above, but this also results in a decrease in the electrical conductivity of the TCNQ salt. Furthermore, since a dispersion solution of fine crystals made of TCNQ salt is used, the impregnation rate into a porous substrate is particularly poor, and even if an ultrasonic diffusion impregnation method is used, the impregnation rate is low. In the method (3) above, not only is the vacuum evaporation work complicated, but it is also completely unsuitable for attachment to porous substrates. The present invention provides a completely new method for processing organic semiconductor materials, more specifically, a method for producing a liquid consisting only of TCNQ salt, cooling and solidifying the liquid, and applying the liquid to a substrate of a predetermined shape. By cooling and solidifying in contact, any shape can be formed.
A semiconductor material consisting of TCNQ salt can be obtained. The most practical way to obtain a liquid consisting only of TCNQ salt is to liquefy the powdered TCNQ salt in its original form by heating and melting it. However, simply heating and melting the TCNQ salt thermally decomposes the TCNQ salt and turns it into almost an electrical insulator. The present invention shows that even if some TCNQ salts are heated and melted, it takes a short time to thermally decompose, but there is sufficient time for adhesion, and therefore it is possible to cool and solidify within such a time. maintains high conductivity if
It is based on the completely new knowledge that TCNQ salt can be obtained. TCNQ and its various salts, as well as its production process, are described in, for example, J.Am.Chem.Soc., Vol.84,
Disclosed in PP3374-3387 (1962). TCNQ
Salts include a single salt represented by M n + (TCNQ-)n and a complex salt represented by M n + (TCNQ-)n (TCNQ)m. In addition, the above M is an organic cation,
n means the value of the cation, and m means a positive number corresponding to the number of moles of neutral TCNQ contained in 1 mole of the complex salt. In the present invention, however, the use of complex salts is more preferred. The above m of the complex salt is 0.5 to 1.5, preferably about 1. Examples of TCNQ salts used in the present invention include:
Examples include TCNQ salts of quinoline, isoquinoline and pyridine substituted at the N-position. In addition, the substituent at the N position is C2 - C18 (carbon number 2-18) alkyl (e.g. ethyl, propyl, butyl, pentyl, octyl, decyl, octadecyl), C5 - C8 cycloalkyl (e.g. cyclopentyl). , cyclohexyl),
Hydrocarbon groups such as C3 - C18 alkene (eg allyl), phenyl or phenyl( C1 - C18 )alkyl (eg phenethyl). More preferred examples of the TCNQ salt used in the present invention include TCNQ salt of N-n-propylquinoline,
TCNQ salt of N-ethylisoquinoline, TCNQ salt of N-isopropylquinoline, TCNQ salt of N-hexylquinoline, TCNQ salt of N-n-propylisoquinoline, TCNQ salt of N-isopropylisoquinoline, N-n-butylisoquinoline TCNQ salt of N-n-butylpyridine
TCNQ salt). The melting points of various TCNQ salts used in the present invention are described below for nine types of salts shown as P-1 to P-10. P-1...N-n-propylquinoline + (TCNQ-)
(TCNQ) P-2...N-isopropylquinoline + (TCNQ-)
(TCNQ) P-3...N-n-propylisoquinoline +
(TCNQ-) (TCNQ) P-4...N-isopropylisoquinoline +
(TCNQ−) (TCNQ) P-5…N-n butylisoquinoline + (TCNQ−)
(TCNQ) P-6...N-ethylquinoline + (TCNQ−)
(TCNQ) P-7...N-ethylisoquinoline + (TCNQ-)
(TCNQ) P-8...N-n-hexylquinoline + (TCNQ-)
(TCNQ) P-9...N-n-hexylisoquinoline +

【表】 上記各塩の製造は例えば次の通りである。N−
アルキルヨードとキノリン(又はイソキノリン、
ピリジン)とを反応させて得られるN−アルキル
キノリン(又はイソキノリン、ピリジン)ヨーダ
イドとTCNQとを適当な溶媒(例えばアセトニ
トリル)中で、適当なモル比(例えば3:4)で
反応させてTCNQ塩を作る。この塩は不純物が
多いので、適当な溶媒(例えばアセトニトリルに
て82℃以下の温度)での加熱溶解−冷却−晶出か
らなる再結晶操作を繰り返すことにより塩の純度
が上げられる。得られる結晶は針状又はロツド状
の粉末である。 上記反応又は高純度化で用いられる溶媒の種類
により、キノリン(又はイソキノリン、ピリジ
ン)部とTCNQ部とのモル比は若干変化する。
例えば、反応時及び高純度化作業での溶媒が共に
アセトニトニルの場合、mが1の錯塩状態の
TCNQ塩が通常得られるが、高純度化作業時の
それがメタノールであると、mが1より小さくな
る。上記モル比は、TCNQ塩にTCNQを紛砕混
入しても変化する。例えば、mが1のTCNQ塩
に5%のTCNQを混入した融解固化塩は、mが
約1.14となる。この様にmが1より若干変化して
も使用可能である。 本発明に含まれないTCNQ塩、例えばHキノ
リン(又はイソキノリン)のTCNQ塩やN−メ
チルキノリン(又はイソキノリン)のTCNQ塩
は加熱すると融解せずに分解するか、あるいは融
解と同時に分解してしまう。 これに対し、上記の如き本発明の対象とする
TCNQ塩は加熱すると融解して液化状態を呈す
るが、その状態で熱分解するまで実質的な時間を
要する。この場合の熱分解は突然起こり、塩は電
気的絶縁物と化す。完全に融解後、絶縁化するま
での時間は次の通りである。
[Table] The production of each of the above salts is, for example, as follows. N-
Alkyl iodo and quinoline (or isoquinoline,
TCNQ salt is obtained by reacting N-alkylquinoline (or isoquinoline, pyridine) iodide obtained by reacting N-alkylquinoline (or isoquinoline, pyridine) iodide with TCNQ in an appropriate molar ratio (e.g. 3:4) in an appropriate solvent (e.g. acetonitrile). make. Since this salt contains many impurities, the purity of the salt can be increased by repeating a recrystallization operation consisting of heating dissolution, cooling, and crystallization in an appropriate solvent (for example, acetonitrile at a temperature of 82° C. or lower). The resulting crystals are needle-shaped or rod-shaped powders. The molar ratio of the quinoline (or isoquinoline, pyridine) moiety to the TCNQ moiety varies slightly depending on the type of solvent used in the above reaction or purification.
For example, if the solvent used in the reaction and in the purification work is acetonityl, a complex salt with m of 1 is
TCNQ salt is usually obtained, but when it is methanol during purification work, m is less than 1. The above molar ratio changes even if pulverized TCNQ is mixed into the TCNQ salt. For example, a melt-solidified salt obtained by mixing 5% TCNQ into a TCNQ salt with m of 1 has m of about 1.14. In this way, it can be used even if m changes slightly from 1. TCNQ salts not included in the present invention, such as TCNQ salts of H-quinoline (or isoquinoline) and TCNQ salts of N-methylquinoline (or isoquinoline), decompose without melting when heated, or decompose simultaneously with melting. . In contrast, the objects of the present invention as described above
When TCNQ salt is heated, it melts and becomes liquefied, but it takes a substantial amount of time for it to decompose thermally in that state. Thermal decomposition in this case occurs suddenly and the salt becomes an electrical insulator. The time required for insulation after complete melting is as follows.

【表】 但し、加熱は、アルミケースにTCNQ塩の結
晶粉末を詰め、上記温度の金属板上に接触させて
行なつた。 従つて、液化状態のTCNQ塩はその分解前に
冷却固化されねばならない。それにより、高電導
度を有する半導体が得られる。例えば、P−1及
びP−2の場合、融点以上で約300℃以下の温度
に加熱され、そして例えば260℃で液化完了後10
秒以内、好ましくは5秒以内に室温での冷却又は
水等の冷媒中での冷却が開始される。P−3及び
P−4、P−5では、融点以上で約320℃以下の
温度、例えば260℃に加熱され、液化完了後約70
秒以内、好ましくは1分以内に室温での冷却又は
水等の冷媒中での冷却が開始される。 この様に分解前に冷却固化して得られる
TCNQ塩の電導度は次の通りである。
[Table] However, heating was performed by filling an aluminum case with TCNQ salt crystal powder and bringing it into contact with a metal plate at the above temperature. Therefore, TCNQ salt in liquefied state must be cooled and solidified before its decomposition. Thereby, a semiconductor with high electrical conductivity is obtained. For example, in the case of P-1 and P-2, it is heated to a temperature above the melting point and below about 300°C, and after completion of liquefaction at 260°C, for example, 10
Cooling at room temperature or in a coolant such as water begins within seconds, preferably within 5 seconds. P-3, P-4, and P-5 are heated to a temperature above the melting point and below about 320°C, for example 260°C, and after liquefaction is completed, the temperature is about 70°C.
Cooling at room temperature or in a coolant such as water begins within seconds, preferably within one minute. In this way, it is obtained by cooling and solidifying before decomposition.
The conductivity of TCNQ salt is as follows.

【表】 本発明により得られる半導体は上記従来法(1)や
(2)の場合の如きTCNQ塩の微細結晶の集りでは
なく、ほぼ多結晶塊状態に近い。 本発明によれば、TCNQ塩を100%溶解した溶
液により基板へのTCNQ塩の付着をなすのと同
じことであるから、上記従来方法(1)とは全く異な
り、ほとんど1回の付着作業で、基板が箔状のみ
ならず多孔質の場合でも、必要な量のTCNQ塩
を形成することができ、量産性の向上はもとよ
り、乾燥の度にTCNQ塩が劣化するといつた従
来の欠点が克服される。更に、本発明によれば、
成形されたTCNQ塩は非晶質状態に近いから、
基板への付着力が十分大きく、従つて従来の如き
凝固用樹脂を用いる必要がなく、TCNQ塩の不
所望な電導度の低下を避けることができる。 以下本発明実施例を固体電解コンデンサを製造
する場合を例にとつて説明する。 まずNイソプロピルキノリンのTCNQ塩が準
備される。斯るTCNQ塩の作成自体は前掲の文
献J.Am.Chem.Soc.、Vol.84、pp3374〜3387
(1962)の記載に基いて行えるが、簡単に述べれ
ば、ヨウ化イソプロピルとキノリンとを反応させ
てイソプロピルキノリンヨウドを作成すると共
に、アセトニトリルにTCNQを溶かしたものを
用意し、これらをほゞ3:4モル反応させること
により粉末結晶状のNイソプロピルキノリンの
TCNQ塩が作られる。以後この塩を単にTCNQ
塩と称す。 一方、通常の固体電解コンデンサの製造方法に
従つて、第1図に示す如く、アルミニウム粉末の
焼結体を陽極酸化処理し、酸化皮膜を有する皮膜
形成性金属としての多孔質コンデンサ素子1が作
成される。 上記準備の後、実行される工程は、コンデンサ
素子1にTCNQ塩からなる固体電解質を含浸付
着することである。即ち、準備されている粉末状
のTCNQ塩を第2図に示す如くアルミニウム容
器2に適度の加圧下で収納し、容器2を加熱する
ことにより融解液化したTCNQ塩浴3が設けら
れる。この浴の温度は270℃以下に保持される。
尚、アルミニウム容器2へのTCNQ塩収納時の
加圧は本質的なものではない。 続く工程では、第3図に示す如く、予め260℃
〜270℃に加熱保持されているコンデンサ素子1
をTCNQ塩浴3に浸漬し、直ちに引き上げて、
室温下で放置する。これにより、多孔質のコンデ
ンサ素子1に含浸したTCNQ塩が冷却固化し、
目的の固体電解質となる。上記TCNQ塩の液化
から冷却固化までの所要時間は10秒程度である。 残りの工程では、通常行なわれている様に、第
4図に示す如く、含浸済みのコンデンサ素子1′
表面にグラフアイト層4、銀塗料層5が順次被着
され、最後に斯る素子1が陰極リード線6と共に
アルミニウム容器7内に収納され、半田8及びエ
ポキシ樹脂9にて固定される。 上記素子1として、従来の二酸化マンガンを固
体電解質とするコンデンサでは1μFの容量を示す
ものを用いたところ、完成されたコンデンサの容
量は0.75μFであつた。これは二酸化マンガンの場
合の含浸率を100%として75%の含浸率を意味す
る。又、上記の如く0.75μFのコンデンサの寿命試
験結果は次表に示す如く良好であつた。
[Table] The semiconductor obtained by the present invention is the conventional method (1) or
It is not a collection of microcrystals of TCNQ salt like in case (2), but is almost in the state of a polycrystalline mass. According to the present invention, it is the same as attaching TCNQ salt to the substrate using a solution containing 100% TCNQ salt, so it is completely different from the conventional method (1) described above, and almost all the attaching work is done in one time. , it is possible to form the required amount of TCNQ salt even when the substrate is not only foil-like but also porous, which not only improves mass productivity but also overcomes the conventional drawback that TCNQ salt deteriorates every time it is dried. be done. Furthermore, according to the present invention,
Because the shaped TCNQ salt is close to an amorphous state,
The adhesion force to the substrate is sufficiently large, so that there is no need to use a conventional coagulating resin, and an undesired decrease in the conductivity of the TCNQ salt can be avoided. Embodiments of the present invention will be described below, taking as an example the case of manufacturing a solid electrolytic capacitor. First, the TCNQ salt of N-isopropylquinoline is prepared. The preparation of such TCNQ salt itself is described in the above-mentioned document J.Am.Chem.Soc., Vol.84, pp3374-3387.
(1962), but to put it simply, isopropyl quinoline iodide is produced by reacting isopropyl iodide with quinoline, and a solution of TCNQ in acetonitrile is prepared, and these are mixed into approximately 3 : 4 moles of N-isopropylquinoline in powder crystal form by reacting with
TCNQ salt is made. From now on, simply use this salt as TCNQ
It's called salt. On the other hand, as shown in FIG. 1, a porous capacitor element 1 as a film-forming metal having an oxide film was prepared by anodizing a sintered body of aluminum powder according to a normal manufacturing method for solid electrolytic capacitors. be done. After the above preparation, the step to be carried out is to impregnate the capacitor element 1 with a solid electrolyte consisting of TCNQ salt. That is, as shown in FIG. 2, the prepared powder TCNQ salt is stored in an aluminum container 2 under moderate pressure, and the container 2 is heated to provide a TCNQ salt bath 3 in which the TCNQ salt is melted and liquefied. The temperature of this bath is maintained below 270°C.
Note that pressurizing the aluminum container 2 when storing TCNQ salt is not essential. In the following process, as shown in Figure 3, the temperature is preliminarily heated to 260℃.
Capacitor element 1 heated and maintained at ~270℃
immersed in TCNQ salt bath 3, immediately pulled out,
Leave at room temperature. As a result, the TCNQ salt impregnated into the porous capacitor element 1 is cooled and solidified.
It becomes the desired solid electrolyte. The time required from liquefaction to cooling solidification of the TCNQ salt is about 10 seconds. In the remaining steps, as is usual, the impregnated capacitor element 1' is prepared as shown in FIG.
A graphite layer 4 and a silver paint layer 5 are sequentially applied to the surface, and finally the element 1 is housed together with a cathode lead wire 6 in an aluminum container 7 and fixed with solder 8 and epoxy resin 9. As the element 1, a conventional capacitor having a capacitance of 1 μF using manganese dioxide as a solid electrolyte was used, and the capacitance of the completed capacitor was 0.75 μF. This means an impregnation rate of 75%, assuming that the impregnation rate in the case of manganese dioxide is 100%. Also, as mentioned above, the life test results of the 0.75 μF capacitor were good as shown in the following table.

【表】 次に本発明の第2の実施例として、感温抵抗体
を製造する場合を説明する。まず第5図に示す如
く、ガラス基板10を準備し、斯る基板を第2図
と同様にTCNQ塩浴3に浸漬し、直ちに引上げ
て、室温下で放置する。これにより第6図に示す
如く、基板10周囲にTCNQ塩からなる有機半
導体膜11が付着する。上記TCNQ塩浴3の保
持温度やTCNQ塩の液化から冷却固化までの時
間は上記第1の実施例と同様である。 次いで、有機半導体膜11を有する基板10を
第7図に示す如く、通常の銅プリント回路12を
有する樹脂基板13上に固着するとともに、有機
半導体膜11の両端と銅プリント回路12とを導
電性塗料14にて結合し、目的とする感温抵抗体
が完成する。第8図に斯る抵抗体の温度特性を示
す。 以上の説明より明らかな如く、本発明によれば
TCNQ塩からなる有機半導体を所定形状の基体
に容易に付着することができ、かつ斯る付着作業
時にTCNQ塩の劣化もほとんど伴わない。
[Table] Next, as a second embodiment of the present invention, a case of manufacturing a temperature-sensitive resistor will be described. First, as shown in FIG. 5, a glass substrate 10 is prepared, and the substrate is immersed in the TCNQ salt bath 3 in the same manner as in FIG. 2, immediately taken out, and left at room temperature. As a result, as shown in FIG. 6, an organic semiconductor film 11 made of TCNQ salt is attached around the substrate 10. The holding temperature of the TCNQ salt bath 3 and the time from liquefaction to cooling solidification of the TCNQ salt are the same as in the first embodiment. Next, as shown in FIG. 7, the substrate 10 having the organic semiconductor film 11 is fixed onto a resin substrate 13 having a normal copper printed circuit 12, and both ends of the organic semiconductor film 11 and the copper printed circuit 12 are made conductive. They are bonded with paint 14, and the desired temperature-sensitive resistor is completed. FIG. 8 shows the temperature characteristics of such a resistor. As is clear from the above explanation, according to the present invention
An organic semiconductor made of TCNQ salt can be easily attached to a substrate of a predetermined shape, and the TCNQ salt is hardly deteriorated during such an attachment operation.

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第4図は本発明実施例方法を説明す
る工程別図であり、第1図は側面図、第2図乃至
第4図は断面図である。第5図乃至第7図は本発
明の他の実施例を示す工程別断面図、第8図は温
度特性図である。 3……TCNQ塩浴、11……有機半導体膜。
1 to 4 are step-by-step diagrams illustrating a method according to an embodiment of the present invention, with FIG. 1 being a side view and FIGS. 2 to 4 being sectional views. FIGS. 5 to 7 are cross-sectional views showing other embodiments of the present invention by process, and FIG. 8 is a temperature characteristic diagram. 3...TCNQ salt bath, 11...Organic semiconductor film.

Claims (1)

【特許請求の範囲】 1 N位を炭化水素基で置換したキノリン、イソ
キノリン又はピリジンのTCNQ錯塩を加熱融解
により液化し、該TCNQ錯塩が熱分解するまで
の時間内に冷却固化することを特徴とする有機半
導体物質の処理方法。 2 特許請求の範囲第1項において、前記炭化水
素基は炭素数2〜18までのアルキル基であること
を特徴とする有機半導体物質の処理方法。 3 特許請求の範囲第2項において、TCNQと
炭素数2〜18までのアルキル基で置換したキノリ
ン、イソキノリン又はピリジンとのモル比はほぼ
2:1であることを特徴とする有機半導体物質の
処理方法。
[Claims] 1. A TCNQ complex salt of quinoline, isoquinoline or pyridine substituted with a hydrocarbon group at the N-position is liquefied by heating and melting, and the TCNQ complex salt is cooled and solidified within the time until the TCNQ complex salt is thermally decomposed. A method for processing organic semiconductor materials. 2. A method for treating an organic semiconductor material according to claim 1, wherein the hydrocarbon group is an alkyl group having 2 to 18 carbon atoms. 3. Treatment of an organic semiconductor material according to claim 2, characterized in that the molar ratio of TCNQ to quinoline, isoquinoline, or pyridine substituted with an alkyl group having 2 to 18 carbon atoms is approximately 2:1. Method.
JP57173689A 1982-10-01 1982-10-01 Method of treating organic semiconductive substance Granted JPS5963604A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57173689A JPS5963604A (en) 1982-10-01 1982-10-01 Method of treating organic semiconductive substance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57173689A JPS5963604A (en) 1982-10-01 1982-10-01 Method of treating organic semiconductive substance

Publications (2)

Publication Number Publication Date
JPS5963604A JPS5963604A (en) 1984-04-11
JPH0373961B2 true JPH0373961B2 (en) 1991-11-25

Family

ID=15965278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57173689A Granted JPS5963604A (en) 1982-10-01 1982-10-01 Method of treating organic semiconductive substance

Country Status (1)

Country Link
JP (1) JPS5963604A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0610199B2 (en) * 1985-11-18 1994-02-09 日本カ−リツト株式会社 Charge transfer complex
JPS62204514A (en) * 1986-03-04 1987-09-09 信英通信工業株式会社 Solid electrolytic capacitor
JPH0821520B2 (en) * 1987-01-12 1996-03-04 和光純薬工業株式会社 Solid electrolytic capacitor
JP2586917B2 (en) * 1987-12-22 1997-03-05 日本カーリット株式会社 Heat resistant solid electrolytic capacitors

Also Published As

Publication number Publication date
JPS5963604A (en) 1984-04-11

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