JPH0620876A - Manufacture of solid-state electrolytic capacitor - Google Patents
Manufacture of solid-state electrolytic capacitorInfo
- Publication number
- JPH0620876A JPH0620876A JP21582891A JP21582891A JPH0620876A JP H0620876 A JPH0620876 A JP H0620876A JP 21582891 A JP21582891 A JP 21582891A JP 21582891 A JP21582891 A JP 21582891A JP H0620876 A JPH0620876 A JP H0620876A
- Authority
- JP
- Japan
- Prior art keywords
- tcnq
- electrolytic capacitor
- electrode
- complex
- anode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
(57)【要約】 (修正有)
【目的】 陽極用電極をTCNQとドナー材塩との溶液
に浸漬し、アノード電解反応によりTCNQ錯体を陽極
用電極上に生成析出させることにより、上記錯体の分解
点に近い温度でも含浸でき、上記電極表面とTCNQ錯
体の接合性を高め、固体電解コンデンサの tanδの低減
を可能とする。
【構成】 陽極用電極をTCNQとドナー材塩との溶液
に浸漬し、アノード電解反応によりTCNQ錯体を陽極
用電極上に生成析出させることにより含浸させることを
特徴としている。(57) [Summary] (Modified) [Purpose] By immersing the anode electrode in a solution of TCNQ and a salt of a donor material, a TCNQ complex is produced and deposited on the anode electrode by an anodic electrolytic reaction to form the above complex. It can be impregnated even at a temperature close to the decomposition point, enhances the bondability between the electrode surface and the TCNQ complex, and makes it possible to reduce the tan δ of the solid electrolytic capacitor. [Structure] An anode electrode is immersed in a solution of TCNQ and a salt of a donor material, and a TCNQ complex is generated and deposited on the anode electrode by an anodic electrolytic reaction to impregnate it.
Description
【0001】[0001]
【産業上の利用分野】本発明は、固体電解質としてTC
NQ錯体を用いた固体電解コンデンサの製造方法に関す
るものである。The present invention relates to TC as a solid electrolyte.
The present invention relates to a method for manufacturing a solid electrolytic capacitor using an NQ complex.
【0002】[0002]
【従来の技術】表面に陽極酸化皮膜を有する弁作用金属
からなる陽極体電極と該電極に対向して構成された陰極
用電極との間に固体電解質を介在させてなる従来の固体
電解コンデンサにおいては、固体電解質として二酸化マ
ンガンが用いられてきた。2. Description of the Related Art In a conventional solid electrolytic capacitor in which a solid electrolyte is interposed between an anode body electrode made of a valve metal having an anodized film on its surface and a cathode electrode formed facing the electrode. Have used manganese dioxide as a solid electrolyte.
【0003】しかしながら、この方法は二酸化マンガン
を電極上に形成させる際に、一般に陽極体電極を硝酸マ
ンガン溶液に浸漬させた後、加熱分解を行なうため、陽
極酸化皮膜が損傷をうけること、加えて二酸化マンガン
による陽極酸化皮膜の皮膜修復性が乏しいという欠点が
あった。However, according to this method, when manganese dioxide is formed on the electrode, the anode electrode is generally immersed in a manganese nitrate solution and then thermally decomposed, so that the anodic oxide film is damaged. It has a drawback that the anodic oxide film formed by manganese dioxide is poor in film recoverability.
【0004】これらの欠点を補う方法としてTCNQ錯
体などの有機半導体を固体電解質として用いた固体電解
コンデンサが出現している。この含浸方法に関する代表
的な例として特開昭57-173928号公報に記載されている
ようにTCNQ錯体を含む有機半導体を加熱融解により
液化させ、分解にいたるまでの間に素子を入れ、急冷固
化させるものである。As a method of compensating for these drawbacks, solid electrolytic capacitors using an organic semiconductor such as TCNQ complex as a solid electrolyte have appeared. As a typical example of this impregnation method, as described in JP-A-57-173928, an organic semiconductor containing a TCNQ complex is liquefied by heating and melting, and an element is put in until decomposition and rapid solidification. It is what makes me.
【0005】しかしながら、この方法によれば、用いる
TCNQ錯体は融解点と分解点を有し、かつその温度間
隔がある程度なければ含浸性が極端に悪くなる。TCN
Q錯体の分解点はTCNQの昇華温度の290℃付近であ
り、融解点と分解点の温度幅をもたせるためには、どう
しても融解温度を下げることになる。However, according to this method, the TCNQ complex to be used has a melting point and a decomposition point, and impregnation property becomes extremely poor unless there is a certain temperature interval. TCN
The decomposition point of the Q complex is around 290 ° C., which is the sublimation temperature of TCNQ, and the melting temperature must be lowered in order to have a temperature range between the melting point and the decomposition point.
【0006】一方において、固体電解コンデンサには耐
熱性が要求されており、特にチップ製品については面実
装時に半田ディップ、リフロ−の温度に耐えられる電解
質でなくてはならず、従来の融解含浸法に適したTCN
Q錯体では上記の耐熱性に耐えられるものは、かなり困
難である。即ち耐熱性に優れたTCNQ錯体は融解点も
高く分解点との温度差も少なくなるので含浸性が極端に
悪くなる。逆に含浸性を良好にしようとすれば融解点が
低温側になるので耐熱性が極端に悪くなる。On the other hand, solid electrolytic capacitors are required to have heat resistance, and especially for chip products, the electrolyte must be able to withstand solder dip and reflow temperatures during surface mounting. Suitable for TCN
It is quite difficult for the Q complex to withstand the above heat resistance. That is, since the TCNQ complex having excellent heat resistance has a high melting point and a small temperature difference from the decomposition point, impregnation property is extremely deteriorated. On the other hand, if the impregnation property is improved, the melting point will be on the low temperature side, and the heat resistance will be extremely deteriorated.
【0007】[0007]
【発明が解決しようとする課題】本発明は上記の問題点
を解決することである。即ち耐熱性錯体は融解点が高く
分解点との差が充分なくて含浸が不可能であったが本発
明により可能ならしめ、また電極表面とTCNQ錯体の
接合性が強固となりコンデンサのtanδの改良を図っ
たものである。SUMMARY OF THE INVENTION The present invention is to solve the above problems. That is, the heat-resistant complex had a high melting point and a sufficient difference from the decomposition point to impregnate it. However, the present invention makes it possible, and the bonding property between the electrode surface and the TCNQ complex is strengthened and the tan δ of the capacitor is improved. Is intended.
【0008】[0008]
【課題を解決するための手段】本発明の具体的手法とし
ては、(1)陽極用電極が拡大された表面及び該表面に
陽極酸化皮膜を有する弁作用金属もしくは該金属の合金
よりなると共に固体電解質としてTCNQ錯体を用いる
固体電解コンデンサの製造方法において、TCNQとド
ナ−材塩との溶液に該陽極用電極を浸漬し、アノ−ド電
解反応によりTCNQ錯体を陽極用電極上に生成、析出
させることにより含浸させることを特徴とする固体電解
コンデンサの製造方法。 (2)支持電解質を用いることを特徴とする請求項1に
記載の固体電解コンデンサの製造方法。 (3)弁作用金属がアルミニウムまたはその合金である
ことを特徴とする請求項1または2に記載の固体電解コ
ンデンサの製造方法である。 本発明の方法において使用する弁作用金属とは、その酸
化物が電気絶縁体(誘電体)となる金属のことであっ
て、周期表の3族、4族及び5族金属を指し、例えばA
l、Ti、Zr、Hf、Ta、Nbなどであるが、特に
Alがコスト的に安価で又電解エッチング処理などによ
り表面積拡大が容易で高い静電容量が得られるなどの点
で好適に使用される。該金属の合金とは、Al−Ti、
Al−Zr、Al−Hf、Al−Ta、Al−Nb、な
どと、AlとTi、Zr、Hf、Ta、Nbの複数組合
せ合金などがある。また、ドナ−材とは、TCNQ錯体
において安定な対カチオンを与える物質であって、電子
供与物質が使用される。好適なドナ−材の例は、キノリ
ン、イソキノリン、インド−ル、キナゾリン、キノキサ
リン、カルバゾ−ル、アクリジン、フェナントリジン、
フェナジン、あるいはその誘導体の比較的沸点の高い芳
香族アミン類である。ドナ−材塩とは、ドナ−材の塩の
ことであり、4級塩及びプロトン酸塩の両者を包含す
る。ドナ−材の4級塩は、例えばドナ−材とハロゲン化
アルキルとの反応により調製される。ハロゲン化アルカ
リとしては、炭素数1〜16、特に1〜10の直鎖状ま
たは分枝鎖状アルキルの塩化物、臭化物または沃化物を
使用しうるが、特にアルミもしくはアルミ合金での含浸
に適し、反応が効率よく進行する点で、沃化物が望まし
い。また、ドナ−材の4級化塩の対イオンとして、ハロ
ゲンイオン以外に、硫酸イオン、スルホン酸イオンも使
用しうる。また、ドナ−材のプロトン酸塩としては、塩
酸塩、臭化水素酸塩、硫酸塩、スルホン酸塩、燐酸塩、
硝酸塩などが挙げられる。As a concrete means of the present invention, (1) a valve action metal or an alloy of the metal having a surface having an enlarged anode electrode and an anodic oxide film on the surface, and a solid In a method for manufacturing a solid electrolytic capacitor using a TCNQ complex as an electrolyte, the anode electrode is immersed in a solution of TCNQ and a donor salt, and a TCNQ complex is produced and deposited on the anode electrode by an anodic electrolysis reaction. A method for manufacturing a solid electrolytic capacitor, characterized in that the solid electrolytic capacitor is impregnated therewith. (2) The method for producing a solid electrolytic capacitor according to claim 1, wherein a supporting electrolyte is used. (3) The method for producing a solid electrolytic capacitor according to claim 1 or 2, wherein the valve action metal is aluminum or its alloy. The valve action metal used in the method of the present invention is a metal whose oxide serves as an electrical insulator (dielectric) and refers to Group 3, Group 4 and Group 5 metals of the periodic table, for example, A
1, Ti, Zr, Hf, Ta, Nb, etc., but Al is particularly preferably used because it is inexpensive in cost, the surface area can be easily expanded by electrolytic etching, and a high capacitance can be obtained. It The metal alloy is Al-Ti,
There are Al-Zr, Al-Hf, Al-Ta, Al-Nb, and the like, and a plurality of combination alloys of Al and Ti, Zr, Hf, Ta, and Nb. The donor material is a substance that gives a stable counter cation in the TCNQ complex, and an electron donating substance is used. Examples of suitable donor materials are quinoline, isoquinoline, indol, quinazoline, quinoxaline, carbazol, acridine, phenanthridine,
Phenazine or its derivative is an aromatic amine having a relatively high boiling point. The donor material salt is a salt of the donor material, and includes both a quaternary salt and a proton acid salt. The quaternary salt of the donor material is prepared, for example, by reacting the donor material with an alkyl halide. As the alkali halide, a straight-chain or branched-chain alkyl chloride, bromide or iodide having 1 to 16 carbon atoms, particularly 1 to 10 carbon atoms can be used, but is particularly suitable for impregnation with aluminum or an aluminum alloy. Iodide is preferable because the reaction proceeds efficiently. Further, as the counter ion of the quaternized salt of the donor material, a sulfate ion or a sulfonate ion may be used in addition to the halogen ion. Further, as the proton acid salt of the donor material, hydrochloride, hydrobromide, sulfate, sulfonate, phosphate,
Examples include nitrates.
【0009】本発明の基本的な考えは、液状のTCNQ
錯体原料を用いて電着法によりコンデンサの陽極用電極
上に固体のTCNQ錯体を析出させることにより、TC
NQ錯体を該電極に効率よく含浸させることにある。19
70年代後半より有機電気化学の著しい発展は、様々な分
野に多大な貢献をしているが、本発明もこうした背景よ
り見いだされたものである。即ち有機電解では、電解溶
液−支持電解質−電極の組合せ選択により活性反応種の
反応制御が可能になってきたからである。TCNQ錯体
の電極生成反応はTCNQの電解酸化でのラジカル生成
とドナ−材との有機合成反応との抱き合わせによって起
こると考えた。そこで本発明者は各種検討を繰り返し電
極上で導電性錯体が生成できる条件を見いだすに至っ
た。The basic idea of the present invention is that liquid TCNQ is used.
By using the complex raw material to deposit a solid TCNQ complex on the anode electrode of the capacitor by the electrodeposition method, TC
The purpose is to efficiently impregnate the electrode with the NQ complex. 19
The remarkable development of organic electrochemistry since the latter half of the 1970s has greatly contributed to various fields, and the present invention was also found out from such a background. That is, in organic electrolysis, it has become possible to control the reaction of active reactive species by selecting the combination of electrolytic solution-supporting electrolyte-electrode. It was considered that the electrode formation reaction of the TCNQ complex was caused by the conjugation of the radical formation in the electrolytic oxidation of TCNQ and the organic synthesis reaction with the donor material. Therefore, the present inventor repeated various studies and found conditions under which the conductive complex can be formed on the electrode.
【0010】即ち、陽極用電極として例えばエッチング
処理で表面が拡大され、該表面に酸化皮膜の誘電体皮膜
が形成された弁作用金属からなるものを用い、電極での
電子移動過程での挙動に着目しながら、TCNQ錯体生
成反応が生起する条件を探索した。その結果、上記のよ
うに、TCNQとドナ−材塩との溶液に該陽極用電極を
浸漬し、アノ−ド電解反応により、TCNQ錯体を該電
極上に析出させることにより良好なものが得られること
が判明した。この際、溶媒としては、TCNQ及びドナ
−材塩の比較的溶け易いものが好ましく、特に塩化メチ
レン、アセトニトリルなどの使用が好ましい。この反応
の実施にあたっては、支持電解質を用いることが望まし
く、好適な支持電解質としては、パラトルエンスルホン
酸などを例示しうる。That is, as the anode electrode, for example, a valve action metal whose surface is enlarged by an etching treatment and a dielectric film of an oxide film is formed on the surface is used, and the behavior in the electron transfer process at the electrode is While paying attention, the conditions under which the TCNQ complex formation reaction occurs were searched. As a result, as described above, a good product can be obtained by immersing the anode electrode in a solution of TCNQ and a donor salt and depositing a TCNQ complex on the electrode by an anodic electrolytic reaction. It has been found. At this time, as the solvent, those in which TCNQ and the donor material salt are relatively soluble are preferable, and methylene chloride, acetonitrile and the like are particularly preferably used. In carrying out this reaction, it is desirable to use a supporting electrolyte, and a suitable supporting electrolyte may be paratoluene sulfonic acid.
【0011】[0011]
【実施例1】以下、本発明の具体的実施例について述べ
る。厚さ90μmの高純度アルミニウム箔(純度99.99%)
を交流により電解エッチングを行い、約80倍に拡大され
た表面積を有する電極箔を作製し、中性燐酸溶液にて20
V化成を行い、誘電体皮膜を形成させた。(電極A)EXAMPLE 1 Specific examples of the present invention will be described below. High-purity aluminum foil with a thickness of 90 μm (purity 99.99%)
Electrolytic etching is performed by alternating current to prepare an electrode foil with a surface area that is about 80 times larger.
V formation was performed to form a dielectric film. (Electrode A)
【0012】上記電極を、ノルマルオクチルキノリン+
沃化物と過剰のTCNQ及びパラトルエンスルホン酸と
を塩化メチレンに溶かした溶液中に浸漬させ、電流5m
Aで5時間定電流アノ−ド反応をおこなわせた。次いで
乾燥させた後コロイダルカ−ボンを塗布形成し、さらに
銀ペ−ストで陰極リ−ドを取り出しエポキシ樹脂で外装
し、10V33μFの固体電解コンデンサを作製した。
また比較のため、現在行なわれている融解含浸法も行い
特性調査を行なった。[0012] The above electrode, normal octyl quinoline +
The iodide and excess TCNQ and paratoluenesulfonic acid were dipped in a solution of methylene chloride to obtain a current of 5 m.
A constant current anodic reaction was carried out at A for 5 hours. Then, after being dried, colloidal carbon was applied and formed, and the cathode lead was taken out with a silver paste and was covered with an epoxy resin to prepare a 10V 33 μF solid electrolytic capacitor.
For comparison, the melting impregnation method that is currently used was also conducted to investigate the characteristics.
【0013】[0013]
【実施例2】厚さ40μmのAl90Zr10合金箔を超急冷
法により作製し、芯材として99.99%アルミ箔70μm厚み
のものを用い、三層クラッド電極箔を作製した。その後
電解エッチングを行い、CV積として約4000μFV/cm
2 を有する電極箔とし、中性燐酸溶液にて20V化成を行
い、誘電体皮膜を形成させた。(電極B)Example 2 An Al90Zr10 alloy foil having a thickness of 40 μm was produced by a super-quenching method, and a 99.99% aluminum foil having a thickness of 70 μm was used as a core material to produce a three-layer clad electrode foil. After that, electrolytic etching is performed to obtain a CV product of about 4000 μFV / cm.
The electrode foil having No. 2 was used, and a 20 V chemical conversion was performed with a neutral phosphoric acid solution to form a dielectric film. (Electrode B)
【0014】上記電極を、Nメチル1,10オルトフェ
ナントロリン+ 沃化物と過剰のTCNQ及びパラトルエ
ンスルホン酸とを塩化メチレンに溶かした溶液中に浸漬
させ、電流10mAで5時間定電流アノ−ド反応をおこ
なわせた。次いで乾燥させた後コロイダルカ−ボンを塗
布形成し、さらに銀ペ−ストで その後コロイダルカ−
ボンを塗布形成し、さらに銀ペ−ストで陰極リ−ドを取
り出しエポキシ樹脂で外装し、10V100μFの固体
電解コンデンサを作製した。また比較のため、現在行な
われている融解含浸法も行い特性調査を行なった。The above electrode was immersed in a solution of N-methyl 1,10 orthophenanthroline + iodide, excess TCNQ and paratoluenesulfonic acid dissolved in methylene chloride, and a constant current anodic reaction was performed at a current of 10 mA for 5 hours. Was done. Next, it is dried and coated with colloidal carbon, and then silver paste is used to colloidal carbon.
Carbon was applied and formed, and then the cathode lead was taken out with a silver paste, and was packaged with an epoxy resin to prepare a 10V 100 μF solid electrolytic capacitor. For comparison, the melting impregnation method that is currently used was also conducted to investigate the characteristics.
【0015】実施例1の結果を表1に、実施例2の結果
を表2にそれぞれ示した。The results of Example 1 are shown in Table 1, and the results of Example 2 are shown in Table 2.
【0016】[0016]
【表1】 [Table 1]
【0017】[0017]
【表2】 [Table 2]
【0018】[0018]
【発明の効果】表1、表2に示したように、本発明によ
って処理された製品はtanδの改良に加え、静電容量
の増大に見られるように含浸性も向上されている。また
従来の融解含浸法と比較しても良い特性を示している。
また従来の融解含浸法では不可能であった融点を持たな
いTCNQ錯体でも含浸が可能となり、工業的かつ実用
的価値大なるものである。As shown in Tables 1 and 2, in addition to the improvement of tan δ, the products treated according to the present invention have an improved impregnation property as seen in the increase of capacitance. Also, it shows good characteristics as compared with the conventional melt impregnation method.
Further, it is possible to impregnate a TCNQ complex having no melting point, which is impossible with the conventional melt impregnation method, which is of great industrial and practical value.
Claims (3)
に陽極酸化皮膜を有する弁作用金属もしくは該金属の合
金よりなると共に固体電解質としてTCNQ錯体を用い
る固体電解コンデンサの製造方法において、TCNQと
ドナ−材塩との溶液に該陽極用電極を浸漬し、アノ−ド
電解反応によりTCNQ錯体を陽極用電極上に生成、析
出させることにより含浸させることを特徴とする固体電
解コンデンサの製造方法。1. A method for producing a solid electrolytic capacitor comprising a valve-action metal or an alloy of the metal having an anodized film on an enlarged surface of the anode electrode and an anodized film on the surface and using a TCNQ complex as a solid electrolyte, wherein TCNQ and A method for producing a solid electrolytic capacitor, characterized in that the anode electrode is immersed in a solution with a donor material salt, and the TCNQ complex is generated and precipitated on the anode electrode by an anodic electrolysis reaction to impregnate the electrode with the TCNQ complex.
求項1に記載の固体電解コンデンサの製造方法。2. The method for producing a solid electrolytic capacitor according to claim 1, wherein a supporting electrolyte is used.
金であることを特徴とする請求項1または2に記載の固
体電解コンデンサの製造方法。3. The method for producing a solid electrolytic capacitor according to claim 1, wherein the valve action metal is aluminum or its alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21582891A JP3221889B2 (en) | 1991-07-31 | 1991-07-31 | Method for manufacturing solid electrolytic capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21582891A JP3221889B2 (en) | 1991-07-31 | 1991-07-31 | Method for manufacturing solid electrolytic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0620876A true JPH0620876A (en) | 1994-01-28 |
| JP3221889B2 JP3221889B2 (en) | 2001-10-22 |
Family
ID=16678938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21582891A Expired - Fee Related JP3221889B2 (en) | 1991-07-31 | 1991-07-31 | Method for manufacturing solid electrolytic capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3221889B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5647647A (en) * | 1994-08-24 | 1997-07-15 | Sumitomo Electric Industries, Ltd. | Deceleration control device for vehicle |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102450645B1 (en) | 2022-04-08 | 2022-10-06 | 주식회사 알바트레이스 | Ultra-small Wavelength-variable Liquid Crystal Etherone Filter for Minimizing Damage in the Manufacturing Process, Light Source and Optical Transceiver Including the Same |
-
1991
- 1991-07-31 JP JP21582891A patent/JP3221889B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5647647A (en) * | 1994-08-24 | 1997-07-15 | Sumitomo Electric Industries, Ltd. | Deceleration control device for vehicle |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3221889B2 (en) | 2001-10-22 |
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