JPH0374663U

JPH0374663U -

Info

Publication number: JPH0374663U
Application number: JP13606789U
Authority: JP
Priority date: 1989-11-27
Filing date: 1989-11-27
Publication date: 1991-07-26

Description

[Brief explanation of drawings]

第１図は本考案の一実施例に係るプラズマＣＶ
Ｄ装置の電極構造を示す図、第２図は第１図に示
す電極構造の斜視図、第３図は第１図並びに第２
図に示す電極構造を持つプラズマＣＶＤ装置の構
成を示す図、第４図は従来のプラズマＣＶＤ装置
の電極構造を示す図に、第５図は基板がセツトさ
れない側の改良された従来の電極を示す図である
。１１……平板電極（第１の電極）、１２……い
かだ状電極（第２の電極）、１３……基板、１４
……材料ガス、１５……プラズマ電源、１６……
真空チヤンバー、１７……ガス導入口、１８……
ヒータ、１９……プラズマ。 FIG. 1 shows a plasma CV according to an embodiment of the present invention.
2 is a perspective view of the electrode structure shown in FIG. 1, and FIG. 3 is a diagram showing the electrode structure of the device D.
4 is a diagram showing the configuration of a plasma CVD apparatus having the electrode structure shown in FIG. 4. FIG. 4 is a diagram showing the electrode structure of a conventional plasma CVD apparatus. FIG. FIG. 11... Flat plate electrode (first electrode), 12... Raft-shaped electrode (second electrode), 13... Substrate, 14
...Material gas, 15...Plasma power supply, 16...
Vacuum chamber, 17... Gas inlet, 18...
Heater, 19...Plasma.

Claims

[Scope of utility model registration request]

The first stage is where the substrate on which the thin film is to be formed is set.
and a second electrode provided parallel to and spaced apart from the first electrode, the plasma is generated between the first and second electrodes, and the material is discharged from the back side of the second electrode. plasma C, which is provided for forming a thin film on the substrate by introducing a gas;
In the electrode structure of the VD device, the second electrode has a raft-like structure in which a large number of elongated electrode pieces are arranged in parallel at intervals.
Electrode structure of VD device.