JPH041066B2 - - Google Patents

Info

Publication number: JPH041066B2
Authority: JP; Japan
Prior art keywords: film; sputtering; etching; oxide film; bias voltage
Prior art date: 1986-06-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP12877886A

Other languages

English (en)

Japanese (ja)

Other versions

JPS62284067A (ja

Inventor

Toshiaki Wada

Yoshiaki Katsuyama

Yasuteru Kakimoto

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Proterial Ltd

Original Assignee

Sumitomo Special Metals Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-06-02

Filing date

1986-06-02

Publication date

1992-01-09

1986-06-02 Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd

1986-06-02 Priority to JP12877886A priority Critical patent/JPS62284067A/ja

1987-12-09 Publication of JPS62284067A publication Critical patent/JPS62284067A/ja

1992-01-09 Publication of JPH041066B2 publication Critical patent/JPH041066B2/ja

Status Granted legal-status Critical Current

Links

238000004544 sputter deposition Methods 0.000 claims description 23
229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 21
239000000758 substrate Substances 0.000 claims description 13
238000000034 method Methods 0.000 claims description 10
229910004298 SiO 2 Inorganic materials 0.000 claims description 9
230000003247 decreasing effect Effects 0.000 claims description 4
239000010408 film Substances 0.000 description 45
238000005530 etching Methods 0.000 description 22
238000003486 chemical etching Methods 0.000 description 5
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
239000010409 thin film Substances 0.000 description 4
239000002253 acid Substances 0.000 description 3
239000000919 ceramic Substances 0.000 description 3
239000011248 coating agent Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
238000007796 conventional method Methods 0.000 description 3
230000007423 decrease Effects 0.000 description 3
229910000147 aluminium phosphate Inorganic materials 0.000 description 2
230000010354 integration Effects 0.000 description 2
230000001681 protective effect Effects 0.000 description 2
238000000151 deposition Methods 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
239000002184 metal Substances 0.000 description 1
238000000059 patterning Methods 0.000 description 1
230000007261 regionalization Effects 0.000 description 1

Landscapes

Physical Vapour Deposition (AREA)

JP12877886A 1986-06-02 1986-06-02 酸化物被膜の形成方法 Granted JPS62284067A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP12877886A JPS62284067A (ja)	1986-06-02	1986-06-02	酸化物被膜の形成方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP12877886A JPS62284067A (ja)	1986-06-02	1986-06-02	酸化物被膜の形成方法

Publications (2)

Publication Number	Publication Date
JPS62284067A JPS62284067A (ja)	1987-12-09
JPH041066B2 true JPH041066B2 (2)	1992-01-09

Family

ID=14993231

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP12877886A Granted JPS62284067A (ja)	1986-06-02	1986-06-02	酸化物被膜の形成方法

Country Status (1)

Country	Link
JP (1)	JPS62284067A (2)

1986
- 1986-06-02 JP JP12877886A patent/JPS62284067A/ja active Granted

Also Published As

Publication number	Publication date
JPS62284067A (ja)	1987-12-09

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Legal Events

Date	Code	Title	Description
2004-07-01	S533	Written request for registration of change of name	Free format text: JAPANESE INTERMEDIATE CODE: R313533
2004-07-09	R350	Written notification of registration of transfer	Free format text: JAPANESE INTERMEDIATE CODE: R350
2006-06-02	EXPY	Cancellation because of completion of term