JPH04162017A - Manufacture of liquid crystal element - Google Patents

Manufacture of liquid crystal element

Info

Publication number
JPH04162017A
JPH04162017A JP2288690A JP28869090A JPH04162017A JP H04162017 A JPH04162017 A JP H04162017A JP 2288690 A JP2288690 A JP 2288690A JP 28869090 A JP28869090 A JP 28869090A JP H04162017 A JPH04162017 A JP H04162017A
Authority
JP
Japan
Prior art keywords
resist
layer
transparent
black
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2288690A
Other languages
Japanese (ja)
Inventor
Masatoshi Kudo
眞壽 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2288690A priority Critical patent/JPH04162017A/en
Publication of JPH04162017A publication Critical patent/JPH04162017A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To provide a liquid crystal element manufacturing process with which black stripes with high dimensional accuracy are formed with a smaller number of processes, by putting an organic substance layer on a transparent base and further thereover a transparent electroconductive layer, forming a resist over this transparent electroconductive layer, removing the organic substance layer and transparent electroconductive layer situated in voids in the resist, forming recess in the organic substance layer in transparent electrode pattern voids and the pattern itself, applying a black coating, and removing the resist. CONSTITUTION:First a transparent base 1 is coated with sublimative UV hardening resin over the whole surface, and an organic substance layer 2 is formed. As a transparent electroconductive film 3, ITO film is formed on this organic substance layer 2. Then photo-resist is coated over the transparent electroconductive film 3, followed by light exposure and development, and thus resist 4 is formed. This is subjected to ethanol gas plasma processing, and the film 3 and layer 2 in the part not masked with the resist 4 are removed. As a black dye 5, a black ink including carbon black is coated, and when this is upon drying immersed in water solution of hydrogen peroxide, the resist 4 swells with moistening and separates off together with the coating, while the remaining part forms black stripes 6. This is used as the base board, and a liquid crystal element is achieved.

Description

【発明の詳細な説明】 産業上の利用分野 本発明(よ 液晶表示装置に用いられる液晶素子の製造
方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a liquid crystal element used in a liquid crystal display device.

従来の技術 液晶表示装置で番ヨ  表示コントラストを高めるため
に その液晶素子に用いられる基板の透明電極パターン
の間隙部にブラックストライプが設けられる。
In order to enhance display contrast in conventional liquid crystal display devices, black stripes are provided in gaps between transparent electrode patterns on a substrate used in the liquid crystal element.

以下図面を参照しながら従来の液晶素子の製造方法の一
例について説明する。
An example of a conventional method for manufacturing a liquid crystal element will be described below with reference to the drawings.

第3図は 従来の液晶素子の透明電極及びブラックスト
ライプの形成方法を示す工程説明図である。
FIG. 3 is a process explanatory diagram showing a conventional method for forming transparent electrodes and black stripes in a liquid crystal element.

第3図(A)に示すように 透明基体21上に透明導電
膜22を設けも 次に導電膜22上にフォトレジストを
塗布したの板 透明電極用フォトマスク24を用いてフ
ォトレジスト23を露光現像して、第3図(B)に示す
ように所定のパターンのレジスト23を形成する。
As shown in FIG. 3(A), a transparent conductive film 22 is provided on a transparent substrate 21. Next, a photoresist is coated on the conductive film 22, and a photoresist 23 is exposed using a transparent electrode photomask 24. By developing, a resist 23 having a predetermined pattern is formed as shown in FIG. 3(B).

次に第3図(C)に示すように レジスト23の間隙部
の透明導電膜を塩酸などによりエツチングしたの敷 第
3図(D)に示すようにレジスト23を除去することに
より、所定のパターンの透明電極25を形成する。
Next, as shown in FIG. 3(C), the transparent conductive film in the gap between the resists 23 is etched with hydrochloric acid, etc., and the resist 23 is removed as shown in FIG. 3(D) to form a predetermined pattern. A transparent electrode 25 is formed.

次に第3図(E)に示すように染色性感光性樹脂26を
透明基体21上に塗布する。
Next, as shown in FIG. 3(E), a dyeable photosensitive resin 26 is applied onto the transparent substrate 21.

次に第3図(F)に示すように ブラックストライプ用
フォトマスク27を用いて前記染色性感光性樹脂26を
露光し 現像することによって所定のストライプパター
ンの染色性感光性樹脂26を形成すも 次に第3図(G)に示すように 所定のストライブパタ
ーンの前記染色性感光性樹脂26を染料分散液等で染色
することによりブラックストライプ28を形成してい連 また印刷などの手段によって直接、透明基体上に形成す
る手段も用いられてい九 発明が解決しようとする課題 しかしながら染色法で(よ ブラックストライプの寸法
精度は出せる力(工程が煩雑となり、コストも高くな4 一方印刷法は低コストである力丈 寸法精度が低いとい
う課題があっt島 本発明は上記課題に鑑へ 少ない工程数で寸法精度の高
いブラックストライプを形成できる液晶素子の製造方法
を提供するものであム 課題を解決するための手段 上記課題を解決するために本発明の液晶素子の製造方法
で(よ 透明基体上に有機物層を設け、前記有機物層上
に透明導電層を設け、前記透明導電層上に所定のパター
ンのレジストを形成し プラズマ処理により前記レジス
トの間隙部の透明導電層と有機物層を除去することによ
り、透明電極パターンの形成と前記透明電極パターン間
隙部の有機物層における凹部の形成とを行い、 次に黒
色塗料を塗布し前記レジストを除去することにより、前
記凹部にブラックストライプを形成する。
Next, as shown in FIG. 3(F), the dyeable photosensitive resin 26 is exposed and developed using a black stripe photomask 27 to form the dyeable photosensitive resin 26 in a predetermined stripe pattern. Next, as shown in FIG. 3(G), black stripes 28 are formed by dyeing the dyeable photosensitive resin 26 in a predetermined stripe pattern with a dye dispersion or the like, and directly by printing or other means. However, the dyeing method cannot achieve the dimensional accuracy of the black stripes (the process is complicated and the cost is high).4 On the other hand, the printing method has a low cost. In view of the above problems, the present invention provides a method for manufacturing a liquid crystal element that can form black stripes with high dimensional accuracy in a small number of steps. Means for Solving the above problems In the method for manufacturing a liquid crystal element of the present invention, an organic layer is provided on a transparent substrate, a transparent conductive layer is provided on the organic layer, and a predetermined layer is formed on the transparent conductive layer. forming a patterned resist and removing the transparent conductive layer and the organic layer in the gap between the resist by plasma treatment, thereby forming a transparent electrode pattern and forming a recess in the organic layer in the gap between the transparent electrode patterns; Next, black stripes are formed in the recesses by applying black paint and removing the resist.

作用 透明基体上に有機物層を設け、前記有機物層上に透明導
電層を設ζす、前記透明導電層上に所定のパターンのレ
ジストを形成し プラズマ処理により前記レジストの間
隙部の透明導電層と有機物層を除去することにより、透
明電極パターンの形成と前記透明電極パターン間隙部の
有機物層における凹部の形成とを行い、 次に黒色塗料
を塗布し前記レジストを除去することにより、前記凹部
にブラックストライプを形成するた敢 ブラックストラ
イプ形成のためのフォトリソ工程を必要とせず、透明導
電層と有機物層を連続して除去することとレジスト上に
黒色塗料を塗布し レジスト除去と同時に不要部の黒色
塗料を除去することにより、工程数が少なくなり、また
透明電極との位置合わせが不要で寸法精度の高いブラッ
クストライプが形成されも 実施例 以下本発明の一実施例の液晶素子の製造方法について、
図面を参照しながら説明する。
An organic material layer is provided on a transparent substrate, a transparent conductive layer is provided on the organic material layer, a resist having a predetermined pattern is formed on the transparent conductive layer, and the transparent conductive layer in the gap between the resist and the transparent conductive layer are formed by plasma treatment. By removing the organic material layer, a transparent electrode pattern is formed and a recess is formed in the organic material layer in the gap between the transparent electrode patterns. Next, black paint is applied and the resist is removed to form a black in the recess. The challenge of forming stripes: Without the need for a photolithography process to form black stripes, the transparent conductive layer and the organic layer are successively removed, and the black paint is applied on the resist, and the black paint is applied to unnecessary areas at the same time as the resist is removed. By removing , the number of steps is reduced, and black stripes with high dimensional accuracy are formed without alignment with transparent electrodes.
This will be explained with reference to the drawings.

第1図は本発明の液晶素子の製造方法の第1の実施例を
示す工程説明図である。
FIG. 1 is a process explanatory diagram showing a first embodiment of the method for manufacturing a liquid crystal element of the present invention.

まず第1図(A)に示すように 透明基体1に有機物層
2を形成する。本実施例で1表 有機物層2として、昇
華性紫外線硬化樹脂をスピンコードなどの方法で全面に
塗布した 次に第1図(B)に示すように透明導電膜3を層2上に
成膜すム 透明導電膜3として(よ ITo(インジウ
ム・錫酸化物)をスパッタ法で成膜し九 次にフォトレジストを導電!!3上に塗布したのぢ そ
の露光 現像を行い、 第1図(C)に示すように所定
のパターンのレジスト4を形成する。
First, as shown in FIG. 1(A), an organic layer 2 is formed on a transparent substrate 1. In this example, as the organic layer 2, a sublimable ultraviolet curing resin was applied to the entire surface by a method such as a spin code, and then a transparent conductive film 3 was formed on the layer 2 as shown in FIG. 1(B). As a transparent conductive film 3, ITo (indium tin oxide) was formed by sputtering, and a photoresist was coated on the conductive film 3. The photoresist was exposed and developed. A resist 4 having a predetermined pattern is formed as shown in C).

次に平行平板型ドライエツチング装置を用いて、エタノ
ールガスプラズマ処理を行うと、第1図(D)に示すよ
うにレジスト4でマスクされていない部分の透明導電膜
3と有機物層2とが除去されも 本実施例では 高周波電力2kW、エタノールガス圧1
0mTo r rで30分間処理したところ透明導電膜
3と有機物層2は深さ1.5μm除去され九 またレジ
スト4(友 はとんど変化しなかった なおIToは有
機金属となって除去される。
Next, when ethanol gas plasma treatment is performed using a parallel plate type dry etching device, the transparent conductive film 3 and the organic layer 2 are removed from the portions not masked by the resist 4, as shown in FIG. 1(D). However, in this example, the high frequency power is 2 kW, the ethanol gas pressure is 1
When treated at 0 mTorr for 30 minutes, the transparent conductive film 3 and the organic layer 2 were removed to a depth of 1.5 μm, and the resist 4 (resist 4 did not change at all), and the ITo was removed as an organic metal. .

次に第1図(E)に示すように黒色塗料5を塗布する。Next, as shown in FIG. 1(E), black paint 5 is applied.

黒色塗料5としてカーボンブラックを含む黒色インクを
使っ九 黒色塗料5が乾燥後、過酸化水素水中に浸すと
、レジスト4が膨潤し その上に塗られた黒色塗料と共
に脱落し 第1図(F)に示すよう(ミ 残った部分で
ブラックストライプ6が形成され通 その後、第1図(F)の基板を上側基板と下側基板に用
いて、第1図(G)に示す液晶素子が得られも すなわ板 第1図(F)の基板上にポリイミド膜を塗布
しラビング処理を行った後、上側基板と下側基板を、そ
のブラックストライプが互いに直交するようく かつ側
基板を所望の間隙を保ち並置しすム そして、側基板間
に液晶を注入してえ液晶素子が完成される。
A black ink containing carbon black is used as the black paint 5. When the black paint 5 dries and is immersed in hydrogen peroxide, the resist 4 swells and falls off together with the black paint applied on top of it. Figure 1 (F) As shown in (Mi) After the black stripe 6 is formed in the remaining portion, the liquid crystal element shown in FIG. 1(G) is obtained by using the substrates shown in FIG. 1(F) as the upper and lower substrates. After coating the polyimide film on the substrate shown in Figure 1 (F) and performing a rubbing process, the upper and lower substrates are arranged so that their black stripes are perpendicular to each other, and the side substrates are spaced at a desired distance. Then, liquid crystal is injected between the side substrates to complete the liquid crystal element.

この様にして得られた本実施例の液晶素子の特性(表 
コントラストの高い良好なものであった第2図は本発明
の第2の実施例で得られた液晶素子の構成図である。
Characteristics of the liquid crystal element of this example obtained in this way (Table 1)
FIG. 2, which showed good contrast and high contrast, is a structural diagram of a liquid crystal element obtained in a second embodiment of the present invention.

上側基板において、印刷法により形成されたカラーフィ
ルタ10と透明基体1とからなるカラーフィルタ基板上
に有機物層2を形成する以外は第1の実施例と同様にし
て、第2図に示すようなカラーの液晶素子が得られる。
In the upper substrate, the organic layer 2 was formed in the same manner as in the first embodiment except that an organic layer 2 was formed on a color filter substrate consisting of a color filter 10 formed by a printing method and a transparent substrate 1, as shown in FIG. A color liquid crystal element is obtained.

以上のように透明基体上に有機物層を設け、前記有機物
層上に透明導電層を設け、前記透明導電層上に所定のパ
ターンのレジストを形成し プラズマ処理により前記レ
ジストの間隙部の透明導電層と有機物層を除去すること
により、透明電極パターンの形成と前記透明電極パター
ン間隙部の有機物層における凹部の形成とを行い、 次
に黒色塗料を塗布し前記レジストを除去することにより
、前記凹部にブラックストライプを形成するたム少ない
工程数で寸法精度の高いブラックストライプを形成する
ことができも またカーボンブラックを使用できるため
遮光性にもすぐれ 基板表面の平坦性も良く、高い表示
特性を有する液晶素子を提供することかできる。
As described above, an organic layer is provided on a transparent substrate, a transparent conductive layer is provided on the organic layer, a resist with a predetermined pattern is formed on the transparent conductive layer, and a transparent conductive layer is formed in the gaps between the resists by plasma treatment. By removing the organic material layer, a transparent electrode pattern is formed and a recess is formed in the organic material layer in the gap between the transparent electrode patterns.Next, black paint is applied and the resist is removed to form a recess in the recess. It is possible to form a black stripe with high dimensional accuracy with a small number of steps to form a black stripe.Also, since carbon black can be used, it has excellent light shielding properties.The substrate surface has good flatness, and a liquid crystal display with high display characteristics. It is possible to provide the elements.

また第2の実施例によれは カラーの液晶素子を提供す
ることができも この場合 有機物層2を形成すること
により、カラーフィルタの平坦性を向上させることもで
きも 発明の効果 以上のように本発明(よ 透明基体上に有機物層を設け
、前記有機物層上に透明導電層を設け、前記透明導電層
上に所定のパターンのレジストを形成し プラズマ処理
により前記レジストの間隙部の透明導電層と有機物層を
除去することにより、透明電極パターンの形成と前記透
明電極パターン間隙部の有機物層における凹部の形成と
を行し\次に黒色塗料を塗布し前記レジストを除去する
ことにより、前記凹部にブラックストライプを形成する
た八 少ない工程数で寸法精度の高いブラックストライ
プを形成することができる。
Further, according to the second embodiment, it is possible to provide a color liquid crystal element, but in this case, by forming the organic layer 2, the flatness of the color filter can be improved. According to the present invention, an organic layer is provided on a transparent substrate, a transparent conductive layer is provided on the organic layer, a resist with a predetermined pattern is formed on the transparent conductive layer, and the transparent conductive layer is formed in the gap between the resists by plasma treatment. By removing the organic material layer, a transparent electrode pattern is formed, and a recess is formed in the organic material layer in the gap between the transparent electrode patterns.Next, by applying black paint and removing the resist, the recess is formed. 8. Black stripes with high dimensional accuracy can be formed with a small number of steps.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の液晶素子の製造方法の第1の実施例の
工程説明図 第2図は本発明の第2の実施例で得られた
液晶素子の構成図 第3図は従来の液晶素子の製造方法
の工程説明図である。 1・・・透明基#、、 2・・・有機物層 3・・・透
明導電層4・・・レジスト、 5・・・黒色塗料 6・
・・ブラックストライス 代理人の氏名 弁理士 小鍜治 明 ほか2名l0−−
− カ  ラ  −  ]  ィ  ル タV?+rz bで鯉!家、盛 枠5需凶(Hい鹸曹冑 S   ε ≦?
FIG. 1 is an explanatory diagram of the process of the first embodiment of the method for manufacturing a liquid crystal device of the present invention. FIG. 2 is a diagram showing the configuration of a liquid crystal device obtained in the second embodiment of the present invention. FIG. FIG. 3 is a process explanatory diagram of a method for manufacturing an element. 1...Transparent group #, 2...Organic layer 3...Transparent conductive layer 4...Resist 5...Black paint 6.
...Name of Blackstrice's agent: Patent attorney Akira Okaji and 2 others l0--
- Kara - ] Irta V? Carp with +rz b! House, 5 slots are bad (H Kenso S ε ≦?

Claims (1)

【特許請求の範囲】[Claims] (1)透明基体上に有機物層を設け、前記有機物層上に
透明導電層を設け、前記透明導電層上に所定のパターン
のレジストを形成し、プラズマ処理により前記レジスト
の間隙部の透明導電層と有機物層を除去することにより
、透明電極パターンの形成と前記透明電極パターン間隙
部の有機物層における凹部の形成とを行い、次に黒色塗
料を塗布し前記レジストを除去することにより、前記凹
部にブラックストライプを形成する液晶素子の製造方法
(1) An organic layer is provided on a transparent substrate, a transparent conductive layer is provided on the organic layer, a resist with a predetermined pattern is formed on the transparent conductive layer, and the transparent conductive layer is formed in the gaps between the resists by plasma treatment. By removing the organic material layer, a transparent electrode pattern is formed and a recess is formed in the organic material layer in the gap between the transparent electrode patterns, and then a black paint is applied and the resist is removed to form a recess in the recess. A method for manufacturing a liquid crystal element that forms a black stripe.
JP2288690A 1990-10-26 1990-10-26 Manufacture of liquid crystal element Pending JPH04162017A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2288690A JPH04162017A (en) 1990-10-26 1990-10-26 Manufacture of liquid crystal element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2288690A JPH04162017A (en) 1990-10-26 1990-10-26 Manufacture of liquid crystal element

Publications (1)

Publication Number Publication Date
JPH04162017A true JPH04162017A (en) 1992-06-05

Family

ID=17733433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2288690A Pending JPH04162017A (en) 1990-10-26 1990-10-26 Manufacture of liquid crystal element

Country Status (1)

Country Link
JP (1) JPH04162017A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07333591A (en) * 1994-06-02 1995-12-22 Samsung Electron Devices Co Ltd Liquid crystal display device and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07333591A (en) * 1994-06-02 1995-12-22 Samsung Electron Devices Co Ltd Liquid crystal display device and manufacturing method thereof

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