JPH0444008A - Manufacturing method of liquid crystal element - Google Patents

Manufacturing method of liquid crystal element

Info

Publication number
JPH0444008A
JPH0444008A JP2153652A JP15365290A JPH0444008A JP H0444008 A JPH0444008 A JP H0444008A JP 2153652 A JP2153652 A JP 2153652A JP 15365290 A JP15365290 A JP 15365290A JP H0444008 A JPH0444008 A JP H0444008A
Authority
JP
Japan
Prior art keywords
black
transparent
liquid crystal
material layer
organic material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2153652A
Other languages
Japanese (ja)
Inventor
Masatoshi Kudo
眞壽 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2153652A priority Critical patent/JPH0444008A/en
Publication of JPH0444008A publication Critical patent/JPH0444008A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To decrease the man-hours and improve the dimension accuracy by forming a recessed part in the organic material layer in the gap part between transparent electrode patterns by a plasma process, applying a black paint, and removing the black paint on the transparent electrodes, and forming a black stripe in the recessed part. CONSTITUTION:The organic material layer 2 is provided on a transparent base body 1 and the transparent electrodes 6 are patterned and formed on the organic material layer 2. Then the recessed part is formed in the organic material layer 2 in the gap between the patterns of the transparent electrodes 6 by the plasma process. Then the black paint 7 is applied and the black paint on the transparent electrodes 6 are removed to form the black stripe 8 in the recessed part. The need for a photolithographic process for black stripe formation is eliminated and the need for positioning with transparent electrodes is also eliminated and the man-hours are reduced and the dimension accuracy is increased.

Description

【発明の詳細な説明】 産業上の利用分野 本発明41  液晶表示装置に用いられる液晶素子の製
造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Industrial Field of Application The present invention 41 relates to a method of manufacturing a liquid crystal element used in a liquid crystal display device.

従来の技術 液晶表示装置で(よ 表示コントラストを高めるため番
ミ  その液晶素子に用いられる基板の透明電極の間隙
部にブラックストライプが設けられる。
In conventional liquid crystal display devices (in order to increase display contrast), black stripes are provided in the gaps between transparent electrodes of the substrate used in the liquid crystal element.

以下図面を参照しながら従来の液晶素子の製造方法にお
けるブラックストライプの形成方法の一例について説明
する。
An example of a method for forming black stripes in a conventional method for manufacturing a liquid crystal device will be described below with reference to the drawings.

第3図(よ 従来の液晶素子の製造方法における透明電
極及びブラックストライプの形成方法を示す断面図であ
る。
FIG. 3 is a sectional view showing a method of forming transparent electrodes and black stripes in a conventional method of manufacturing a liquid crystal element.

第3図(A)に示すように 透明基体21上に透明導電
膜22を設ける。次にフォトレジストを塗布して、透明
電極用フォトマスク24を用いてその露光 現像を行し
\ 第3図(B)に示すように所定のパターンのレジス
ト23を形成する。
As shown in FIG. 3(A), a transparent conductive film 22 is provided on a transparent substrate 21. Next, a photoresist is applied and exposed and developed using a transparent electrode photomask 24 to form a resist 23 in a predetermined pattern as shown in FIG. 3(B).

次に第3図(C)に示すように レジスト23の間隙部
の透明導電膜を塩酸などによりエツチング除去し 第3
図(D)に示すようにレジスト23を除去することによ
り、所定のパターンの透明電極25を形成する。
Next, as shown in FIG. 3(C), the transparent conductive film in the gap between the resists 23 is removed by etching with hydrochloric acid or the like.
By removing the resist 23 as shown in Figure (D), a transparent electrode 25 having a predetermined pattern is formed.

次に第3図(E)に示すように染色性感光性樹脂26を
透明基体21上に塗布する。
Next, as shown in FIG. 3(E), a dyeable photosensitive resin 26 is applied onto the transparent substrate 21.

次に第3図(F)に示すように ブラックストライプ用
フォトマスク27を用いて前記染色性感光性樹脂26を
露光し 現像することによって所定のストライプパター
ンの染色性感光性樹脂26を形成する。
Next, as shown in FIG. 3(F), the dyeable photosensitive resin 26 is exposed and developed using a black stripe photomask 27, thereby forming the dyeable photosensitive resin 26 in a predetermined stripe pattern.

次に第3図(G)に示すようへ 所定のストライプパタ
ーンの前記染色性感光性樹脂26を染料分散液等で染色
することによりブラックストライプ28を形成していk また印刷などの手段によって直接、透明基体上に形成す
る手段も用いられていた 発明が解決しようとする課題 しかしながら染色法で(よ ブラックストライプの寸法
精度は出せる力(工程が煩雑となり、コストも高くなる
。一方印刷法は低コストである力丈寸法精度が低いとい
う課題があった 本発明は上記課題に鑑へ 少ない工程数で寸法精度の高
いブラックストライプを形成できる液晶素子の製造方法
を提供するものである。
Next, as shown in FIG. 3(G), black stripes 28 are formed by dyeing the dyeable photosensitive resin 26 in a predetermined stripe pattern with a dye dispersion or the like. However, the dimensional accuracy of the black stripes cannot be achieved with the dyeing method (the process is complicated and the cost is high; on the other hand, the printing method is low cost). In view of the above problem, the present invention provides a method for manufacturing a liquid crystal element that can form black stripes with high dimensional accuracy in a small number of steps.

課題を解決するための手段 上記課題を解決するために本発明の液晶素子の製造方法
で(よ 透明基体上に有機物層を設け、前記有機物層上
に透明電極をパターン形成L プラズマ処理により前記
透明電極パターン間隙部の有機物層に凹部を形成し 次
に黒色塗料を塗布し前記透明電極上の黒色塗料を除去す
ることにより、前記四部にブラックストライプを形成す
る。
Means for Solving the Problems In order to solve the above problems, the method for manufacturing a liquid crystal element of the present invention includes: providing an organic layer on a transparent substrate, patterning a transparent electrode on the organic layer; Concave portions are formed in the organic layer in the gaps between the electrode patterns, and then black paint is applied and the black paint on the transparent electrodes is removed to form black stripes in the four portions.

プラズマ処理に使用する気体としては 酸秦窒秦 アル
ゴン等が上げられる力(透明電極に損傷を与えず有機物
層を除去するにC訳  酸素を使用することが望ましい
Gases used for plasma treatment include oxygen, nitrogen, argon, etc. (oxygen is preferably used to remove the organic layer without damaging the transparent electrode).

作用 透明基体上に有機物層を設け、前記有機物層上に透明電
極をパターン形成し プラズマ処理により前記透明電極
パターン間隙部の有機物層に凹部を形成し 次に黒色塗
料を塗布し前記透明電極上の黒色塗料を除去することに
より、前記凹部にブラックストライプを形成するた敢 
ブラックストライプ形成のためのフォトリソ工程を必要
とせず、工程数が少なくなり、かつ透明電極との位置合
わぜが不要で寸法精度の高いブラックストライプが形成
される。
An organic material layer is provided on a working transparent substrate, a transparent electrode is patterned on the organic material layer, a recess is formed in the organic material layer in the gap between the transparent electrode patterns by plasma treatment, and then a black paint is applied and a transparent electrode is formed on the transparent electrode. By removing the black paint, it is possible to form black stripes in the recesses.
A photolithography process for forming black stripes is not required, the number of steps is reduced, and alignment with transparent electrodes is not required, making it possible to form black stripes with high dimensional accuracy.

実施例 以下本発明の一実施例の液晶素子の製造方法について、
図面を参照しながら説明する。
Example Below, regarding a method for manufacturing a liquid crystal element according to an example of the present invention,
This will be explained with reference to the drawings.

第1図は本発明の液晶素子の製造方法の第1の実施例を
示す工程説明図である。
FIG. 1 is a process explanatory diagram showing a first embodiment of the method for manufacturing a liquid crystal element of the present invention.

まず第1図(A)に示すように 透明基体lに有機物層
2を形成する。本実施例では昇華性紫外線硬化樹脂をス
ピンコードなどの方法で全面に塗布しに 次に第1図(B)に示すように透明導電膜3を成膜する
。透明導電膜3として、 ITO(インジウム・錫酸化
物)をスパッタ法で成膜し九次にフォトレジストを塗布
 露光 現像を行((第1図(C)に示すように所定の
パターンのレジスト4を形成する。
First, as shown in FIG. 1(A), an organic layer 2 is formed on a transparent substrate 1. In this embodiment, a sublimable ultraviolet curing resin is applied to the entire surface by a method such as a spin code, and then a transparent conductive film 3 is formed as shown in FIG. 1(B). As the transparent conductive film 3, ITO (indium tin oxide) is formed by sputtering, and then a photoresist is applied, exposed, and developed (as shown in Figure 1 (C), a resist 4 of a predetermined pattern is formed. form.

次に第1図(D)に示すようにレジスト4の間隙部の透
明導電膜を塩酸などによりエツチングし第1図Eに示す
ように レジスト4を除去することにより所定のパター
ンの透明電極6を形成する。
Next, as shown in FIG. 1(D), the transparent conductive film in the gap between the resists 4 is etched with hydrochloric acid or the like, and as shown in FIG. 1E, the resist 4 is removed to form transparent electrodes 6 in a predetermined pattern. Form.

次に平行平板型ドライエツチング装置において酸素プラ
ズマ処理を行うことにより、第1図(F)に示すように
透明電極5でマスクされていない部分の有機物層を除去
し 凹部を形成する。高周波電力1kW酸素ガス圧20
0mTorrで5分間処理したところ有機物層は深さ1
.6μm除去された 次に第1図(G)に示すように黒色塗料7を塗布する。
Next, oxygen plasma treatment is performed in a parallel plate type dry etching apparatus to remove the organic layer in the portions not masked by the transparent electrode 5 and form recesses, as shown in FIG. 1(F). High frequency power 1kW oxygen gas pressure 20
When treated at 0 mTorr for 5 minutes, the organic layer was 1 deep.
.. After removing 6 μm, black paint 7 is applied as shown in FIG. 1(G).

黒色塗料7としてゼラチンとカーボンを3:5の比で配
合したものを使った 次にドクターブレード等で透明電極5上の黒色塗料7を
掻き取ることにより、第1図(H)に示すよう置 凹部
にブラックストライプ8が形成された 第1図(I)の上側基板と下側基板は第1図(H)に示
したブラックストライプが形成された基板を互いに直交
するように組み合わせている。基板上にポリイミド膜を
塗布しラビング処理を行った後、感光性樹脂土手により
基板間距離を保ち液晶を注入したところ表示コントラス
トの高い液晶素子が得られた 第2図は本発明の液晶素子の製造方法の第2の実施例で
得られた液晶素子の構成図である。
A mixture of gelatin and carbon in a ratio of 3:5 was used as the black paint 7, and then the black paint 7 on the transparent electrode 5 was scraped off with a doctor blade, etc., and then placed as shown in Figure 1 (H). The upper and lower substrates shown in FIG. 1(I) on which the black stripes 8 are formed in the recessed portions are assembled with the substrates on which the black stripes shown in FIG. 1(H) are formed so as to be orthogonal to each other. After applying a polyimide film on the substrate and performing a rubbing process, a distance between the substrates was maintained using a photosensitive resin bank and liquid crystal was injected. A liquid crystal element with high display contrast was obtained. Figure 2 shows the liquid crystal element of the present invention. FIG. 3 is a configuration diagram of a liquid crystal element obtained in a second example of the manufacturing method.

上側基板において、印刷法により形成されたカラーフィ
ルタ11と透明基体lとからなるカラーフィルタ基板上
に有機物層2を形成する以外(よ第1の実施例と同様に
して、第2図に示すようなカラーの液晶素子が得られる
In the upper substrate, the organic substance layer 2 was formed on the color filter substrate consisting of the color filter 11 formed by the printing method and the transparent substrate 1 (as shown in FIG. 2) in the same manner as in the first embodiment. A liquid crystal element with various colors can be obtained.

以上のように透明基体上に有機物層を投法 前記有機物
層上に透明電極をパターン形成し プラズマ処理により
前記透明電極パターン間隙部の有機物層に凹部を形成し
 次に黒色塗料を塗布し前記透明電極上の黒色塗料を除
去することにより、前記凹部にブラックストライプを形
成するたへ少ない工程数で寸法精度の高いブラックスト
ライプを形成することができる。
As described above, an organic material layer is cast on a transparent substrate, a transparent electrode is patterned on the organic material layer, a recess is formed in the organic material layer in the gap between the transparent electrode patterns by plasma treatment, and then a black paint is applied and the transparent electrode is formed on the organic material layer. By removing the black paint on the electrodes, it is possible to form black stripes with high dimensional accuracy using fewer steps than forming black stripes in the recesses.

またカーボンブラックを使用できるため遮光性にもすぐ
れ 基板表面の平坦性も良く、高い表示特性を有する液
晶素子を提供することができる。
Furthermore, since carbon black can be used, it has excellent light shielding properties and the flatness of the substrate surface, making it possible to provide a liquid crystal element with high display characteristics.

また第2の実施例によれば カラーの液晶素子を提供す
ることができる。この場合、有機物層2を形成すること
により、カラーフィルタの平坦性を向上させることもで
きる。
Furthermore, according to the second embodiment, a color liquid crystal element can be provided. In this case, by forming the organic layer 2, the flatness of the color filter can also be improved.

発明の効果 以上のように本発明は 透明基体上に有機物層を設け、
前記有機物層上に透明電極をパターン形成し プラズマ
処理により前記透明電極パターン間隙部の有機物層に凹
部を形成し 次に黒色塗料を塗布し前記透明電極上の黒
色塗料を除去することにより、前記凹部にブラックスト
ライプを形成するた敢 少ない工程数で寸法精度の高い
ブラ・ツクストライプを形成することができる。
Effects of the Invention As described above, the present invention provides an organic layer on a transparent substrate,
A transparent electrode is patterned on the organic material layer, a recess is formed in the organic material layer in the gap between the transparent electrode patterns by plasma treatment, and then a black paint is applied and the black paint on the transparent electrode is removed to form the recess. It is possible to form black stripes with high dimensional accuracy in a small number of steps.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の液晶素子の製造方法の第1の実施例に
おける工程阻 第2図は本発明の第2の実施例で得られ
た液晶素子の構成図 第3図は従来の液晶素子の製造方
法における透明電極及びブラックストライプの形成方法
を示す工程図である。 ■・・・透明基I、*、2・・・有機物層 3・・・透
明導電風4・・・レジスト、 6・・・透明電極 7・
・・黒色塗粧 8・・・ブラックストライス 代理人の氏名 弁理士 粟野重孝 はか1名」、明差I
本 /fキyA、物屓 ・−透gハ 肴電模 レシフト フ不tマスク 透 せ月 笥先 Aノシー 煕免 1行 フラソクストライフ 酉己 I″5″VIll斡 う人品層 図
FIG. 1 shows process steps in a first embodiment of the method for manufacturing a liquid crystal device of the present invention. FIG. 2 is a diagram showing the configuration of a liquid crystal device obtained in a second embodiment of the present invention. FIG. 3 shows a conventional liquid crystal device. FIG. 3 is a process diagram showing a method for forming transparent electrodes and black stripes in the manufacturing method of FIG. ■...Transparent group I, *, 2...Organic layer 3...Transparent conductive wind 4...Resist, 6...Transparent electrode 7.
...Black paint 8...Name of Black Strice agent: Patent attorney Shigetaka Awano, Haka 1 person", Akira I
Book / f key yA, material - transparent gha side electric model resiftoff not tmask transparent moon sill A no see himen 1 line full text life love self I″5″VIll 斡human character stratification diagram

Claims (1)

【特許請求の範囲】[Claims] 透明基体上に有機物層を設け、前記有機物層上に透明電
極をパターン形成し、プラズマ処理により前記透明電極
パターン間隙部の有機物層に凹部を形成し、次に黒色塗
料を塗布し前記透明電極上の黒色塗料を除去することに
より、前記凹部に前記黒色塗料からなるブラックストラ
イプを形成することを特徴とする液晶素子の製造方法。
An organic material layer is provided on a transparent substrate, a transparent electrode is patterned on the organic material layer, a recess is formed in the organic material layer in the gap between the transparent electrode patterns by plasma treatment, and then a black paint is applied on the transparent electrode. A method for manufacturing a liquid crystal element, comprising: forming a black stripe made of the black paint in the concave portion by removing the black paint.
JP2153652A 1990-06-12 1990-06-12 Manufacturing method of liquid crystal element Pending JPH0444008A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2153652A JPH0444008A (en) 1990-06-12 1990-06-12 Manufacturing method of liquid crystal element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2153652A JPH0444008A (en) 1990-06-12 1990-06-12 Manufacturing method of liquid crystal element

Publications (1)

Publication Number Publication Date
JPH0444008A true JPH0444008A (en) 1992-02-13

Family

ID=15567224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2153652A Pending JPH0444008A (en) 1990-06-12 1990-06-12 Manufacturing method of liquid crystal element

Country Status (1)

Country Link
JP (1) JPH0444008A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1164890A (en) * 1997-08-20 1999-03-05 Semiconductor Energy Lab Co Ltd Electronic equipment and production thereof
WO2008087696A1 (en) 2007-01-15 2008-07-24 Aderans Holdings Co., Ltd. Wig and method for manufacturing the wig

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1164890A (en) * 1997-08-20 1999-03-05 Semiconductor Energy Lab Co Ltd Electronic equipment and production thereof
WO2008087696A1 (en) 2007-01-15 2008-07-24 Aderans Holdings Co., Ltd. Wig and method for manufacturing the wig

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