JPH04164570A - Electrolytic dressing method - Google Patents
Electrolytic dressing methodInfo
- Publication number
- JPH04164570A JPH04164570A JP28795890A JP28795890A JPH04164570A JP H04164570 A JPH04164570 A JP H04164570A JP 28795890 A JP28795890 A JP 28795890A JP 28795890 A JP28795890 A JP 28795890A JP H04164570 A JPH04164570 A JP H04164570A
- Authority
- JP
- Japan
- Prior art keywords
- grinding
- film
- electrolytic
- nonconductor
- grinding wheel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 18
- 239000000615 nonconductor Substances 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 21
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 4
- 239000012530 fluid Substances 0.000 claims description 20
- 229910021645 metal ion Inorganic materials 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000007788 liquid Substances 0.000 abstract description 7
- 239000003795 chemical substances by application Substances 0.000 description 12
- 239000006061 abrasive grain Substances 0.000 description 8
- 238000005868 electrolysis reaction Methods 0.000 description 6
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 5
- 238000003754 machining Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000003957 anion exchange resin Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
Landscapes
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、研削加工に用いる砥石に電解作用を与えて砥
石のトーレンシング(目立て)を行う電解ドレッシング
研削装置に使用される電解ドレッシング方法に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an electrolytic dressing method used in an electrolytic dressing grinding device that applies an electrolytic action to a grinding wheel used for grinding to perform grinding. .
(従来の技術)
研削加工において、加工の進行に伴って砥石の目つぶれ
や目づまりによって研削抵抗の増加、或いは被削材との
焼き付き等の現象が生じる。特にメタルボンド砥石は強
固であるため、切刃の自生作用がほとんどなく、セラミ
ックスなどの硬質材料を加工する場合には上記のような
現象が顕著であり、砥石の切れ味を回復、維持するため
にドレッシング作業は非常に重要である。(Prior Art) In the grinding process, as the process progresses, phenomena such as an increase in grinding resistance or seizure with the workpiece occur due to crushing or clogging of the grindstone. Metal bonded whetstones are especially strong, so there is almost no self-sharpening effect on the cutting edge, and the above phenomenon is noticeable when processing hard materials such as ceramics. Dressing work is very important.
近来、メタルボンド砥石のドレッシング方法として加工
中においても常時ドレッシングが可能な電解ドレッング
研削法が開発され、各方面で実用に供されつつある。Recently, an electrolytic dredge grinding method has been developed as a dressing method for metal bonded grindstones, which allows constant dressing even during processing, and is being put into practical use in various fields.
電解ドレッシング研削法を平面研削盤に適用した例を第
3図に示す。第3図に示すように、研削盤の回転軸1に
メタルボンド砥石2が固定され、給電ブラシ3を砥石台
金に接触させることにより、メタルボンド砥石2の面全
体を陽極とする。これに対し、陰極4は砥石カバー5内
においてメタルボンド砥石2の外周面と対向し、一定の
間隔を設けた形で設置されている。さらに、砥石カバー
5の上部等に設けた研削液供給ノズル6.7より、電解
質を含んだ水溶性研削液を両極間に流した上で、別に設
けた直流或いはパルス波形の電流を出力する電解用を源
8によって両極間に電解作用を起こし、陽極であるメタ
ルボンド砥石2のメタルボンドのみ選択的に溶出させ、
砥粒の突出と切屑の除去を図っている。なお、図中9は
工作物である。Figure 3 shows an example of applying the electrolytic dressing grinding method to a surface grinder. As shown in FIG. 3, a metal bond grindstone 2 is fixed to a rotating shaft 1 of a grinding machine, and by bringing a power supply brush 3 into contact with the grindstone base metal, the entire surface of the metal bond grindstone 2 is used as an anode. On the other hand, the cathode 4 is disposed within the grindstone cover 5 so as to face the outer circumferential surface of the metal bond grindstone 2 and to be spaced apart from each other by a constant distance. Furthermore, a water-soluble grinding fluid containing an electrolyte is flowed between the two electrodes from a grinding fluid supply nozzle 6.7 provided on the top of the grinding wheel cover 5, etc., and then a separately provided electrolyte that outputs a direct current or pulse waveform current is added. An electrolytic action is caused between the two electrodes by the source 8, and only the metal bond of the metal bond grinding wheel 2, which is the anode, is selectively eluted.
The aim is to protrude the abrasive grains and remove chips. Note that 9 in the figure is a workpiece.
しかしながら、上記構成の電解ドレッシング研削におい
ては、従来の水溶性研削液を使用して電解ドレッシング
を行うと陽極側であるメタルボンド砥石2の表面に金属
酸化物などの不導体皮膜が生成し、ドレッシング作用が
進行しなくなり、ドレッシング効率および加工効率の低
下を招く。However, in electrolytic dressing grinding with the above configuration, when electrolytic dressing is performed using a conventional water-soluble grinding fluid, a nonconducting film such as metal oxide is generated on the surface of the metal bond grinding wheel 2 on the anode side, and the dressing The action will not proceed, leading to a decrease in dressing efficiency and processing efficiency.
また、逆に、鏡面研削仕上を行うような砥粒径が10μ
m以下程度のメタルボンド砥石2を使用する場合は砥粒
突き出し量が数μmと非常に小さく、メタルボンド砥石
2の真円度や砥石面の凹凸を砥粒突き出し量販下に管理
することは非常に困難であるため、砥石表面に金属酸化
物皮膜のような緩衝材になるものが存在しないと砥石結
合側と工作物が直接接触し、加工面荒れや焼き付きが発
生する。On the other hand, the abrasive grain size for mirror polishing is 10μ.
When using a metal bonded grinding wheel 2 with a diameter of less than m, the amount of abrasive grain protrusion is very small, a few μm, and it is extremely difficult to control the roundness of the metal bonded whetstone 2 and the unevenness of the grinding wheel surface under the abrasive grain protrusion volume sales. If there is no cushioning material such as a metal oxide film on the surface of the grinding wheel, the bonding side of the grinding wheel and the workpiece will come into direct contact, resulting in roughened and burned surfaces.
以上のように電解ドレッシング研削加工において荒加工
から中仕上加工時には砥石表面に不導体皮膜を生成させ
ない方が得策であるが、鏡面仕上加工時には砥石表面を
不導体皮膜でおおった方が良いと言える。なお、鏡面仕
上時のメタルボンド砥石は砥粒径が小さく、ドレツシン
グ量は微量で良いため、不導体皮Hによるドレッシング
効率低下はほとんど問題にならない。As mentioned above, in electrolytic dressing grinding, it is better not to generate a nonconductive film on the grinding wheel surface during rough processing to semi-finishing, but it is better to cover the grinding wheel surface with a nonconductive film during mirror finishing processing. . It should be noted that the abrasive grain size of the metal bonded grindstone used for mirror finishing is small, and only a small amount of dressing is required, so that the reduction in dressing efficiency due to the nonconductor skin H is hardly a problem.
しかるに、生成した不導体皮膜を除去する方法として、
特開昭60−20859号公報に示されるように、結合
度の低いWAなどの皮膜除去用の砥石を別に設け、この
砥石によって皮膜を機械的に除去する方法が考えられる
。However, as a method for removing the generated nonconductor film,
As shown in Japanese Unexamined Patent Publication No. 60-20859, a method can be considered in which a grindstone for removing a coating such as WA having a low degree of bonding is separately provided and the coating is mechanically removed by this grindstone.
(発明が解決しようとする課題)
しかしながら、上記方法では皮膜除去用砥石の砥粒脱落
による工作物仕上面へのスクラッチ、さらに砥石送り機
構および回転軸が別に必要などの点であまり有効な方法
ではない、といった課題がある。(Problem to be Solved by the Invention) However, the above method is not very effective in that it causes scratches on the finished surface of the workpiece due to the abrasive grains falling off from the film removal grindstone, and also requires a separate grindstone feeding mechanism and rotating shaft. There are issues such as no.
本発明は上記のような点に鑑み提案されたもので、その
目的とするところは、加工区分によって不導体皮膜生成
を制御し、いかなる加工区分であっても常に安定した電
解ドレッシング研削を実現し得る電解ドレッシング方法
を提供することにある。The present invention has been proposed in view of the above points, and its purpose is to control the generation of a nonconducting film depending on the processing section and to realize stable electrolytic dressing grinding regardless of the processing section. An object of the present invention is to provide an electrolytic dressing method that obtains the desired results.
(課題を解決するための手段)
本発明は、電解作用を用いてメタルボンド砥石のドレッ
シングを行う電解ドレッシング研削加工において、荒加
工、仕上加工などの加工区分に応じて研削液中に混入す
る不導体皮膜除去成分量を制御し、砥石面に生成する不
導体皮膜量を常に適正な状態に保つ構成とすることによ
り、上記目的を達成している。(Means for Solving the Problems) The present invention is directed to the electrolytic dressing grinding process in which a metal bond grinding wheel is dressed using electrolytic action, and the present invention is directed to the use of impurities that are mixed into the grinding fluid depending on the machining classification such as rough machining and finishing machining. The above object is achieved by controlling the amount of components removed from the conductive film and maintaining the amount of the non-conducting film formed on the grinding wheel surface in an appropriate state at all times.
また、電解作用を用いてメタルボンド砥石のドレッシン
グを行う電解ドレッシング研削加工において、荒加工、
仕上加工などの加工区分に応じて研削液中に混入する不
導体皮膜除去成分量を制御し、砥石面に生成する不導体
皮膜量を常に適正な状態に保つようにし、さらに前記の
不導体皮膜除去成分は電解作用により溶出する金属イオ
ンと錯化合物を生成し、不導体皮膜生成を防止する作用
を持つと共に、回収した研削液より、不導体皮膜除去成
分のみを回収する構成とし、上記目的を達成している。In addition, in the electrolytic dressing grinding process that uses electrolytic action to dress the metal bond grinding wheel, rough machining,
The amount of nonconductor film removal components mixed into the grinding fluid is controlled according to the processing category such as finishing, and the amount of nonconductor film generated on the grinding wheel surface is always kept in an appropriate state. The removal component forms a complex compound with the metal ions eluted by electrolytic action, which has the effect of preventing the formation of a nonconductor film, and the structure is such that only the nonconductor film removal component is recovered from the recovered grinding fluid, and the above purpose is achieved. Achieved.
(実施例)
第1図は本発明の一実施例を示し、平面研削盤に適用し
たものである。(Embodiment) FIG. 1 shows an embodiment of the present invention, which is applied to a surface grinder.
すなわち、本発明は第3図に示した従来例と同様に、回
転軸1に取付けられたメタルボンド砥石2、給電ブラン
3、陰極4、砥石カバー5、研削液供給ノズル6.7、
電解用電源8を設けた上で、前記砥石カバ−5上部に不
導体皮膜除去成分である不導体皮膜除去剤の入ったタン
ク10を設け、そのタンク10より液供給ノズル11を
砥石カバー5内に配している。That is, the present invention is similar to the conventional example shown in FIG.
In addition to providing an electrolytic power source 8, a tank 10 containing a nonconducting film removing agent, which is a nonconducting film removing component, is provided above the grinding wheel cover 5, and a liquid supply nozzle 11 is supplied from the tank 10 into the grinding wheel cover 5. It is arranged in
しかして、電解作用により、溶出する金属イオンと錯化
合物を生成し、不導体皮膜生成を防止する不導体皮膜除
去剤として、本実施例ではEDTA(エチレンジアミン
四酢酸)溶液を使用している。Therefore, in this example, an EDTA (ethylenediaminetetraacetic acid) solution is used as a nonconductor film removing agent that forms a complex compound with the eluted metal ions through electrolytic action and prevents the formation of a nonconductor film.
このEDTAは溶出した金属イオンと配位結合し、安定
な錯イオンとなり、不導体化を防止する働きを持ち、ま
た、電解加工液に使用される塩化ナトリウムや硝酸ナト
リウム等に比べると腐食性はかなり小さく、機械腐食の
心配はない。This EDTA coordinates with the eluted metal ions to form stable complex ions, which has the function of preventing passivation, and is less corrosive than sodium chloride, sodium nitrate, etc. used in electrolytic processing fluids. It is quite small and there is no need to worry about mechanical corrosion.
なお、不導体皮膜除去剤としては金属イオンと安定な諸
イオンを生成し、l!械への腐食性、人体への毒性等が
なければ他の物質でも構わない。In addition, as a nonconductor film removing agent, it generates metal ions and stable ions, and l! Other materials may be used as long as they are not corrosive to machinery or toxic to humans.
本不導体皮膜除去剤の電解ドレッシング部への供給は流
量の制御が可能な液供給ノズル11に設けたバルブll
aにより、電解溶出する金属イオンの量を予め予測して
調整する。The present nonconductive film removing agent is supplied to the electrolytic dressing section by a valve 11 provided in the liquid supply nozzle 11 whose flow rate can be controlled.
The amount of metal ions to be electrolytically eluted is predicted and adjusted in advance using a.
EDTAは金属イオンと1:1のモル比で反応するため
、EDTA溶液の濃度、使用砥石の直径。Since EDTA reacts with metal ions at a molar ratio of 1:1, the concentration of the EDTA solution and the diameter of the grinding wheel used.
巾、砥粒径、溶出金属の電気化学当量、比重、電解電流
値、電解時間、電解効率などの既知の値より、必要液量
が概ね計算できる。The required amount of liquid can be roughly calculated from known values such as width, abrasive grain size, electrochemical equivalent of eluted metal, specific gravity, electrolysis current value, electrolysis time, and electrolysis efficiency.
第2図に流量制御の一例を示す。FIG. 2 shows an example of flow rate control.
この不導体皮膜除去剤は電解ドレッシング部へ供給され
た後、機械テーブル上を流れ、下方に設けられた研削液
回収タンク12へ流入する。この研削液回収タンク12
では沈澱槽12a、フィルタ、遠心分離機なとにより、
液中の切屑を除去した後に、第1のポンプP1により吸
い上げられ、自動洗浄の可能なサブミクロンフィルタを
備えた不導体皮膜除去副処理装置13において不導体皮
膜除去剤のみを回収する。不導体皮膜除去剤の回収には
陰イオン交換樹脂による処理、半透膜と電気泳動とを利
用した処理などでも良い。After being supplied to the electrolytic dressing section, this nonconductive film removing agent flows over the machine table and flows into the grinding fluid recovery tank 12 provided below. This grinding fluid recovery tank 12
Now, with the sedimentation tank 12a, filter, centrifuge, etc.
After the chips in the liquid are removed, only the nonconductive film removing agent is sucked up by the first pump P1 and collected in the nonconductive film removal sub-processing device 13 equipped with a submicron filter capable of automatic cleaning. The nonconductive film removing agent may be recovered by treatment with an anion exchange resin, treatment using a semipermeable membrane and electrophoresis, or the like.
不導体皮膜除去剤を回収した研削液はツマイブ13aを
介し清液槽12bに流入され、第2のポンプP2により
吸い上げられ、研削液ノズル6.7と連結されたバイブ
14を介し研削加工点、および電解ドレッシング部へと
再び供給される。The grinding fluid that has collected the nonconductive film remover flows into the clear fluid tank 12b via the grinding tube 13a, is sucked up by the second pump P2, and is sent to the grinding point via the vibrator 14 connected to the grinding fluid nozzle 6.7. and supplied again to the electrolytic dressing section.
なお、フィルタ類によって不導体皮膜除去剤を回収する
場合は、研削液に含まれる成分中で不導体皮膜除去剤が
最も大きな分子である必要がある。In addition, when recovering a nonconductor film removal agent by filters, it is necessary that the nonconductor film removal agent has the largest molecule among the components contained in the grinding fluid.
上記のように各装置を設けた上で、荒から中仕上加工時
には不導体皮膜除去剤の量を適正量に制御して研削液と
共に電解ドレッシング部に供給し、砥石面に生成する不
導体皮膜量を適正な状態に制御し、不導体皮膜を発生さ
せず、高効率ドレッシング状態を維持する。After installing each device as described above, during rough to semi-finishing, the amount of nonconductor film removal agent is controlled to an appropriate amount and supplied to the electrolytic dressing section together with the grinding fluid, and a nonconductor film is generated on the grinding wheel surface. Controls the amount to an appropriate level, does not generate a nonconductive film, and maintains a highly efficient dressing state.
これに対して鏡面仕上加工時には、前加工時に使用した
不導体皮膜除去剤が回収されて、かつ不導体皮膜除去剤
を電解ドレッシング部に流さないようにし、よって、砥
石表面に不導体皮膜を生成させ、砥石母地と工作物との
接触を防止し、良好な鏡面に仕上げる。On the other hand, during mirror finishing processing, the non-conducting film remover used during the previous processing is recovered and the non-conducting film removing agent is not allowed to flow into the electrolytic dressing section, thereby creating a non-conducting film on the grinding wheel surface. This prevents contact between the grindstone base and the workpiece, resulting in a good mirror finish.
なお、荒から中仕上加工時にメタルボンドの電解によっ
てメタルボンド砥石2が不必要に消耗することは避けな
ければならないため、電解用電源8の電気条件、或いは
不導体皮膜除去剤の流量を適切にamすることが必要で
ある。In addition, it is necessary to avoid unnecessary consumption of the metal bond grinding wheel 2 due to metal bond electrolysis during rough to semi-finishing processing, so the electrical conditions of the electrolysis power source 8 or the flow rate of the nonconductive film removing agent must be adjusted appropriately. It is necessary to am.
(発明の効果)
以上のように本発明によれば、電解作用を用いてメタル
ボンド砥石のドレッシングを行う電解ドレッシング研削
加工において、荒加工、仕上加工などの加工区分に応じ
て研削液中に混入する不導体皮膜除去成分量を制御し、
砥石面に生成する不導体皮膜量を常に適正な状態に保つ
ようにしたり、あるいはこれに加え前記の不導体皮膜除
去成分は電解作用により溶出する金属イオンと錯化合物
を生成し、不導体皮膜生成を防止する作用を持つと共に
、回収した研削液より、不導体皮膜除去成分のみを回収
するようにした構成とし、
(11加工区分に応じて研削液を使い分けることにより
、不導体皮膜の生成を制御し、いかなる加工区分であっ
ても常に良好な電解ドレッシング研削状態が維持できる
。(Effects of the Invention) As described above, according to the present invention, in the electrolytic dressing grinding process in which a metal bond grinding wheel is dressed using electrolytic action, particles are mixed into the grinding fluid depending on the processing classification such as rough processing and finishing processing. Control the amount of components removed from the nonconducting film,
The amount of nonconducting film formed on the grinding wheel surface is always kept at an appropriate level, or in addition, the above-mentioned nonconducting film removing component generates a complex compound with the metal ions eluted by electrolytic action to form a nonconducting film. In addition to having the effect of preventing However, a good electrolytic dressing grinding condition can always be maintained in any processing section.
(2)生成した不導体皮膜の除去を別に設けた砥石で行
うものではないため、脱落砥粒による工作物仕上面への
スクラッチの心配や砥石送り機構を別に設ける必要はな
い。(2) Since the generated nonconductive film is not removed using a separate grindstone, there is no need to worry about scratches on the finished surface of the workpiece due to falling abrasive grains, and there is no need to provide a separate grindstone feeding mechanism.
(3)砥石のドレッシング作業に特殊技術を!しないた
め、簡単に切れ味を維持することが可能となる。(3) Special technology for dressing the grindstone! This makes it possible to easily maintain sharpness.
等の効果がある。There are other effects.
第1rMは本発明を平面研削盤に適用した実施例、第2
図は本発明における不導体皮膜除去荊流量電解ドレッシ
ング電流値の制御例、第3図は平面研削盤に電解ドレッ
シングを適用した従来例を示す。
I・・・・・回転軸
2・・・・・メタルボンド砥石
3・・・・・給電プラノ
4・・・・・陰極
5・・・・・砥石カバー
6.7・・・研削液ノズル
8・・・ ・電解用電源
9・・・・・工作物
10・・・・タンク
11・ 液供給ノズル
12−・・・研削液回収タンク
13・・・−不導体皮膜除去側処理装置(ばか1名)
第1図
第2図
時間(min)The first rM is an example in which the present invention is applied to a surface grinder, and the second rM is an example in which the present invention is applied to a surface grinder.
The figure shows an example of controlling the flow rate and electrolytic dressing current value for removing a nonconducting film according to the present invention, and FIG. 3 shows a conventional example in which electrolytic dressing is applied to a surface grinder. I... Rotating shaft 2... Metal bond grinding wheel 3... Power supply plano 4... Cathode 5... Grinding wheel cover 6.7... Grinding fluid nozzle 8 ... ・Electrolysis power source 9...Workpiece 10...Tank 11・Liquid supply nozzle 12-...Grinding fluid recovery tank 13...-Nonconductor film removal side processing device (baka 1 Figure 1 Figure 2 Time (min)
Claims (2)
グを行う電解ドレッシング研削加工において、 荒加工、仕上加工などの加工区分に応じて研削液中に混
入する不導体皮膜除去成分量を制御し、砥石面に生成す
る不導体皮膜量を常に適正な状態に保つようにしたこと
を特徴とする電解ドレッシング方法。(1) In the electrolytic dressing grinding process that uses electrolytic action to dress the metal bond grinding wheel, the amount of components removed from the nonconducting film mixed in the grinding fluid is controlled according to the processing classification such as roughing and finishing, and An electrolytic dressing method characterized in that the amount of nonconducting film formed on the surface is always maintained in an appropriate state.
グを行う電解ドレッシング研削加工において、 荒加工、仕上加工などの加工区分に応じて研削液中に混
入する不導体皮膜除去成分量を制御し、砥石面に生成す
る不導体皮膜量を常に適正な状態に保つようにし、さら
に前記の不導体皮膜除去成分は電解作用により溶出する
金属イオンと錯化合物を生成し、不導体皮膜生成を防止
する作用を持つと共に、回収した研削液より、不導体皮
膜除去成分のみを回収するようにしたことを特徴とする
電解ドレッシング方法。(2) In the electrolytic dressing grinding process that uses electrolytic action to dress the metal bond grinding wheel, the amount of components removed from the nonconducting film mixed in the grinding fluid is controlled according to the processing classification such as roughing and finishing, and The amount of nonconductor film formed on the surface is always maintained in an appropriate state, and furthermore, the above-mentioned nonconductor film removal component forms a complex compound with the metal ions eluted by electrolytic action, and has the effect of preventing the formation of a nonconductor film. An electrolytic dressing method characterized in that only nonconductor film removal components are recovered from the recovered grinding fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28795890A JPH04164570A (en) | 1990-10-25 | 1990-10-25 | Electrolytic dressing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28795890A JPH04164570A (en) | 1990-10-25 | 1990-10-25 | Electrolytic dressing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04164570A true JPH04164570A (en) | 1992-06-10 |
Family
ID=17723947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28795890A Pending JPH04164570A (en) | 1990-10-25 | 1990-10-25 | Electrolytic dressing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04164570A (en) |
-
1990
- 1990-10-25 JP JP28795890A patent/JPH04164570A/en active Pending
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