JPH0420226U - - Google Patents
Info
- Publication number
- JPH0420226U JPH0420226U JP6172390U JP6172390U JPH0420226U JP H0420226 U JPH0420226 U JP H0420226U JP 6172390 U JP6172390 U JP 6172390U JP 6172390 U JP6172390 U JP 6172390U JP H0420226 U JPH0420226 U JP H0420226U
- Authority
- JP
- Japan
- Prior art keywords
- projection exposure
- pattern detection
- reduction projection
- reduction
- data processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
Description
第１図は本考案の実施例に用いた縮小投影露光
装置の全体図、第２図はこの処理を行うための概
略フローチヤートである。
１……Ｘ−Ｙステージ、２……縮小レンズ、３
……レテイクル、４……ウエハ、５……Ｘ，Ｙレ
テイクルマーク検出系、６……θ用レテイクルマ
ーク検出系、７……データ処理装置。
FIG. 1 is an overall view of a reduction projection exposure apparatus used in an embodiment of the present invention, and FIG. 2 is a schematic flowchart for carrying out this process. 1...X-Y stage, 2...Reducing lens, 3
... reticle, 4 ... wafer, 5 ... X, Y reticle mark detection system, 6 ... reticle mark detection system for θ, 7 ... data processing device.
Claims (1)
置（レーザ測長系）、パターン検出データの処理
装置よりなる縮小投影露光装置において、回路パ
ターン描画されている原画であるレテイクル位置
を高精度に認識し、位置決めすることによつて、
半導体の製造における重ね合わせを高精度に実現
することを特徴とする縮小投影露光装置。 In a reduction projection exposure device consisting of a reduction lens, a pattern detection optical system, a position measurement device (laser length measurement system), and a pattern detection data processing device, the reticle position, which is the original image on which the circuit pattern is drawn, is recognized with high precision, By positioning
A reduction projection exposure system that is characterized by realizing highly accurate overlay in semiconductor manufacturing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6172390U JPH0420226U (en) | 1990-06-13 | 1990-06-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6172390U JPH0420226U (en) | 1990-06-13 | 1990-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0420226U true JPH0420226U (en) | 1992-02-20 |
Family
ID=31590223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6172390U Pending JPH0420226U (en) | 1990-06-13 | 1990-06-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0420226U (en) |
-
1990
- 1990-06-13 JP JP6172390U patent/JPH0420226U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR970067585A (en) | Measurement method of projection characteristics and projection exposure method | |
| JP2000029202A (en) | Manufacturing method of mask | |
| EP0459737A2 (en) | Reticle for a reduced projection exposure apparatus | |
| JPH0420226U (en) | ||
| JP2000164498A (en) | Scanning projection exposure equipment | |
| JPS60177623A (en) | Exposure device | |
| JPS59923A (en) | Projection type light exposing device | |
| JPH0550849B2 (en) | ||
| JPH0321842U (en) | ||
| JPH0612754B2 (en) | Projection exposure device | |
| JP2647835B2 (en) | Wafer exposure method | |
| JPH02130910A (en) | Alignment | |
| JPH11251232A (en) | Substrate, exposure apparatus and element manufacturing method | |
| JPH0470732U (en) | ||
| JP3110796B2 (en) | Reticle alignment method and exposure apparatus | |
| JPH05216209A (en) | Photo mask | |
| JPH02198128A (en) | Method of recording and reading identification information of semiconductor wafer | |
| JPS62112140U (en) | ||
| JPH0469408B2 (en) | ||
| JP2979625B2 (en) | Method for checking exposure conditions of reduction projection exposure equipment | |
| JPS5885339U (en) | Reduction projection exposure equipment | |
| JP2987899B2 (en) | Positioning method | |
| JPH0594935A (en) | Exposure equipment | |
| JPS6157519U (en) | ||
| JPH03229104A (en) | Position shift detecting method |