JPH0470732U - - Google Patents
Info
- Publication number
- JPH0470732U JPH0470732U JP11354690U JP11354690U JPH0470732U JP H0470732 U JPH0470732 U JP H0470732U JP 11354690 U JP11354690 U JP 11354690U JP 11354690 U JP11354690 U JP 11354690U JP H0470732 U JPH0470732 U JP H0470732U
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- reduction
- projection exposure
- measurement
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Description
第１図は本考案の全体構成図、第２図は回路パ
ターンが描画されているレテイクルを示す図、第
３図はウエハ上に露光されたチツプ配列図、第４
図は理想格子座標に対し実測値をプロツトした図
である。
１……位置計測付Ｘ−Ｙステージ、２……縮小
投影レンズ、３……レテイクル微動台、４……ウ
エハ、５……パターン検出装置、６……露光光源
、７……データ処理装置、８……レテイクル、９
……Ｘ／Ｙターゲツトパターン。
Figure 1 is an overall configuration diagram of the present invention, Figure 2 is a diagram showing a reticle on which a circuit pattern is drawn, Figure 3 is a diagram of the chip arrangement exposed on a wafer, and Figure 4 is a diagram showing the arrangement of chips exposed on a wafer.
The figure shows actually measured values plotted against ideal grid coordinates. 1... X-Y stage with position measurement, 2... Reduction projection lens, 3... Reticle fine movement table, 4... Wafer, 5... Pattern detection device, 6... Exposure light source, 7... Data processing device, 8... Reticle, 9
...X/Y target pattern.
Claims (1)
Ｘ−Ｙステージと露光照明系および演算装置（記
憶装置付）よりなる縮小投影露光装置において、
ウエハ上に多数チツプ露光された、チツプ内のタ
ーゲツトをパターン位置検出器で測定し、この測
定を多数チツプくり返す事により理想格子に対す
るパターンの位置ずれを求め、データ処理するこ
とを特徴とする縮小投影露光装置。 In a reduction projection exposure apparatus consisting of a reduction lens, a pattern detection optical system, an X-Y stage with position measurement, an exposure illumination system, and an arithmetic unit (with a storage device),
A reduction method characterized by measuring a target in a chip exposed on a wafer with a pattern position detector, repeating this measurement for a number of chips to find the positional deviation of the pattern with respect to an ideal grid, and then processing the data. Projection exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11354690U JPH0470732U (en) | 1990-10-31 | 1990-10-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11354690U JPH0470732U (en) | 1990-10-31 | 1990-10-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0470732U true JPH0470732U (en) | 1992-06-23 |
Family
ID=31861147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11354690U Pending JPH0470732U (en) | 1990-10-31 | 1990-10-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0470732U (en) |
-
1990
- 1990-10-31 JP JP11354690U patent/JPH0470732U/ja active Pending
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