JPH0321842U - - Google Patents
Info
- Publication number
- JPH0321842U JPH0321842U JP8219489U JP8219489U JPH0321842U JP H0321842 U JPH0321842 U JP H0321842U JP 8219489 U JP8219489 U JP 8219489U JP 8219489 U JP8219489 U JP 8219489U JP H0321842 U JPH0321842 U JP H0321842U
- Authority
- JP
- Japan
- Prior art keywords
- chip
- wafer
- chips
- projection exposure
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 3
- 238000005259 measurement Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
Description
第１図は本案の実施例に用いた縮小投影露光装
置の全体図、第２図はこの処理を行うための概略
フローチヤート図である。
１…Ｘ−Ｙステージ、２…縮小レンズ、３…レ
テイクル、４…ウエハ、５…パターン検出器、６
…データ処理装置。
FIG. 1 is an overall view of a reduction projection exposure apparatus used in an embodiment of the present invention, and FIG. 2 is a schematic flowchart for carrying out this process. 1...X-Y stage, 2...reducing lens, 3...reticle, 4...wafer, 5...pattern detector, 6
...Data processing equipment.
Claims (1)
置（レーザ測長系）、パターン検出データの処理
装置より成る縮小投影露光装置において、回路パ
ターンが描画されているレテイクルと、ウエハ上
のチツプを交互にパターン検出を行い重ね合わせ
露光するチツプアライメント方式で、チツプアラ
イメントが不可能なチツプに対しても疑似的にチ
ツプアライメントを行うことによつて、ウエハ上
の全てのチツプに対して高精度なアライメントを
行うことを特徴とする縮小投影露光装置。 In a reduction projection exposure system consisting of a reduction lens, a pattern detection optical system, a position measurement device (laser length measurement system), and a processing device for pattern detection data, the reticle on which the circuit pattern is drawn and the chip on the wafer are patterned alternately. A chip alignment method that performs detection and overlapping exposure performs pseudo chip alignment even for chips for which chip alignment is not possible, achieving highly accurate alignment for all chips on the wafer. A reduction projection exposure apparatus characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8219489U JPH0321842U (en) | 1989-07-14 | 1989-07-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8219489U JPH0321842U (en) | 1989-07-14 | 1989-07-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0321842U true JPH0321842U (en) | 1991-03-05 |
Family
ID=31628786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8219489U Pending JPH0321842U (en) | 1989-07-14 | 1989-07-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0321842U (en) |
-
1989
- 1989-07-14 JP JP8219489U patent/JPH0321842U/ja active Pending
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