JPH0427683B2 - - Google Patents
Info
- Publication number
- JPH0427683B2 JPH0427683B2 JP58005184A JP518483A JPH0427683B2 JP H0427683 B2 JPH0427683 B2 JP H0427683B2 JP 58005184 A JP58005184 A JP 58005184A JP 518483 A JP518483 A JP 518483A JP H0427683 B2 JPH0427683 B2 JP H0427683B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- mark
- wafer
- mask
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58005184A JPS59132126A (ja) | 1983-01-18 | 1983-01-18 | 位置合わせ装置 |
| US06/570,189 US4636626A (en) | 1983-01-14 | 1984-01-12 | Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58005184A JPS59132126A (ja) | 1983-01-18 | 1983-01-18 | 位置合わせ装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1234596A Division JPH02191314A (ja) | 1989-09-12 | 1989-09-12 | パターン検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59132126A JPS59132126A (ja) | 1984-07-30 |
| JPH0427683B2 true JPH0427683B2 (fr) | 1992-05-12 |
Family
ID=11604142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58005184A Granted JPS59132126A (ja) | 1983-01-14 | 1983-01-18 | 位置合わせ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59132126A (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6262519A (ja) * | 1985-09-13 | 1987-03-19 | Canon Inc | 位置検出装置 |
-
1983
- 1983-01-18 JP JP58005184A patent/JPS59132126A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59132126A (ja) | 1984-07-30 |
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