JPH0430102A - Reflecting plate - Google Patents
Reflecting plateInfo
- Publication number
- JPH0430102A JPH0430102A JP2135312A JP13531290A JPH0430102A JP H0430102 A JPH0430102 A JP H0430102A JP 2135312 A JP2135312 A JP 2135312A JP 13531290 A JP13531290 A JP 13531290A JP H0430102 A JPH0430102 A JP H0430102A
- Authority
- JP
- Japan
- Prior art keywords
- base body
- reflecting plate
- protective layer
- reflector
- silicon nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はOA機器などの照明系を構成するに用いられる
反射板に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a reflector plate used for constructing a lighting system of OA equipment or the like.
複写機などのOA機器における光源を備えた′照明装置
で用いられている反射板は、光源から放射される光束を
所望の方向へ効率よく反射して必要な対象を照明するた
めの器具であって、その鏡面形状も、用途に応じて平面
状のものから球面、楕円面、放物面など、種々使い分け
られている。A reflector used in a lighting device equipped with a light source in office automation equipment such as a copying machine is a device that efficiently reflects the luminous flux emitted from the light source in a desired direction to illuminate the necessary target. The shape of the mirror surface varies depending on the purpose, from flat to spherical, ellipsoidal, paraboloidal, etc.
かかる照明系における反射板は、その鏡面がとくに精密
である必要はないけれども特殊な形状であるために、通
常アルミニウム合金の圧延や鋳造成いは切削等によって
所望の形状に成形したのちその反射面部分をラッピング
や電解研磨するなどによって鏡面加工して製造されてい
る。Although the reflective plate in such lighting systems does not need to have a particularly precise mirror surface, it does have a special shape, so it is usually formed into the desired shape by rolling or casting aluminum alloy, or by cutting, and then the reflective surface is It is manufactured by mirror-finishing the parts by lapping or electropolishing.
このような反射板は例えば複写機の照明装置等に用いる
と、光源として用いられるハロゲンランプによる点滅の
繰り返し照射を受けるため、連続的に使用するときには
反射板の温度が250〜300°C程度にもなることが
しばしばであり、その反射面が酸化をうけてアルマイト
化し、次第にクラックが発生して鏡面が荒れてしまうと
いう問題があった。When such a reflector is used in, for example, a lighting device of a copying machine, it is exposed to repeated flashing irradiation from a halogen lamp used as a light source, so when used continuously, the temperature of the reflector may rise to around 250 to 300°C. There was a problem in that the reflective surface was oxidized and turned into alumite, which gradually caused cracks to occur and the mirror surface to become rough.
これに対して、鏡面部分の酸化劣化を防止するために、
保護膜としてシリコン層を設ける方法が提案されている
が、このように構成された反射板でも使用環境でのクラ
ンクや剥離などの経時的劣化が充分に抑制できず、耐熱
性や耐湿性においても満足できるものではなかった。On the other hand, in order to prevent oxidation deterioration of the mirror surface,
A method of providing a silicon layer as a protective film has been proposed, but even with a reflector configured in this way, aging deterioration such as cracking and peeling in the usage environment cannot be sufficiently suppressed, and the heat resistance and moisture resistance are also poor. It wasn't satisfying.
本発明は上述の事情に鑑みてなされたものであって、そ
の目的とするところは、耐熱性及び耐湿性に優れ、繰り
返して大幅に変化する環境条件の下でも酸化や剥離が生
じない反射板を提供することにある。The present invention has been made in view of the above-mentioned circumstances, and its purpose is to provide a reflective plate that has excellent heat resistance and moisture resistance, and that does not oxidize or peel off even under repeated and significantly changing environmental conditions. Our goal is to provide the following.
かかる本発明の目的は、所定の形状を有するアルミニウ
ム合金製反射板基体の鏡面部分に窒化珪素と二酸化珪素
との混合物からなる表面保護層を設けたことを特徴とす
る反射板によって達成することができる。This object of the present invention can be achieved by a reflector, which is characterized in that a surface protective layer made of a mixture of silicon nitride and silicon dioxide is provided on a mirror surface portion of an aluminum alloy reflector base having a predetermined shape. can.
本発明の反射板を構成する基体は、アルミニ・ラム合金
の圧延や鋳造成いは切削等によって所望の形状に成形し
たのちラッピングや電解研慶するなどによって鏡面加工
したものであって、従来から反射板として用いられてい
るものと同様な基体が用いられる。The base material constituting the reflector of the present invention is formed by rolling or casting an aluminum ram alloy into a desired shape by cutting, etc., and then mirror-finished by lapping, electrolytic polishing, etc. A substrate similar to that used as a reflector is used.
本発明においては、かかる基体の鏡面部分に窒化珪素と
二酸化珪素との混合物からなる表面保護層を設けるが、
その組成は優位量の窒化珪素と劣位量の二酸化珪素とか
らなるのがよく、例えば90〜50%の窒化珪素と50
〜10%の二酸化珪素との混合物が好ましく用いられる
。かかる表面保護層は例えば真空蒸着法やスパッタリン
グ法などにより形成することができ、その厚さは0.1
〜0、5μm程度、好ましくは0.2μm前後であるの
がよい。In the present invention, a surface protective layer made of a mixture of silicon nitride and silicon dioxide is provided on the mirror surface portion of the substrate.
The composition may consist of a predominant amount of silicon nitride and a minor amount of silicon dioxide, for example 90-50% silicon nitride and 50% silicon nitride.
A mixture with ~10% silicon dioxide is preferably used. Such a surface protective layer can be formed by, for example, a vacuum evaporation method or a sputtering method, and its thickness is 0.1
The thickness is preferably about 0.5 μm, preferably about 0.2 μm.
本発明の反射板は、耐熱衝撃及び耐温湿性に優れた保護
層が設けられていて、耐久性が著しく改良されたもので
ある。The reflective plate of the present invention is provided with a protective layer having excellent thermal shock resistance and temperature and humidity resistance, and has significantly improved durability.
〔実施例1〕
光輝アルミニウム合金(A5650)から圧延法によっ
て第1図に示した横断面形状を有する反射板基体lを形
成した。この基体1を充分に精密洗浄し乾燥したのちに
真空蒸着槽内に取付け、約180°Cに加熱した状態で
真空度I X 10−’Torrまで排気し、窒化珪素
と二酸化珪素との重量比70:30の混合物のターゲッ
トを電子ビーム加熱することにより、基体1の鏡面部分
2の上に厚さ0.18μmの表面保護層3を蒸着して、
本発明の反射板Aを得た。[Example 1] A reflector substrate 1 having the cross-sectional shape shown in FIG. 1 was formed from a bright aluminum alloy (A5650) by a rolling method. After thorough precision cleaning and drying, this substrate 1 was installed in a vacuum deposition tank, heated to about 180°C and evacuated to a vacuum degree of I x 10-' Torr, and the weight ratio of silicon nitride and silicon dioxide was determined. By electron beam heating a target of a 70:30 mixture, a surface protective layer 3 with a thickness of 0.18 μm was deposited on the mirrored portion 2 of the substrate 1.
Reflector A of the present invention was obtained.
〔実施例2〕
反射板基体をアルミニウム合金(A6063)で形成し
た他は実施例1と同様にして、基体の鏡面部分の上に厚
さ0.20μmの表面保護層を蒸着して、本発明の反射
板Bを得た。[Example 2] In the same manner as in Example 1 except that the reflector substrate was formed of aluminum alloy (A6063), a surface protective layer with a thickness of 0.20 μm was deposited on the mirrored portion of the substrate, and the present invention was carried out. Reflector B was obtained.
実施例1において用いたと同じ反射板基体を用い、シリ
コンターゲットを用いたほかは実施例1と同様にして、
基体の鏡面部分の上に厚さ0.20μmのシリコン層を
蒸着し、対照の反射板Cを得た。The same process as in Example 1 was carried out except that the same reflector substrate as used in Example 1 was used and a silicon target was used.
A silicon layer with a thickness of 0.20 μm was deposited on the mirror surface portion of the substrate to obtain a control reflector C.
これらの反射板について下記のような耐温湿度試験及び
点灯試験(熱衝撃試験)を行ない、耐久性を調べた。These reflectors were subjected to the following temperature/humidity resistance test and lighting test (thermal shock test) to examine their durability.
耐11uUK訣
温度80°C1相対湿度90%の雰囲気中に1゜0時間
放置した後乾燥させ、表面保護層の状態を観察した。After being left in an atmosphere with a temperature of 80°C and a relative humidity of 90% for 1°0 hours, it was dried and the condition of the surface protective layer was observed.
対照の反射板Cは保護層に剥離が発生していたのに対し
、本発明の反射板A及びBは曇りの発生はもちろん、何
等の変化も認められなかった。In the control reflector C, peeling occurred in the protective layer, whereas in the reflectors A and B of the present invention, not only fogging but also no change was observed.
んU暖
1350Wのハロゲンランプによって6秒間照射と5秒
間消灯とを20回繰り返したのち10分間休止する試験
を100時間実施して、表面保護層の状態を観察した。A test was conducted for 100 hours in which irradiation for 6 seconds and turning off for 5 seconds was repeated 20 times using a 1350 W halogen lamp, followed by a rest for 10 minutes, and the state of the surface protective layer was observed.
対照の反射板Cは保護層にはクラックと剥離が発生して
いたのに対し、本発明の反射板A及びBには何等の変化
も認められなかった。While the control reflective plate C had cracks and peeling in the protective layer, no changes were observed in the reflective plates A and B of the present invention.
本発明の反射板は、耐温湿性及び耐熱衝撃性が優れてお
り、長期間にわたって安定した使用ができる特長がある
。The reflective plate of the present invention has excellent temperature and humidity resistance and thermal shock resistance, and has the advantage of being able to be used stably over a long period of time.
第1図は本発明の反射板の構成を示す断面図である。
1・・・反射板基体、2・・・鏡面部分、3・・・表面
保護層。
第
図FIG. 1 is a sectional view showing the structure of a reflector of the present invention. DESCRIPTION OF SYMBOLS 1...Reflector base body, 2... Mirror surface part, 3... Surface protective layer. Diagram
Claims (1)
面部分に窒化珪素と二酸化珪素との混合物からなる表面
保護層を設けたことを特徴とする反射板。1. A reflector plate comprising a surface protective layer made of a mixture of silicon nitride and silicon dioxide provided on a mirror surface portion of an aluminum alloy reflector substrate having a predetermined shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2135312A JPH0430102A (en) | 1990-05-28 | 1990-05-28 | Reflecting plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2135312A JPH0430102A (en) | 1990-05-28 | 1990-05-28 | Reflecting plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0430102A true JPH0430102A (en) | 1992-02-03 |
Family
ID=15148793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2135312A Pending JPH0430102A (en) | 1990-05-28 | 1990-05-28 | Reflecting plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0430102A (en) |
-
1990
- 1990-05-28 JP JP2135312A patent/JPH0430102A/en active Pending
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