JPS635301A - Reflecting mirror - Google Patents
Reflecting mirrorInfo
- Publication number
- JPS635301A JPS635301A JP14901686A JP14901686A JPS635301A JP S635301 A JPS635301 A JP S635301A JP 14901686 A JP14901686 A JP 14901686A JP 14901686 A JP14901686 A JP 14901686A JP S635301 A JPS635301 A JP S635301A
- Authority
- JP
- Japan
- Prior art keywords
- photocatalyst layer
- reflecting mirror
- layer
- mirror
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011941 photocatalyst Substances 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 19
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 5
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 4
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 9
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 230000001681 protective effect Effects 0.000 abstract description 3
- -1 Fe23 Inorganic materials 0.000 abstract 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 description 14
- 238000005498 polishing Methods 0.000 description 9
- 229910052736 halogen Inorganic materials 0.000 description 8
- 150000002367 halogens Chemical class 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000011253 protective coating Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000003973 paint Substances 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 238000005566 electron beam evaporation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000008093 supporting effect Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 206010016275 Fear Diseases 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- WHOPEPSOPUIRQQ-UHFFFAOYSA-N oxoaluminum Chemical compound O1[Al]O[Al]1 WHOPEPSOPUIRQQ-UHFFFAOYSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
この発明は、白熱ランプ、ハロゲンランプ、水銀灯等の
照明器具に使用される冑効率反射鏡に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a helmet efficiency reflector used in lighting equipment such as incandescent lamps, halogen lamps, and mercury lamps.
白熱ランプ、ハロゲンランプ、水銀灯等の照明器具の照
射効率を高めるために反射鏡が使用されている。Reflectors are used to improve the irradiation efficiency of lighting equipment such as incandescent lamps, halogen lamps, and mercury lamps.
このような反射鏡は、たとえば、金属基材を化学研磨、
電解研磨９胴布研磨等によって研磨して鏡面としたり、
第３図にみるように、金属、プラスチック、ガラス、セ
ラミック等の基材３表面に直接に、あるいは、有機塗装
被膜等の下地層を介して、ＡＩ、 Ａｇ等の光輝性金属
膜４を形成して鏡面とした表面に、アルマイト、透明塗
装膜、金属酸化物膜等の透明な保護被膜６を形成するこ
とで製造されている。Such a reflector can be manufactured by, for example, chemically polishing a metal substrate,
Electrolytic polishing 9 Polishing to a mirror surface by cloth polishing, etc.
As shown in FIG. 3, a bright metal film 4 such as AI or Ag is formed directly on the surface of a base material 3 such as metal, plastic, glass, or ceramic, or via a base layer such as an organic paint film. It is manufactured by forming a transparent protective coating 6 such as alumite, a transparent coating film, a metal oxide film, etc. on a mirror-finished surface.
このような反射鏡１′は、製造初期には、非常に反射効
率が良く、たとえば、可視域（３８０〜７８０ｎｍ）で
は８０〜９６％の反射率を示す。Such a reflecting mirror 1' has very good reflection efficiency at the initial stage of manufacture, and exhibits a reflectance of 80 to 96% in the visible range (380 to 780 nm), for example.
ところが、このような反射鏡１′は、長期間使用すると
、その表面に、雰囲気中の浮遊物（主に有機物質）が汚
れとして付着し、反射効率が低下する、と言う問題があ
る。たとえば、使用する条件にもよるが、−年間使用す
ると、２０〜５０％も反射効率が低下してしまう場合も
ある。このため、このような反射鏡１′を使用するにあ
たっては、必要に応じて、その表面の清掃を行う必要が
あるが、特に有機物の汚れは、ランプの熱により反射鏡
表面に焼き付いてしまうため、容易に取り除くことがで
きなくなってしまう。However, when such a reflecting mirror 1' is used for a long period of time, there is a problem in that floating matter (mainly organic substances) in the atmosphere adheres to the surface of the reflecting mirror 1' as dirt, reducing reflection efficiency. For example, depending on the conditions of use, the reflection efficiency may drop by as much as 20 to 50% after one year of use. Therefore, when using such a reflector 1', it is necessary to clean the surface of the reflector 1' as necessary, but organic dirt in particular is burned onto the reflector surface by the heat of the lamp. , it becomes impossible to remove it easily.
この発明は、以上の事情に鑑みてなされたものであって
、初期の高い反射率を長期間に渡って維持することがで
きる反射鏡を提供することを目的としている。This invention has been made in view of the above circumstances, and an object thereof is to provide a reflecting mirror that can maintain an initial high reflectance over a long period of time.
以上の目的を達成するため、この発明は、鏡面を有する
反射鏡であって、前記鏡面上の最上層に、透明な光触媒
層が形成されていることを特徴とする反射鏡を要旨とし
ている。In order to achieve the above object, the gist of the present invention is a reflecting mirror having a mirror surface, characterized in that a transparent photocatalyst layer is formed on the uppermost layer on the mirror surface.
以下に、この発明を、その一実施例をあられす図面を参
照しつつ、詳しく説明する。Hereinafter, one embodiment of the present invention will be described in detail with reference to the accompanying drawings.
第１図にみるように、この発明の反射鏡１は、たとえば
、白熱ランプ、ハロゲンランプ、水銀灯等の光源２の後
方に設けられて使用されるものである。As shown in FIG. 1, a reflecting mirror 1 of the present invention is used by being provided behind a light source 2 such as an incandescent lamp, a halogen lamp, or a mercury lamp.
この実施例では、第２図にみるように、基材３表面に直
接に、あるいは、有ｉ＝装被膜等の下地層を介して、Ａ
Ｉ、 Ａｇ等の光輝性金属膜４を形成して鏡面５が形成
されている。In this embodiment, as shown in FIG. 2, A
A mirror surface 5 is formed by forming a glittering metal film 4 of I, Ag, or the like.
基材３の材料としては、これに限定されるものではない
が、たとえば、金属、プラスチック、ガラス、セラミッ
ク等を使用することができる。また、以上のような鏡面
５は、金属基材を化学研磨、電解研磨２胴布研磨等によ
って研磨して形成されるようであっても構わない。Although the material of the base material 3 is not limited to this, for example, metal, plastic, glass, ceramic, etc. can be used. Further, the mirror surface 5 as described above may be formed by polishing a metal base material by chemical polishing, electrolytic polishing, double cloth polishing, or the like.
以上のようにして形成された鏡面５の表面には、必要に
応じて、従来と同様な保護被膜６を形成してもよい。A conventional protective coating 6 may be formed on the surface of the mirror surface 5 formed as described above, if necessary.
このような保護被膜６の材料としては、これに限定され
るものではないが、たとえば、鏡面５が金属基材表面を
研磨したものである場合には、その表面を酸化してなる
アルマイト等の酸化膜を、また、鏡面５が基材３表面に
光輝性金属膜４を形成してなるものである場合には、有
機塗料等の透明塗装膜、５ｉ０２． Ａｌ２Ｏ２、Ｃｅ
０ｚ、 Ｍｇｈ等を真空薄着等の方法で形成した金属酸
化物膜等を使用することができる。The material for such a protective coating 6 is not limited to this, but for example, if the mirror surface 5 is a polished surface of a metal base material, an alumite or the like made by oxidizing the surface may be used. In the case where the mirror surface 5 is formed by forming a glittering metal film 4 on the surface of the base material 3, a transparent coating film such as an organic paint, 5i02. Al2O2, Ce
A metal oxide film formed of Oz, Mgh, etc. by a method such as vacuum deposition can be used.
以上のようにして形成された鏡面５上に、前記保護被膜
６を介して、あるいは、介さず直接に、その最上層に、
透明な光触媒層７が形成されることで、この発明の反射
鏡１は構成されている。Directly onto the mirror surface 5 formed as described above, with or without the protective coating 6, as the top layer.
The reflective mirror 1 of the present invention is configured by forming the transparent photocatalyst layer 7.
このような光触媒層７に使用される物質としては、Ｔｉ
０ｚ、’Ｆｅ２Ｏ：＋ 、 Ｉｎ２Ｏ３および−ｏ３か
らなる群より選ばれた少なくとも１つの化合物を挙げる
ことができる。このような化合物を前記光触媒層とする
方法は、この発明では特に限定されないが、たとえば、
以下の方法によることができる。The material used for such a photocatalyst layer 7 is Ti.
At least one compound selected from the group consisting of Oz, 'Fe2O:+, In2O3 and -o3 can be mentioned. The method of using such a compound as the photocatalyst layer is not particularly limited in the present invention, but for example,
This can be done by the following method.
抵抗加熱による真空蒸着法、スパッタリング法、電子銃
による電子ビーム蒸着法およびイオンブレーティング法
等の真空プロセス、
前記化合物中の金属（Ｔｉ、 Ｆｅ、 Ｉｎ、 Ｗ等）
を含む有機金属化合物溶液を、鏡面５上に塗布し、乾燥
したあと、それを高温で焼き付ける方法、前記化合物の
微粒子粉末を透明塗料中にｌ捏合分散させておき、これ
を鏡面５上に塗布乾燥させて塗膜を形成する方法等。Vacuum processes such as vacuum evaporation method using resistance heating, sputtering method, electron beam evaporation method using an electron gun, and ion blating method, metals in the compound (Ti, Fe, In, W, etc.)
A method of applying an organometallic compound solution containing the compound on the mirror surface 5, drying it, and then baking it at a high temperature, or kneading and dispersing the fine particle powder of the compound in a transparent paint, and applying this on the mirror surface 5. Method of drying to form a coating film, etc.
なお、最後の、微粒子粉末を透明塗料中に混合分散させ
ておいて、それによって塗膜を形成する方法では、分散
させる化合物の微粒子粉末の粒径が０．１−以下であり
、透明塗料に対する添加量が１０〜２０％であることが
好ましい。なぜなら、微粒子粉末の粒径が０．１μｍを
越えると、この微粒子粉末による隠蔽が強くなって塗膜
の透明性が低下する傾向がある。また、添加量が１０％
未満では添加した効果が充分でなく、逆に２０％を越え
ると、やはり、塗膜の透明性が低下する傾向があるから
である。In addition, in the last method of mixing and dispersing fine particulate powder in a transparent paint and thereby forming a coating film, the particle size of the fine particulate powder of the compound to be dispersed is 0.1- or less, and It is preferable that the amount added is 10 to 20%. This is because, if the particle size of the fine particle powder exceeds 0.1 μm, the concealment by the fine particle powder becomes strong and the transparency of the coating film tends to decrease. In addition, the amount added is 10%
If it is less than 20%, the added effect will not be sufficient, and if it exceeds 20%, the transparency of the coating film will tend to decrease.
前記各方法で形成される光触媒層７の膜厚は、この発明
では、特に限定されるものではないが、０．５〜５μｍ
程度であることが好ましい。なぜなら、光触媒層７の膜
厚が０．５ ｔｒｍ未満では、その触媒効果が充分でな
く、逆に、光触媒層７の膜厚が５μｍを越えると、場合
によっては、その透明性が著しく低下する恐れがあり、
透明性が低下しない場合であっても、５−以下の場合と
触媒効果が余り変わらない傾向があるからである。In the present invention, the thickness of the photocatalyst layer 7 formed by each of the above methods is not particularly limited, but is 0.5 to 5 μm.
It is preferable that the degree of This is because if the thickness of the photocatalytic layer 7 is less than 0.5 trm, its catalytic effect will not be sufficient, and conversely, if the thickness of the photocatalytic layer 7 exceeds 5 μm, its transparency may drop significantly in some cases. There is fear;
This is because even if the transparency does not decrease, the catalytic effect tends to be not much different from that in the case of 5- or less.
以上のような光触媒層７には、さらに、Ｐｉ、 Ｐｄ、
ＲｈおよびＩｒよりなる群から選ばれた少なくとも１
つの金属を担持させるようであってもよい。このような
金属は、付着した汚れを分解する触媒として働（もので
あって、それを光触媒層７に担持させることにより、汚
れの除去作用をより活発に行わせることができるように
なるのである。The photocatalyst layer 7 as described above further contains Pi, Pd,
At least one selected from the group consisting of Rh and Ir
It is also possible to support one metal. Such metals act as catalysts to decompose adhered dirt, and by supporting them on the photocatalyst layer 7, the dirt removal action can be performed more actively. .
このような金属を光触媒層７に担持させる方法は、この
発明では、特に限定されないが、たとえば、以下のよう
な方法を用いることができる。すなわち、前記金属の可
溶性塩を水溶液とし、それに前記光触媒層７が形成され
た反射鏡１を浸漬して、前記可溶性塩を光触媒層７に染
み込ませる。The method of supporting such a metal on the photocatalyst layer 7 is not particularly limited in the present invention, but for example, the following method can be used. That is, the soluble salt of the metal is made into an aqueous solution, and the reflecting mirror 1 on which the photocatalyst layer 7 is formed is immersed in the aqueous solution, so that the photocatalyst layer 7 is soaked with the soluble salt.
そのあと、これに、紫外線等を照射して可溶性塩を分解
し、光触媒層７中に、前記金属を担持させるのである。Thereafter, this is irradiated with ultraviolet rays or the like to decompose the soluble salt, and the metal is supported in the photocatalyst layer 7.
なお、以上のようにして担持させる金属の量も、この発
明では特に限定されないが、光触媒層に対して、０．１
〜２％の金属を担持させることが好ましい。なぜなら、
担持量が０．１％未満では、担持させる効果が充分に得
られず、２％を越えると、光触媒層の透明性が低下して
しまう恐れがあるからである。Note that the amount of metal supported in the above manner is not particularly limited in the present invention, but 0.1
Preferably, ~2% metal is supported. because,
This is because if the supported amount is less than 0.1%, a sufficient supporting effect cannot be obtained, and if it exceeds 2%, the transparency of the photocatalyst layer may decrease.
以上のように、最上層に光触媒層７が形成された、この
発明の反射鏡１においては、雰囲気中の浮遊物が汚れと
して付着しても、それは、前記光触媒層７中のＴｉＯ２
，Ｆｅａｒｓ 、 Ｉｎ２Ｏ３および−０３等の金属化
合物や、Ｐｔ、 Ｐｄ、 Ｒｈおよびｒｒ等の金属と、
光源からの紫外線との作用によって分解され除去される
。したがって、このような汚れが、光触媒層７表面に残
ることはなく、反射鏡表面を常に清潔に保つことができ
るようになる。As described above, in the reflecting mirror 1 of the present invention in which the photocatalyst layer 7 is formed on the uppermost layer, even if floating matter in the atmosphere adheres as dirt, it is difficult to remove the TiO2 in the photocatalyst layer 7.
, Fears, In2O3 and -03, and metals such as Pt, Pd, Rh and rr,
It is decomposed and removed by the action of ultraviolet light from the light source. Therefore, such dirt does not remain on the surface of the photocatalyst layer 7, and the surface of the reflecting mirror can always be kept clean.
つぎに、この発明の実施例について、比較例とあわせて
、説明する。Next, examples of the present invention will be described together with comparative examples.
（実施例１）
プレスあるいはヘラ絞り等の方法で所望の形状に成形さ
れたアルミニウム基板表面を脱脂後、リン酸７２．３重
量％、硝酸６．９重量％、水１８．９重盪％２リン酸ア
ルミニウム１．９重量％からなり１００℃に加熱された
化学研磨液中に１２０秒間浸漬して、その表面を研磨し
た。その後このアルミニウム基板を充分に水洗、乾燥し
て、鏡面を得た。この鏡面に対し、酸化チタンの微粒子
粉末（粒径０．０８−）を１０％添加したシリコン系透
明塗料をスプレー法によって塗布し、２２０〜２５０°
Ｃで２０分間の焼付を行い、厚み３〜５μｍの透明な光
触媒層が形成された反射鏡を得た。得られた反射鏡は、
可視光線（３８０〜７８０μｍ）の平均反射率が８５％
であった。以上のような反射鏡を、水銀灯使用の高天井
用照明器具に使用したところ、１００００時間運転後も
、その表面への汚れの付着は殆ど認められず、また、平
均反射率も殆ど変化しなかった。(Example 1) After degreasing the surface of an aluminum substrate formed into a desired shape by a method such as pressing or drawing with a spatula, 72.3% by weight of phosphoric acid, 6.9% by weight of nitric acid, and 18.9% by weight of water were added. The surface was polished by immersing it in a chemical polishing solution containing 1.9% by weight of aluminum phosphate and heated to 100° C. for 120 seconds. Thereafter, this aluminum substrate was sufficiently washed with water and dried to obtain a mirror surface. A silicone-based transparent paint containing 10% titanium oxide fine particle powder (particle size 0.08-) was applied to this mirror surface by a spray method, and
Baking was performed at C for 20 minutes to obtain a reflecting mirror on which a transparent photocatalyst layer with a thickness of 3 to 5 μm was formed. The obtained reflector is
Average reflectance of visible light (380-780μm) is 85%
Met. When the above-mentioned reflector was used in a high-ceiling lighting fixture that uses a mercury lamp, almost no dirt was observed on its surface even after 10,000 hours of operation, and the average reflectance remained almost unchanged. Ta.
（実施例２）
プレス成形によってパラボラ形に成形された硬質ガラス
基材の表面に、ｌＸｌ０−ｓ〜ｌＸｌ０−’Ｔｏｒｒの
真空下、抵抗加熱蒸着法によって厚み７００〜１０００
人の光輝性アルミニウム膜を形成した。つぎに、この光
輝性アルミニウム膜の上に、Ｉ Ｘ １０−’〜５ Ｘ
１０−’Ｔｏｒｒの真空下、電子ビーム蒸着法によっ
て厚み４０００〜７０００人の透明な二酸化珪素保護被
膜を形成した。このあと、この上に、さらに、電子ビー
ム蒸着法により、厚み１．０〜１．２μｍの酸化チタン
製光触媒層を形成し、反射鏡を得た。得られた反射鏡は
、可視光線の平均反射率が９０％であった。以上のよう
な反射鏡を、ミニハロゲンランプスポットライトに使用
したところ、１００００時間運転後も、その表面への汚
れの付着は殆ど認められず、また、平均反射率も殆ど変
化しなかった。(Example 2) On the surface of a hard glass substrate formed into a parabolic shape by press molding, a thickness of 700 to 1000 was formed by resistance heating vapor deposition under a vacuum of lXl0-s to lXl0-'Torr.
A photoluminescent aluminum film was formed. Next, on this bright aluminum film, I X 10-' to 5 X
A transparent silicon dioxide protective coating having a thickness of 4,000 to 7,000 wafers was formed by electron beam evaporation under a vacuum of 10-' Torr. Thereafter, a titanium oxide photocatalyst layer having a thickness of 1.0 to 1.2 μm was further formed thereon by electron beam evaporation to obtain a reflecting mirror. The resulting reflecting mirror had an average reflectance of 90% for visible light. When the above-mentioned reflector was used in a mini halogen lamp spotlight, almost no dirt was observed on the surface of the reflector even after 10,000 hours of operation, and the average reflectance hardly changed.
（実施例３）
実施例２と同様にして、二酸化珪素保護被膜までを形成
した硬質ガラス基材を、テトライソプロポキシチタン（
Ｔｉ（０−ｉＣ３Ｈ７）４） （７） ５％エタ） −
／Ｌ。(Example 3) In the same manner as in Example 2, a hard glass substrate on which a silicon dioxide protective film was formed was coated with tetraisopropoxytitanium (
Ti(0-iC3H7)4) (7) 5% eta) -
/L.
２８２反に繰り返し浸ン貞、乾燥させたあと、５００
’ｃで３０分間焼付し、酸化チタンからなる光触媒層が
形成された反射鏡を得た。形成された光触媒層の膜厚は
１．０μｍであった。つぎに、この反射鏡を、塩化白金
水溶液に浸漬したあと、これに紫外線を照射して、光触
媒層に白金を担持させた。光触媒層への白金の担持量は
１％であった。こうして得られた反射鏡は、可視光線の
平均反射率が９０％であった。以上のような反射鏡を、
ミニハロゲンランプスポットライトに使用したところ、
１００００時間運転後も、その表面への汚れの付着は殆
ど認められず、また、平均反射率も殆ど変化しなかった
。After repeatedly soaking in 282 sheets and drying, 500
'c for 30 minutes to obtain a reflecting mirror on which a photocatalyst layer made of titanium oxide was formed. The thickness of the photocatalyst layer formed was 1.0 μm. Next, this reflecting mirror was immersed in a platinum chloride aqueous solution and then irradiated with ultraviolet rays to cause platinum to be supported on the photocatalyst layer. The amount of platinum supported on the photocatalyst layer was 1%. The reflector thus obtained had an average reflectance of visible light of 90%. A reflector like the one above,
When used in a mini halogen lamp spotlight,
Even after 10,000 hours of operation, almost no dirt was observed on the surface, and the average reflectance hardly changed.
（比較例１）
最上層に光触媒層を形成しなかった以外は、実施例２．
３と同様にして反射鏡を作製した。得られた反射鏡の製
造直後の可視光線の平均反射率は９０％であった。この
反射鏡を、ミニハロゲンランプスポットライトに使用し
たところ、１００００時間運転後には、その表面に、か
なりの汚れが付着していることが観察され、可視光線の
平均反射率が７８％に低下していた。(Comparative Example 1) Example 2 except that the photocatalyst layer was not formed on the top layer.
A reflecting mirror was produced in the same manner as in 3. The average reflectance of visible light of the obtained reflecting mirror immediately after manufacture was 90%. When this reflector was used in a mini halogen lamp spotlight, it was observed that after 10,000 hours of operation, a considerable amount of dirt had adhered to its surface, and the average reflectance of visible light decreased to 78%. was.
（実施例４）
実施例２と同様にして、二酸化珪素保護被膜までを形成
した硬質ガラス基材に、さらに、１×１０−５〜Ｉ Ｘ
１０−’Ｔｏｒｒの真空下、電子ビーム１着法により
、厚み１．０〜１．２−の酸化インジウム製光触媒層を
形成し、反射鏡を得た。得られた反射鏡は、可視光線の
平均反射率が８８％であった。(Example 4) In the same manner as in Example 2, a hard glass substrate with a silicon dioxide protective coating formed thereon was further coated with 1 x 10-5 to I
An indium oxide photocatalyst layer having a thickness of 1.0 to 1.2 mm was formed by the electron beam single deposition method under a vacuum of 10 Torr to obtain a reflecting mirror. The resulting reflecting mirror had an average reflectance of visible light of 88%.
以上のような反射鏡を、ミニハロゲンランプスポットラ
イトに使用したところ、１００００時間運転後も、その
表面への汚れの付着は殆ど認められず、また、平均反射
率も殆ど変化しなかった。When the above-mentioned reflector was used in a mini halogen lamp spotlight, almost no dirt was observed on the surface of the reflector even after 10,000 hours of operation, and the average reflectance hardly changed.
（実施例５）
前記実施例４で得られた反射鏡を、塩化パラジウム水溶
液に浸漬し乾燥させたあと、これに紫外線を照射して、
光触媒層にパラジウムを０．５％担持させた。こうして
得られた反射鏡は、可視光線の平均反射率が８８％であ
った。以上のような反射１を、ミニハロゲンランプスポ
ットライトに使用したところ、１００００時間運転後も
、その表面への汚れの付着は殆ど認められず、また、平
均反射率も殆ど変化しなかった。(Example 5) The reflecting mirror obtained in Example 4 was immersed in a palladium chloride aqueous solution and dried, and then irradiated with ultraviolet rays,
0.5% palladium was supported on the photocatalyst layer. The reflector thus obtained had an average reflectance of visible light of 88%. When Reflection 1 as described above was used in a mini halogen lamp spotlight, almost no dirt was observed on its surface even after 10,000 hours of operation, and the average reflectance hardly changed.
この発明の反射鏡は以上のようであり、鏡面上の最上層
に、透明な光触媒層が形成されているため、初期の高い
反射率を長期間に渡って維持することができるようにな
っている。The reflecting mirror of this invention is as described above, and since a transparent photocatalyst layer is formed on the top layer of the mirror surface, it is possible to maintain an initial high reflectance over a long period of time. There is.
第１図はこの発明の反射鏡を照明器具に使用する場合の
構成を説明する説明図、第２図はこの発明の一実施例の
構成を説明する説明図、第３図は従来の反射鏡を照明器
具に使用する場合の構成を説明する説明図である。
１・・・反射鏡 ５・・・鏡面 ７・・・光触媒層代理
人 弁理士 松 本 武 彦
第１図 第３図Fig. 1 is an explanatory diagram illustrating the configuration when the reflecting mirror of the present invention is used in a lighting equipment, Fig. 2 is an explanatory diagram illustrating the configuration of an embodiment of the present invention, and Fig. 3 is an explanatory diagram illustrating the configuration of a conventional reflecting mirror. FIG. 2 is an explanatory diagram illustrating a configuration when used in a lighting fixture. 1...Reflector 5...Mirror surface 7...Photocatalyst layer agent Patent attorney Takehiko Matsumoto Figure 1 Figure 3
Claims (3)
層に、透明な光触媒層が形成されていることを特徴とす
る反射鏡。(1) A reflecting mirror having a mirror surface, characterized in that a transparent photocatalyst layer is formed on the uppermost layer on the mirror surface.
＿２Ｏ＿３およびＷＯ＿３からなる群より選ばれた少な
くとも１つである特許請求の範囲第１項記載の反射鏡。(2) The photocatalyst layer is TiO_2, Fe_2O_3, In
The reflecting mirror according to claim 1, which is at least one selected from the group consisting of _2O_3 and WO_3.
る群から選ばれた少なくとも１つの金属が担持されてい
る特許請求の範囲第１項または第２項記載の反射鏡。(3) The reflecting mirror according to claim 1 or 2, wherein the photocatalyst layer supports at least one metal selected from the group consisting of Pt, Pd, Rh, and Ir.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14901686A JPS635301A (en) | 1986-06-25 | 1986-06-25 | Reflecting mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14901686A JPS635301A (en) | 1986-06-25 | 1986-06-25 | Reflecting mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS635301A true JPS635301A (en) | 1988-01-11 |
Family
ID=15465828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14901686A Pending JPS635301A (en) | 1986-06-25 | 1986-06-25 | Reflecting mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS635301A (en) |
Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02284629A (en) * | 1989-04-26 | 1990-11-22 | Matsushita Electric Ind Co Ltd | Method for regenerating photocatalyst and deodorizing device with photocatalyst |
| JPH07163887A (en) * | 1993-12-15 | 1995-06-27 | Nikon Corp | Antifungal method of object and object protected by the method |
| JPH07171408A (en) * | 1993-06-28 | 1995-07-11 | Ishihara Sangyo Kaisha Ltd | Photocatalyst body and method for producing the same |
| JPH09129012A (en) * | 1995-03-31 | 1997-05-16 | Toshiba Lighting & Technol Corp | Photocatalysts, fluorescent lamps and lighting fixtures |
| JPH09227829A (en) * | 1995-12-22 | 1997-09-02 | Toto Ltd | Photocatalytic hydrophilic coating composition, method for forming hydrophilic coating and coated article |
| JPH09225011A (en) * | 1995-04-28 | 1997-09-02 | Toshiba Lighting & Technol Corp | Lighting equipment |
| JPH09231821A (en) * | 1995-12-22 | 1997-09-05 | Toto Ltd | Luminaire and method for maintaining illuminance |
| JPH09230810A (en) * | 1995-12-22 | 1997-09-05 | Toto Ltd | Outdoor display board and its cleaning method |
| JPH09251804A (en) * | 1996-03-14 | 1997-09-22 | Toshiba Lighting & Technol Corp | Lighting equipment |
| JPH09313887A (en) * | 1996-05-28 | 1997-12-09 | Agency Of Ind Science & Technol | Photocatalyst sheet |
| WO1999033564A1 (en) * | 1997-12-23 | 1999-07-08 | Studiengesellschaft Kohle Mbh | Highly porous photocatalyst for utilising visible light |
| JPH11512337A (en) * | 1995-09-15 | 1999-10-26 | サン−ゴバン ビトラージュ | Substrate with photocatalytic coating |
| JPH11512336A (en) * | 1995-09-15 | 1999-10-26 | ロディア シミ | Substrate with photocatalytic coating based on titanium dioxide and organic dispersion based on titanium dioxide |
| US6013372A (en) * | 1995-03-20 | 2000-01-11 | Toto, Ltd. | Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with superhydrophilic photocatalytic surface, and method of making thereof |
| US6090489A (en) * | 1995-12-22 | 2000-07-18 | Toto, Ltd. | Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface |
| JP2000315420A (en) * | 1999-04-30 | 2000-11-14 | Shimadzu Corp | Lighting device with air purifying function |
| US6337129B1 (en) | 1997-06-02 | 2002-01-08 | Toto Ltd. | Antifouling member and antifouling coating composition |
| JP2002160256A (en) * | 2000-11-24 | 2002-06-04 | Koito Mfg Co Ltd | Lamp instrument constituent member made of synthetic resin and method for forming surface film thereof |
| US6413581B1 (en) | 1997-03-14 | 2002-07-02 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
| US6447123B2 (en) | 1999-06-25 | 2002-09-10 | Gentex Corporation | Electrochromic device having a self-cleaning hydrophilic coating |
| US6816297B1 (en) | 1999-06-25 | 2004-11-09 | Gentex Corporation | Electrochromic mirror having a self-cleaning hydrophilic coating |
| EP0689962B2 (en) † | 1994-06-29 | 2005-07-06 | Murakami Kaimeido Co., Ltd | Vehicle mirror |
| US6939611B2 (en) | 1994-10-31 | 2005-09-06 | Kanagawa Academy Of Science And Technology | Window glass employing titanium dioxide photocatalyst |
| JP2006343293A (en) * | 2005-06-10 | 2006-12-21 | Toyota Motor Corp | Exhaust gas analyzer |
-
1986
- 1986-06-25 JP JP14901686A patent/JPS635301A/en active Pending
Cited By (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02284629A (en) * | 1989-04-26 | 1990-11-22 | Matsushita Electric Ind Co Ltd | Method for regenerating photocatalyst and deodorizing device with photocatalyst |
| JPH07171408A (en) * | 1993-06-28 | 1995-07-11 | Ishihara Sangyo Kaisha Ltd | Photocatalyst body and method for producing the same |
| US6498000B2 (en) | 1993-06-28 | 2002-12-24 | Ishihara Sangyo Kaisha, Ltd. | Photocatalyst composite and process for producing the same |
| JPH07163887A (en) * | 1993-12-15 | 1995-06-27 | Nikon Corp | Antifungal method of object and object protected by the method |
| EP0689962B2 (en) † | 1994-06-29 | 2005-07-06 | Murakami Kaimeido Co., Ltd | Vehicle mirror |
| US7327074B2 (en) | 1994-10-31 | 2008-02-05 | Kanagawa Academy Of Science And Technology | Illuminating devices employing titanium dioxide photocatalysts |
| US7157840B2 (en) | 1994-10-31 | 2007-01-02 | Kanagawa Academy Of Science And Technology | Illuminating devices employing titanium dioxide photocatalysts |
| US6939611B2 (en) | 1994-10-31 | 2005-09-06 | Kanagawa Academy Of Science And Technology | Window glass employing titanium dioxide photocatalyst |
| US6013372A (en) * | 1995-03-20 | 2000-01-11 | Toto, Ltd. | Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with superhydrophilic photocatalytic surface, and method of making thereof |
| JPH09129012A (en) * | 1995-03-31 | 1997-05-16 | Toshiba Lighting & Technol Corp | Photocatalysts, fluorescent lamps and lighting fixtures |
| JPH09225011A (en) * | 1995-04-28 | 1997-09-02 | Toshiba Lighting & Technol Corp | Lighting equipment |
| JPH11512337A (en) * | 1995-09-15 | 1999-10-26 | サン−ゴバン ビトラージュ | Substrate with photocatalytic coating |
| JPH11512336A (en) * | 1995-09-15 | 1999-10-26 | ロディア シミ | Substrate with photocatalytic coating based on titanium dioxide and organic dispersion based on titanium dioxide |
| JPH09231821A (en) * | 1995-12-22 | 1997-09-05 | Toto Ltd | Luminaire and method for maintaining illuminance |
| JPH09227829A (en) * | 1995-12-22 | 1997-09-02 | Toto Ltd | Photocatalytic hydrophilic coating composition, method for forming hydrophilic coating and coated article |
| JPH09230810A (en) * | 1995-12-22 | 1997-09-05 | Toto Ltd | Outdoor display board and its cleaning method |
| US6090489A (en) * | 1995-12-22 | 2000-07-18 | Toto, Ltd. | Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface |
| JPH09251804A (en) * | 1996-03-14 | 1997-09-22 | Toshiba Lighting & Technol Corp | Lighting equipment |
| JPH09313887A (en) * | 1996-05-28 | 1997-12-09 | Agency Of Ind Science & Technol | Photocatalyst sheet |
| US6413581B1 (en) | 1997-03-14 | 2002-07-02 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
| US6337129B1 (en) | 1997-06-02 | 2002-01-08 | Toto Ltd. | Antifouling member and antifouling coating composition |
| WO1999033564A1 (en) * | 1997-12-23 | 1999-07-08 | Studiengesellschaft Kohle Mbh | Highly porous photocatalyst for utilising visible light |
| JP2000315420A (en) * | 1999-04-30 | 2000-11-14 | Shimadzu Corp | Lighting device with air purifying function |
| US6816297B1 (en) | 1999-06-25 | 2004-11-09 | Gentex Corporation | Electrochromic mirror having a self-cleaning hydrophilic coating |
| US6447123B2 (en) | 1999-06-25 | 2002-09-10 | Gentex Corporation | Electrochromic device having a self-cleaning hydrophilic coating |
| JP2002160256A (en) * | 2000-11-24 | 2002-06-04 | Koito Mfg Co Ltd | Lamp instrument constituent member made of synthetic resin and method for forming surface film thereof |
| JP2006343293A (en) * | 2005-06-10 | 2006-12-21 | Toyota Motor Corp | Exhaust gas analyzer |
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