JPH0430738B2 - - Google Patents

Info

Publication number
JPH0430738B2
JPH0430738B2 JP58126115A JP12611583A JPH0430738B2 JP H0430738 B2 JPH0430738 B2 JP H0430738B2 JP 58126115 A JP58126115 A JP 58126115A JP 12611583 A JP12611583 A JP 12611583A JP H0430738 B2 JPH0430738 B2 JP H0430738B2
Authority
JP
Japan
Prior art keywords
semiconductor wafer
heating
port
transport
cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58126115A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6018919A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58126115A priority Critical patent/JPS6018919A/ja
Publication of JPS6018919A publication Critical patent/JPS6018919A/ja
Publication of JPH0430738B2 publication Critical patent/JPH0430738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58126115A 1983-07-13 1983-07-13 半導体ウエハ−の加熱装置 Granted JPS6018919A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58126115A JPS6018919A (ja) 1983-07-13 1983-07-13 半導体ウエハ−の加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58126115A JPS6018919A (ja) 1983-07-13 1983-07-13 半導体ウエハ−の加熱装置

Publications (2)

Publication Number Publication Date
JPS6018919A JPS6018919A (ja) 1985-01-31
JPH0430738B2 true JPH0430738B2 (de) 1992-05-22

Family

ID=14927003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58126115A Granted JPS6018919A (ja) 1983-07-13 1983-07-13 半導体ウエハ−の加熱装置

Country Status (1)

Country Link
JP (1) JPS6018919A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2691907B2 (ja) * 1988-05-27 1997-12-17 東京エレクトロン株式会社 加熱方法及び処理装置及び処理方法
JP2784452B2 (ja) * 1988-10-20 1998-08-06 東京エレクトロン株式会社 基板の加熱装置及びレジスト処理装置及びレジスト処理方法

Also Published As

Publication number Publication date
JPS6018919A (ja) 1985-01-31

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