JPH04310321A - Manufacture and surface treatment of metal probe - Google Patents
Manufacture and surface treatment of metal probeInfo
- Publication number
- JPH04310321A JPH04310321A JP7757491A JP7757491A JPH04310321A JP H04310321 A JPH04310321 A JP H04310321A JP 7757491 A JP7757491 A JP 7757491A JP 7757491 A JP7757491 A JP 7757491A JP H04310321 A JPH04310321 A JP H04310321A
- Authority
- JP
- Japan
- Prior art keywords
- metal probe
- sodium hydroxide
- probe
- voltage
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 title claims abstract description 71
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 title claims description 57
- 239000002184 metal Substances 0.000 title claims description 57
- 238000004381 surface treatment Methods 0.000 title claims description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 69
- 238000005498 polishing Methods 0.000 claims abstract description 26
- 239000003792 electrolyte Substances 0.000 claims abstract description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 26
- 239000007864 aqueous solution Substances 0.000 claims description 14
- 239000008151 electrolyte solution Substances 0.000 claims description 13
- 229910052697 platinum Inorganic materials 0.000 claims description 13
- 239000007769 metal material Substances 0.000 claims description 10
- 239000000243 solution Substances 0.000 claims description 9
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 239000002341 toxic gas Substances 0.000 abstract 1
- 230000001988 toxicity Effects 0.000 abstract 1
- 231100000419 toxicity Toxicity 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 5
- 238000002171 field ion microscopy Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910001260 Pt alloy Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 229910000575 Ir alloy Inorganic materials 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 231100000481 chemical toxicant Toxicity 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、走査トンネル顕微鏡(
STM)におけるプローブのような鋭い先端を有する金
属探針の製造方法および表面処理方法に関する。[Industrial Application Field] The present invention relates to a scanning tunneling microscope (
The present invention relates to a method of manufacturing and a method of surface treatment of a metal probe having a sharp tip such as a probe in STM.
【0002】0002
【従来の技術】STMに用いられる金属探針の製造方法
として電解研磨法が広く知られている。図3はこの電解
研磨法を実現するための一般的な電解研磨装置の構成図
である。この図において、1は探針を形成するための金
属材料例えば白金線、2は白金線1の対極となる電極、
3は白金線1を電解研磨する媒体となる電解液、4は電
解液を収容する電解槽、5は電解研磨エネルギーを供給
する交流電源を示す。電解液3には、従来、濃度35[
%]の塩酸100[ml]と活性剤2[ml]との混合
液(新版電気化学便覧、電気化学協会編、昭和39年1
2月25日丸善発行)や、濃度50[%]の青酸ナトリ
ウムと濃度30[%]との等量混合液(実験生物学講座
5、電気的測定法、平本・竹中編、丸善発行)が用いら
れている。2. Description of the Related Art Electrolytic polishing is widely known as a method for manufacturing metal probes used in STM. FIG. 3 is a configuration diagram of a general electrolytic polishing apparatus for realizing this electrolytic polishing method. In this figure, 1 is a metal material for forming the probe, such as a platinum wire, 2 is an electrode that is the opposite electrode of the platinum wire 1,
Reference numeral 3 indicates an electrolytic solution serving as a medium for electropolishing the platinum wire 1, 4 indicates an electrolytic bath containing the electrolytic solution, and 5 indicates an AC power supply for supplying electrolytic polishing energy. Conventionally, the electrolytic solution 3 has a concentration of 35 [
%] of hydrochloric acid and 2 [ml] of activator (New Edition Electrochemistry Handbook, edited by the Electrochemical Society, 1968)
February 25th, published by Maruzen), and a mixture of equal volumes of sodium cyanide at a concentration of 50% and 30% (Experimental Biology Course 5, Electrical Measurement Methods, edited by Hiramoto and Takenaka, published by Maruzen) is used.
【0003】このような構成により、研磨時間の経過と
ともに白金線1の電解液3に漬けられた部分が徐々に浸
食され、その先端が尖鋭に成形される。なお、白金線1
の代わりに白金を含有する合金線を用いても同様の効果
が得られる。With this configuration, the portion of the platinum wire 1 immersed in the electrolyte 3 is gradually eroded as the polishing time progresses, and the tip thereof is formed into a sharp point. In addition, platinum wire 1
Similar effects can be obtained by using an alloy wire containing platinum instead.
【0004】一方、STMの解像度の向上を図るため、
金属探針の先端表面を更に鋭利加工する表面処理方法も
知られている。これには白金電析による表面処理方法と
電界イオン顕微鏡による表面処理方法とがある。前者の
方法は、電界析出初期に生じる島状析出物を利用して金
属探針の先端に微細な凹凸を形成することにより鋭利度
の向上を図るものである(特開平第2−88904号参
照)。また後者の方法は、電界イオン顕微鏡(FIM)
で金属探針の先端における原子配列を観察しながら加工
することにより原子分解能を得ようとするものである。On the other hand, in order to improve the resolution of STM,
A surface treatment method is also known in which the tip surface of a metal probe is further sharpened. This includes a surface treatment method using platinum electrodeposition and a surface treatment method using a field ion microscope. The former method aims to improve the sharpness by forming fine irregularities on the tip of the metal probe using island-like precipitates generated in the initial stage of electric field deposition (see Japanese Patent Application Laid-Open No. 2-88904). ). The latter method uses field ion microscopy (FIM)
The aim is to obtain atomic resolution by observing and processing the atomic arrangement at the tip of a metal probe.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、従来の
金属探針の製造方法および表面処理方法には以下のよう
な解決すべき課題があった。[Problems to be Solved by the Invention] However, conventional metal probe manufacturing methods and surface treatment methods have the following problems to be solved.
【0006】即ち、従来の金属探針の製造方法では、電
解液3に塩酸を用いているので、この電解液3から腐食
性の有害ガスが発生して白金線1以外の金属製品まで腐
食させ、人体にも悪影響を及ぼす。これに対応するには
図3に示す電界研磨装置を耐食性材料で構成しなければ
ならず、更に、換気設備も必要とする。そのため、充分
な設備投資を余儀なくされる。That is, in the conventional method for manufacturing metal probes, hydrochloric acid is used as the electrolytic solution 3, so corrosive and harmful gases are generated from the electrolytic solution 3 and corrode metal products other than the platinum wire 1. , which also has a negative effect on the human body. In order to meet this requirement, the electropolishing apparatus shown in FIG. 3 must be constructed of corrosion-resistant material, and ventilation equipment is also required. Therefore, sufficient capital investment is forced.
【0007】また、青酸ナトリウムは毒性の強い薬品な
ので、これを電解液3として用いる場合には、厳重な注
意とその管理を必要とし、製造能率の向上が図れない。Furthermore, since sodium cyanide is a highly toxic chemical, when it is used as the electrolytic solution 3, strict care and management are required, making it impossible to improve production efficiency.
【0008】更に、探針の表面処理を行う場合、白金電
析による方法ではメッキ液やメッキ用電源等を別途用意
しなければならず、FIMによる方法では高価かつ大掛
かりな真空系装置を必要とする。これらはいずれも金属
探針の製造コストの上昇を招く。Furthermore, when performing surface treatment on the probe, a method using platinum electrodeposition requires the preparation of a plating solution, a plating power source, etc. separately, and a method using FIM requires an expensive and large-scale vacuum system. do. All of these lead to an increase in the manufacturing cost of the metal probe.
【0009】本発明は上記課題を解決するために創案さ
れたものであり、その目的とするところは、安全な作業
環境および管理のもとで金属探針の製造を行うことがで
き、しかも、設備投資の負担を軽減させることができる
金属探針の製造方法を提供することにある。The present invention was devised to solve the above-mentioned problems, and its purpose is to be able to manufacture metal probes in a safe working environment and under control, and to An object of the present invention is to provide a method for manufacturing a metal probe that can reduce the burden of equipment investment.
【0010】また、本発明の他の目的は、簡易な手段、
および加工コストの低減が図れる金属探針の表面処理方
法を提供することにある。Another object of the present invention is to provide simple means,
Another object of the present invention is to provide a surface treatment method for a metal probe that can reduce processing costs.
【0011】[0011]
【課題を解決するための手段および作用】上記目的を達
成するため、本発明では、白金もしくは白金を含有する
金属材料の被研磨部分と該被研磨部分の対極をなす電極
とを電解液中に浸漬し、この金属材料および電極に所定
値の電圧を印加して電解研磨を行うことにより金属材料
の被研磨部分を尖鋭に成形するようにした金属探針の製
造方法において、前記電解液を水酸化ナトリウム水溶液
としたことを特徴とする。[Means for Solving the Problems and Effects] In order to achieve the above object, in the present invention, a part of platinum or a metal material containing platinum to be polished and an electrode opposite to the part to be polished are placed in an electrolytic solution. In a method for manufacturing a metal probe, the part of the metal material to be polished is formed into a sharp point by electrolytic polishing by applying a voltage of a predetermined value to the metal material and the electrode. It is characterized by being a sodium oxide aqueous solution.
【0012】また、金属探針の表面処理方法として、白
金もしくは白金を含有する金属材料からなる金属探針と
該金属探針の対極をなす電極とを規定濃度1乃至6の水
酸化ナトリウム水溶液に浸漬するとともに、この金属探
針および電極に5ボルト乃至10ボルトの交流電圧を印
加して電解研磨を行ない、金属探針の表面に突起体を形
成したことを特徴とする。[0012] Also, as a surface treatment method for a metal probe, a metal probe made of platinum or a metal material containing platinum and an electrode serving as a counter electrode of the metal probe are placed in a sodium hydroxide aqueous solution with a specified concentration of 1 to 6. The metal probe is immersed, and an alternating current voltage of 5 to 10 volts is applied to the metal probe and electrode to perform electrolytic polishing, thereby forming protrusions on the surface of the metal probe.
【0013】[0013]
【実施例】以下、図面を参照して本発明の実施例を説明
する。Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings.
【0014】(第一実施例)本発明の第一実施例に係る
金属探針の製造方法は、図3に示した前記金属探針の製
造装置において、交流電源5から供給される電解電圧を
0.2ボルト〜60ボルト、電解液3を水酸化ナトリウ
ム水溶液とし、その規定濃度を種々の値に変えて電解研
磨を試みたものである。(First Embodiment) A method for manufacturing a metal probe according to a first embodiment of the present invention is to use the metal probe manufacturing apparatus shown in FIG. Electrolytic polishing was attempted at 0.2 volts to 60 volts, using an aqueous sodium hydroxide solution as the electrolytic solution 3, and changing the specified concentration to various values.
【0015】その結果、水酸化ナトリウム水溶液の濃度
が1規定濃度〜5規定濃度の範囲内では、その先端半径
が0.1μm〜数μmの実用的な白金探針あるいは白金
合金探針を簡易に、且つ、再現良く形成できることが判
明した。As a result, when the concentration of the sodium hydroxide aqueous solution is within the range of 1N to 5N, it is possible to easily create a practical platinum probe or platinum alloy probe with a tip radius of 0.1 μm to several μm. , and it was found that it could be formed with good reproducibility.
【0016】上記範囲外の濃度でも先端が鋭利な探針は
形成されるのであるが、1規定濃度以下では電解反応が
遅いので作業効率が悪く、5規定濃度を超える場合は、
研磨部分周辺での電解液の対流が十分に行われなくなる
ので、実用的な先端半径のものを形成するための研磨時
間の調整が極めて微妙であり、再現性を確保することが
困難であった。また、研磨時間の調整で済まないほど濃
度が高すぎるときは、探針の先端が数10μmとなって
、STM用の探針としては使用不可のものとなった。A tip with a sharp tip can be formed even at a concentration outside the above range, but if the concentration is below 1N, the electrolytic reaction will be slow, resulting in poor work efficiency; if the concentration exceeds 5N,
Since sufficient convection of the electrolytic solution around the polished part does not take place, the polishing time needed to be adjusted to form a practical tip radius is extremely delicate, making it difficult to ensure reproducibility. . In addition, when the concentration was too high to the extent that the polishing time could not be adjusted, the tip of the probe became several tens of micrometers long, making it unusable as a probe for STM.
【0017】なお、上記製造方法において、特に、水酸
化ナトリウム水溶液を2規定濃度〜4規定濃度、電解電
圧を30ボルト〜40ボルトの交流電圧とし、電流が流
れなくなるまで電解研磨を行った場合は、数分〜20分
程度の短い時間で、0.1μm〜5μmの鋭利な先端半
径を有する探針を再現良く形成できることが確認された
。[0017] In the above manufacturing method, in particular, when the sodium hydroxide aqueous solution has a concentration of 2N to 4N, the electrolytic voltage is an AC voltage of 30 to 40V, and electrolytic polishing is performed until no current flows. It was confirmed that a probe having a sharp tip radius of 0.1 μm to 5 μm could be formed with good reproducibility in a short time of about several minutes to 20 minutes.
【0018】このように、本実施例に係る金属探針の製
造方法によれば、白金線あるいは白金合金線を水酸化ナ
トリウム水溶液に浸漬し、所定の電解電圧を印加して電
解研磨を行うことにより、白金線等の先端を鋭利に形成
できることが判明した。また、短い時間で、鋭利な先端
半径の探針を再現良く形成するためには、特に、水酸化
ナトリウム水溶液の濃度を2規定濃度〜4規定濃度、電
解電圧を30ボルト〜40ボルトの交流電圧とし、電流
が流れなくなるまで電解研磨を行えば良いことが確認さ
れた。As described above, according to the method for manufacturing a metal probe according to this embodiment, a platinum wire or a platinum alloy wire is immersed in an aqueous sodium hydroxide solution, and a predetermined electrolytic voltage is applied to perform electrolytic polishing. It was found that the tips of platinum wires, etc. can be made sharp. In addition, in order to form a probe with a sharp tip radius in a short period of time with good reproducibility, the concentration of the sodium hydroxide aqueous solution should be adjusted to 2N to 4N, and the electrolytic voltage should be set to an AC voltage of 30 to 40V. It was confirmed that electrolytic polishing can be performed until no current flows.
【0019】周知のとおり、水酸化ナトリウム水溶液は
、青酸カリウムのように毒性を発揮せず、腐食性の有害
ガスも発生しないので、人体にも悪影響を及ぼすことが
なく、その取扱いや管理も極めて容易となる。そのため
、電解液3に有毒性溶液を用いていた従来の製造方法に
比べて製造効率が著しく向上する。加えて、電界研磨装
置を耐食性材料で構成する必要がなく、換気設備も不要
となるので、設備投資の負担が大幅に軽減される。As is well known, an aqueous sodium hydroxide solution is not toxic like potassium cyanide and does not emit corrosive harmful gases, so it does not have any adverse effects on the human body, and its handling and management are extremely easy. It becomes easier. Therefore, the manufacturing efficiency is significantly improved compared to the conventional manufacturing method in which a toxic solution is used as the electrolytic solution 3. In addition, there is no need to construct the electropolishing apparatus with corrosion-resistant materials and no ventilation equipment is required, so the burden of capital investment is significantly reduced.
【0020】なお、本実施例では、交流電源5を用いて
電解研磨を行った場合について説明してきたが、直流電
圧のもとでも水酸化ナトリウム水溶液を用いて電解研磨
を行うことができる。[0020] In this embodiment, a case has been described in which electrolytic polishing is performed using the AC power source 5, but electrolytic polishing can also be performed using a sodium hydroxide aqueous solution under a DC voltage.
【0021】(第二実施例)次に、図1および図2を参
照して本発明の第二実施例を説明する。(Second Embodiment) Next, a second embodiment of the present invention will be described with reference to FIGS. 1 and 2.
【0022】図1に本発明の第二実施例に係る金属探針
の表面処理方法を実現するための装置構成図を示す。図
中、2〜5は図3に示した前記金属探針の製造装置と同
一部品、6は白金とイリジウムとの合金からなる金属探
針であってその先端が予め粗加工されたものである。ま
た、電解液3には上記第一実施例と同様、水酸化ナトリ
ウム水溶液を用いている。FIG. 1 shows a configuration diagram of an apparatus for realizing a method for surface treatment of a metal probe according to a second embodiment of the present invention. In the figure, 2 to 5 are the same parts as the metal probe manufacturing apparatus shown in FIG. 3, and 6 is a metal probe made of an alloy of platinum and iridium, the tip of which has been roughly processed in advance. . Further, as the electrolytic solution 3, a sodium hydroxide aqueous solution is used as in the first embodiment.
【0023】本実施例は、上記構成の装置を用い、その
先端が図2(a)に示す形状の金属探針6を電解液3た
る水酸化ナトリウム水溶液に浸漬するとともに、この水
酸化ナトリウム水溶液の濃度と交流電源5から供給され
る電解電圧を種々の値に変えて電解研磨を試みたもので
ある。[0023] In this example, the apparatus having the above-mentioned configuration is used, and the metal probe 6 whose tip is shaped as shown in FIG. Electrolytic polishing was attempted by changing the concentration of the oxide and the electrolytic voltage supplied from the AC power source 5 to various values.
【0024】その結果、電解電圧が5ボルト〜10ボル
トの交流電圧、水酸化ナトリウム水溶液の濃度が1規定
濃度〜6規定濃度の範囲では、図2(b)に示すように
、金属探針6の表面に先鋭突起体が形成されることが確
認された。これは、原子面の作用により研磨速度が1桁
以上も異なるいわゆる異方性研磨の状態が生じ、金属探
針6の表面が部分的に三角錐状や四角錐状に成形される
ことによる。As a result, when the electrolytic voltage is an AC voltage of 5 volts to 10 volts and the concentration of the sodium hydroxide aqueous solution is in the range of 1 normal to 6 normal, the metal probe 6 as shown in FIG. It was confirmed that sharp protrusions were formed on the surface. This is because a so-called anisotropic polishing state occurs in which the polishing rate differs by more than one order of magnitude due to the action of the atomic plane, and the surface of the metal probe 6 is partially shaped into a triangular pyramid shape or a quadrangular pyramid shape.
【0025】これら突起体の先端半径は、図2(a)に
示した処理前の金属探針6の先端半径に比べて1桁以上
も小さくなるため、あたかも金属探針6自体の先端半径
が小さくなったと同様の効果が得られる。したがって、
これをSTM探針として用いた場合はその解像度が飛躍
的に向上する。The tip radius of these protrusions is more than an order of magnitude smaller than the tip radius of the metal probe 6 before treatment shown in FIG. 2(a), so it is as if the tip radius of the metal probe 6 itself is A similar effect can be obtained if the size is made smaller. therefore,
When this is used as an STM probe, its resolution is dramatically improved.
【0026】なお、水酸化ナトリウム水溶液の濃度が6
規定濃度を超える場合および交流電圧が10ボルトを超
える場合は、電解研磨が促進されて金属探針6の表面が
平滑化し、水酸化ナトリウム水溶液の濃度が1規定濃度
未満の場合は電解研磨に時間がかかりすぎる。また、交
流電圧が5ボルト未満の場合は、金属探針粒界に沿った
研磨が行われるので、必ずしもその表面に先鋭突起体が
形成されるとは限らない。[0026] Note that when the concentration of the sodium hydroxide aqueous solution is 6
When the concentration exceeds the specified concentration and when the AC voltage exceeds 10 volts, electrolytic polishing is promoted and the surface of the metal probe 6 is smoothed, and when the concentration of the sodium hydroxide aqueous solution is less than 1 specified concentration, the electrolytic polishing takes time. It takes too much. Further, when the AC voltage is less than 5 volts, polishing is performed along the grain boundaries of the metal probe, so sharp protrusions are not necessarily formed on the surface.
【0027】このように、本実施例では、金属探針6の
表面を1規定濃度〜6規定濃度の水酸化ナトリウム水溶
液に浸漬し、交流5ボルト〜10ボルトの電解電圧を供
給して、その表面上に先鋭突起体を形成するようにした
ので、簡易な表面処理加工により、あたかも金属探針自
体の先端を先鋭に加工した場合と同様の効果を奏し、高
解像度が要求されるSTMに適した金属探針を得ること
ができる。As described above, in this embodiment, the surface of the metal probe 6 is immersed in a sodium hydroxide aqueous solution having a concentration of 1 to 6 normal, and an electrolytic voltage of 5 to 10 volts AC is supplied to the surface of the metal probe 6. Since sharp protrusions are formed on the surface, a simple surface treatment produces the same effect as if the tip of the metal probe itself were sharpened, making it suitable for STM, which requires high resolution. A metal probe can be obtained.
【0028】また、本実施例で用いる電解液3は、前記
第一実施例と同様、水酸化ナトリウム水溶液であり、し
かも、金属探針の製造(粗加工)に用いる一般的な装置
をそのまま使用できるので、安全な作業環境のもとで簡
易に金属探針の表面処理ができる。Further, the electrolytic solution 3 used in this example is a sodium hydroxide aqueous solution as in the first example, and the general equipment used for manufacturing (rough processing) metal probes can be used as is. This makes it possible to easily treat the surface of metal probes in a safe working environment.
【0029】[0029]
【発明の効果】以上の説明のとおり、本発明に係る金属
探針の製造方法では、電解液に水酸化ナトリウム水溶液
を用いたので、安全な作業環境および管理のもとで探針
の製造が可能となり、しかも、設備投資の負担を大幅に
軽減できるという優れた効果を奏することができる。[Effects of the Invention] As explained above, in the method for manufacturing a metal probe according to the present invention, a sodium hydroxide aqueous solution is used as the electrolyte, so the probe can be manufactured in a safe working environment and under control. In addition, it is possible to achieve the excellent effect of significantly reducing the burden of equipment investment.
【0030】特に、水酸化ナトリウム水溶液を2規定濃
度〜4規定濃度、電解電圧を30ボルト〜40ボルトの
交流電圧とし、電流が流れなくなるまで電解研磨を行っ
た場合は、数分〜20分程度の短い時間で、0.1μm
〜5μmの鋭利な先端半径を有する探針を再現良く形成
できるので、作業効率が著しく向上する。In particular, when the aqueous sodium hydroxide solution has a concentration of 2N to 4N and the electrolytic voltage is an AC voltage of 30 to 40V, and electrolytic polishing is performed until no current flows, the polishing time is about several minutes to 20 minutes. 0.1μm in a short time
Since a probe having a sharp tip radius of ~5 μm can be formed with good reproducibility, work efficiency is significantly improved.
【0031】また、本発明に係る金属探針の表面処理方
法では、金属探針の表面を1規定濃度〜6規定濃度の水
酸化ナトリウム水溶液に浸漬し、交流5ボルト〜10ボ
ルトの電解電圧を供給して、その表面上に先鋭突起体を
形成するようにしたので、簡易な表面処理加工により、
あたかも金属探針自体の先端を先鋭に加工した場合と同
様の効果を奏し、高解像度が要求されるSTMに適した
金属探針を得ることができる。[0031] Furthermore, in the method for surface treatment of a metal probe according to the present invention, the surface of the metal probe is immersed in an aqueous sodium hydroxide solution having a concentration of 1N to 6N, and an electrolytic voltage of 5 to 10 V AC is applied. By supplying the material and forming sharp protrusions on the surface, a simple surface treatment process can be performed.
This produces the same effect as if the tip of the metal probe itself were sharpened, and a metal probe suitable for STM, which requires high resolution, can be obtained.
【0032】しかも、この方法は、金属探針の粗加工に
用いた装置をそのまま流用できるので、FIM等の高価
な装置やメッキ用装置等を用いていた従来のFIMによ
る方法や電解析出方法によらずとも、安全な作業環境の
もとで簡易に金属探針の表面処理ができるという実用的
な効果も奏する。Moreover, this method allows the same equipment used for rough processing of metal probes to be used as is, so it is not possible to use the conventional FIM method or electrolytic deposition method, which used expensive equipment such as FIM or plating equipment. It also has the practical effect of allowing the surface treatment of metal probes to be easily performed in a safe working environment.
【図1】本発明の第二実施例に係る金属探針の表面処理
方法を実現するための装置構成図である。FIG. 1 is a configuration diagram of an apparatus for realizing a method for surface treatment of a metal probe according to a second embodiment of the present invention.
【図2】本発明の第二実施例による金属探針の先端形状
の変化図であり、(a)は処理前、(b)は処理後の先
端形状を表したものである。FIG. 2 is a diagram showing changes in the tip shape of a metal probe according to a second embodiment of the present invention, in which (a) shows the tip shape before treatment, and (b) shows the tip shape after treatment.
【図3】従来の金属探針の製造方法を実現するための製
造装置の構成図である。FIG. 3 is a configuration diagram of a manufacturing apparatus for realizing a conventional metal probe manufacturing method.
1…探針用金属材料、2…電極、3…電解液、4…電解
槽、5…交流電源、6…金属探針。DESCRIPTION OF SYMBOLS 1... Metal material for probe, 2... Electrode, 3... Electrolyte, 4... Electrolytic cell, 5... AC power supply, 6... Metal probe.
Claims (3)
の被研磨部分と該被研磨部分の対極をなす電極とを電解
液中に浸漬し、この金属材料および電極に所定値の電圧
を印加して電解研磨を行うことにより、金属材料の被研
磨部分を尖鋭に成形するようにした金属探針の製造方法
において、前記電解液を水酸化ナトリウム水溶液とした
ことを特徴とする金属探針の製造方法。[Claim 1] A part to be polished of platinum or a metal material containing platinum and an electrode serving as a counter electrode to the part to be polished are immersed in an electrolytic solution, and a voltage of a predetermined value is applied to the metal material and the electrode. A method for manufacturing a metal probe in which a polished portion of a metal material is shaped into a sharp point by electrolytic polishing, characterized in that the electrolyte is an aqueous sodium hydroxide solution. .
化ナトリウム水溶液とするとともに、前記電圧を30ボ
ルト乃至40ボルトの交流電圧としたことを特徴とする
請求項1記載の金属探針の製造方法。2. The metal probe according to claim 1, wherein the electrolyte is an aqueous sodium hydroxide solution with a specified concentration of 2 to 4, and the voltage is an alternating current voltage of 30 to 40 volts. Production method.
からなる金属探針と該金属探針の対極をなす電極とを規
定濃度1乃至6の水酸化ナトリウム水溶液に浸漬し、こ
の金属探針および電極に5ボルト乃至10ボルトの交流
電圧を印加して電解研磨を行うことにより、金属探針の
表面に先鋭突起体を形成したことを特徴とする金属探針
の表面処理方法。3. A metal probe made of platinum or a metal material containing platinum and an electrode serving as a counter electrode of the metal probe are immersed in a sodium hydroxide aqueous solution with a specified concentration of 1 to 6, and the metal probe and electrode 1. A method for surface treatment of a metal probe, characterized in that a sharp protrusion is formed on the surface of the metal probe by applying an AC voltage of 5 to 10 volts to perform electrolytic polishing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7757491A JPH04310321A (en) | 1991-04-10 | 1991-04-10 | Manufacture and surface treatment of metal probe |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7757491A JPH04310321A (en) | 1991-04-10 | 1991-04-10 | Manufacture and surface treatment of metal probe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04310321A true JPH04310321A (en) | 1992-11-02 |
Family
ID=13637773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7757491A Pending JPH04310321A (en) | 1991-04-10 | 1991-04-10 | Manufacture and surface treatment of metal probe |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04310321A (en) |
-
1991
- 1991-04-10 JP JP7757491A patent/JPH04310321A/en active Pending
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