JPH0431385A - Device of growing crystal - Google Patents
Device of growing crystalInfo
- Publication number
- JPH0431385A JPH0431385A JP13755390A JP13755390A JPH0431385A JP H0431385 A JPH0431385 A JP H0431385A JP 13755390 A JP13755390 A JP 13755390A JP 13755390 A JP13755390 A JP 13755390A JP H0431385 A JPH0431385 A JP H0431385A
- Authority
- JP
- Japan
- Prior art keywords
- solution
- crystal
- growth
- growing
- replenishment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
結晶成長装置、特に液相より混晶半導体の結晶を成長さ
せる装置に関し、
組成の均一な多元混晶半導体の結晶を成長させることが
可能な結晶成長装置を提供することを目的とし、
[1]成長溶液溜め12と、補給溶液溜め13と、該成
長溶液溜め12と該補給溶液溜め13とを連結する補給
溝14と、を備えたるつぼ11を有し、該成長溶液溜め
12の底面は略逆円錐面をなしているように構成する。[Detailed Description of the Invention] [Summary] A crystal growth device capable of growing a crystal of a multi-component mixed crystal semiconductor with a uniform composition, regarding a crystal growth device, particularly a device for growing a crystal of a mixed crystal semiconductor from a liquid phase. [1] A crucible 11 including a growth solution reservoir 12, a replenishment solution reservoir 13, and a replenishment groove 14 connecting the growth solution reservoir 12 and the replenishment solution reservoir 13. However, the bottom surface of the growth solution reservoir 12 is configured to have a substantially inverted conical surface.
[21前記の[1]において前記成長溶液溜め12及び
前記補給溶液溜め13にはそれぞれ電極15、16が配
置されており、結晶成長時には成長溶液1と補給溶液2
との間に通電するように構成する。[21 In [1] above, electrodes 15 and 16 are arranged in the growth solution reservoir 12 and the replenishment solution reservoir 13, respectively, and during crystal growth, the growth solution 1 and the replenishment solution 2 are
The configuration is such that electricity is applied between the
本発明は、結晶成長装置、特に液相より混晶半導体の結
晶を成長させる装置に関する。The present invention relates to a crystal growth apparatus, and particularly to an apparatus for growing mixed crystal semiconductor crystals from a liquid phase.
近年、混晶半導体、特に■−V族半導体混晶を用いた光
半導体デバイスや超高速半導体デバイス等がめざましい
進歩を遂げている。これらのデバイスには三元混晶の半
導体を必要とする場合が多いが、その場合には一般には
GaASやInP等の二元混晶半導体のウェーハ上に、
これと格子整合する三元混晶を成長させている。しかし
混晶半導体の適用範囲を拡げるためには、既成の二元混
晶との格子整合に限定されず、任意の格子定数を持つ多
元混晶の半導体が必要であるため、このような多元混晶
の均質な結晶を引き上げることが出来る結晶成長装置の
開発が望まれている。In recent years, remarkable progress has been made in optical semiconductor devices and ultrahigh-speed semiconductor devices using mixed crystal semiconductors, particularly -V group semiconductor mixed crystals. These devices often require a ternary mixed crystal semiconductor, but in that case, it is generally made on a wafer of a binary mixed crystal semiconductor such as GaAS or InP.
A ternary mixed crystal that lattice-matches this is grown. However, in order to expand the range of applications of mixed crystal semiconductors, it is necessary to create multi-component mixed crystal semiconductors with arbitrary lattice constants, not limited to lattice matching with existing binary mixed crystals. It is desired to develop a crystal growth apparatus that can pull homogeneous crystals.
従来の多元混晶用として開発された結晶成長装置の一例
を第2図により説明する。第2図(a)(b)は従来の
結晶成長装置の一例を示す要部模式図であり、同図(a
)は側断面図、同図(b)はるつぼ上面図である。図中
、1は成長溶液、2は成長溶液lに溶質を補給する補給
溶液であり、3は種結晶、4は溶質補給材である。21
はるつぼであり、成長溶液lを収容する成長溶液溜め2
2と、補給溶液2を収容する補給溶液溜め23と、両者
を連結する補給溝24とを備えている。成長溶液溜め2
2の底面は平面をなしている。15.16は電極、17
は種結晶移動手段、18は溶質補給材移動手段である。An example of a conventional crystal growth apparatus developed for multi-component mixed crystals will be explained with reference to FIG. FIGS. 2(a) and 2(b) are schematic diagrams of main parts showing an example of a conventional crystal growth apparatus, and FIGS.
) is a side sectional view, and (b) is a top view of the crucible. In the figure, 1 is a growth solution, 2 is a replenishment solution that supplies solute to the growth solution 1, 3 is a seed crystal, and 4 is a solute replenisher. 21
A growth solution reservoir 2 which is a crucible and contains a growth solution 1
2, a replenishment solution reservoir 23 that accommodates the replenishment solution 2, and a replenishment groove 24 that connects the two. Growth solution reservoir 2
The bottom surface of 2 is flat. 15.16 is the electrode, 17
18 is a seed crystal moving means, and 18 is a solute replenishment material moving means.
るつぼ21の周囲には加熱手段が配設されている(図示
は省略)。A heating means is provided around the crucible 21 (not shown).
この装置によりInGaAsの結晶を成長させるには、
種結晶3をInP、溶質補給材4をGaAsとし、種結
晶3を種結晶移動手段17で徐々に引き上げて結晶を成
長させる。結晶が成長するに従って成長溶液l中の溶質
のGaとAsが減耗するため、電極15と電極16との
間に電流を流して補給溶液2から成長溶液lへこれらを
補給し、成長する結晶の組成の均一性を維持する。To grow InGaAs crystals using this equipment,
The seed crystal 3 is made of InP, the solute replenishing material 4 is made of GaAs, and the seed crystal 3 is gradually pulled up by the seed crystal moving means 17 to grow the crystal. As the crystal grows, the solutes Ga and As in the growth solution 1 are depleted, so a current is passed between the electrodes 15 and 16 to replenish these from the replenishment solution 2 to the growth solution 1, thereby increasing the growth of the growing crystal. Maintain uniformity of composition.
組成の均一な多元混晶半導体を成長させるためには、成
長溶液中の不足した溶質を速やかに補給して常に成長溶
液の組成を一定に保つ必要がある。In order to grow a multi-component mixed crystal semiconductor with a uniform composition, it is necessary to quickly replenish the solute in the growth solution that is lacking in the growth solution to keep the composition of the growth solution constant.
このためには、成長溶液の量が少ない方が溶質補給の効
果が迅速に現れる。For this purpose, the effect of solute replenishment appears more quickly when the amount of growth solution is smaller.
ところが第2図のような結晶成長装置で成長溶液の量を
少な(するために成長溶液溜めを浅くして行くと、表面
張力のために成長溶液の表面が球面になる。従って成長
溶液溜めを余り浅くすることが出来ず、その結果、充分
に均一な組成の結晶を成長させることが出来ないという
問題があった。However, in a crystal growth apparatus like the one shown in Figure 2, when the growth solution reservoir is made shallow to reduce the amount of growth solution, the surface of the growth solution becomes spherical due to surface tension. There was a problem in that the depth could not be made too shallow, and as a result, a crystal with a sufficiently uniform composition could not be grown.
本発明は、このような問題を解決して、組成の均一な多
元混晶半導体の結晶を成長させることが可能な結晶成長
装置を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to solve such problems and provide a crystal growth apparatus capable of growing a multi-component mixed crystal semiconductor crystal with a uniform composition.
この目的は、本発明によれば、[1]成長溶液溜め12
と、補給溶液溜め13と、該成長溶液溜め12と該補給
溶液溜め13とを連結する補給溝14と、を備えたるつ
ぼ11を有し、該成長溶液溜め12の底面は略逆円錐面
をなしていることを特徴とする結晶成長装置とすること
で、[2]前記の[11において前記成長溶液溜め12
及び前記補給溶液溜め13にはそれぞれ電極15.16
が配置されており、結晶成長時には成長溶液1と補給溶
液2との間に通電することを特徴とする結晶成長装置と
することで、達成される。This purpose, according to the invention, is achieved by: [1] Growth solution reservoir 12
, a replenishment solution reservoir 13 , and a replenishment groove 14 connecting the growth solution reservoir 12 and the replenishment solution reservoir 13 , and the bottom surface of the growth solution reservoir 12 has a substantially inverted conical surface. [2] In the above [11], the growth solution reservoir 12
And the replenishment solution reservoir 13 has electrodes 15 and 16, respectively.
This can be achieved by providing a crystal growth apparatus which is characterized in that a current is applied between the growth solution 1 and the replenishment solution 2 during crystal growth.
成長溶液の量を少なくすれば、それだけ組成変動に素早
く対応が出来るが、成長溶液溜めを浅くすれば溶液表面
は表面張力のために球面をなすため、ある程度以上の深
さか必要である。The smaller the amount of growth solution, the more quickly it will be possible to respond to changes in composition, but if the growth solution reservoir is made shallow, the solution surface will form a spherical surface due to surface tension, so a certain depth is required.
本発明では、成長溶液溜めの底面を従来の平面から逆円
錐面に変えることにより、深さを変えることなく容積を
減らすことが出来、従ってそれだけ組成変動への対応が
迅速になる。In the present invention, by changing the bottom surface of the growth solution reservoir from a conventional flat surface to an inverted conical surface, the volume can be reduced without changing the depth, and therefore the response to compositional changes can be made faster.
本発明に基づく混晶半導体用の結晶成長装置の実施例を
第1図により説明する。An embodiment of a crystal growth apparatus for mixed crystal semiconductors according to the present invention will be described with reference to FIG.
第1図(a)(b)は本発明の実施例の装置要部模式図
であり、同図(a)は側断面図、同図(b)はるつぼ上
面図である。図中、■は成長溶液、2は成長溶液1に溶
質を補給する補給溶液であり、3は種結晶、4は溶質補
給材である。11はカーボン製のるつぼであり、表面は
窒化ホロン(PBN )で被覆されている(絶縁のため
)。このるつぼ11は成長溶液1を収容する成長溶液溜
め12と、補給溶液2を収容する補給溶液溜め13と、
両者を連結する補給溝14とを備えている。補給溶液溜
め13の底面は逆円錐面をなしている。15.16は成
長溶液1と補給溶液2との間に通電するための電極であ
り、両者共にカーボン製である。17は種結晶を引き−
Lげるための種結晶移動手段、18は溶質補給材移動手
段である。るつぼ11の周囲には加熱手段が配設されて
いる(図示は省略)。FIGS. 1(a) and 1(b) are schematic diagrams of main parts of an apparatus according to an embodiment of the present invention, in which FIG. 1(a) is a side sectional view and FIG. 1(b) is a top view of a crucible. In the figure, ■ is a growth solution, 2 is a replenishment solution that replenishes solute to the growth solution 1, 3 is a seed crystal, and 4 is a solute replenishment material. 11 is a carbon crucible, the surface of which is coated with holon nitride (PBN) (for insulation). This crucible 11 includes a growth solution reservoir 12 containing a growth solution 1, a replenishment solution reservoir 13 containing a replenishment solution 2,
It is provided with a replenishment groove 14 that connects the two. The bottom surface of the replenishment solution reservoir 13 has an inverted conical surface. Reference numerals 15 and 16 are electrodes for supplying electricity between the growth solution 1 and the replenishment solution 2, both of which are made of carbon. 17 pulls the seed crystal-
18 is a solute replenishment material moving means. A heating means is provided around the crucible 11 (not shown).
この結晶成長装置を用いてInGaAs (Ino、
5:l GaO,47AS)の単結晶を成長させる例に
ついて説明する。成長溶液1はIn−Ga−Asの溶液
(そのモル比は0.875 : 0.032 : 0.
093 )、補給溶液2もIn−Ga−Asの溶液(但
しGaとAsを予めリッチにしておく)で、両溶液共に
温度は約700°C1種結晶3はInP、溶質補給材4
はGaAsとし、種結晶3を種結晶移動手段I7により
引き上げて結晶を成長させる。結晶が成長するに従って
成長溶液1中の溶質のGaとAsが減耗するため、電極
15から電極16へ直流電流を流して補給溶液2から成
長溶液lへこれらを補給し、成長する結晶の組成の均一
性を維持する。この際、成長溶液1の組成をその抵抗値
によりモニタリングし、上記の電流値を変化させて溶質
補給量を調整する。Using this crystal growth apparatus, InGaAs (Ino,
An example of growing a single crystal of 5:l GaO, 47AS) will be described. Growth solution 1 was an In-Ga-As solution (the molar ratio was 0.875:0.032:0.
093), replenishment solution 2 is also an In-Ga-As solution (however, Ga and As are enriched in advance), the temperature of both solutions is about 700°C, the seed crystal 3 is InP, and the solute replenisher 4 is
is GaAs, and the seed crystal 3 is pulled up by the seed crystal moving means I7 to grow the crystal. As the crystal grows, the solutes Ga and As in the growth solution 1 are depleted, so a direct current is passed from the electrode 15 to the electrode 16 to replenish them from the replenishment solution 2 to the growth solution 1, thereby changing the composition of the growing crystal. Maintain uniformity. At this time, the composition of the growth solution 1 is monitored by its resistance value, and the above-mentioned current value is changed to adjust the amount of solute replenishment.
発明者は、上記の電流値を18〜20Aの範囲で変化さ
せて溶質補給量を調節し、引き上げ速度0.1mm/h
rで30時間かけて厚さ3mmのIno、 Ii3 G
ao、 47Asの単結晶を成長させた結果、厚さ方向
の組成の変化を0.5%以下に抑えることが出来た。The inventor adjusted the amount of solute replenishment by changing the above current value in the range of 18 to 20 A, and adjusted the pulling rate to 0.1 mm/h.
Ino, Ii3 G with a thickness of 3 mm over 30 hours at r
As a result of growing a single crystal of 47As, the change in composition in the thickness direction could be suppressed to 0.5% or less.
本発明は以上の実施例に限定されることな(、更に種々
変形して実施出来る。例えば、成長溶液溜めの底面を逆
多角錐面としても、本発明は有効である。又、溶質補給
のための通電を交流としても有効である。The present invention is not limited to the above embodiments (and can be implemented with various modifications. For example, the present invention is effective even if the bottom surface of the growth solution reservoir is an inverted polygonal pyramid surface. It is also effective to use alternating current as the current source.
以上説明したように、本発明によれば、組成の均一な多
元混晶半導体の結晶を成長させることが可能な結晶成長
装置を提供することが出来る。As described above, according to the present invention, it is possible to provide a crystal growth apparatus capable of growing a crystal of a multi-component mixed crystal semiconductor having a uniform composition.
第1図は本発明の実施例の装置要部模式図、第2図は従
来の結晶成長装置の要部模式図、である。
図中、lは成長溶液、
2は補給溶液、
11はるつぼ、
12は成長溶液溜め、
13は補給溶液溜め、
14は補給溝、
15、16は電極、である。
」
本発明の実馳例の装置要部模式図
第 1 図FIG. 1 is a schematic diagram of the main parts of an apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic diagram of the main parts of a conventional crystal growth apparatus. In the figure, l is a growth solution, 2 is a replenishment solution, 11 is a crucible, 12 is a growth solution reservoir, 13 is a replenishment solution reservoir, 14 is a supply groove, and 15 and 16 are electrodes. ” Fig. 1 is a schematic diagram of the main parts of an apparatus according to an embodiment of the present invention.
Claims (1)
と、該成長溶液溜め(12)と該補給溶液溜め(13)
とを連結する補給溝(14)と、を備えたるつぼ(11
)を有し、該成長溶液溜め(12)の底面は略逆円錐面
をなしていることを特徴とする結晶成長装置。 [2]前記成長溶液溜め(12)及び前記補給溶液溜め
(13)にはそれぞれ電極(15、16)が配置されて
おり、結晶成長時には成長溶液(1)と補給溶液(2)
との間に通電することを特徴とする請求項1記載の結晶
成長装置。[Claims] [1] Growth solution reservoir (12) and replenishment solution reservoir (13)
, the growth solution reservoir (12) and the replenishment solution reservoir (13).
a replenishment groove (14) connecting the crucible (11).
), the bottom surface of the growth solution reservoir (12) forming a substantially inverted conical surface. [2] Electrodes (15, 16) are arranged in the growth solution reservoir (12) and the replenishment solution reservoir (13), respectively, and during crystal growth, the growth solution (1) and the replenishment solution (2)
2. The crystal growth apparatus according to claim 1, wherein a current is applied between the crystal growth apparatus and the crystal growth apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13755390A JPH0431385A (en) | 1990-05-28 | 1990-05-28 | Device of growing crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13755390A JPH0431385A (en) | 1990-05-28 | 1990-05-28 | Device of growing crystal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0431385A true JPH0431385A (en) | 1992-02-03 |
Family
ID=15201406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13755390A Pending JPH0431385A (en) | 1990-05-28 | 1990-05-28 | Device of growing crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0431385A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013186969A (en) * | 2012-03-06 | 2013-09-19 | Ulvac Japan Ltd | Method for forming electrode film of organic el element and apparatus for forming electrode film of organic el element |
-
1990
- 1990-05-28 JP JP13755390A patent/JPH0431385A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013186969A (en) * | 2012-03-06 | 2013-09-19 | Ulvac Japan Ltd | Method for forming electrode film of organic el element and apparatus for forming electrode film of organic el element |
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