JPH043492A - Flexible printed circuit board having cover coat and manufacture thereof - Google Patents
Flexible printed circuit board having cover coat and manufacture thereofInfo
- Publication number
- JPH043492A JPH043492A JP10288590A JP10288590A JPH043492A JP H043492 A JPH043492 A JP H043492A JP 10288590 A JP10288590 A JP 10288590A JP 10288590 A JP10288590 A JP 10288590A JP H043492 A JPH043492 A JP H043492A
- Authority
- JP
- Japan
- Prior art keywords
- circuit board
- flexible printed
- printed circuit
- polyamic acid
- cover coat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 54
- 239000000243 solution Substances 0.000 claims abstract description 44
- 229920001721 polyimide Polymers 0.000 claims abstract description 31
- 239000004642 Polyimide Substances 0.000 claims abstract description 27
- 239000000843 powder Substances 0.000 claims abstract description 18
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 16
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000004985 diamines Chemical class 0.000 claims abstract description 7
- 150000001412 amines Chemical class 0.000 claims abstract description 6
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 239000011259 mixed solution Substances 0.000 claims abstract description 3
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 claims abstract 3
- 238000000034 method Methods 0.000 claims description 28
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 239000011889 copper foil Substances 0.000 claims description 12
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 10
- 239000011888 foil Substances 0.000 claims description 10
- 238000005266 casting Methods 0.000 claims description 9
- 229920006015 heat resistant resin Polymers 0.000 claims description 8
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims description 6
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- CQMIJLIXKMKFQW-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 CQMIJLIXKMKFQW-UHFFFAOYSA-N 0.000 claims description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 claims description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 8
- 239000011347 resin Substances 0.000 abstract description 8
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 abstract description 6
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 abstract 2
- BWLKKFSDKDJGDZ-UHFFFAOYSA-N [isocyanato(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(N=C=O)C1=CC=CC=C1 BWLKKFSDKDJGDZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000002904 solvent Substances 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 150000003949 imides Chemical group 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- UIYJZBVVQDMLQX-UHFFFAOYSA-N 4-(3-carboxyphenyl)cyclohexa-3,5-diene-1,1,2-tricarboxylic acid Chemical compound C1=CC(C(O)=O)(C(O)=O)C(C(=O)O)C=C1C1=CC=CC(C(O)=O)=C1 UIYJZBVVQDMLQX-UHFFFAOYSA-N 0.000 description 2
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000000740 bleeding effect Effects 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000004986 phenylenediamines Chemical class 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- -1 2.3.3' Chemical class 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000036461 convulsion Effects 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 238000012691 depolymerization reaction Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- ZHDTXTDHBRADLM-UHFFFAOYSA-N hydron;2,3,4,5-tetrahydropyridin-6-amine;chloride Chemical compound Cl.NC1=NCCCC1 ZHDTXTDHBRADLM-UHFFFAOYSA-N 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の技術分野)
本発明は、耐熱性樹脂をベースとするフレキシブルプリ
ント回路用基板の回路を形成した面上にこれと同じ耐熱
性樹脂をカバーコートとして流延塗布し加熱硬化させて
なる、耐熱性、耐折性、耐寒性、高周波電気特性、機械
特性、耐摩耗性、耐薬品性、耐放射線性等に優れた、カ
バーコート付フレキシブルプリント回路板およびその製
造方法に係るものである。DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to the method of casting a heat-resistant resin as a cover coat on the circuit-formed surface of a flexible printed circuit board based on a heat-resistant resin. A flexible printed circuit board with a cover coat that is heat-cured and has excellent heat resistance, bending resistance, cold resistance, high frequency electrical properties, mechanical properties, abrasion resistance, chemical resistance, radiation resistance, etc., and its production. It is related to the method.
(従来の技術)
従来、フレキシブルプリント回路板では、湿気、汚れ、
損傷から導体面を保護する目的で、回路表面に、フィル
ムを融着、接着するフィルムカバーレイ法、または、液
状コーティング剤を塗布、硬化せしめて被覆するインク
カバーコート法による保護を行って使用されている。(Prior art) Conventionally, flexible printed circuit boards are susceptible to moisture, dirt,
In order to protect the conductor surface from damage, it is used to protect the circuit surface using the film coverlay method, in which a film is fused and adhered, or the ink cover coat method, in which a liquid coating agent is applied and cured. ing.
特に耐熱性が必要とされるフレキシブルプリント回路用
基板には、金属箔上にポリアミック酸溶液を直接流延塗
布し、加熱硬化させて得られる接着剤層のないフレキシ
ブルプリント回路用基板が使用されている。In particular, for flexible printed circuit boards that require heat resistance, flexible printed circuit boards without an adhesive layer are used, which are obtained by directly casting a polyamic acid solution onto metal foil and curing it with heat. There is.
しかしながら、ベースとなるフレキシブルプリント回路
用基板は、接着剤層がな(耐熱性が非常に優れているに
もかかわらず、フィルムカバーレイ法やインクカバーコ
ート法の次のような問題点のために、基板としての耐熱
性や屈曲性、耐折性が良くなかった。However, the base flexible printed circuit board does not have an adhesive layer (despite its extremely high heat resistance, it has problems with the film coverlay method and ink covercoat method, such as the following). However, the heat resistance, flexibility, and bending durability of the substrate were not good.
即ち、フィルムカバーレイ法では、カバーレイ用のポリ
イミドフィルムの耐熱性は優れているにもかかわらず、
カバーレイ用の接着剤層の耐熱性が劣るため、耐熱性は
基板用のベースフィルムやポリイミドフィルムの耐熱性
よりも著しく劣っていた。In other words, in the film coverlay method, although the polyimide film for coverlay has excellent heat resistance,
Since the heat resistance of the adhesive layer for the coverlay was poor, the heat resistance was significantly inferior to that of the base film for the substrate or the polyimide film.
また、インクカバーコート法に使用されているインクは
、通常の熱硬化性樹脂や紫外線硬化型の樹脂であり、ベ
ースのフレキシブルプリント回路用基板の樹脂とは組成
が異なるため、上述のフレキシブルプリント回路用基板
に対する接着性が著しく悪(、また、屈曲性や耐折性お
よび耐熱性も著しく悪かった。In addition, the ink used in the ink cover coating method is a normal thermosetting resin or ultraviolet curable resin, and has a different composition from the resin of the base flexible printed circuit board, so it The adhesion to the substrate was extremely poor (and the flexibility, bending durability, and heat resistance were also extremely poor).
(発明が解決しようとする課題)
本発明は、これまでにかかる欠点を克服すべく鋭意検討
した結果、ベースフィルムと同じ組成のポリアミック酸
に、ポリイミド粉末を可とう性付与剤として添加したポ
リアミック酸を用いて製造したカバーコート付フレキシ
ブルプリント回路板が、耐熱性が非常に良好で、カール
やシワがなく、しかも耐折性や屈曲性が優れているとの
知見を得、本発明を完成するに至ったものである。(Problems to be Solved by the Invention) As a result of intensive studies to overcome these drawbacks, the present invention has developed a polyamic acid that is made by adding polyimide powder as a flexibility imparting agent to a polyamic acid having the same composition as the base film. The present invention was completed based on the knowledge that a flexible printed circuit board with a cover coat manufactured using the same material has very good heat resistance, is free from curls and wrinkles, and has excellent bending durability and flexibility. This is what led to this.
(課題を解決するための手段)
本発明は、耐熱性樹脂をベースとするフレキシブルプリ
ント回路用基板の回路面上に耐熱性樹脂をカバーコート
として流延塗布し加熱硬化させるにあたり、ベースの耐
熱性樹脂と同し組成の耐熱性樹脂にポリイミド粉末を可
とう性付与剤として添加した耐熱性樹脂を使用すること
を特徴とするカバーコート付フレキシブルプリント回路
板およびその製造方法である。(Means for Solving the Problems) The present invention provides a method for casting a heat-resistant resin as a cover coat onto the circuit surface of a flexible printed circuit board based on a heat-resistant resin and curing it by heating. A flexible printed circuit board with a cover coat and a method for producing the same are characterized in that a heat-resistant resin having the same composition as the resin and polyimide powder added as a flexibility imparting agent is used.
(作用)
本発明で用いる耐熱性樹脂は、フィルム形成能があり、
金属箔との密着性があればよいが、つぎに示すようなポ
リイミドが最も目的にがなっている。(Function) The heat-resistant resin used in the present invention has film-forming ability,
It only needs to have good adhesion to the metal foil, but polyimides such as those shown below are most suitable.
すなわち、テトラカルボン酸二無水物成分とジアミン成
分とを、酸成分/アミン成分(モル比)を領 90〜1
.00として反応させるに当たり、3.3.4.4’−
ビフェニルテトラカルボン酸二無水物とパラフェニレン
ジアミンとを反応させて得られたポリアミック酸溶液(
A)と、ピロメリット酸二無水物と4,4’−ジアミノ
ジフェニルエーテルを反応させて得られたポリアミック
酸溶液(B)とを、A/B = 55/45〜75/2
5の割合で混合撹拌して得られるポリアミック酸混合溶
液(C)を加熱硬化させて得られるポリイミドである。That is, the tetracarboxylic dianhydride component and the diamine component are mixed in an acid component/amine component (molar ratio) of 90 to 1.
.. When reacting as 00, 3.3.4.4'-
A polyamic acid solution obtained by reacting biphenyltetracarboxylic dianhydride and paraphenylenediamine (
A) and a polyamic acid solution (B) obtained by reacting pyromellitic dianhydride and 4,4'-diaminodiphenyl ether, A/B = 55/45 to 75/2.
It is a polyimide obtained by heating and curing a polyamic acid mixed solution (C) obtained by mixing and stirring at a ratio of 5 to 5.
本発明で使用されるペース用フレキシブルプリント回路
用基板は、上記のポリアミック酸溶液(C)を金属箔上
に直接流延塗布し、加熱硬化させたものが用いられる。The flexible printed circuit board for pace used in the present invention is obtained by directly casting the above-mentioned polyamic acid solution (C) on metal foil and curing it by heating.
このベース用フレキシブルプリント回路用基板の作製は
通常の2層構造のフレキシブルプリント回路用基板の作
製方法、例えば、特開昭62−200795号公報に示
すような方法で行う。The base flexible printed circuit board is manufactured by a conventional method for manufacturing a two-layer flexible printed circuit board, such as the method disclosed in Japanese Patent Application Laid-Open No. 62-200795.
本発明で可とう性付与剤として用いるポリイミド粉末は
、一般に、3.3’、4.4’−ビフェニルテトラカル
ボン酸二無水物とジフェニルメタンジイソシアネートを
反応させて得られたポリイミド粉末、または、3,3’
,4.4’−ベンゾフェノンテトラカルボン酸二無水物
とジフェニルメタンジイソシアネートを反応させて得ら
れるポリイミド粉末が用いられる。The polyimide powder used as the flexibility imparting agent in the present invention is generally a polyimide powder obtained by reacting 3.3', 4.4'-biphenyltetracarboxylic dianhydride and diphenylmethane diisocyanate, or 3, 3'
, 4.4'-benzophenone tetracarboxylic dianhydride and diphenylmethane diisocyanate are used.
本発明で、カバーコートとして用いるポリアミック酸溶
液は、上記のポリアミック酸溶液(C)に上記のポリイ
ミド粉末を固形分重量比が、■から40%となるように
添加混合したポリアミック酸溶液が用いられる
本発明に言うテトラカルボン酸二無水物とは、3.3’
,4,4’−ビフェニルテトラカルボン酸二無水物と、
ピロメリット酸二無水物であるが、この他の酸、例えば
2.3.3’、4’−ビフェニルテトラカルボン酸二無
水物、3,3’,4.4’−ベンゾフェノンテトラカル
ボン酸二無水物、 3.3’、4.4−P−テルフェニ
ルテトラカルボン酸二無水物、2,3,6.7−ナック
レンチトラカルボン酸二無水物、3.3’,4,4’−
ベンゾフェノンテトラカルボン酸二無水物、3,3’,
4.4’−p−テルフェニルテトラカルボン酸二無水物
、4.4’−ヘキサフルオロイソプロピリデンビス(フ
タル酸無水物)等も併用することが出来る。In the present invention, the polyamic acid solution used as the cover coat is a polyamic acid solution obtained by adding and mixing the above polyimide powder to the above polyamic acid solution (C) so that the solid content weight ratio becomes 40%. The tetracarboxylic dianhydride referred to in the present invention is 3.3'
, 4,4'-biphenyltetracarboxylic dianhydride;
Pyromellitic dianhydride, but other acids such as 2.3.3',4'-biphenyltetracarboxylic dianhydride, 3,3',4.4'-benzophenonetetracarboxylic dianhydride 3.3', 4.4-P-terphenyltetracarboxylic dianhydride, 2,3,6.7-naclentitracarboxylic dianhydride, 3.3',4,4'-
Benzophenone tetracarboxylic dianhydride, 3,3',
4.4'-p-terphenyltetracarboxylic dianhydride, 4.4'-hexafluoroisopropylidene bis (phthalic anhydride), etc. can also be used in combination.
本発明に言うジアミンとは、バラフェニレンジアミンと
4,4’−ジアミノジフェニルエーテルであるがこの他
のアミン例えば4,4゛−ジアミノジフェニルメタン、
3,3°−ジメチルベンジジン、4,4’−ジアミノ−
P−テルフェニル
フェニル、2.8−ジアミノジフェニレンオキサイドな
ども併用することができる。The diamines referred to in the present invention include phenylene diamine and 4,4'-diaminodiphenyl ether, but other amines such as 4,4'-diaminodiphenylmethane,
3,3°-dimethylbenzidine, 4,4'-diamino-
P-terphenylphenyl, 2,8-diaminodiphenylene oxide, etc. can also be used in combination.
テトラカルボン酸二無水物成分とジアミン成分との反応
は酸成分/アミン成分(モル比)0.90〜1.00で
行うのが好ましく、0.90より低いと重合度が上がら
ず硬化後の皮膜特性が悪い。The reaction between the tetracarboxylic dianhydride component and the diamine component is preferably carried out at an acid component/amine component (molar ratio) of 0.90 to 1.00; if it is lower than 0.90, the degree of polymerization will not increase and the Poor film properties.
1、00より大きいと、硬化時にガスを発生し、平滑な
皮膜を得ることが出来ない。If it is larger than 1.00, gas will be generated during curing, making it impossible to obtain a smooth film.
ポリアミック酸溶液を得る反応は通常、テトラカルボン
酸二無水物またはジアミン類と反応しない有機極性溶媒
中で行われる。この有機極性溶媒は、反応系に対して不
活性であり、かつ生成物に対して溶媒であること以外に
、反応成分の少なくとも一方、好ましくは両者に対して
良溶媒でなければならない。 この種の溶媒として代表
的なものは、N.N−ジメチルホルムアミド、N.N−
ジメチルアセトアミド、ジメチルスルホン、ジメチルス
ルホキシド、N−メチル−2〜ピロリドン等があり、こ
れらの溶媒は単独または組み合わせて使用される。この
他にも溶媒として組み合わせて用いられるものとしてベ
ンゼン、ジオキサン、キシレン、 トルエン、シクロヘ
キサン等の非極性溶媒が、原料の分散媒、反応調節剤あ
るいは生成物からの揮散調節剤、皮膜平滑剤等として使
用される。The reaction to obtain the polyamic acid solution is usually carried out in an organic polar solvent that does not react with the tetracarboxylic dianhydride or diamines. In addition to being inert to the reaction system and being a solvent for the product, this organic polar solvent must be a good solvent for at least one, preferably both, of the reaction components. A typical solvent of this type is N. N-dimethylformamide, N. N-
Examples include dimethylacetamide, dimethylsulfone, dimethylsulfoxide, N-methyl-2-pyrrolidone, and these solvents may be used alone or in combination. In addition, non-polar solvents such as benzene, dioxane, xylene, toluene, and cyclohexane are also used in combination as solvents, as dispersion media for raw materials, reaction regulators, volatilization regulators from products, film smoothing agents, etc. used.
反応は一般的に無水の条件下で行うことが好ましい。こ
れはテトラカルボン酸二無水物が水により開環し、不活
性化し、反応を停止させる恐れがあるためである。この
ため仕込原料中の水分も溶媒中の水分も除去する必要が
ある。しかし一方、反応の進行を調節し、樹脂重合度を
コントロールするためにあえて水を添加することも行わ
れる。It is generally preferred that the reaction be carried out under anhydrous conditions. This is because the tetracarboxylic dianhydride may be ring-opened by water, inactivated, and the reaction may be stopped. Therefore, it is necessary to remove both the moisture in the raw materials and the moisture in the solvent. However, on the other hand, water is intentionally added in order to adjust the progress of the reaction and control the degree of resin polymerization.
また反応は不活性ガス雰囲気中で行われることが好まし
い。これはジアミン類の酸化を防止するためである。不
活性ガスとしては一般的に乾燥窒素ガスが使用される。Moreover, it is preferable that the reaction is carried out in an inert gas atmosphere. This is to prevent oxidation of diamines. Dry nitrogen gas is generally used as the inert gas.
本発明で用いるポリイミド樹脂の合成反応は以下の様な
方法で行われる。即ち、3.3’.4.4’−ビフェニ
ルテトラカルボン酸二無水物とパラフェニレンジアミン
とを反応させて得られたポリアミック酸(Aとする)と
ピロメリット酸二無水物と4.4゛ジアミノジフェニル
エーテルとを反応させて得られたポリアミック酸(Bと
する)とをA/B = 55/45〜75/25の割合
で混合撹拌することによってポリアミック酸(Cとする
)を得る方法である。The synthesis reaction of the polyimide resin used in the present invention is carried out in the following manner. That is, 3.3'. A polyamic acid (referred to as A) obtained by reacting 4.4'-biphenyltetracarboxylic dianhydride and paraphenylene diamine, pyromellitic dianhydride, and 4.4'diaminodiphenyl ether is reacted. This is a method of obtaining a polyamic acid (referred to as C) by mixing and stirring the obtained polyamic acid (referred to as B) at a ratio of A/B = 55/45 to 75/25.
Aの比率が上述の割合よりも少ないときには、得られる
カバーコート付フレキシブルプリント回路板にカールが
発生し、逆に多いときには剛直になりすぎ、柔軟性がな
くなる。When the ratio of A is less than the above-mentioned ratio, curling occurs in the resulting cover-coated flexible printed circuit board, and on the other hand, when it is large, it becomes too rigid and lacks flexibility.
A、 Bを合成し、また、これらを混合してCを得る
反応温度は0〜100℃であることが望ましい、0℃以
下だと反応の速度が遅く、100℃以上であると生成し
たポリアミック酸の閉環反応および解重合反応が開始す
るためである。通常、反応は20℃前後で行われる。The reaction temperature for synthesizing A and B and mixing them to obtain C is preferably 0 to 100°C. Below 0°C, the reaction rate is slow, and above 100°C, the resulting polyamic This is because the ring-closing reaction and depolymerization reaction of the acid start. Usually, the reaction is carried out at around 20°C.
本発明により製造されたポリアミック酸生成物をフレキ
シブルプリント回路用基板の作製に使用するに当たって
、各種のシランカップリング剤、ボランカップリング剤
、チタネート系カップリング剤1、アルミニウム系カッ
プリング剤その他キレート系の接着性・密着性向上剤や
各種溶剤、フローエージェントを加えてもよ(、またこ
れらに加えて通常の酸硬化剤、アミン硬化剤やイミダシ
ル、3級アミン等の硬化促進剤の少量を加えてもよく、
またゴムや低分子エポキシ等の可とう性賦与剤や粘度調
整剤、あるいはポリアミドイミド、ポリエーテルイミド
、ポリエステルイミド等をブレンドしてもよくタルク、
マイカ、石英粉末等の充填剤、カーボンブラッ久 フタ
ロシアニンブルー等の着色剤、テトラブロモフェニルメ
タン等の難燃剤、三酸化アンチモン等の難燃助剤の少量
を加えてもよい。When using the polyamic acid product produced according to the present invention for producing a flexible printed circuit board, various silane coupling agents, borane coupling agents, titanate coupling agents 1, aluminum coupling agents and other chelate-based Adhesion/adhesion improvers, various solvents, and flow agents may be added (in addition to these, a small amount of a normal acid curing agent, amine curing agent, imidacil, tertiary amine, etc.) may be added. It's okay,
In addition, flexibility agents and viscosity modifiers such as rubber and low-molecular epoxy, or polyamideimide, polyetherimide, polyesterimide, etc. may be blended with talc,
Small amounts of fillers such as mica and quartz powder, colorants such as carbon black and phthalocyanine blue, flame retardants such as tetrabromophenylmethane, and flame retardant aids such as antimony trioxide may be added.
本発明で可とう性行与剤として用いるポリイミド粉末の
合成反応は、以下の様な方法で行われる。The synthesis reaction of the polyimide powder used as the flexibility imparting agent in the present invention is carried out in the following manner.
すなわち、3,3’,4.4’−ビフェニルテトラカル
ボン酸二無水物、または、3.3’、4.4−ベンゾフ
ェノンテトラカルボン酸二無水物とジフェニルメタンジ
イソシアネートを、溶媒中で100℃から150℃の温
度で反応させる方法である。温度が上記よりも低いと反
応の進行が遅く、高いど生成する粒子の粒径が大きくな
りすぎ、可とう性付与の目的に適さな(なる。このよう
にして得られたポリイミド粉末を可とう性行与剤として
前期のポリアミック酸溶液に固形分重量比で1から40
%加え、通常の方法で混合撹拌する。That is, 3,3',4,4'-biphenyltetracarboxylic dianhydride or 3,3',4,4-benzophenonetetracarboxylic dianhydride and diphenylmethane diisocyanate were heated at 100°C to 150°C in a solvent. This is a method in which the reaction is carried out at a temperature of °C. If the temperature is lower than the above, the reaction progresses slowly, and the particle size of the particles formed becomes too large, making it unsuitable for the purpose of imparting flexibility. As a sexual enhancement agent, the solid content weight ratio is 1 to 40 in the polyamic acid solution used in the previous stage.
% and mix and stir in the usual manner.
可とう性行与剤として加えるポリイミド粉末が1%より
少ないと、可とう性が不十分であり、40%よりも多い
と印刷時に気泡を巻き込み平滑なカバーが得られない。If the amount of polyimide powder added as a flexibility imparting agent is less than 1%, the flexibility will be insufficient, and if it is more than 40%, air bubbles will be drawn in during printing, making it impossible to obtain a smooth cover.
本発明のカバーコート付フレキシブルプリント回路板の
製造方法は、まず、上記のベース用フレキシブルプリン
ト回路用基板の銅箔面を通常の方法によりエツチングし
回路を形成する。次いで、この回路面に上記の可とう性
付与剤入りのポリアミック酸溶液をカバーコートとして
流延塗布し、続いて加熱硬化させてカバーコート付フレ
キシブルプリント回路板を得る。In the method of manufacturing a flexible printed circuit board with a cover coat according to the present invention, first, the copper foil surface of the base flexible printed circuit board is etched by a conventional method to form a circuit. Next, the polyamic acid solution containing the above-mentioned flexibility imparting agent is cast-coated as a cover coat on this circuit surface, and then heated and cured to obtain a cover-coated flexible printed circuit board.
本発明で使用される金属箔は、一般に銅箔が用いられる
が、アルミ箔、ニッケル箔、チタン箔、ステンレス箔、
タングステン箔なども用いることが出来る。金属箔は3
〜200μの厚さのものが使用され、表面は粗面化処理
を施されているものが好ましい。The metal foil used in the present invention is generally copper foil, but aluminum foil, nickel foil, titanium foil, stainless steel foil, etc.
Tungsten foil or the like can also be used. Metal foil is 3
A thickness of ~200 μm is used, and the surface is preferably roughened.
ポリアミック酸溶液を金属箔上に流延塗布してベース用
フレキシブルプリント回路用基板を得る方法は、ロータ
リーコーター、ナイフコータードクターブレード、フロ
ーコーター等の公知の塗布手段で50〜i oooμの
均一な厚さに流延塗布する方法がとられる。次に加熱に
よりポリアミック酸の溶媒を除去し、かつイミド環の形
成を行うが、ポリイミド皮膜が形成される以前に、始め
から強い加熱を行うと、粗面となったりひきつったりす
るので、加熱は低温から徐々に高くする様にした方が好
ましい。例えば、 100℃から350℃まで0.5時
間以上かけて連続的に加熱する。A method for obtaining a base flexible printed circuit board by casting a polyamic acid solution onto a metal foil is to obtain a uniform thickness of 50 to 100μ using known coating means such as a rotary coater, knife coater doctor blade, flow coater, etc. A method of casting is used. Next, the solvent of the polyamic acid is removed by heating and an imide ring is formed. However, if strong heating is applied from the beginning before the polyimide film is formed, the surface will become rough or twitch, so heating is not recommended. It is preferable to gradually increase the temperature from a low temperature. For example, it is heated continuously from 100°C to 350°C over 0.5 hours or more.
0、 5時間未満であると膜厚にもよるが、脱溶媒が不
十分であったり、イミドの閉環が不十分で特性が十分に
発揮されないことがある。また例えば、100℃で30
分、ついで150℃で30分、200℃で30分、25
0℃で30分、300℃で30分、350°Cで20分
という具合いに段階的に昇温してもよい。加熱雰囲気も
空気中でさしつかえない場合もあるが減圧下ないしは不
活性ガスを流しながら非酸化性状態下に行う方が好まし
い場合が多い。この様にして形成されたポリイミド皮膜
層は一般的に10〜200μである。If the time is less than 0.5 hours, depending on the film thickness, the solvent may be removed insufficiently or the ring closure of the imide may be insufficient and the properties may not be fully exhibited. For example, 30°C at 100°C.
minutes, then 30 minutes at 150℃, 30 minutes at 200℃, 25 minutes.
The temperature may be increased stepwise at 0°C for 30 minutes, at 300°C for 30 minutes, and at 350°C for 20 minutes. Although the heating atmosphere may be in the air in some cases, it is often preferable to conduct the heating under reduced pressure or under non-oxidizing conditions while flowing an inert gas. The polyimide coating layer thus formed typically has a thickness of 10 to 200 microns.
このようにして得られたフレキシブルプリント回路用基
板の銅箔面を通常のエツチング方法により、例えば塩化
第二鉄溶液を用いてエツチングし、回路を形成する。The copper foil surface of the flexible printed circuit board thus obtained is etched by a conventional etching method using, for example, a ferric chloride solution to form a circuit.
次に、この回路を形成したフレキシブルプリント回路板
の、回路形成面上に、上記のポリイミド粉末を可とう性
付与剤として含有するポリアミック酸溶液をカバーコー
トとして流延塗布する。Next, a polyamic acid solution containing the above polyimide powder as a flexibility imparting agent is cast as a cover coat onto the circuit forming surface of the flexible printed circuit board on which this circuit is formed.
ポリアミック酸溶液をカバーコートとして回路形成面に
塗布する方法は、スクリーン印刷法、ロータリーコータ
ー、ナイフコーター、 ドクターブレード、フローコー
ター等の公知の塗布手段で20〜500μの均一な厚さ
に流延塗布する方法がとられる。The polyamic acid solution is applied as a cover coat to the circuit forming surface by casting to a uniform thickness of 20 to 500μ using known coating methods such as screen printing, rotary coater, knife coater, doctor blade, and flow coater. A method is taken to do so.
次に、上記のベース用フレキシブルプリント回路用基板
の作製と同様の方法で、加熱によりポリアミック酸の溶
媒を除去し、かつイミド環の形成を行う。この様にして
形成されたポリイミド皮膜層は一般的に4〜100μで
ある。Next, the solvent of the polyamic acid is removed by heating and an imide ring is formed in the same manner as in the production of the base flexible printed circuit board. The polyimide coating layer thus formed typically has a thickness of 4 to 100 microns.
(実施例1)
温度計、撹拌装置、環流コンデンサーおよび乾燥窒素ガ
ス吹き込み口を備えた4つロセパラブルフラスコに精製
した無水のパラフェニレンジアミン108gをとり、こ
れに無水のN−メチル−2−ピロリドン90重量%とト
ルエン10重量%の混合溶剤を、全仕込原料中の固形分
割合が20重量%になるだけの量を加えて溶解した。乾
燥窒素ガスは反応の準備段階より生成物取り出しまでの
全行程にわたり流しておいた。ついで精製した無水の3
゜3’,4.4’−ビフェニルテトラカルボン酸二無水
物294gを攪はんしながら少量ずつ添加するが発熱反
応であるため、外部水槽に約15℃の冷水を循環させて
これを冷却した。添加後、内部温度を20℃に設定し、
5時間撹拌し反応を終了してポリアミック酸溶液(Aと
する)を得た。次に上記と同様の装置及び方法で無水の
4,4゛−ジアミノジフェニルエーテル200gと精製
した無水のピロメリット酸二無水物218gを反応させ
てポリアミック酸(Bとする)を得た。次にAi3よび
Bを、モル比がA/B=60/40になるように混合撹
拌しポリアミック酸溶液(C)を得た。得られた生成物
は、黄色透明の極めて粘稠なポリアミック酸溶液であり
、N−メチル−2−ピロ91290.5重量%溶液の固
有粘度は0.81(30℃)であった。(Example 1) 108 g of purified anhydrous para-phenylenediamine was placed in a four-separable flask equipped with a thermometer, a stirrer, a reflux condenser, and a dry nitrogen gas inlet, and anhydrous N-methyl-2- A mixed solvent of 90% by weight of pyrrolidone and 10% by weight of toluene was added and dissolved in an amount sufficient to make the solid content ratio in the total raw materials 20% by weight. Dry nitrogen gas was allowed to flow throughout the reaction from the preparatory stage to the product removal. Then purified anhydrous 3
゜294 g of 3',4.4'-biphenyltetracarboxylic dianhydride was added little by little while stirring, but since it was an exothermic reaction, cold water of about 15°C was circulated in an external water tank to cool it. . After addition, set the internal temperature to 20 °C,
After stirring for 5 hours, the reaction was completed and a polyamic acid solution (referred to as A) was obtained. Next, 200 g of anhydrous 4,4'-diaminodiphenyl ether and 218 g of purified anhydrous pyromellitic dianhydride were reacted using the same apparatus and method as described above to obtain a polyamic acid (referred to as B). Next, Ai3 and B were mixed and stirred so that the molar ratio was A/B=60/40 to obtain a polyamic acid solution (C). The obtained product was a transparent yellow and extremely viscous polyamic acid solution, and the intrinsic viscosity of the N-methyl-2-pyro 91290.5% by weight solution was 0.81 (30°C).
次に上記と同様の装置を用いてジフェニルメタンジイソ
シアネー)−250gと3,3’,4,4’−ベンゾフ
ェノンテトラカルボン酸二無水物294gを140℃で
5時間反応させポリイミド粉末を得た。Next, using the same apparatus as above, 250 g of diphenylmethane diisocyanate and 294 g of 3,3',4,4'-benzophenonetetracarboxylic dianhydride were reacted at 140°C for 5 hours to obtain polyimide powder.
このポリイミド粉末を、上記のポリアミック酸溶液(C
)中に20重量%添加し、混合撹拌し、カバーコート用
ポリアミック酸溶液(D)を得た。This polyimide powder was mixed with the above polyamic acid solution (C
) and mixed and stirred to obtain a polyamic acid solution (D) for cover coating.
上記のポリアミック酸溶液(C)を銅箔上に流延塗布し
た後乾燥器にいれ100℃から350℃まで連続的に2
時間かけて昇温した。After casting the above polyamic acid solution (C) on copper foil, it was placed in a dryer and continuously heated from 100°C to 350°C for 2 hours.
The temperature was raised over time.
この様にして製造されたフレキシブルプリント回路用基
板上の銅箔をエツチングして回路を形成し、この回路面
に、上記の方法で調製したポリアミック酸溶液(D)を
カバーコートとして流延塗布した後乾燥器に入れ100
℃から350℃まで連続的に2時間かけて昇温した。A circuit was formed by etching the copper foil on the flexible printed circuit board produced in this way, and the polyamic acid solution (D) prepared by the above method was cast as a cover coat on the circuit surface. After that, put it in the dryer for 100 minutes.
The temperature was raised continuously from °C to 350 °C over 2 hours.
この様にして製造されたカバーコート付フレキシブルプ
リント回路板は、カバーコートの印刷性がよく、にじみ
がなく、カバーの密着性も優れており、400度以上の
耐熱性をもち、しかも耐折性(M I T法、O,IR
,0,5kgf)が1万回以上の非常に優れたフレキシ
ブルプリント回路板であった。The flexible printed circuit board with a cover coat manufactured in this way has good printability of the cover coat, no bleeding, excellent adhesion of the cover, heat resistance of 400 degrees or more, and folding durability. (MIT method, O, IR
, 0.5kgf) was an extremely excellent flexible printed circuit board that was tested over 10,000 times.
(実施例2)
実施例1と同様な装置及び方法で、バラフェニレンジア
ミンと3.3’、4.4’−ビフェニルテトラカルボン
酸二無水物からなるポリアミック酸溶液(Aとする)と
、4.4−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。AとBをモル比が70/30になるように混
合撹拌しポリアミック酸溶液(C)を得た。生成物の固
有粘度は0.90であった。つぎにビフェニルテトラカ
ルボン酸二無水物とジフェニルメタンジイソシアネート
を反応させて、ポリイミド粉末を得、これを上記ポリア
ミック酸溶液(C)に15重量%添加し、カバーコート
用ポリアミック酸溶液(D)を得た。(Example 2) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of phenylene diamine and 3.3', 4.4'-biphenyltetracarboxylic dianhydride, and 4 A polyamic acid solution (referred to as B) consisting of 4-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. A and B were mixed and stirred at a molar ratio of 70/30 to obtain a polyamic acid solution (C). The product had an intrinsic viscosity of 0.90. Next, biphenyltetracarboxylic dianhydride and diphenylmethane diisocyanate were reacted to obtain polyimide powder, and 15% by weight of this was added to the above polyamic acid solution (C) to obtain a polyamic acid solution for cover coat (D). .
上記のポリアミック酸溶液(C)を銅箔上に流延塗布し
た後乾燥器に入れ、100℃で30分間、150℃で3
0分間、200℃で30分間、250℃で20分間、3
00℃で10分間それぞれ加熱した後、300℃から3
50℃まで連続的に1時間かけて昇温し、アニールした
。The above polyamic acid solution (C) was cast onto a copper foil and then placed in a dryer at 100°C for 30 minutes and at 150°C for 30 minutes.
0 minutes, 30 minutes at 200℃, 20 minutes at 250℃, 3
After heating at 00℃ for 10 minutes each, heating from 300℃ to 3
The temperature was continuously raised to 50° C. over 1 hour for annealing.
この様にして製造されたフレキシブルプリント回路用基
板上の銅箔をエツチングして回路を形成し、この回路面
に、上記の方法で調製したポリアミック酸溶液(D)を
カバーコートとして流延塗布した後乾燥器に入れ100
℃から350℃まで連続的に2時間かけて昇温した。A circuit was formed by etching the copper foil on the flexible printed circuit board produced in this way, and the polyamic acid solution (D) prepared by the above method was cast as a cover coat on the circuit surface. After that, put it in the dryer for 100 minutes.
The temperature was raised continuously from °C to 350 °C over 2 hours.
この様にして製造されたカバーコート付フレキシブルプ
リント回路板は、カバーコートの印刷性が良(、カール
やシワもなく、強度も優れており、しかも400度以上
の耐熱性をもち、耐折回数も8000回以上の、非常に
優れたフレキシブルプリント回路板であった。The flexible printed circuit board with a cover coat manufactured in this way has good printability of the cover coat (no curls or wrinkles, excellent strength, heat resistance of 400 degrees or more, and a number of folding cycles). It was an extremely excellent flexible printed circuit board that was tested over 8,000 times.
(比較例1)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3’,4.4’−ビフェニルテトラカルボン
酸二無水物からなるポリアミック酸溶液(Aとする)と
、4.4’−ジアミノジフェニルエーテルとピロメリッ
ト酸二無水物からなるポリアミック酸溶液(Bとする)
を合成した。つぎに、AとBをモル比が60/40にな
るように混合撹拌した。(Comparative Example 1) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3.3',4.4'-biphenyltetracarboxylic dianhydride, and 4 .4'-Diamino diphenyl ether and pyromellitic dianhydride polyamic acid solution (referred to as B)
was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 60/40.
実施例1と同様の方法でフレキシブルプリント回路用基
板を作製し、銅箔面をエツチングして回路を形成した。A flexible printed circuit board was prepared in the same manner as in Example 1, and the copper foil surface was etched to form a circuit.
この回路面に、カバーレイとして一般に用いられるカプ
トンフィルムをエポキシ系の接着剤を用いて張り合わせ
た。得られたフィルムカバーレイ付フレキシブルプリン
ト回路板は、カバーレイの接着性が悪く、耐折回数も1
000回以下と劣っていた。また、350℃まで加熱し
たところ、接着剤層が黒化および炭化し耐熱性も劣って
いた。Kapton film, which is commonly used as a coverlay, was attached to this circuit surface using an epoxy adhesive. The resulting flexible printed circuit board with a film coverlay had poor adhesion of the coverlay, and the number of folding cycles was only 1.
000 times or less, which was poor. Furthermore, when heated to 350° C., the adhesive layer turned black and carbonized, and the heat resistance was also poor.
(比較例2)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3”、4゜4−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4,4−ジアミノジフェニルエーテルとピロメリット酸
二無水物からなるポリアミック酸溶液(Bとする)を合
成した。つぎに、AとBをモル比が60/40になるよ
うに混合撹拌した。(Comparative Example 2) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3.3", 4° 4-biphenyltetracarboxylic dianhydride,
A polyamic acid solution (referred to as B) consisting of 4,4-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 60/40.
実施例1と同様な方法でフレキシブル回路用基板を作成
し、銅箔面をエツチングして回路を形成した。この回路
面に、一般に用いられるメラミン、アルキッド系樹脂を
主成分とするインクによって被覆した。しかし、得られ
たカバーコート付フレキシブルプリント回路板は、耐折
回数は500回以下と著しく悪く、さらに、350℃ま
で加熱するとカバーコート部分が炭化および黒化し、耐
熱性が劣っていた。A flexible circuit board was prepared in the same manner as in Example 1, and the copper foil surface was etched to form a circuit. This circuit surface was coated with an ink containing commonly used melamine or alkyd resin as its main component. However, the obtained flexible printed circuit board with a cover coat had a significantly poor folding resistance of 500 times or less, and furthermore, when heated to 350° C., the cover coat portion carbonized and blackened, resulting in poor heat resistance.
(比較例3)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3,3’,4.4−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4.4’−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が60740になる
ように混合撹拌した。(Comparative Example 3) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3,3',4,4-biphenyltetracarboxylic dianhydride,
A polyamic acid solution (referred to as B) consisting of 4.4'-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 60,740.
実施例1と同様な方法でフレキシブル回路用基板を作成
し、銅箔面をエツチングして回路を形成した。この回路
面に、上記の方法で調製したポリアミック酸溶液をカバ
ーコートとして流延塗布した後100℃の乾燥7器に入
れ350℃まで連続的に2時間かけて昇温した。A flexible circuit board was prepared in the same manner as in Example 1, and the copper foil surface was etched to form a circuit. The polyamic acid solution prepared by the above method was cast onto the circuit surface as a cover coat, and then placed in a drying oven at 100° C. and heated continuously to 350° C. over 2 hours.
この様にして製造されたカバーコート付フレキシブルプ
リント回路板は、耐折回数は5000回程度であったが
、カバーコートの印刷性が悪く、にじみや糸ひきがみら
れた。The flexible printed circuit board with a cover coat manufactured in this manner had a durability of about 5,000 folds, but the printability of the cover coat was poor and bleeding and stringiness were observed.
(比較例4)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3,3’,4.4−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4,4’−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が80/20になる
ように混合撹拌した。(Comparative Example 4) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3,3',4,4-biphenyltetracarboxylic dianhydride,
A polyamic acid solution (referred to as B) consisting of 4,4'-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 80/20.
実施例1と同様な方法でフレキシブル回路用基板を作成
し、銅箔面をエツチングして回路を形成した。この回路
面に、上記の方法で調製したポリアミック酸溶液をカバ
ーコートとして流延塗布した後100℃の乾燥器に入れ
350℃まで連続的に2時間かけて昇温した。A flexible circuit board was prepared in the same manner as in Example 1, and the copper foil surface was etched to form a circuit. The polyamic acid solution prepared by the above method was cast onto the circuit surface as a cover coat, and then placed in a dryer at 100° C. and heated continuously to 350° C. over 2 hours.
この様にして製造されたカバーコート付フレキシブルプ
リント回路板は、カバーコートの印刷性が悪く、にじみ
や糸ひきがみられ、また、剛直で柔軟性がなく、耐折性
も600回程度と悪かった。The cover coated flexible printed circuit board manufactured in this way had poor printability with the cover coat, smearing and stringiness were observed, was rigid and inflexible, and had poor folding durability of about 600 times. Ta.
(発明の効果)
本発明の方法により、従来不可能であった、接着層のな
いフレキシブルプリント回路用基板をベースとするカバ
ーレイ付フレキシブルプリント回路板を製造することが
可能になり、こうして得られたフレキシブルプリント回
路板は、接着層がないために耐熱性に優れ、カールがな
いために加工性も良く、また密着性や耐折性、屈曲性に
も優れた基板であった。(Effects of the Invention) The method of the present invention makes it possible to manufacture a flexible printed circuit board with a coverlay based on a flexible printed circuit board without an adhesive layer, which was previously impossible. The flexible printed circuit board has excellent heat resistance because it does not have an adhesive layer, has good workability because it does not curl, and has excellent adhesion, bending durability, and flexibility.
本発明で得られるカバーコート付フレキシブルプリント
回路板は各種の電気、電子機器用配線基板のみならずフ
ラットモータ、テープキャリヤーフロッピーディスクヘ
ッド、高周波アンチ九 電磁シールド板などにも利用さ
れる。The flexible printed circuit board with a cover coat obtained by the present invention is used not only for wiring boards for various electrical and electronic devices, but also for flat motors, tape carriers, floppy disk heads, high frequency anti-electromagnetic shielding boards, etc.
Claims (4)
回路用基板の回路面上にポリイミドをカバーコートとし
て流延塗布し加熱硬化させるにあたり、ベースのポリイ
ミドと同じ組成の耐熱性樹脂に、ポリイミド粉末を可と
う性付与剤として1〜40重量%加えた耐熱性樹脂を使
用することを特徴とするカバーコート付フレキシブルプ
リント回路板。(1) When polyimide is cast as a cover coat on the circuit surface of a polyimide-based flexible printed circuit board and cured by heating, polyimide powder is added to a heat-resistant resin with the same composition as the base polyimide. A flexible printed circuit board with a cover coat, characterized in that a heat-resistant resin to which 1 to 40% by weight is added as a coating agent is used.
ジアミン成分とを、酸成分/アミン成分(モル比)を0
.90〜1.00として反応させるに当たり、3,3’
,4,4’−ビフェニルテトラカルボン酸二無水物とパ
ラフェニレンジアミンとを反応させて得られたポリアミ
ック酸溶液(A)と、ピロメリット酸二無水物と4,4
’−ジアミノジフェニルエーテルを反応させて得られた
ポリアミック酸溶液(B)とを、A/B=55/45〜
75/25の割合で混合撹拌して得られるポリアミック
酸混合溶液を加熱硬化させて得られるポリイミドである
、特許請求項第1項記載のカバーコート付フレキシブル
プリント回路板。(2) The polyimide contains the tetracarboxylic dianhydride component and the diamine component, and the acid component/amine component (molar ratio) is 0.
.. When reacting as 90 to 1.00, 3,3'
, 4,4'-biphenyltetracarboxylic dianhydride and paraphenylenediamine, and a polyamic acid solution (A) obtained by reacting pyromellitic dianhydride and 4,4'-biphenyltetracarboxylic dianhydride.
A/B=55/45~
The flexible printed circuit board with a cover coat according to claim 1, which is a polyimide obtained by heating and curing a polyamic acid mixed solution obtained by mixing and stirring at a ratio of 75/25.
3,3’,4,4’−ビフェニルテトラカルボン酸二無
水物とジフェニルメタンジイソシアネートを反応させて
得られたポリイミド粉末、または、3,3’,4,4’
−ベンゾフェノンテトラカルボン酸二無水物とジフェニ
ルメタンジイソシアネートを反応させて得られたポリイ
ミド粉末である、特許請求項第1項記載のカバーコート
付フレキシブルプリント回路板。(3) The polyimide powder added as a flexibility imparting agent is
Polyimide powder obtained by reacting 3,3',4,4'-biphenyltetracarboxylic dianhydride and diphenylmethane diisocyanate, or 3,3',4,4'
- The flexible printed circuit board with a cover coat according to claim 1, which is a polyimide powder obtained by reacting benzophenone tetracarboxylic dianhydride and diphenylmethane diisocyanate.
ック酸溶液を直接流延塗布し、加熱硬化させて得られる
フレキシブルプリント回路用基板の銅箔面にエッチング
により回路を形成し、これに上記のポリアミック酸溶液
をカバーコートとして流延塗布し、加熱硬化させること
を特徴とする、特許請求項第1項記載のカバーコート付
フレキシブルプリント回路板の製造方法。(4) A circuit is formed by etching on the copper foil surface of a flexible printed circuit board obtained by directly casting the polyamic acid solution according to the above patent claim 2 on a metal foil and curing it by heating. 2. The method for manufacturing a flexible printed circuit board with a cover coat according to claim 1, wherein the polyamic acid solution is cast as a cover coat and cured by heating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10288590A JP2815668B2 (en) | 1990-04-20 | 1990-04-20 | Manufacturing method of flexible printed circuit board with cover coat |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10288590A JP2815668B2 (en) | 1990-04-20 | 1990-04-20 | Manufacturing method of flexible printed circuit board with cover coat |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH043492A true JPH043492A (en) | 1992-01-08 |
| JP2815668B2 JP2815668B2 (en) | 1998-10-27 |
Family
ID=14339324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10288590A Expired - Fee Related JP2815668B2 (en) | 1990-04-20 | 1990-04-20 | Manufacturing method of flexible printed circuit board with cover coat |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2815668B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1048680A4 (en) * | 1998-01-14 | 2003-05-21 | Ajinomoto Kk | MODIFIED POLYMIDE RESIN AND THERMOSETTING RESIN COMPOSITION CONTAINING THE SAME |
| JP2008031251A (en) * | 2006-07-27 | 2008-02-14 | Du Pont Toray Co Ltd | Coverlay |
| JP2015081345A (en) * | 2013-10-22 | 2015-04-27 | 達邁科技股▲分▼有限公司 | Polyimide film incorporating polyimide powder matting agent and its production |
| US9267057B2 (en) | 2011-12-16 | 2016-02-23 | Taimide Technology Incorporated | Polyimide film incorporating polyimide powder delustrant, and manufacture thereof |
-
1990
- 1990-04-20 JP JP10288590A patent/JP2815668B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1048680A4 (en) * | 1998-01-14 | 2003-05-21 | Ajinomoto Kk | MODIFIED POLYMIDE RESIN AND THERMOSETTING RESIN COMPOSITION CONTAINING THE SAME |
| JP2008031251A (en) * | 2006-07-27 | 2008-02-14 | Du Pont Toray Co Ltd | Coverlay |
| US9267057B2 (en) | 2011-12-16 | 2016-02-23 | Taimide Technology Incorporated | Polyimide film incorporating polyimide powder delustrant, and manufacture thereof |
| JP2015081345A (en) * | 2013-10-22 | 2015-04-27 | 達邁科技股▲分▼有限公司 | Polyimide film incorporating polyimide powder matting agent and its production |
| KR20150046706A (en) * | 2013-10-22 | 2015-04-30 | 타이마이드 테크놀로지 인코포레이션 | Polyimide film incorporating polyimide powder delustrant, and manufacture thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2815668B2 (en) | 1998-10-27 |
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