JPH0437257U - - Google Patents
Info
- Publication number
- JPH0437257U JPH0437257U JP8005490U JP8005490U JPH0437257U JP H0437257 U JPH0437257 U JP H0437257U JP 8005490 U JP8005490 U JP 8005490U JP 8005490 U JP8005490 U JP 8005490U JP H0437257 U JPH0437257 U JP H0437257U
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- mask material
- target
- evaporation target
- deposition apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の蒸着装置の概略図、第２図は
マスク材の一例を示す平面図、第３図は被蒸着物
に形成された蒸着膜の膜厚分布を示すグラフであ
る。
１０……蒸着装置、１３……被蒸着物、１４…
…蒸発源、１５……マスク材、１６……開口。
FIG. 1 is a schematic diagram of a vapor deposition apparatus of the present invention, FIG. 2 is a plan view showing an example of a mask material, and FIG. 3 is a graph showing the thickness distribution of a vapor deposited film formed on an object to be vapor deposited. 10... Vapor deposition apparatus, 13... Deposited object, 14...
...Evaporation source, 15...Mask material, 16...Opening.
Claims (1)
且つその開口率を被蒸着物の蒸着面の形状に応じ
て変化させたマスク材を配設し、被蒸着物上に形
成される蒸着膜の厚みを実質的に均一になるよう
にしたことを特徴とする蒸着装置。 A mask material having a large number of openings and whose aperture ratio is changed according to the shape of the evaporation surface of the evaporation target is disposed between the evaporation source and the evaporation target, and the mask material is formed on the evaporation target. A vapor deposition apparatus characterized in that the thickness of the vapor deposited film is made substantially uniform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8005490U JPH0437257U (en) | 1990-07-26 | 1990-07-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8005490U JPH0437257U (en) | 1990-07-26 | 1990-07-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0437257U true JPH0437257U (en) | 1992-03-30 |
Family
ID=31624768
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8005490U Pending JPH0437257U (en) | 1990-07-26 | 1990-07-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0437257U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0479954U (en) * | 1990-11-21 | 1992-07-13 |
-
1990
- 1990-07-26 JP JP8005490U patent/JPH0437257U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0479954U (en) * | 1990-11-21 | 1992-07-13 |