JPH0441174A - Micropolishing method and micropolishing tool - Google Patents

Micropolishing method and micropolishing tool

Info

Publication number
JPH0441174A
JPH0441174A JP2144721A JP14472190A JPH0441174A JP H0441174 A JPH0441174 A JP H0441174A JP 2144721 A JP2144721 A JP 2144721A JP 14472190 A JP14472190 A JP 14472190A JP H0441174 A JPH0441174 A JP H0441174A
Authority
JP
Japan
Prior art keywords
polishing
actuator
magnetic
polished
electrostrictive element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2144721A
Other languages
Japanese (ja)
Inventor
Shinichi Mizuguchi
水口 信一
Shuji Ueda
修治 上田
Yasushi Kato
康司 加藤
Tokuji Umehara
徳次 梅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2144721A priority Critical patent/JPH0441174A/en
Publication of JPH0441174A publication Critical patent/JPH0441174A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/26Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To enlarge the amplitude of a micromotion in the XY direction, by using a lamination type electrostrictive element with the telescopic direction being made in the X direction and that with the telescopic direction in the Y direction with their combination as the actuator in the XY direction. CONSTITUTION:A polishing part 26 is subjected to a micromotion in the XY direction parallel to a polishing face and/or the Z direction vertical to the polishing face by actuators 20, 24x, 24y consisting of electrostrictive elements, in the state of a polishing material M being held between the polishing part 26 of the polishing tool 1 tip and a work W. Moreover, as for the actuators 24x, 24y in the XY direction the lamination type electrostrictive element whose telescopic direction is made in the X direction and that in the Y direction are used with their combination. As for the actuator 20 in the Z direction, the electrostrictive element of lamination type whose telescopic direction is made in the Z direction is used to polish the work W.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、微小研磨方法およ′CF微小研磨工具に関
し、詳しくは、レンズや光学素子等の製造分野において
、超高精度な加工を行うために、微小な領域を精密に研
磨する方法、および、上記方法の実施に用いる研磨工具
に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a micro-polishing method and a CF micro-polishing tool, and more specifically, it is used for ultra-high precision processing in the field of manufacturing lenses, optical elements, etc. The present invention relates to a method for precisely polishing a minute area, and a polishing tool used to carry out the method.

〔従来の技術〕[Conventional technology]

各種の電子機器や光学機器に糺み込まれて使用される非
球面レンズやX線光学素子等は、研磨加工によって製造
されているが、製品の形状精度が0.01μm以下とい
う極めて高精度な加工を要求されており、このような超
高精度な研磨加工を行える加工方法が求められている。
Aspherical lenses and X-ray optical elements used in various electronic and optical devices are manufactured by polishing, but the shape accuracy of the products is extremely high precision of 0.01 μm or less. There is a need for a processing method that can perform such ultra-high precision polishing processing.

そのためには、研磨面に対して、微小な領域に限定して
精密に研磨できる研磨方法が必要となる。
For this purpose, a polishing method that can precisely polish only a minute area of the polished surface is required.

従来、高精度な研磨方法としては、ポリッシング加工や
ラフピング加工等が採用されていたが、前記した0、0
1μm以下の超高精度加工は全く不可能であったため、
近年、より高精度な加工を行える方法として、研磨材と
して磁性研磨流体を用いる磁気研磨法が注目されている
。ここに、磁性研磨流体とは、破性流体単体またはCれ
に微粒状の研磨材を懸濁分散させてなるものを言う。
Conventionally, polishing processing, roughing processing, etc. have been adopted as high-precision polishing methods, but the above-mentioned 0, 0
Ultra-high precision machining of 1 μm or less was completely impossible, so
In recent years, a magnetic polishing method that uses a magnetic polishing fluid as an abrasive has been attracting attention as a method that can perform processing with higher precision. The term "magnetic polishing fluid" as used herein refers to a rupturable fluid alone or one in which fine particles of abrasive material are suspended and dispersed in C.

磁気研磨法では、研磨工具先端の研磨部と被研磨材の間
に、磁性研磨流体を供給するとともに磁界を印加するよ
うにする。そうすると、磁性研磨流体は、磁気的作用で
、被研磨材の研磨面を加圧した状態で研磨部と被@磨材
の間に保持される。
In the magnetic polishing method, a magnetic polishing fluid is supplied and a magnetic field is applied between a polishing part at the tip of a polishing tool and a workpiece to be polished. Then, the magnetic polishing fluid is held between the polishing part and the material to be polished while applying pressure to the polishing surface of the material to be polished by magnetic action.

この状態で、研磨工具を高速回転させると、磁性研磨流
体は研磨工具の回転に引きずられて高速回転運動させら
れて、被研磨材に対し研磨加工を行う。この際に、印加
する磁界の方向や強さを変動させることによって、磁性
研磨流体による研磨面の加圧力を変動させたり、磁性研
磨流体の運動を制御したりして、研磨性能を向上させる
ことも行われている。この磁気研磨法の具体例について
は、例えば、特開昭60−118466号公報、特開昭
61−244457号公報、特公昭1−16623号公
報等に開示されている。
In this state, when the polishing tool is rotated at high speed, the magnetic polishing fluid is dragged by the rotation of the polishing tool and is rotated at high speed, thereby polishing the material to be polished. At this time, by varying the direction and strength of the applied magnetic field, the force applied to the polishing surface by the magnetic polishing fluid can be varied and the movement of the magnetic polishing fluid can be controlled to improve polishing performance. is also being carried out. Specific examples of this magnetic polishing method are disclosed in, for example, JP-A-60-118466, JP-A-61-244457, and JP-A-1-16623.

この磁気研磨法によれば、磁気的な保持力によって研磨
面の微小な領域に研磨材を集中的に作用させることがで
きるので、従来の研゛麿法に比べて、高精度な研磨加工
ができるという利点がある。
According to this magnetic polishing method, it is possible to apply the abrasive material intensively to a minute area of the polishing surface using magnetic holding force, resulting in more precise polishing than the conventional polishing method. It has the advantage of being possible.

しかし、この磁気研磨法によってでも、0.01μm以
下の超高精度加工には未だ充分に対応することが出来な
かった。
However, even with this magnetic polishing method, it has not been possible to sufficiently cope with ultra-high precision machining of 0.01 μm or less.

すなわち、この方法では、磁性研磨流体を研磨工具の高
速回転によって高速回転させるようにするので、研磨面
の仕上がりは研磨工具の回転の状態に直接影響を受ける
ことになる。ところが、研磨工具の回転にはどうしても
回転数の変動や軸ぶれ等が起き易いため、この方法では
、研磨面の仕上がりに、研磨量の変動や局部的な研磨の
偏り、研磨領域の変動が生してしまうと言う問題があっ
たのである。回転機構等の機械的な動作機構には、各部
材がスムーズに運動できるだけの空間的余裕が必要であ
り、そのために研磨部の運動に若干のガタッキが生じる
のもやむを得ないことであり、その結果、研磨面の仕上
がりにムラや変動が生じると言う問題もあった。要する
に、研9部を高速回転する限り、これらの問題を完全に
防止することは不可能であった。
That is, in this method, the magnetic polishing fluid is rotated at high speed by the high speed rotation of the polishing tool, so the finish of the polished surface is directly affected by the rotational state of the polishing tool. However, as the rotation of the polishing tool is prone to fluctuations in rotational speed and shaft wobbling, this method results in fluctuations in the amount of polishing, local polishing bias, and fluctuations in the polishing area in the finished polished surface. There was a problem with this. Mechanical operating mechanisms such as rotating mechanisms require sufficient space to allow each member to move smoothly, and it is unavoidable that there will be some wobble in the movement of the polishing unit. There was also the problem that unevenness and fluctuations occurred in the finish of the polished surface. In short, it has been impossible to completely prevent these problems as long as the grinding section 9 is rotated at high speed.

従来の高速回転磁気研磨法では、磁性研磨流体を研磨面
に押し付けるための加圧力は、研磨工具の回転自体によ
っては生じず、前述のように磁気の印加によって生じさ
せているので、印加する磁気を強くしないと充分な研磨
力が生じず、磁気の強さが変動すると研磨量が変わって
しまう。そのため、この高速回転磁気研磨法では、電磁
石等の磁気発生手段が大掛かりになるとともに、磁気力
の制御を厳密に行う必要があると言う問題もあった。さ
らに、この加圧力を得るための磁気回路は、被研磨材自
体がその一部を構成する必要があるため、被研磨材が磁
気的な導体すなわち磁性体でなければならないという制
約があった。もっとも、被研磨材が非磁性体であっても
、薄いものであれば、この非磁性被研磨材を通して磁気
回路を構成することもできる。しかし、この場合でも、
被研磨材の厚みの僅かな変動や磁気的性質の変動によっ
て磁性研磨流体の研磨面加圧力が変わるので、研磨量や
研磨精度等の管理が難しいという問題があった。なお、
前記したレンズや゛光学素子等は、非磁性体であるとと
もにかなりの厚みがあるので、上記高速回転磁気研磨法
を通用することが出来ない。
In the conventional high-speed rotation magnetic polishing method, the pressure force for pressing the magnetic polishing fluid against the polishing surface is not generated by the rotation of the polishing tool itself, but by the application of magnetism as described above. If the magnetic strength is not strong enough, sufficient polishing force will not be generated, and if the magnetic strength changes, the amount of polishing will change. Therefore, this high-speed rotational magnetic polishing method requires a large-scale magnetism generating means such as an electromagnet, and also has the problem of requiring strict control of the magnetic force. Furthermore, since the material to be polished itself must constitute a part of the magnetic circuit for obtaining this pressing force, there is a restriction that the material to be polished must be a magnetic conductor, that is, a magnetic material. However, even if the material to be polished is a non-magnetic material, a magnetic circuit can be constructed through the non-magnetic material as long as it is thin. However, even in this case,
Since the pressing force of the magnetic polishing fluid on the polishing surface changes due to slight variations in the thickness or magnetic properties of the material to be polished, there has been a problem in that it is difficult to control the amount of polishing, polishing accuracy, etc. In addition,
The above-mentioned lenses, optical elements, etc. are non-magnetic and have considerable thickness, so the high-speed rotational magnetic polishing method described above cannot be applied to them.

そこで、上記従来の高速回転磁気研磨法の問題点を解消
し、より高精度な加工が可能であるとともに、被研磨材
の磁気的性質に影響を受けず、非磁性体からなる被研磨
材にも良好に通用することのできる微小研磨方法を提供
するべ(、発明者らは、先に、研磨部を電歪素子すなわ
ちピエゾ素子からなるアクチュエータで研磨面に平行な
XY方向と研磨面に垂直なZ方向に微小運動させ、この
研磨部の微小運動を磁性研磨流体に伝達して被研磨材の
研磨面を研磨させるようにする微小研磨方法および微小
研磨工具を開発した。
Therefore, we have solved the problems of the conventional high-speed rotation magnetic polishing method mentioned above, and it is possible to process with higher precision. To provide a micro-polishing method that can be used successfully in We have developed a micro-polishing method and a micro-polishing tool that make micro-movements in the Z direction and transmit the micro-movements of the polishing part to a magnetic polishing fluid to polish the polished surface of the workpiece.

この電歪素子からなるアクチュエータを用いる新規な微
小研磨方法および微小研磨工具は、研磨部を高速回転す
る必要がないため、また、被研磨材自体を磁性研磨流体
保持と磁性研磨流体加圧のための磁気回路の一部にする
必要がないため、前述した従来の高速回転微小研磨法の
゛諸問題を完全に解消することが出来る。
This new micro-polishing method and micro-polishing tool using an actuator consisting of an electrostrictive element does not require high-speed rotation of the polishing section, and also allows the material to be polished to hold and pressurize the magnetic polishing fluid. Since it is not necessary to make it a part of the magnetic circuit, the problems of the conventional high-speed rotation micro-polishing method described above can be completely solved.

すなわち、この新規な駆動方式による微小研磨法では、
電歪素子の働きで磁性研磨流体を被研磨材に押し付ける
とともに研磨部を研磨面に沿って微小運動させるように
し、これによって被研磨材を研磨加工するようにしてい
る。つまり、研磨部に対し電歪素子を利用するXY方向
アクチュエータまたはZ方向アクチュエータによる微小
運動を与えて、磁性研磨流体を被研磨材の研磨面に対し
て水平方向または垂直方向に微小運動させるようにし、
磁性研磨流体に対し、研磨面に対する水平方向の微小運
動によって研磨面に沿う微小の研磨運動を行わせ、研磨
面に対する垂直方向の微小運動によって研磨面に対する
加圧力を得させるようにしたものである。
In other words, in the micropolishing method using this new drive method,
The electrostrictive element forces the magnetic polishing fluid onto the workpiece and causes the polishing section to move minutely along the polishing surface, thereby polishing the workpiece. In other words, a minute movement is applied to the polishing part by an XY-direction actuator or a Z-direction actuator that uses an electrostrictive element, so that the magnetic polishing fluid is caused to make a minute movement in the horizontal or vertical direction with respect to the polishing surface of the material to be polished. ,
The magnetic polishing fluid is made to perform a minute polishing movement along the polishing surface by making a minute movement in the horizontal direction with respect to the polishing surface, and to obtain a pressing force against the polishing surface by making a minute movement in the vertical direction to the polishing surface. .

このように、この新規な駆動方式による微小研磨法では
、研磨部の回転を必要としない結果、回転ムラや軸ぶれ
等による研磨のバラツキや表面粗さムラ等が生じない。
In this way, the micro-polishing method using this novel drive method does not require rotation of the polishing section, and as a result, there are no variations in polishing or uneven surface roughness due to uneven rotation, shaft runout, or the like.

電歪素子によるアクチュエータは、機械的な摺動部分や
作動機°構が全くなく、印加電圧にしたがって極めて正
確に駆動するので、磁性研磨流体の運動も安定している
。このような点でも、研磨のバラツキやムラを生じさせ
ない。アクチュエータによる磁性研磨流体のXY方向運
動は、従来のような回転運動に比べて遥かに微小である
ため、被研磨材をきめ細かく研磨加工して、表面粗さの
極めて小さな超高精度な鏡面加工を可能とする。
An actuator using an electrostrictive element has no mechanical sliding parts or operating mechanism, and is driven extremely accurately according to the applied voltage, so that the movement of the magnetic polishing fluid is also stable. In this respect as well, variations and unevenness in polishing are not caused. The movement of the magnetic polishing fluid in the X and Y directions by the actuator is much smaller than conventional rotational movement, so it is possible to finely polish the material to be polished and achieve ultra-high precision mirror finishing with extremely low surface roughness. possible.

また、この新規な駆動方式による微小研磨法では、磁性
研磨流体を被研磨材に押し付ける加圧力は電歪素子によ
るZ方向アクチュエータで加えるので、研磨工具の研磨
部から被研磨材につながる磁気回路を設けておく必要が
なくなり、その結果、被研磨材が非磁性体であっても何
ら差し支えなく研磨加工ができるし、被研磨材の材質や
厚みによる磁気的性質の違いに関係なく、アクチュエー
タへの印加電圧だけで被研磨材への加圧力が設定制御で
きるので、被研磨材の材質や形状による研磨能率や研磨
精度への影響を生じさせないのである。被研磨材は、従
来の高速回転磁気研磨法でも研磨できる鋼等の磁性体材
料のほか、従来の高速回転磁気研磨法では研磨出来なか
ったガラスやセラミック等の非磁性体材料も使用できる
。非研磨材の形状も、薄いものから分厚いものまで幅広
く適用でき、研磨面は平面や球面あるいは自由曲面等も
加工できる。
In addition, in the micro-polishing method using this new drive method, the pressure force for pressing the magnetic polishing fluid onto the material to be polished is applied by a Z-direction actuator using an electrostrictive element, so the magnetic circuit connecting from the polishing part of the polishing tool to the material to be polished is As a result, even if the material to be polished is non-magnetic, it can be polished without any problem, and regardless of the difference in magnetic properties due to the material and thickness of the material to be polished, the actuator can be Since the pressure applied to the material to be polished can be set and controlled using only the applied voltage, polishing efficiency and polishing accuracy are not affected by the material or shape of the material to be polished. As the material to be polished, in addition to magnetic materials such as steel that can be polished by conventional high-speed rotational magnetic polishing methods, non-magnetic materials such as glass and ceramics that cannot be polished by conventional high-speed rotational magnetic polishing methods can also be used. The non-abrasive material can be used in a wide variety of shapes, from thin to thick, and the polished surface can be flat, spherical, or free-form.

この新規な駆動方法による微小磁気研磨方法によれば、
上述のように、研磨部の微小運動は、電歪素子に電圧を
印加することによって得られる極めて微小な運動である
ので、磁性Vr麿原流体、研磨部周辺の極めて微小な領
域のみで被研磨材を高精度に研磨することができ、被研
磨材の表面をきめ細かく均一にgf磨することができる
。従来の高速回転研磨法に比べて、はるかに均一な′g
f麿加工が施されるので、超高精度な鏡面加工も可能に
なり、形状精度0.01μm以下の超高精度研磨加工を
容易かつ確実に実現できるのである。
According to the micro magnetic polishing method using this new driving method,
As mentioned above, the minute movement of the polishing section is an extremely minute movement obtained by applying a voltage to the electrostrictive element, so the magnetic Vr fluid causes the polishing to occur only in an extremely small area around the polishing section. The material can be polished with high precision, and the surface of the material to be polished can be finely and uniformly gf polished. Much more uniform ′g compared to traditional high-speed rotation polishing methods
Since f-polishing is performed, ultra-high precision mirror finishing is also possible, and ultra-high precision polishing with a shape accuracy of 0.01 μm or less can be easily and reliably achieved.

なお、この新規な駆動方法による微小研磨方法および微
小研磨工具は、研磨材として磁性5fF慶流体を用いな
い方法にも利用することが出来る。
Note that the micro-polishing method and micro-polishing tool using this novel driving method can also be used in a method that does not use a magnetic 5fF aqueous fluid as the abrasive.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかし、その後の研究により、この新規な微小研磨方法
および微小研磨工具には、つぎのような新たな問題のあ
ることが分かった。
However, subsequent research has revealed that this new micropolishing method and micropolishing tool have the following new problems.

すなわち、この新規な駆動方式による微小研磨方法では
、XY方向アクチュエータを構成する電歪素子として1
個でもってXY両方向駆動可能な屈曲型のものを用いて
いたのであるが、屈曲型電歪素子は、周波数を高(とれ
る利点を有するものの、XY方向の大きな振幅を得るた
めに機械的な共振現象を利用する結果、第4図に見るよ
うに、外力(被研磨材に対する加圧力の反力)の大小に
より上記振幅の大きさ、すなわち変位りが変動すること
が避けられず、その制御が不可能であると言う問題点で
ある。
That is, in the micropolishing method using this new drive method, one electrostrictive element constituting the XY direction actuator
Previously, bendable electrostrictive elements were used that could be driven individually in both the X and Y directions.Although bendable electrostrictive elements have the advantage of being able to achieve high frequencies, they require mechanical resonance in order to obtain large amplitudes in the X and Y directions. As a result of utilizing this phenomenon, as shown in Figure 4, it is inevitable that the above amplitude, that is, the displacement, will fluctuate depending on the magnitude of the external force (reaction force of the pressing force on the material to be polished), and it is difficult to control it. The problem is that it is impossible.

また、屈曲型の電歪素子によるxyX方向振幅は、機械
的な共振現象を利用するため、余り大きく取れないと言
う問題もあった。その結果、たとえば、′gF磨工臭の
′gfs部がポリウレタンシートで構成されている場合
に、上記振幅が゛ポリウレタンシートの気孔径よりも小
さいため、研磨面に加工痕が部分的にしか付かず、所望
の大きさの加工形状が得られないと言うような現象が住
しることがあった。
Further, there is a problem in that the amplitude in the xyx directions by the bending type electrostrictive element cannot be set very large because it utilizes a mechanical resonance phenomenon. As a result, for example, when the 'gfs part of the 'gF polishing odor' is composed of a polyurethane sheet, the above amplitude is smaller than the pore diameter of the polyurethane sheet, so machining marks are only partially formed on the polished surface. However, there have been cases where a machined shape of a desired size cannot be obtained.

そこで、この発明は、XY方向の振幅が外力で変化せず
その制御が容易であり、また、この振幅を大きく取れる
新規な駆動方式による微小研磨法および微小研磨工具を
提供することを課題とする〔課題を解決するための手段
〕 上記課題を解決するための、この発明にかかる微小研磨
方法および微小研磨工具の主要構成は、以下のとおりで
ある。
Therefore, an object of the present invention is to provide a micro-polishing method and a micro-polishing tool using a novel drive method in which the amplitude in the XY directions does not change due to external force and can be easily controlled, and which can increase the amplitude. [Means for Solving the Problems] The main configurations of the micropolishing method and micropolishing tool according to the present invention for solving the above problems are as follows.

まず、この発明にかかる微小研磨方法は、研磨工具先端
の研磨部と被研磨材の間に研磨材を保持した状態で、前
記研磨部を電歪素子からなるアクチュエータで研磨面と
平行なXY方向および/または研磨面と垂直なX方向に
微小運動させ、かつ、前記XY方向のアクチュエータと
しては伸縮方向をX方向とする積層型の電歪素子°・と
伸縮方向をY方向とする積層型の電歪素子とを組み合わ
せて用いるようにするとともに前記2方向のアクチュエ
ータとしては伸縮方向をX方向とする積層型の電歪素子
を用いるようにして、被研磨材を研磨するようにする。
First, in the micro-polishing method according to the present invention, with an abrasive being held between a polishing part at the tip of a polishing tool and a workpiece to be polished, the polishing part is moved in XY directions parallel to the polishing surface using an actuator made of an electrostrictive element. and/or a laminated electrostrictive element whose expansion/contraction direction is in the X direction and a laminated type electrostrictive element whose expansion/contraction direction is in the Y direction as actuators in the The workpiece to be polished is polished by using a laminated type electrostrictive element whose expansion/contraction direction is the X direction as the two-direction actuator.

つぎに、この発明にかかる微小研磨工具は、被研磨材の
研磨面に対面する研磨部と、積層型の電歪素子からなり
その伸縮作用により前記研磨部を研磨面と平行なX方向
に微小運動させるX方向アクチュエータと、積層型の電
歪素子からなりその伸縮作用により前記研磨部を研磨面
と平行で前記X方向に垂直なY方向に微小運動させるY
方向アクチュエータと、積層型の電歪素子からなりその
伸縮作用により前記研磨部を研磨面と垂直なX方向に微
小運動させるX方向アクチュエータとを備える。
Next, the micro-polishing tool according to the present invention includes a polishing section facing the polishing surface of the material to be polished, and a laminated electrostrictive element, and its expansion and contraction action causes the polishing section to be microscopically moved in the X direction parallel to the polishing surface. Y is composed of an X-direction actuator for movement and a laminated electrostrictive element, and its expansion/contraction action causes minute movement of the polishing part in the Y-direction parallel to the polishing surface and perpendicular to the X-direction.
The present invention includes a directional actuator and an X-direction actuator which is made of a laminated electrostrictive element and causes the polishing section to move minutely in the X direction perpendicular to the polishing surface by its expansion and contraction action.

この発明において、研磨工具は、従来の高速回転磁気研
磨法の場合と同様、適当な支持部材に支持された状態で
、先端の研磨部を被研磨材に沿って移動させられるが、
この支持手段や移動手段は、各種の工作機械等で用いら
れている手段が採用される。
In this invention, the polishing tool is supported by a suitable support member and the polishing part at the tip is moved along the material to be polished, as in the case of the conventional high-speed rotation magnetic polishing method.
As this supporting means and moving means, means used in various machine tools and the like are employed.

研磨工具は、後述の微小駆動手段により、被研磨材の形
状や目的に応じて、その研磨部を、研磨面に水平な方向
すなわちXY方向へ微小運動させ、また、vr磨面に垂
直な方向すなわちX方向へ微小運動させる。さらに、軸
を傾ける等の動作を行わせるようにすれば、複雑な曲面
形状等の研磨加工を行うことが出来る。
The polishing tool uses micro-driving means, which will be described later, to minutely move its polishing part in the direction horizontal to the polishing surface, that is, in the That is, it is made to make a minute movement in the X direction. Furthermore, by performing operations such as tilting the axis, it is possible to polish complex curved surfaces.

被研磨材は研磨部の表面性状に対応する性状に加工され
る。この研磨部は、Snメンキ層やポリウレタン層等で
構成することが出来る。研磨部の形状は平面でも良いが
、球面にすると、研磨部の隅角が研磨面に当たることが
容易に避けられる。
The material to be polished is processed to have properties corresponding to the surface properties of the polished portion. This polishing portion can be composed of an Sn coating layer, a polyurethane layer, or the like. The shape of the polishing part may be flat, but if it is made spherical, the corners of the polishing part can easily be prevented from coming into contact with the polishing surface.

球面にすると、平面に比べ、同し幅でも実質的幅が大き
くなり、加工痕1個当たりの幅を大きく出来る。研磨部
をポリウレタンで構成する場合には、研磨部のXY方向
の微小運動の振幅がポリウレタンの気孔径よりも大きく
なるようにすると、研磨切れによる部分的研磨が住じず
、所望形状の加工痕を容易に得ることで出来る。
When a spherical surface is used, the actual width is larger than that of a flat surface even if the width is the same, and the width per machining mark can be increased. When the polishing part is made of polyurethane, if the amplitude of the micromovement in the XY direction of the polishing part is larger than the pore diameter of the polyurethane, partial polishing due to polishing breakage will not occur, and machining marks of the desired shape will be created. This can be done by easily obtaining .

球面の5に房部は、研磨工具先端に転勤自在に保持され
た球体で構成すると良い。この転勤により、研磨部の偏
摩耗が防止されるからである。球体゛は、軸受機構の球
体のように、機械的に保持されても良く、磁力で保持さ
れても良い。また、研磨材の粘性により保持されても良
い。
It is preferable that the spherical convex section 5 is constituted by a spherical body which is movably held at the tip of the polishing tool. This is because this transfer prevents uneven wear of the polishing part. The sphere may be held mechanically, like the sphere of a bearing mechanism, or may be held magnetically. Alternatively, it may be held by the viscosity of the abrasive.

この発明に用いる研磨材は、いわゆる磁性fIg流体に
限らず、非磁性研磨流体も用いることが出来る。
The abrasive used in this invention is not limited to the so-called magnetic fIg fluid, but also non-magnetic polishing fluids can be used.

磁性研磨流体は、いわゆる磁性流体としての性質と、研
磨材としての機能を備えているものであり、通常の磁気
研磨法に用いられているものと同様のものを用いること
ができる。−船釣な磁性流体は、Few ○4等からな
り粒径10nm以下程度の微細な磁性粉粒を水や油等に
コロイド状に分散させたものであるが、この磁性流体を
構成する磁性粉粒が、被研磨材に対する研磨性を有して
いれば、このような磁性粉粒からなる磁性流体をそのま
ま用いることもできる。磁性研磨剤粉粒の具体例として
は、α−Fes 04  (ベンガラ)等が挙げられる
。また、研磨性を有さない磁性粉粒からなる磁性流体に
、磁性を有さない通常の研磨材粉粒を懸濁分散させたも
のでもよい。この場合の研磨材粉粒としては、A I 
= OsやSin、等が用いられ、粒径1100n以下
程度のものが好ましく使用される。
The magnetic polishing fluid has properties as a so-called magnetic fluid and functions as an abrasive, and can be the same as those used in normal magnetic polishing methods. - The magnetic fluid used for boat fishing is made by colloidally dispersing fine magnetic powder particles with a particle size of 10 nm or less, such as Few ○4, in water, oil, etc. As long as the particles have abrasive properties for the material to be polished, a magnetic fluid made of such magnetic powder particles can be used as is. Specific examples of the magnetic abrasive powder include α-Fes 04 (red iron). Alternatively, ordinary abrasive particles without magnetism may be suspended and dispersed in a magnetic fluid made of magnetic particles without abrasive properties. In this case, the abrasive powder particles are A I
= Os, Sin, etc. are used, and those with a particle size of about 1100 nm or less are preferably used.

研磨材として磁性研磨流体を用いる場合において、研磨
工具先端の研磨部と被研磨材の間に磁性vr磨原流体磁
気的に保持するには、例えば、研磨工具先端の研磨部に
近接させるように磁気ヨークを設けて磁気回路を構成す
れば、その磁気的作用によってVr麿邪の近傍に容易に
磁性研磨流体を保持しておくことができる。
When using a magnetic polishing fluid as an abrasive, in order to magnetically hold the magnetic VR polishing fluid between the polishing part at the tip of the polishing tool and the material to be polished, for example, the polishing fluid must be placed close to the polishing part at the tip of the polishing tool. If a magnetic circuit is constructed by providing a magnetic yoke, the magnetic polishing fluid can be easily held near the Vr due to its magnetic action.

研磨部を微小運動させるアクチュエータは、電圧を印加
することによって伸縮する、ピエゾ素子とも呼ばれる電
歪素子を用いる。研磨部をこのアクチュエータに連結し
て周期的に変動する電圧をアクチュエータに印加すれば
、研磨部を微小運動させることができる。印加電圧の周
波数によってアクチュエータの微小運動の周波数が変わ
り、印加電圧の大きさによってアクチュエータの微小運
動の振幅が変わる。研磨部のこの微小運動が研磨材に伝
達されて、研磨材が研磨部と同じような微小運動を行い
、研磨材のこの微小運動で被研磨材を研磨する。
The actuator that makes minute movements of the polishing part uses an electrostrictive element, also called a piezo element, which expands and contracts by applying a voltage. By connecting the polishing section to this actuator and applying a periodically varying voltage to the actuator, the polishing section can be moved minutely. The frequency of the minute movement of the actuator changes depending on the frequency of the applied voltage, and the amplitude of the minute movement of the actuator changes depending on the magnitude of the applied voltage. This minute movement of the abrasive part is transmitted to the abrasive material, the abrasive material performs the same minute movement as the abrasive part, and the material to be polished is polished by this minute movement of the abrasive material.

X方向アクチュエータは研磨部を研磨面に水平なX方向
に微小運動させて、また、Y方向アクチュエータは研磨
部を研磨面に水平で上記X方向に垂直なY方向に微小運
動させて、研磨材を被l1ilF磨材の研磨面と平行な
方向に微小運動させ被研磨材を研磨加工する。XY方向
アクチュエータによる研磨部の動きは、X方向またはY
方向への単独の動きであってもよいし、X方向の動きと
Y方向の動きを関連させて同時に動かせる動きであって
もよい。例えば、X方向とY方向の運動の位相を制御す
ることによって、リサージュ運動をさせることができる
The X-direction actuator makes a small movement of the polishing part in the X direction, which is horizontal to the polishing surface, and the Y-direction actuator makes a small movement of the polishing part in the Y direction, which is horizontal to the polishing surface and perpendicular to the above-mentioned X direction. The material to be polished is polished by making small movements in a direction parallel to the polishing surface of the material to be polished. The movement of the polishing section by the XY direction actuator is in the X direction or in the Y direction.
It may be a single movement in the direction, or it may be a movement in which the movement in the X direction and the movement in the Y direction are related and can be moved simultaneously. For example, Lissajous motion can be achieved by controlling the phase of motion in the X and Y directions.

X方向アクチュエータは、研磨面に対して垂直な方向に
研磨部を動かし、研磨材を°被研磨材に垂直方向から衝
突するように運動させ、被研磨材に加圧力を与える。し
たがって、X方向アクチュエータに加える電圧の大きさ
で、被研磨材に加わる加圧力を制御することができる。
The X-direction actuator moves the polishing part in a direction perpendicular to the polishing surface, moves the abrasive so that it collides with the workpiece from the perpendicular direction, and applies pressure to the workpiece. Therefore, the pressing force applied to the material to be polished can be controlled by the magnitude of the voltage applied to the X-direction actuator.

また、このX方向アクチュエータの微小運動によるボン
ピング作用で、研磨材が研磨面に順次供給されることに
なる。
Moreover, the abrasive material is sequentially supplied to the polishing surface by the pumping effect caused by the minute movement of the X-direction actuator.

XY方向アクチュエータとX方向アクチュエータは、各
方向別々に電圧印加配線をしておくことにより、X方向
とY方向の場合は印加電圧の掛は方を適宜に制御するこ
とによっても、それぞれの先端をX、Y、X方向に微小
運動させる。各アクチュエータに電圧を印加する駆動配
線は、駆動アンプやファンクションジェ不レーク等に接
続される。これらの駆動回路もしくは駆動機構は、通常
の機械装置における電歪素子を用いたアクチュエータの
場合と同様の構造が採用できる。XY方向アクチュエー
タの場合、X方向とY方向の印加電圧の位相を適当に制
御することによって、xyX方向アクチュエータ先端す
なわち研磨部の運動軌跡を単純な直線的動きからりサー
ジュ運動のような複雑な動きまで自由に変更することが
できるのである。
For the XY direction actuator and the Make small movements in the X, Y, and X directions. Drive wiring that applies voltage to each actuator is connected to a drive amplifier, a function generator, and the like. These drive circuits or drive mechanisms can have a structure similar to that of actuators using electrostrictive elements in ordinary mechanical devices. In the case of an XY direction actuator, by appropriately controlling the phase of the applied voltages in the X and Y directions, the movement locus of the tip of the xyX direction actuator, that is, the polishing part, can be changed from a simple linear movement to a complex movement such as a surge movement. You can change it freely.

X方向アクチュエータとY方向アクチュエータとX方向
アクチュエータとは、積層型の電歪素子を用いて構成す
る。積層型のものを用いれば、伸縮でX方向またはY方
向の微小運動を行う。積層型の電歪素子は、その両端に
電圧を印加して伸縮させる。
The X-direction actuator, the Y-direction actuator, and the X-direction actuator are constructed using laminated electrostrictive elements. If a laminated type is used, minute movements in the X direction or Y direction will be made by expansion and contraction. A stacked electrostrictive element expands and contracts by applying a voltage to both ends thereof.

XY方向アクチュエータおよびX方向アクチュエータは
、通常は直接に研磨部を駆動せず、先端を研磨部とする
研磨軸に水平方向や垂直方向の微小駆動を加えるように
する等して、研磨部を駆動する。
The XY-direction actuator and the X-direction actuator usually do not directly drive the polishing section, but instead drive the polishing section by applying micro-drives in the horizontal or vertical direction to a polishing shaft whose tip is the polishing section. do.

この場合に、X方向の7クチユエータによる加圧力を研
磨部に確実に伝えるとともに、かつ、研磨部のxY方向
の動きを自在とさせるためには、X方向のアクチュエー
タと研磨部の間に研磨部のxyX方向微小運動を自在と
する球対隅状の連結部を設けて、XY方向のアクチュエ
ータの作用点をこの連結部と前記研磨部の間に設けるよ
うにするのが良い。
In this case, in order to reliably transmit the pressurizing force from the seven actuators in the X direction to the polishing section and to allow the polishing section to move freely in the x and Y directions, the polishing section must be placed between the actuator in the X direction and the polishing section. It is preferable to provide a ball-to-corner connecting portion that allows small movements in the x, y, and x directions, and to provide the point of action of the actuator in the X and Y directions between this connecting portion and the polishing portion.

研磨部の微小運動は、上記したX方向の微小運動とXY
方向の微小運動を同時に行わせることが最も好ましいが
、X方向もしくはXY方向の何れか一方のみでも研磨加
工は可能である。
The micro-movement of the polishing part is the above-mentioned micro-movement in the X direction and the XY
Although it is most preferable to perform minute movements in both directions at the same time, polishing is also possible in either the X direction or the XY direction.

研磨材が被研磨材に加ねえる加圧力は、上述のように、
X方向アクチュエータによる加圧力で決まり、磁気的な
保持力を併用する場合はこの保持力の影響も受ける。し
かし、この加圧力は加工の進行とともに減少する。そこ
で、被研磨材に加わる加圧荷重の値を検出して、これを
X方向アクチュエータの制御にフィードバックして加圧
力制御を行うようにすることが好ましい。加圧荷重値を
検出する荷重検出手段は、被研磨材に加わる垂直方向の
荷重を検知できさえするものであれば、通常の各種機械
装置に組み込まれているものと同様の圧力センサが使用
できる。例えば、被研磨材をロードセルの上に載置した
状態で研磨加工を行えば、被研磨材に加わる加圧荷重の
大゛きさをロードセルで検出して、電気信号として取り
出すことが出来る。
As mentioned above, the pressure applied by the abrasive to the material to be polished is
It is determined by the pressure applied by the X-direction actuator, and when magnetic holding force is used in combination, it is also affected by this holding force. However, this pressing force decreases as processing progresses. Therefore, it is preferable to detect the value of the pressurizing load applied to the material to be polished and feed this back to the control of the X-direction actuator to control the pressurizing force. As the load detection means for detecting the applied load value, pressure sensors similar to those built into various ordinary mechanical devices can be used as long as they can detect the vertical load applied to the material to be polished. . For example, if polishing is performed with the material to be polished placed on a load cell, the magnitude of the pressure load applied to the material to be polished can be detected by the load cell and extracted as an electrical signal.

荷重検出手段で検出された加圧荷重値は、電機信号に変
換されて、アクチュエータの駆動を制御する。具体的に
は、検出信号が適当な電気回路で処理されて、アクチュ
エータに電圧を印加する駆動回路に入力され、ここで予
め設定された加圧荷重値と検出された加圧荷重値とを比
較して、X方向アクチュエータに印加する電圧を増やし
たり減らしたりする。すなわち、X方向アクチュエータ
による加圧力をフィードハック制御するようにするので
ある。このフィードバンク制御は、たとえば、X方向ア
クチュエータによる加圧力を常に所定の大きさに保った
り、加工過程の初期は大きく(荒研磨)、中期は中程度
に(中研g)、そして終期は小さく (仕上研磨)なる
ようにして行う。
The pressurized load value detected by the load detection means is converted into an electric signal to control the drive of the actuator. Specifically, the detection signal is processed by an appropriate electric circuit and input to a drive circuit that applies voltage to the actuator, where the preset pressure load value and the detected pressure load value are compared. to increase or decrease the voltage applied to the X-direction actuator. In other words, the pressure applied by the X-direction actuator is subjected to feed-hack control. This feedbank control can, for example, always keep the pressure applied by the X-direction actuator at a predetermined level, or keep it large at the beginning of the machining process (rough grinding), moderate in the middle (medium grinding g), and small at the end ( Finish polishing).

なお、この多段階研磨の場合でも、各過程での加圧力は
一定であるように制御するのが好ましい。
Note that even in the case of this multi-step polishing, it is preferable to control the pressing force in each step to be constant.

このように、X方向の加圧力を一定に保持する場合にお
いて、X方向アクチュエータによる加圧力に振動が加わ
るように制御すれば、この振動によるポンピング作用で
、研磨材が研磨面に順次供給され、かつ、順次排除され
るような現象が起きるようになる。
In this way, when the pressing force in the X direction is held constant, if vibration is controlled to be added to the pressing force by the X direction actuator, the pumping action of this vibration will sequentially supply the abrasive to the polishing surface. Moreover, a phenomenon in which they are gradually eliminated begins to occur.

加圧力の設定値は、被研磨材の材質や研磨精度等の条件
にしたがって、適当に決められる。
The set value of the pressing force is appropriately determined according to conditions such as the material of the workpiece to be polished and the polishing accuracy.

研磨材として磁気研磨流体を用いる場合は、研磨軸は、
その磁気保持のための磁気回路の一部としての中央ヨー
クとなるので、研磨軸は磁性体で形成される。これに対
向する対向ヨークは、中央ヨークの先端の研磨部との間
に磁気ギャップとなる隙間をあけるようにして配置され
る。例えば、断面円形の中央ヨークの周囲に間隔をあけ
て円環状の対向ヨークが囲むように配置しておく。この
ようにしておけば、中央ヨークの研磨部周辺に磁気研磨
流体を良好に保持しておける。なお、棒状あるいは板状
等の対向ヨークを、中央ヨークと並べて配置しておくこ
ともできる。対向ヨークも磁気回路の一部を構成するの
で、磁性体で形成されていることは言うまでもない。対
向ヨークのうち、中央ヨークと対向する先端部が、先細
り形状になっていれば、対向ヨークの先端部分に磁界を
集中させることができて好ましい。
When using magnetic polishing fluid as the polishing material, the polishing shaft is
The polishing shaft is made of a magnetic material because it serves as a central yoke as part of the magnetic circuit for maintaining the magnetism. The opposing yoke facing this is arranged with a gap forming a magnetic gap between it and the polishing portion at the tip of the central yoke. For example, a central yoke having a circular cross section is surrounded by annular opposing yokes at intervals. By doing so, the magnetic polishing fluid can be well maintained around the polishing portion of the central yoke. Note that a bar-shaped or plate-shaped opposing yoke may be arranged side by side with the central yoke. Since the opposing yoke also constitutes a part of the magnetic circuit, it goes without saying that it is made of a magnetic material. It is preferable that the distal end portion of the opposing yoke, which faces the central yoke, has a tapered shape so that the magnetic field can be concentrated at the distal end portion of the opposing yoke.

中央ヨークと対向ヨークを磁性発生手段で連結すること
によって、磁気回路が構成される。磁気発生手段として
は、永久磁石あるいは電磁石の何れも採用できるが、こ
の発明では、磁界の向きや大きさを変える必要がないの
で、永久磁石の方が構造が簡単で好ましい。永久磁石と
しては、Sm−Co磁石等からなるものが使用できる。
A magnetic circuit is constructed by connecting the central yoke and the opposing yoke with magnetism generating means. Although either a permanent magnet or an electromagnet can be used as the magnetism generating means, in this invention, since there is no need to change the direction or magnitude of the magnetic field, a permanent magnet is preferable because it has a simpler structure. As the permanent magnet, a magnet made of Sm-Co magnet or the like can be used.

〔作  用〕[For production]

積層型の電歪素子は、その積層枚数によって伸縮のスト
ロークを大小でき、積層枚数を多くするとストロークが
大きくなる。したがって、XY方向のアクチュエータと
して伸縮方向をX方向とする積層型の電歪素子と伸縮方
向をY方向とする積層型の電歪素子とを組み合わせて用
いるようにすると、大きな振幅が得られ、かつ、この微
小運動の振幅の大きさ、すなわち変位りは第3図にみる
ように外力の大小で変動しない。研磨部がポリウレタン
シートで構成されている場合に、XY方向のアクチュエ
ータの微小運動の振幅をポリウレタンシートの気孔径よ
りも大きくするようにすると、部分的研磨が起きない。
In a laminated electrostrictive element, the stroke of expansion and contraction can be increased or decreased depending on the number of laminated elements, and as the number of laminated elements increases, the stroke becomes larger. Therefore, if a laminated electrostrictive element whose expansion/contraction direction is the X direction and a laminated electrostrictive element whose expansion/contraction direction is the Y direction are used in combination as an XY-direction actuator, a large amplitude can be obtained, and The magnitude of the amplitude of this minute movement, that is, the displacement, does not vary depending on the magnitude of the external force, as shown in FIG. When the polishing section is made of a polyurethane sheet, if the amplitude of the minute movement of the actuator in the XY directions is made larger than the pore diameter of the polyurethane sheet, partial polishing will not occur.

X方向のアクチュエータと研磨部の間に研磨部のxyX
方向微小運動を自在とする球対隅状の連結部を設けて、
XY方向のアクチュエータの作用点をこの連結部と前記
研磨部の間に設けるようにすると、研磨部のXY方向の
微小運動を妨げずにX方向のアクチュエータの加圧力を
研磨部に伝えることが出来る。
xyX of the polishing part between the actuator in the X direction and the polishing part
Providing a ball-to-corner connection that allows for small directional movements,
By providing the point of action of the actuator in the X and Y directions between this connecting portion and the polishing portion, the pressing force of the actuator in the X direction can be transmitted to the polishing portion without interfering with minute movements of the polishing portion in the X and Y directions. .

〔実 施 例〕〔Example〕

ついで、この発明の実施例を、図を参照しながら、以下
に詳しく説明する。
Next, embodiments of the invention will be described in detail below with reference to the drawings.

第1図はこの発明にかかる微小研磨方法の実施に用いる
研磨装置の主要部たる研磨工具を示している。この研磨
工具1は、その本体部10が研磨装置本体(図示せず)
に支持軸11で支持固定されている。この支持軸11は
、水平方向および垂直方向に自由に移動できるとともに
°、任意の角度で傾くことができるようにもなっている
。支持軸11の作動機構は、通常の工作機械における加
工軸等の作動機構と同様のものである。
FIG. 1 shows a polishing tool which is the main part of a polishing apparatus used to carry out the micropolishing method according to the present invention. This polishing tool 1 has a main body 10 that is a polishing device main body (not shown).
is supported and fixed by a support shaft 11. This support shaft 11 can move freely in the horizontal and vertical directions, and can also be tilted at any angle. The operating mechanism of the support shaft 11 is similar to that of a machining shaft or the like in a normal machine tool.

工具本体部10の下面中心には図で見て鉛直方向たるX
方向のアクチュエータ20が設けられ、その下端部から
は、球対隅状の連結作用を有する連結部21を介して、
ブロック22が吊り下げられている。ここに、球対隅状
の連結作用とは、ブロック22をX方向アクチュエータ
20に対して、X方向に対して垂直のXY方向(図で見
て垂直方向)に微小運動を自在とさせなからX方向アク
チュエータ20の2方向の微小運動を確実にブロック2
2に伝える連結作用を言う。そして、このブロック22
の下端には研磨軸たる中央ヨーク23が一体的に連結さ
れて垂下している。前記ブロック22の上部には、図で
見て水平のX方向側面にX方向アクチュエータ24Xの
先端が当接接続され、図で見て水平で上記X方向に対し
垂直のY方向側面(図の向側側面)にY方向アクチュエ
ータ24yの先端が当接接続されている。この実施例で
は、X方向アクチュエータ20とX方向アクチュエータ
24xとY方向アクチュエータ24yは、いずれも、多
数の薄型エピゾ素子を積層してなり電圧を印加すること
によってX方向(中央ヨーク23の軸方向)、X方向、
Y方向に伸縮し、X方向の微小運動で研磨材を被研磨材
に押しつけ、X方向とY方向の微小運動の組み合わせで
研磨材を被研磨材の研磨面内で自由に運動させることが
できるようになっている。
At the center of the bottom surface of the tool main body 10 is a vertical wall X.
A direction actuator 20 is provided, and from its lower end, via a connection part 21 having a ball-to-corner connection action,
A block 22 is suspended. Here, the sphere-to-corner connection action means that the block 22 is allowed to make minute movements in the XY direction (vertical direction in the figure) that is perpendicular to the X direction with respect to the X direction actuator 20. Reliably blocks minute movements of the X-direction actuator 20 in two directions 2
It refers to the connecting action that is transmitted to 2. And this block 22
A central yoke 23, which is a polishing shaft, is integrally connected to the lower end of the polishing shaft and hangs down. At the top of the block 22, the tip of an X-direction actuator 24X is connected in contact with the side surface in the X direction that is horizontal in the figure, and the side surface in the Y direction that is horizontal in the figure and perpendicular to the X direction (the direction in the figure). The tip of the Y-direction actuator 24y is abutted and connected to the side surface). In this embodiment, the X-direction actuator 20, the X-direction actuator 24x, and the Y-direction actuator 24y are all formed by stacking a large number of thin episodic elements, and are activated in the X direction (the axial direction of the central yoke 23) by applying a voltage. , X direction,
It expands and contracts in the Y direction, presses the abrasive material against the material to be polished with minute movements in the X direction, and allows the abrasive material to move freely within the polishing surface of the material to be polished by a combination of minute movements in the X and Y directions. It looks like this.

XYZ方向アクチュエータの諸元としては、下記第1表
のようなものが使用できる。
As the specifications of the XYZ direction actuator, those shown in Table 1 below can be used.

中央ヨーク23の先端部は次第に細くなり、先端面は球
面になっている。この球面部分が研磨部26である。こ
の研・房部26は、S′nメツキ眉等からなっていても
良いが、ポリウレタン層からなっているときには、この
ポリウレタン層に含浸保持された磁性研磨流体Mが被研
磨材Wの研磨面を研磨するのである。
The tip of the central yoke 23 is gradually tapered and has a spherical tip surface. This spherical portion is the polishing portion 26. This polishing/finishing part 26 may be made of S'n plating, etc., but when it is made of a polyurethane layer, the magnetic polishing fluid M impregnated and held in this polyurethane layer is applied to the polishing surface of the material W to be polished. It is to polish.

この実施例では、研磨部26は、中央ヨーク23の先端
に転勤自在に保持された球体25からなり、表面がSn
メツキ層で表面仕上げされている。この球体25は、こ
の実施例では、永久磁石40の磁力で中央ヨーク23先
端に磁気的に保持されている。しかし、このような球体
は、磁性研磨流体Mの粘性で中央ヨーク23の先端に保
持されても良く、中央ヨーク23の先端内部に嵌合され
て機械的に保持されても良い。
In this embodiment, the polishing section 26 consists of a sphere 25 held at the tip of the central yoke 23 in a freely transferable manner, and the surface is made of Sn.
The surface is finished with a matte layer. In this embodiment, the sphere 25 is magnetically held at the tip of the central yoke 23 by the magnetic force of a permanent magnet 40. However, such a sphere may be held at the tip of the central yoke 23 by the viscosity of the magnetic polishing fluid M, or may be fitted inside the tip of the central yoke 23 and held mechanically.

各アクチュエータ20,24x、24yの駆動配線50
は、3CHビエゾドライハアンプ力・らなる駆動アンプ
51に電気的接続されている。3CHピエゾドライバア
ンプの具体的な仕様としては、例えば、350■、10
0mA、30kHzである。駆動アンプ51には、Z方
向用の信号発生器52とXY方向用の可変位相2出゛力
信号発生器53が接続されている。これらの信号発生器
5253から、駆動アンプ51を介して各アクチュエー
タ20,24x、24yに所定の周波数からなる電圧を
印加して、各アクチュエータ20,24x、24)+2
2x、22)’の駆動を制御する。
Drive wiring 50 for each actuator 20, 24x, 24y
is electrically connected to a drive amplifier 51 consisting of a 3CH viezo driver amplifier. The specific specifications of the 3CH piezo driver amplifier are, for example, 350■, 10
0mA, 30kHz. A signal generator 52 for the Z direction and a variable phase two-output signal generator 53 for the XY directions are connected to the drive amplifier 51. From these signal generators 5253, voltages having a predetermined frequency are applied to each actuator 20, 24x, 24y via the drive amplifier 51, and each actuator 20, 24x, 24)+2
2x, 22)'.

工具本体10の下面には、非磁性体からなる筒状体30
が取りつけられている。筒状体30の中間部(第1図の
右側側面部)には、アクチュエータ24x、24yや各
アクチュエータの駆動配線50等を挿入する開口31が
個形成されている。
A cylindrical body 30 made of a non-magnetic material is provided on the lower surface of the tool body 10.
is attached. An opening 31 is formed in the middle portion of the cylindrical body 30 (the right side surface portion in FIG. 1) into which the actuators 24x, 24y, drive wiring 50 of each actuator, etc. are inserted.

筒状部30の下部には、リング状の磁性体からなる接続
体32がねじ込み接続されている。接続体32の内周部
分の一部は、中央ヨーク23の外周面に近接する位置ま
で延びている。接続体32には、その外周側面から内周
下面に向けて貫通する流体供給路33が形成され、流体
供給路33の外周端には流体供給パイプ34が接続され
ている。
A connecting body 32 made of a ring-shaped magnetic material is screwed and connected to the lower part of the cylindrical portion 30 . A portion of the inner peripheral portion of the connecting body 32 extends to a position close to the outer peripheral surface of the central yoke 23. A fluid supply path 33 is formed in the connecting body 32 and penetrates from the outer circumferential side surface toward the inner circumferential lower surface, and a fluid supply pipe 34 is connected to the outer circumferential end of the fluid supply path 33.

この流体供給パイプ34に磁性研磨流体を供給すると、
磁性研磨流体が流体供給路33から中央ヨーク23の先
端外周付近に滴下し供給される。接続体32の下端には
リング状のS m −Co磁石からなる永久磁石40が
取り付けられている。永久磁石40の磁力の強さは、例
えば5にガウス程度である。永久磁石40の下端には磁
性体からなる対向ヨーク35が取り付けられている。対
向ヨーク35は、下端に向けて円錐状に狭まっており、
先端内周部分が先細り状に尖っていて、この先端内周部
分が、中央ヨーク23の先端との間に一定の隙間をあけ
て対向配置されている。その結果、永久磁石40から接
続体32、中央ヨーク23を経て対向ヨーク35から永
久磁石40へと戻る磁気回路が構成されるとともに、中
央ヨーク23と対向ヨーク35の間にはドーナツツ状の
磁気ギャップが構成されることになる。
When the magnetic polishing fluid is supplied to this fluid supply pipe 34,
A magnetic polishing fluid is dripped and supplied from the fluid supply path 33 to the vicinity of the outer periphery of the tip of the central yoke 23 . A permanent magnet 40 made of a ring-shaped S m -Co magnet is attached to the lower end of the connecting body 32 . The strength of the magnetic force of the permanent magnet 40 is, for example, about 5 Gauss. An opposing yoke 35 made of a magnetic material is attached to the lower end of the permanent magnet 40. The opposing yoke 35 narrows in a conical shape toward the lower end,
The inner circumferential portion of the tip is tapered and pointed, and the inner circumferential portion of the tip is disposed to face the tip of the center yoke 23 with a certain gap therebetween. As a result, a magnetic circuit is formed from the permanent magnet 40, through the connecting body 32, the central yoke 23, and from the opposing yoke 35 back to the permanent magnet 40, and a donut-shaped magnetic gap is formed between the central yoke 23 and the opposing yoke 35. will be constructed.

中央ヨーク23および対向ヨーク35の下方には、荷重
検出手段となるロードセル60が設置されでおり、被研
磨材Wはこのロードセル60の上に載せられた状態で研
磨加工が行われる。ロードセル60の検出出力は、コン
トローラ61を経て駆動アンプ51へと入力されるよう
になっており、2方向アクチユエータ20から被研磨材
Wに加わる加圧力がフィードバンク制御されるようにな
っている。
A load cell 60 serving as a load detection means is installed below the central yoke 23 and the opposing yoke 35, and the workpiece W to be polished is polished while being placed on the load cell 60. The detection output of the load cell 60 is inputted to the drive amplifier 51 via the controller 61, and the pressurizing force applied from the two-way actuator 20 to the material to be polished W is subjected to feedbank control.

駆動アンプ51にはまた、Z方向アクチュエータ20の
加圧力に振動を付与するために、FCゼネレータ70か
ら振動付与信号が入力されるようになっている。
A vibration application signal is also input to the drive amplifier 51 from the FC generator 70 in order to apply vibration to the pressing force of the Z-direction actuator 20 .

このよ°うな構造の研磨装置を用いて行なう、この発明
の磁気微小研磨方法を、以下に具体的に説明する。
The magnetic micropolishing method of the present invention, which is carried out using a polishing apparatus having such a structure, will be specifically described below.

被研磨材Wをロードセル60の上に載せた状態で研磨工
具1を被研磨材Wの上に配置する。流体供給パイプ34
から中央ヨーク23の先端部分に磁性研磨流体Mを供給
すると、磁性研磨流体Mは中央ヨーク23と対向ヨーク
35の間の磁気ギャップ付近に磁気的に保持される。こ
の状態では、第2図に模式的に示すように、磁性研磨流
体Mが中央ヨーク23の先端下面部分まで覆って保持さ
れることになるので、磁気的な作用で磁性研磨流体Mが
被研磨材Wの表面に押し付けられた状態になる。
The polishing tool 1 is placed on the workpiece W with the workpiece W placed on the load cell 60. Fluid supply pipe 34
When the magnetic polishing fluid M is supplied to the tip of the central yoke 23 from the central yoke 23, the magnetic polishing fluid M is magnetically held near the magnetic gap between the central yoke 23 and the opposing yoke 35. In this state, as schematically shown in FIG. 2, the magnetic polishing fluid M is held covering the lower surface of the tip of the central yoke 23, so that the magnetic polishing fluid M is held by the magnetic action. It is pressed against the surface of the material W.

つぎに、Z方向アクチュエータ20に周期的な電圧を印
加すると、Z方向アクチュエータ20が被研磨材Wの研
磨面に垂直方向(第1図で見て上下方向)に微小の伸縮
運動を起こす。それに伴って、中央ヨーク23の先端た
る研磨部26が第2図で見て上下方向(直線矢印方向)
に微小運動を行い、磁性研磨流体Mを被研磨材Wの表面
(研磨面)に押しつけ加圧する。また、XY方向アクチ
ュエータ24X、24yにも周期的な電圧が印加され、
xy方向アクチュエータ24X、24yの各先端が当接
されたブロック22が水平方向(図で見て左右方向)に
揺動する。その結果、研磨部26が球対隅状の連結部2
1を中心にして第2図に円孤形矢印で示すように大きく
揺動する。この揺動は、被研磨材Wの表面(研磨面)に
対して水平方向(XY方向)の微小運動となる。このX
Y方向の微小運動と前記Z方向の微小運動が磁性研磨流
体Mに伝達されて、磁性研磨流体Mが被研磨材Wの表面
(研磨面)を研磨加工する。磁性研磨流体Mは、中央ヨ
ーク23の先端と被研磨材Wの間に挟まれた部分付近の
みで被研磨材Wを加圧して研磨作用を行うので、被研磨
材Wには、はぼ中央ヨーク23の先端形状に相当する大
きさの加工痕Hが形成される。
Next, when a periodic voltage is applied to the Z-direction actuator 20, the Z-direction actuator 20 causes minute expansion and contraction movements in a direction perpendicular to the polishing surface of the material W to be polished (vertical direction as seen in FIG. 1). Accordingly, the polishing portion 26, which is the tip of the central yoke 23, moves in the vertical direction (in the direction of the straight arrow) as seen in FIG.
A minute movement is made to press the magnetic polishing fluid M against the surface (polishing surface) of the workpiece W to be polished. Further, a periodic voltage is applied to the XY direction actuators 24X and 24y,
The block 22, to which the tips of the xy-direction actuators 24X and 24y are abutted, swings in the horizontal direction (left-right direction as seen in the figure). As a result, the polishing portion 26 forms a ball-to-corner connecting portion 2.
1 as the center, as shown by the arc-shaped arrow in FIG. This oscillation results in a minute movement in the horizontal direction (XY direction) with respect to the surface (polishing surface) of the material to be polished W. This X
The small movement in the Y direction and the small movement in the Z direction are transmitted to the magnetic polishing fluid M, and the magnetic polishing fluid M polishes the surface (polishing surface) of the material to be polished W. The magnetic polishing fluid M performs a polishing action by pressurizing the workpiece W only in the vicinity of the portion sandwiched between the tip of the central yoke 23 and the workpiece W. A machining mark H having a size corresponding to the shape of the tip of the yoke 23 is formed.

このような研磨作用を行わせながら、研磨工具1全体を
所定の研磨面形状に従って水平方向あるいは三次元方向
に移動させて、上記加工[Hを被研磨材Wの研磨面全体
に広げ終えると、平面や球面あるいは自由曲面等の所望
の研磨面を自由に得ることが出来る。
While performing such a polishing action, the entire polishing tool 1 is moved horizontally or three-dimensionally according to a predetermined polishing surface shape, and the above-mentioned processing [H] is spread over the entire polishing surface of the material W to be polished. Desired polished surfaces such as flat, spherical, or free-form surfaces can be obtained freely.

この間、被研磨材Wを載置したロードセル60では、研
磨工具1の研磨部26が磁性研磨流体Mを介して被研磨
材Wに加える加圧力が加圧荷重値として検出されており
、この加圧荷重信号がコントローラ61を経て駆動アン
プ51にフィードバックされている。そのため、例えば
、被研磨材Wに加わる加圧力が規定の値以上になれば、
駆動アンプ51でZ方向アクチュエータ20への印加電
圧を下げる等して加圧力が小さくなるように制御され、
逆に、被研磨材Wに加わる加圧力が規定の値以下になれ
ば、駆動アンプ51でZ方向アクチュエータ20への印
加電圧を上げる等して加圧力が大きくなるように制御さ
れる。他方、加工痕1個の加工を行う過程においては、
加圧力が時間の経過とともに減少する傾向があるので、
ロードセル60は、この傾向も検出して検出結果を駆動
アンプ51にフィードバックすることにより、加圧力が
常に一定となるようにする。また、Z方向用の信号発生
器52は、加工痕1個の加工を行う過程において、初期
は加圧力が大きく、中期は加圧力が中程度に、そして終
期は加圧力が小さくなるように、駆動アンプ51に対し
て制御信号を発する。その間、FCゼネレータ70は、
駆動アンプ51に対してZ方向アクチュエータ20の加
圧力に振動を付与するための振動付与信号を発し続ける
During this time, in the load cell 60 on which the workpiece W is placed, the pressure applied by the polishing section 26 of the polishing tool 1 to the workpiece W through the magnetic polishing fluid M is detected as a pressure load value. The pressure load signal is fed back to the drive amplifier 51 via the controller 61. Therefore, for example, if the pressure applied to the material W to be polished exceeds a specified value,
The drive amplifier 51 lowers the voltage applied to the Z-direction actuator 20 to reduce the pressing force,
Conversely, if the pressure applied to the material to be polished W becomes less than a specified value, the drive amplifier 51 increases the voltage applied to the Z-direction actuator 20, thereby increasing the pressure. On the other hand, in the process of machining one machining mark,
Since the pressurizing force tends to decrease over time,
The load cell 60 also detects this tendency and feeds back the detection result to the drive amplifier 51, thereby ensuring that the pressing force is always constant. In addition, the signal generator 52 for the Z direction is configured such that in the process of machining one machining mark, the pressing force is large at the beginning, the pressing force is medium in the middle period, and the pressing force is small at the final stage. A control signal is issued to the drive amplifier 51. Meanwhile, the FC generator 70
A vibration imparting signal for imparting vibration to the pressing force of the Z-direction actuator 20 is continuously emitted to the drive amplifier 51.

〔発明の効果〕〔Effect of the invention〕

この発明は、以上のようにXY方向のアクチュエータと
して伸縮方向をX方向とする積層型の電歪素子と伸縮方
向をY方向とする積層型の電歪素子とを組み合わせて用
いるようにするため、XY方向の微小運動の振幅が大き
くなるとともに、外力の大小で変動しないようになり、
そのため、制御が容易となる。さらに、この発明によれ
ば、研磨部がポリウレタンシートで構成されている場合
に、XY方向のアクチュエータの微小運動の振幅をポリ
ウレタンシートの気孔径よりも大きくするようにすると
、部分的研磨が起きないようになる、また、Z方向のア
クチュエータと研磨部の間に研磨部のxy方向の微小運
動を自在とする球対隅状の連結部を設けて、XY方向の
アクチュエータの作用点をこの連結部と前記研磨部の間
に設けることにより、研磨部のXY方向の微小運動を妨
げずにZ方向のアクチュエータの加圧力を研磨部に伝え
ることが出来るようになる。
As described above, the present invention uses a laminated electrostrictive element whose expansion/contraction direction is the X direction and a laminated electrostrictive element whose expansion/contraction direction is the Y direction as an actuator in the XY directions in combination. The amplitude of minute movements in the X and Y directions increases, and it no longer fluctuates depending on the magnitude of external force.
Therefore, control becomes easy. Furthermore, according to the present invention, when the polishing section is composed of a polyurethane sheet, if the amplitude of the minute movement of the actuator in the XY directions is made larger than the pore diameter of the polyurethane sheet, partial polishing will not occur. In addition, a ball-to-corner connection part is provided between the actuator in the Z direction and the polishing part to allow minute movements of the polishing part in the x and y directions, and the point of action of the actuator in the By providing this between the polishing section and the polishing section, it becomes possible to transmit the pressing force of the actuator in the Z direction to the polishing section without interfering with the minute movements of the polishing section in the X and Y directions.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明にかかる微小研磨方法の実施に用いる
研磨装置の主要部たる研磨工具の断面図、第2図はこの
発明の研磨作用の説明図、第3図はこの発明に用いる積
層型の電歪素子の特性を表すグラフ、第4図は屈曲型の
電歪素子の特性を表すグラフである。 1・・・研磨工具 20・・・Z方向アクチュエータ2
1・・・球対隅状の連結部 23・・・中央ヨーク 2
4x・・・X方向アクチュエータ 24y・・・Y方向
アクチュエータ 26・・・研磨部 35・・・対向ヨ
ークM・・・磁性研磨流体 W・・・被研磨材第 図 退動数 (Hz)
Fig. 1 is a sectional view of a polishing tool which is the main part of the polishing device used to carry out the micro-polishing method according to the present invention, Fig. 2 is an explanatory diagram of the polishing action of the present invention, and Fig. 3 is a laminated type used in the present invention. FIG. 4 is a graph showing the characteristics of a bending type electrostrictive element. 1... Polishing tool 20... Z direction actuator 2
1... Ball-to-corner connection part 23... Central yoke 2
4x...X-direction actuator 24y...Y-direction actuator 26... Polishing section 35... Opposing yoke M... Magnetic polishing fluid W... Retraction frequency of the material to be polished (Hz)

Claims (1)

【特許請求の範囲】 1 研磨工具先端の研磨部と被研磨材の間に研磨材を保
持した状態で、前記研磨部を電歪素子からなるアクチュ
エータで研磨面と平行なXY方向および/または研磨面
と垂直なZ方向に微小運動させ、かつ、前記XY方向の
アクチュエータとしては伸縮方向をX方向とする積層型
の電歪素子と伸縮方向をY方向とする積層型の電歪素子
とを組み合わせて用いるようにするとともに前記Z方向
のアクチュエータとしては伸縮方向をZ方向とする積層
型の電歪素子を用いるようにして、被研磨材を研磨する
ようにする微小研磨方法。 2 研磨部がポリウレタンシートで構成されている場合
に、前記XY方向のアクチュエータの微小運動の振幅を
前記ポリウレタンシートの気孔径よりも大きくするよう
にする請求項1記載の微小研磨方法。 3 Z方向のアクチュエータと研磨部の間に研磨部のX
Y方向の微小運動を自在とする球対隅状の連結部を設け
て、XY方向のアクチュエータの作用点をこの連結部と
前記研磨部の間に設けるようにする請求項1または2記
載の微小研磨方法。 4 研磨材が磁性研磨流体であってその保持を磁力で行
うようにする請求項1から3までのいずれかに記載の微
小研磨方法。 5 被研磨材の研磨面に対面する研磨部と、積層型の電
歪素子からなりその伸縮作用により前記研磨部を研磨面
と平行なX方向に微小運動させるX方向アクチュエータ
と、積層型の電歪素子からなりその伸縮作用により前記
研磨部を研磨面と平行で前記X方向に垂直なY方向に微
小運動させるY方向アクチュエータと、積層型の電歪素
子からなりその伸縮作用により前記研磨部を研磨面と垂
直なZ方向に微小運動させるZ方向アクチュエータとを
備える微小研磨工具。 6 Z方向のアクチュエータと研磨部の間に研磨部のX
Y方向の微小運動を自在とする球対隅状の連結部を備え
、XY方向のアクチュエータの作用点がこの連結部と前
記研磨部の間に設けられている請求項5記載の微小研磨
工具。 7 先端に研磨部を有する中央ヨークと、前記研磨部の
周囲に磁気ギャップを作るための対向ヨークと、これら
のヨークに磁気を流す磁気発生手段とを備えた請求項5
または6記載の微小研磨工具。
[Claims] 1. With an abrasive material held between a polishing part at the tip of a polishing tool and a workpiece to be polished, the polishing part is polished in XY directions parallel to the polishing surface and/or in an actuator made of an electrostrictive element. A combination of a laminated electrostrictive element whose expansion/contraction direction is in the X direction and a laminated electrostrictive element whose expansion/contraction direction is in the Y direction for fine movement in the Z direction perpendicular to the plane, and as the XY direction actuator. A micropolishing method in which a laminated electrostrictive element whose expansion/contraction direction is in the Z direction is used as the Z-direction actuator to polish a material to be polished. 2. The micro-polishing method according to claim 1, wherein when the polishing section is composed of a polyurethane sheet, the amplitude of the micro-movement of the actuator in the X and Y directions is made larger than the pore diameter of the polyurethane sheet. 3 Place the X of the polishing part between the actuator in the Z direction and the polishing part.
3. The microscopic device according to claim 1, further comprising a ball-to-corner connecting portion that allows for free micro-movement in the Y direction, and a point of action of an actuator in the XY direction is provided between the connecting portion and the polishing portion. Polishing method. 4. The micropolishing method according to claim 1, wherein the abrasive is a magnetic polishing fluid and is held by magnetic force. 5. A polishing part facing the polishing surface of the material to be polished, an X-direction actuator that is made of a laminated electrostrictive element and which moves the polishing part minutely in the X direction parallel to the polishing surface by the expansion and contraction action of the electrostrictive element, and a laminated electrostrictive element. a Y-direction actuator, which is made up of a strain element and causes the polishing section to move minutely in the Y direction parallel to the polishing surface and perpendicular to the X direction by its expansion and contraction; and a Y-direction actuator, which is made up of a laminated electrostrictive element and causes the polishing section to move minutely in the Y direction that is parallel to the polishing surface and perpendicular to the X direction; A micro-polishing tool comprising a Z-direction actuator for micro-movement in a Z-direction perpendicular to a polishing surface. 6 Place the X of the polishing part between the actuator in the Z direction and the polishing part.
6. The micro-polishing tool according to claim 5, further comprising a ball-to-corner connecting portion that allows fine movement in the Y direction, and a point of action of an actuator in the XY directions is provided between the connecting portion and the polishing portion. 7. Claim 5, comprising: a central yoke having a polishing section at the tip; opposing yokes for creating a magnetic gap around the polishing section; and magnetism generating means for causing magnetism to flow through these yokes.
Or the micro-abrasive tool described in 6.
JP2144721A 1990-06-01 1990-06-01 Micropolishing method and micropolishing tool Pending JPH0441174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2144721A JPH0441174A (en) 1990-06-01 1990-06-01 Micropolishing method and micropolishing tool

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2144721A JPH0441174A (en) 1990-06-01 1990-06-01 Micropolishing method and micropolishing tool

Publications (1)

Publication Number Publication Date
JPH0441174A true JPH0441174A (en) 1992-02-12

Family

ID=15368771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2144721A Pending JPH0441174A (en) 1990-06-01 1990-06-01 Micropolishing method and micropolishing tool

Country Status (1)

Country Link
JP (1) JPH0441174A (en)

Similar Documents

Publication Publication Date Title
KR940007405B1 (en) Micro-abrading method and tool
JPH03178767A (en) Micropolishing method and micropolishing tool
JP2682260B2 (en) Micro polishing method and micro polishing tool
CN113579987A (en) Method and device for polishing free-form surface by curvature self-adaptive cluster magneto-rheological process
US5951368A (en) Polishing apparatus
JPWO2019054280A1 (en) Processing equipment
JP5061296B2 (en) Flat double-side polishing method and flat double-side polishing apparatus
CN108972302A (en) A kind of disresonance type vibration auxiliary polishing device and method
JP4396518B2 (en) Attitude control device and precision processing device
CN108044495B (en) Directional polishing device and method for magnetic field remote control tool
JP2011083827A (en) Magnetic fluid polishing method and polishing device
RU2315391C2 (en) Precision machining device and method
JP2006224227A (en) Magnetic polishing method
JPH0441174A (en) Micropolishing method and micropolishing tool
JPH0441173A (en) Micro-polishing method and micro-polishing tool
JPH0441176A (en) Micro-polishing method
JP2805982B2 (en) Micro polishing method and micro polishing tool
JPH0441175A (en) Micropolishing method and micropolishing tool
JP2010012525A (en) Shaft machining mechanism, machining device employing the mechanism, and grinding wheel
JP2007098541A (en) Polishing tool and polish method
JP2002127003A (en) Precision machining device with attitude control device and attitude control method
JPH05162064A (en) Microterritory polishing device
JP7555087B1 (en) Polishing tool, polishing head, polishing device, and polishing method
JPH11333702A (en) Device and method for generating spherical surface
JP2007167969A (en) Scratch processing method and processing apparatus therefor