JPH0442921Y2 - - Google Patents
Info
- Publication number
- JPH0442921Y2 JPH0442921Y2 JP1987062676U JP6267687U JPH0442921Y2 JP H0442921 Y2 JPH0442921 Y2 JP H0442921Y2 JP 1987062676 U JP1987062676 U JP 1987062676U JP 6267687 U JP6267687 U JP 6267687U JP H0442921 Y2 JPH0442921 Y2 JP H0442921Y2
- Authority
- JP
- Japan
- Prior art keywords
- die pad
- resin
- semiconductor device
- adhesive layer
- tape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Wire Bonding (AREA)
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は半導体装置に関するもので、特にダイ
パツドを有するリードフレームと、半導体ペレツ
トを搭載するための特定の構造のダイパツドテー
プを用いた半導体装置に関するものである。[Detailed description of the invention] [Field of industrial application] The present invention relates to a semiconductor device, and in particular a semiconductor device using a lead frame having a die pad and a die pad tape having a specific structure for mounting semiconductor pellets. It is related to.
従来の半導体装置は第1図および第2図に示す
ようなダイパツド1、リード2およびサポートバ
ー3から構成されるリードフレームのダイパツド
1の上に第2図に示すようにダイボンデイング接
着剤層5を介して半導体ペレツト4を載置し、該
ペレツト4上に形成された電極7とリード2とを
接続したボンデイングワイヤー6と共に封止樹脂
8により一体化した構成を有する。
A conventional semiconductor device has a die bonding adhesive layer 5 as shown in FIG. 2 on a die pad 1 of a lead frame, which is composed of a die pad 1, leads 2, and support bars 3 as shown in FIGS. A semiconductor pellet 4 is placed through the pellet 4 and is integrated with a bonding wire 6 that connects the electrode 7 formed on the pellet 4 and the lead 2 using a sealing resin 8.
この場合、ダイパツドの背面は封止樹脂との接
着封止性が悪いために、リードと封止樹脂との界
面から侵入した外部からの水分が溜り易く、半導
体装置をサーキツト板に面実装する際のはんだ付
け工程の加熱処理の際、これがもとで水分の急激
な膨張により封止樹脂等に内部応力を生じ、半導
体ペレツトや封止樹脂等にクラツクが発生する問
題を有する。 In this case, since the back surface of the die pad has poor adhesive sealing properties with the encapsulating resin, moisture from the outside that enters through the interface between the leads and the encapsulating resin tends to accumulate, making it difficult to surface-mount the semiconductor device on the circuit board. During the heat treatment in the soldering process, this causes internal stress in the sealing resin etc. due to rapid expansion of moisture, causing a problem of cracks occurring in the semiconductor pellets, the sealing resin etc.
〔考案が解決しようとする問題点〕
本考案は上記の実情に鑑みてなされたものであ
り、ダイパツドと封止樹脂との直径の接触を避
け、その代わりに封止樹脂と親和性のあるダイパ
ツドテープを介在させることによりリードフレー
ムと封止樹脂との接着封止性を向上せしめ、信頼
性に優れた半導体装置を提供することを目的とす
るものである。[Problems to be solved by the invention] The present invention was made in view of the above-mentioned circumstances, and avoids diametral contact between the die pad and the sealing resin, and instead uses a die pad that is compatible with the sealing resin. The purpose of this invention is to provide a semiconductor device with excellent reliability by improving the adhesive sealing properties between the lead frame and the sealing resin by interposing the lead frame and the sealing resin.
本考案の概要はリードの中央のダイパツド上に
半導体ペレツトが配置され、少なくも該ダイパツ
ドの下面が、接着性を有するダイパツドテープに
良く接着され、かつ該半導体パレツト上部に設け
た電極とリードとがボンデイングワイヤーで接続
され、これらが封止樹脂で密封封止されている半
導体装置である。
The outline of the present invention is that a semiconductor pellet is placed on a die pad at the center of the lead, at least the bottom surface of the die pad is well adhered to an adhesive die pad tape, and the electrode and the lead provided on the top of the semiconductor pallet are connected to each other. This is a semiconductor device in which the two are connected with bonding wires and these are hermetically sealed with a sealing resin.
次に本考案を図面を参照しつつ説明する。 Next, the present invention will be explained with reference to the drawings.
本考案の半導体装置の一例は第3図に示すとお
りで、同図イは半導体ペレツト4の下面にダイボ
ンデイング接着剤層5を設けてダイパツド1と接
合し、その下面をダイパツドテープ10の上面に
接着させる。このダイパツドテープ10は第4図
に示すような各種のものを選択して使用すること
ができる。すなわちイに示すように全体が接着性
を有する支持体10aからなるもの、ロに示すよ
うに支持体10bの上面に接着層11を設けたも
の、ハに示すように支持体10bの上面に接着層
11、下面に接着層12aを有するもの、ニに示
すように支持体10bの上面に接着層11、下面
に表面処理層12bを設けたものが選択使用され
る。その他の構造は従来と同様に、半導体ペレツ
ト上面の電極7とリード2,2の上面との間はボ
ンデイングワイヤー6によつて電気的に接続され
ている。又、これらの全体は封止樹脂8によつて
密封封止されているが、この封止樹脂8は前期ダ
イパツドテープ10とよく接着し、信頼性の高い
半導体装置が得られる。 An example of the semiconductor device of the present invention is as shown in FIG. Glue to. This die pad tape 10 can be selected from various types as shown in FIG. 4. That is, as shown in A, the entire support body 10a has adhesive properties, as shown in B, an adhesive layer 11 is provided on the top surface of the support body 10b, and as shown in C, that the support body 10a is adhesively bonded to the top surface of the support body 10b. A support 10b having an adhesive layer 11 and an adhesive layer 12a on its lower surface, and a support 10b having an adhesive layer 11 on its upper surface and a surface treatment layer 12b on its lower surface as shown in d are selectively used. The rest of the structure is the same as the conventional one, and the electrode 7 on the upper surface of the semiconductor pellet and the upper surface of the leads 2, 2 are electrically connected by bonding wires 6. Further, the entire structure is hermetically sealed with a sealing resin 8, which adheres well to the die pad tape 10, resulting in a highly reliable semiconductor device.
第3図ロはダイパツドの下面とリードの下面に
ダイパツドテープの上面を接着させた点のみが、
第3図イと異なり、その他は全く同様である。 In Figure 3B, the only difference is that the top surface of the die pad tape is adhered to the bottom surface of the die pad and the bottom surface of the leads.
This is different from Figure 3A, but the rest is exactly the same.
両者の使用上の差異はダイパツドテープがリード
を覆う場合は第3図ロ、覆わない場合は第3図イ
であるが、第3図イの方が封止樹脂の効果が十分
発揮されるからより好ましいものと言える。The difference in use between the two is when the die pad tape covers the leads, as shown in Figure 3 (B), and when it does not, as shown in Figure 3 (A), the effect of the sealing resin is more fully demonstrated in Figure 3 (A). It can be said that it is more preferable.
次に本考案において用いられるダイパツドテー
プを構成する材料について述べる。 Next, the materials constituting the die pad tape used in the present invention will be described.
接着性ダイパツドテープ材料としては以下のも
のがあげられる。 Examples of adhesive die pad tape materials include:
全体が接着性のテープからなる場合、
熱硬化性樹脂:エポキシ樹脂、ポリイミド樹脂
等加熱硬化(キユア)する形式の樹脂で80℃ぐら
いの融点を有する半硬化(Bステージ)状のもの
で、そのまま加熱硬化することによつて強い接着
性を発揮するものが挙げられる。 If the entire tape is made of adhesive, thermosetting resin: A semi-cured (B-stage) type of resin that cures under heat, such as epoxy resin or polyimide resin, with a melting point of about 80°C, and can be used as is. Examples include those that exhibit strong adhesive properties when cured by heating.
熱可塑性樹脂:ポリフエニレンサルフアイド
(PPS)、ポリエチレンテレフタレートフイルム等
300℃以上の融点を有し、接着性を発揮するもの
が挙げられる。 Thermoplastic resin: polyphenylene sulfide (PPS), polyethylene terephthalate film, etc.
Examples include those that have a melting point of 300°C or higher and exhibit adhesive properties.
その他の接着テープからなる場合
支持体
支持体は例えば厚さ10〜10μm、好ましくは25〜
75μmのポリイミド、ポリエーテルイミド、ポリ
フエニレンサルフアイド、ポリエーテル・エーテ
ルケトン等の耐熱性フイルムや、エポキシ樹脂を
ガラスクロスに含浸し、加熱硬化もしくは半硬化
したエポキシガラスクロス、エポキシ・ポリイミ
ド・ガラスクロス、ガラスクロスにビスマレイミ
ドトリアジン樹脂(BTレジン)を含浸させた
BTレジンガラスクロス等の耐熱テープが用いら
れる。 When consisting of other adhesive tapes, the support may have a thickness of, for example, 10 to 10 μm, preferably 25 to
Heat-resistant films such as 75μm polyimide, polyetherimide, polyphenylene sulfide, polyether/etherketone, etc.; epoxy glass cloth impregnated with epoxy resin and cured or semi-cured by heating; epoxy/polyimide/glass Cloth, glass cloth impregnated with bismaleimide triazine resin (BT resin)
Heat-resistant tape such as BT resin glass cloth is used.
接着層
支持体の下面の接着層および上面の接着層は耐
熱性エポキシ樹脂、ポリイミド樹脂等を5〜
50μm好ましくは20〜30μmの塗布厚となるように
半硬化の状態で塗布して形成される。ただし、い
ずれも半硬化状態(Bステージ)で設けるので硬
化温度は下面の接着層の方が上面の接着層より高
い方が望ましい。その理由は先に半導体チツプお
よびリード下面に支持体の上面の接着層を接して
これを熱硬化させるが、このテープを接着すると
きには支持体の下面の接着層が完全に硬化すると
樹脂封止の際に接着し難くなるからである。Adhesive layer The adhesive layer on the lower surface of the support and the adhesive layer on the upper surface are made of heat-resistant epoxy resin, polyimide resin, etc.
It is formed by coating in a semi-cured state to a coating thickness of 50 μm, preferably 20 to 30 μm. However, since both are provided in a semi-cured state (B stage), it is desirable that the curing temperature of the lower adhesive layer is higher than that of the upper adhesive layer. The reason for this is that the adhesive layer on the upper surface of the support is first brought into contact with the semiconductor chip and the lower surface of the leads, and then cured by heat. This is because it becomes difficult to bond.
表面処理層
支持体の下面を砂目立によるマツト加工、化学
酸化ガス炎酸化、コロナ放電処理、エンボス加
工、マツト艶消し加工等による表面処理を施し、
微細な凹凸、極性の付与、酸化皮膜の破壊脆化等
により封止樹脂との接着性を向上するために設け
られる。Surface Treatment Layer The lower surface of the support is subjected to surface treatments such as pine graining, chemical oxidizing gas flame oxidation, corona discharge treatment, embossing, matte matte finishing, etc.
It is provided to improve the adhesion with the sealing resin by providing fine irregularities, imparting polarity, and making the oxide film fracture and brittle.
この表面処理層の存在によつて厚みや重量を増
大させることなく、封止材料の強固な接着を実現
した半導体装置を提供しうる。 Due to the presence of this surface treatment layer, it is possible to provide a semiconductor device that achieves strong adhesion of the sealing material without increasing the thickness or weight.
このような構成よりなるダイパツドテープは通
常例えば原反を幅3〜10mm、長さ200〜300mのテ
ープ状に加工され、リールに巻回されて供給する
ことができ、その場合半導体ペレツトの寸法に合
わせて裁断した上で、所定のリードフレームに適
用され接着される。 Die pad tape with such a structure is usually processed into a tape shape with a width of 3 to 10 mm and a length of 200 to 300 m, and can be supplied wound on a reel, in which case the dimensions of the semiconductor pellet are The material is cut to match the desired size, then applied and glued to a designated lead frame.
実施例 1
ガラスクロスエポキシ樹脂を含浸し半硬化せし
めた厚さ200μmエポキシガラスクロス不織布プリ
プレグ(「シルボンT61」新興化学工業株式会社
製)からなるダイパツドテープを所望の大きさに
切断して、第1図に示す形状の鉄系の金属板例え
ばコバール板を打ち抜き加工してなるリードフレ
ームのダイパツドの下面に加熱接着し、かつ半導
体ペレツトの載置、リードの取りつけおよび樹脂
封止は従来どおりに行つて第3図イに示すような
半導体装置を組み立てた。
Example 1 A die-pad tape made of a 200 μm thick epoxy glass cloth nonwoven fabric prepreg impregnated with glass cloth epoxy resin and semi-cured (“Silbon T61” manufactured by Shinko Kagaku Kogyo Co., Ltd.) was cut into a desired size and cut into pieces. A lead frame made by punching an iron-based metal plate, such as a Kovar plate, as shown in Fig. 1, is heat-bonded to the lower surface of the die pad, and the semiconductor pellets are placed, the leads are attached, and the resin sealing is performed in the conventional manner. A semiconductor device as shown in Figure 3A was then assembled.
得られた半導体装置について85℃、85%RH
(相対湿度)の雰囲気にて24時間放置後260℃のは
んだ浴に3時間浸漬した後、プレツシヤークツカ
ーテスト(PCT)にて250時間試験したが全く異
常がなかつた。 85℃, 85%RH for the obtained semiconductor device
After being left in an atmosphere of (relative humidity) for 24 hours, it was immersed in a 260°C solder bath for 3 hours, and then tested for 250 hours using a pressure vacuum test (PCT), with no abnormalities at all.
実施例 2
厚さ50μmのポリイミド樹脂フイルム(「ユーピ
レツクスS」宇部興産社製)からなる支持体の片
面に下面の接着層として下記配合の塗液を乾燥後
の塗布層が20μmとなるように塗布乾燥した。Example 2 On one side of a support made of a polyimide resin film ("Upilex S" manufactured by Ube Industries, Ltd.) with a thickness of 50 μm, a coating liquid of the following composition was applied as an adhesive layer on the lower surface so that the coated layer after drying was 20 μm. Dry.
エポキシ樹脂(「エピコート1001」油化シエル
エポキシ社製)
80% MEK 溶液 ……120重量部
ジシアンジアミド(和光純薬社製)
……10重量部
ポリアミド樹脂
(「#6900」ヘンケル白水社製)
メタノール/トルエン(1:1)20%溶液
……100重量部
次に上面の接着層として下記配合の塗液を乾燥
後の塗布厚が20μmとなるように塗布した。 Epoxy resin (“Epicote 1001” manufactured by Yuka Ciel Epoxy Co., Ltd.) 80% MEK solution …120 parts by weight Dicyandiamide (manufactured by Wako Pure Chemical Industries, Ltd.) …10 parts by weight Polyamide resin (“#6900” manufactured by Henkel Hakusuisha) Methanol/ 20% toluene (1:1) solution...100 parts by weight Next, a coating liquid having the following composition was applied as an adhesive layer on the upper surface so that the coating thickness after drying was 20 μm.
エポキシ樹脂(「EOCN−102」、日本化薬社製)
……100重量部
ポリエステル樹脂(「KA−1036」、荒川化学社
製) ……50重量部
イミダゾール系硬化剤(「2PZ」、四国化成社
製) ……10重量部
メチルエチルケトン ……100重量部
得られたダイパツドテープを所望の大きさに切
断して、鉄系の金属板例えばコバール板を打ち抜
き加工してなるリードフレームのダイパツドおよ
びリードの下面に加熱接着し、その他は実施例1
と同様にして第3図ロに示すような半導体装置を
組立てた。 Epoxy resin (“EOCN-102”, manufactured by Nippon Kayaku Co., Ltd.) …100 parts by weight Polyester resin (“KA-1036”, manufactured by Arakawa Chemical Co., Ltd.) …50 parts by weight Imidazole-based curing agent (“2PZ”, Shikoku Kasei )...10 parts by weight Methyl ethyl ketone...100 parts by weight Die pads and leads for lead frames are made by cutting the obtained die pad tape into desired sizes and punching out iron-based metal plates such as Kovar plates. The rest is Example 1.
In the same manner as above, a semiconductor device as shown in FIG. 3B was assembled.
得られた半導体装置について、実装試験による
信頼性を見たところ、接着層の電流のリークは見
られず、安定した接着性が確認された。又、ワイ
ヤーボンダビリテイーも良好で樹脂封止したとき
ワイヤー流れもなく信頼性のある半導体装置を構
成することができ、又85℃、85%RHの雰囲気に
て24時間放置後260℃のはんだ浴に3秒間浸漬し
たのちPCTにて250時間試験したが全く異常がな
かつた。 When the reliability of the obtained semiconductor device was checked through a mounting test, no current leakage was observed in the adhesive layer, and stable adhesiveness was confirmed. In addition, wire bondability is good, and when resin-sealed, there is no wire flow and a reliable semiconductor device can be constructed. Also, after being left in an atmosphere of 85°C and 85% RH for 24 hours, soldering at 260°C is possible. After being immersed in the bath for 3 seconds, it was tested using PCT for 250 hours, but no abnormalities were found.
実施例 3
厚さ50μmのポリイミド樹脂フイルム(「カプト
ン200V」東レデユポン社製)からなる支持体の
下面に、接着層としてポリウレタン系樹脂(「チ
ツソレツクス372」チツソ社製)のジメチルホル
ムアミド/メチルエチルケトン=2/1の43%溶
液70重量部とフエノール・ノボラツク・エポキシ
樹脂(「EPPN−201」、日本化薬社製)のメチル
エチルケトン20%溶液30重量部との混合液を半硬
化の状態になるよう120℃5分間の加熱条件で乾
燥後の塗布厚が40μmとなるように塗布してダイ
パツドテープを作成した。Example 3 On the lower surface of a support made of a 50 μm thick polyimide resin film (“Kapton 200V” manufactured by Toray DuPont), a polyurethane resin (“Chitso Rex 372” manufactured by Chitso Corporation) of dimethylformamide/methyl ethyl ketone = 2 was applied as an adhesive layer. A mixture of 70 parts by weight of a 43% solution of 1/1 and 30 parts by weight of a 20% solution of phenol novolac epoxy resin ("EPPN-201", manufactured by Nippon Kayaku Co., Ltd.) in methyl ethyl ketone was heated to a semi-cured state at 120 parts by weight. A die pad tape was prepared by applying the film under heating conditions of 5 minutes at °C so that the coating thickness after drying was 40 μm.
得られたダイパツドテープを所望の大きさに切
断後リードフレームのダイパツドの下面に接着層
により加熱接着した後、第3図イに示す半導体装
置を組立てた。 The resulting die pad tape was cut to a desired size and then heated and bonded to the lower surface of the die pad of the lead frame using an adhesive layer, and the semiconductor device shown in FIG. 3A was assembled.
得られた半導体装置について、実装試験による
信頼性を見たところ、接着層の電流のリークは見
られず、安定した接着性が確認された。又、ワイ
ヤーボンダビリテイーも良好で信頼性のある半導
体装置を構成することができた。又85℃、85%
RHの雰囲気にて24時間放置後260℃のはんだ浴
に3秒間浸漬したのちPCTにて250時間試験した
が全く異常がなかつた。 When the reliability of the obtained semiconductor device was checked through a mounting test, no current leakage was observed in the adhesive layer, and stable adhesiveness was confirmed. Furthermore, a reliable semiconductor device with good wire bondability could be constructed. Also 85℃, 85%
After being left in a RH atmosphere for 24 hours, it was immersed in a 260°C solder bath for 3 seconds and then tested using PCT for 250 hours, with no abnormalities at all.
実施例 4
厚さ50μmのポリイミド樹脂フイルム(「カプト
ン200V」東レデユポン社製)からなる支持体の
片面に、接着層としてポリウレタン系樹脂(「チ
ツソレツクス372」チツソ社製)のジメチルホル
ムアミド/メチルエチルケトン=2/1の43%溶
液70重量部と、フエノール・ノボラツク・エポキ
シ樹脂(EPPN−201」日本化薬社製)のメチル
エチルメトン20%溶液30重量部との混合液を、半
硬化の状態になるように120℃ 5分間の加熱条
件で、乾燥後の塗布厚が40μmとなるように塗布
し、その反対面にはブラスト加工により表面処理
してダイパツドテープを作成した。Example 4 On one side of a support made of a 50 μm thick polyimide resin film (“Kapton 200V” manufactured by Toray DuPont), a polyurethane resin (“Chitso Rex 372” manufactured by Chitso Corporation) of dimethylformamide/methyl ethyl ketone = 2 was applied as an adhesive layer. A mixture of 70 parts by weight of a 43% solution of 1/1 and 30 parts by weight of a 20% solution of phenol novolac epoxy resin (EPPN-201 manufactured by Nippon Kayaku Co., Ltd.) in methyl ethylmethone was brought to a semi-cured state. The film was applied under heating conditions of 120° C. for 5 minutes to a coating thickness of 40 μm after drying, and the opposite side was surface-treated by blasting to create a die pad tape.
得られたダイパツドテープを所望の大きさに切
断後第1図に示すリードフレームのダイパツド下
面に接着層により加熱接着し第3図イに示す半導
体装置を組み立てた。 The resulting die pad tape was cut to a desired size and then heated and bonded to the lower surface of the die pad of the lead frame shown in FIG. 1 using an adhesive layer to assemble the semiconductor device shown in FIG. 3A.
得られた半導体装置について、実装試験による
信頼性を見たところ、接着層に電流のリークは見
られず、安定した接着性が確認された。又、ワイ
ヤーボンダビリテイーも良好で信頼性のある半導
体装置を構成することができた。又85℃、85%
RHの雰囲気にて24時間放置後260℃のはんだ浴
に3秒間浸漬した後PCTにて250時間試験したが
全く異常がなかつた。 When the reliability of the obtained semiconductor device was checked through a mounting test, no current leakage was observed in the adhesive layer, and stable adhesiveness was confirmed. Furthermore, a reliable semiconductor device with good wire bondability could be constructed. Also 85℃, 85%
After being left in a RH atmosphere for 24 hours, it was immersed in a 260°C solder bath for 3 seconds and then tested using PCT for 250 hours, but no abnormalities were found.
本考案は上記の構成に示したとおり、ダイパツ
ドの背面と封止樹脂が直接接触しておらず、かつ
ダイパツドと封止樹脂との密着性が向上している
ので樹脂の封止性が向上し信頼性のある半導体装
置を提供することができる。
As shown in the above configuration, the present invention improves the sealing performance of the resin because the back surface of the die pad and the sealing resin are not in direct contact and the adhesion between the die pad and the sealing resin is improved. A reliable semiconductor device can be provided.
又、ダイパツドとダイパツドテープおよびダイ
パツドテープと封止樹脂の接着強度がある程度強
固であれば、本ダイパツドテープはダイパツドと
封止樹脂との熱膨張係数の差による歪みを吸収す
る効果を有する。 In addition, if the adhesive strength between the die pad and the die pad tape and between the die pad tape and the sealing resin is strong to a certain extent, this die pad tape has the effect of absorbing distortion due to the difference in thermal expansion coefficient between the die pad and the sealing resin. .
第1図は従来の技術によるリードフレームの斜
視図、第2図は従来の半導体装置の断面図、第3
図イ,ロは本考案の半導体装置の断面図である。
第4図は本考案において用いられるダイパツドテ
ープの各例の断面図。
1……ダイパツド、2……リード、3……サポ
ートバー、4……半導体ペレツト、5……ダイボ
ンデイング接着剤層、6……ボンデイングワイヤ
ー、7……電極、8……封止樹脂、10……ダイ
パツドテープ、10a……接着性支持体、10b
……支持体、11……上面の接着層、12a……
下面の接着層、12b……表面処理層。
FIG. 1 is a perspective view of a lead frame according to the prior art, FIG. 2 is a sectional view of a conventional semiconductor device, and FIG. 3 is a sectional view of a conventional semiconductor device.
Figures A and B are cross-sectional views of the semiconductor device of the present invention.
FIG. 4 is a sectional view of each example of die pad tape used in the present invention. DESCRIPTION OF SYMBOLS 1... Die pad, 2... Lead, 3... Support bar, 4... Semiconductor pellet, 5... Die bonding adhesive layer, 6... Bonding wire, 7... Electrode, 8... Sealing resin, 10 ... Die pad tape, 10a ... Adhesive support, 10b
...Support, 11...Top adhesive layer, 12a...
Adhesive layer on lower surface, 12b...Surface treatment layer.
Claims (1)
ペレツトが配置接合され、かつ少なくとも該ダイ
パツドの下面が、絶縁性ダイパツドテープに接着
され、かつ該半導体ペレツト上部に設けた電極と
リード間がボンデイングワイヤーで接続され、こ
れらが封止樹脂で密封封止されていることを特徴
とする半導体装置。 A semiconductor pellet is arranged and bonded on a die pad in the center of a lead frame, and at least the lower surface of the die pad is adhered to an insulating die pad tape, and the electrode provided on the upper part of the semiconductor pellet and the lead are connected with a bonding wire. , a semiconductor device characterized in that these are hermetically sealed with a sealing resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987062676U JPH0442921Y2 (en) | 1987-04-27 | 1987-04-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987062676U JPH0442921Y2 (en) | 1987-04-27 | 1987-04-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63170946U JPS63170946U (en) | 1988-11-07 |
| JPH0442921Y2 true JPH0442921Y2 (en) | 1992-10-12 |
Family
ID=30897174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987062676U Expired JPH0442921Y2 (en) | 1987-04-27 | 1987-04-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0442921Y2 (en) |
-
1987
- 1987-04-27 JP JP1987062676U patent/JPH0442921Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63170946U (en) | 1988-11-07 |
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