JPH0443608A - Manufacture of voltage-dependent nonlinear resistor ceramic composition and varistor - Google Patents
Manufacture of voltage-dependent nonlinear resistor ceramic composition and varistorInfo
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- JPH0443608A JPH0443608A JP2151993A JP15199390A JPH0443608A JP H0443608 A JPH0443608 A JP H0443608A JP 2151993 A JP2151993 A JP 2151993A JP 15199390 A JP15199390 A JP 15199390A JP H0443608 A JPH0443608 A JP H0443608A
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
産業上の利用分野
本発明は電気機器、電子機器で発生する異常高電圧、ノ
イズ、静電気などから機器の半導体及び回路を保護する
ためのコンデンサ特性とバリスタ特性を有する電圧依存
性非直線抵抗体磁器組成物およびバリスタの製造方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a voltage having capacitor characteristics and varistor characteristics to protect semiconductors and circuits of equipment from abnormal high voltage, noise, static electricity, etc. generated in electrical equipment and electronic equipment. The present invention relates to a dependent nonlinear resistor ceramic composition and a method for manufacturing a varistor.
従来の技術
従来、各種の電気機器、電子機器における異常高電圧の
吸収、ノイズの除去、火花消去、静電気対策のために電
圧依存性非直線抵抗特性を有するSiCバリスタや、Z
nO系バリスタなどが使用されている。このようなバリ
スタの電圧−電流特性は近似的に次式のように表すこと
ができる。Conventional technology Conventionally, SiC varistors and Z
nO type varistors are used. The voltage-current characteristics of such a varistor can be approximately expressed as in the following equation.
α
1 =(V/C)
ここで、■は電流、■は電圧、Cはバリスタ固有の定数
、αは電圧−電流非直線指数である。α 1 =(V/C) Here, ■ is a current, ■ is a voltage, C is a constant specific to the varistor, and α is a voltage-current nonlinear index.
SiCバリスタのαは2〜7程度、ZnO系バリスタで
はαが50にもおよぶものがある。このようなバリスタ
は比較的高い電圧の吸収には優れた性能を有しているが
、誘電率が低く、固有の静電容量が小さいため、バリス
タ電圧以下の比較的低い電圧の吸収にはほとんど効果を
示さず、また誘電損失tanδが5〜10%と大きい。The α of SiC varistors is about 2 to 7, and the α of some ZnO-based varistors is as high as 50. Such varistors have excellent performance in absorbing relatively high voltages, but due to their low dielectric constant and small inherent capacitance, they have little ability to absorb relatively low voltages below the varistor voltage. It has no effect, and the dielectric loss tan δ is as large as 5 to 10%.
一方、これらの低電圧のノイズなどの除去には見かけの
誘電率が5X10’程度で、tanδが1%前後の半導
体コンデンサが利用されている。しかし、このような半
導体コンデンサはサージなどによりある限度以上の電圧
または電流が印加されると、静電容量が減少したり破壊
したりして、コンデンサとしての機能を果たさなくなっ
たりする。On the other hand, semiconductor capacitors with an apparent dielectric constant of about 5×10' and a tan δ of about 1% are used to remove these low voltage noises. However, when a voltage or current exceeding a certain limit is applied to such a semiconductor capacitor due to a surge or the like, the capacitance decreases or breaks down, and the capacitor no longer functions as a capacitor.
そこで最近になって5rTi03を主成分とし、バリス
タ特性とコンデンサ特性の両方の機能を有するものが開
発され、コンピュータなどの電子機器におけるIC,L
SIなどの半導体素子の保護に利用されている。Recently, products containing 5rTi03 as the main component and having both varistor and capacitor properties have been developed, and ICs and L
It is used to protect semiconductor devices such as SI.
発明が解決しようとする課題
上記の5rTiO,を主成分とするバリスタとコンデン
サの両方の機能を有する素子はZnO系バリスタに比べ
誘電率が約10倍と大きいが、αやサージ耐量が小さく
、バリスタ電圧を低くすると特性が劣化しゃずいといっ
た欠点を有していた。Problems to be Solved by the Invention Although the dielectric constant of the above-mentioned 5rTiO-based device, which functions as both a varistor and a capacitor, is about 10 times higher than that of a ZnO-based varistor, its α and surge resistance are small, making it difficult to use as a varistor. This had the disadvantage that when the voltage was lowered, the characteristics deteriorated.
そこで本発明では、誘電率が大きく、バリスタ電圧が低
く、αが大きいと共にサージ耐量が大きい電圧依存性非
直線抵抗体磁器組成物およびバリスタの製造方法を捷供
することを目的とするものである。Therefore, it is an object of the present invention to provide a voltage-dependent nonlinear resistor ceramic composition that has a large dielectric constant, a low varistor voltage, a large α, and a large surge withstand capacity, and a method for producing the varistor.
課題を解決するための手段
上記の問題点を解決するために本発明では、(Sr+−
Jgx)aTios (0,001≦χ≦0.300.
0.950≦a<1.000) (以下第1成分と呼ぶ
)を90゜000〜99.998molχ、Nbt05
. TatOs+ WOs、 DytOs、Y!03+
LazO+CeO,、Sagos、Pr、O,、、N
d2O,のうち少なくとも1種類以上(以下第2成分と
呼ぶ)をo、ooi〜5.000molχ、AltOi
、5bzOx、BaO,BeO,PbO,BtOs、C
r1OsFezO,、CdO,K10.CaO,Co、
Ot、 CuO,Cu、O,Li to、 LiFMg
O,Mn0z、 Mo0=、 tia、0. NaF、
Nip、 RhtOx、 Sea、、 Ag、05i
Oz、 SiC,SrO,Tl tCh、 Th0z、
TiO2、V2O5,Bi zo* 、 Zn0Zr
O□、5nOzのうち少なくとも1種類以上(以r第3
成分と呼ぶ)を0.001−5.000molχ含有し
てなる主成分100重量部と、MgTi(h 60.
000〜32.500molχ、 5i(h 40.
000〜67.5solχからなる混合物を1200〜
1300’Cで焼成してなる添加物(以下第4成分と呼
ぶ) 0.001〜10.000重量部とからなる電
圧依存性非直線抵抗体磁器組成物を得ることにより、問
題を解決しようとするものである。Means for Solving the Problems In order to solve the above problems, in the present invention, (Sr+-
Jgx) aTios (0,001≦χ≦0.300.
0.950≦a<1.000) (hereinafter referred to as the first component) is 90°000 to 99.998 molχ, Nbt05
.. TatOs+ WOs, DytOs, Y! 03+
LazO+CeO,,Sagos,Pr,O,,,N
At least one kind (hereinafter referred to as the second component) of d2O, o, ooi to 5.000 molχ, AltOi
, 5bzOx, BaO, BeO, PbO, BtOs, C
r1OsFezO,, CdO, K10. CaO, Co,
Ot, CuO, Cu, O, Li to, LiFMg
O, Mn0z, Mo0=, tia, 0. NaF,
Nip, RhtOx, Sea, Ag, 05i
Oz, SiC, SrO, Tl tCh, Th0z,
TiO2, V2O5, Bizo*, Zn0Zr
At least one or more of O□, 5nOz (hereinafter the third
100 parts by weight of the main component containing 0.001-5.000 molχ of MgTi (h 60.
000-32.500molχ, 5i(h 40.
000 to 67.5solχ
We attempted to solve the problem by obtaining a voltage-dependent nonlinear resistor ceramic composition consisting of 0.001 to 10.000 parts by weight of an additive (hereinafter referred to as the fourth component) fired at 1300'C. It is something to do.
また、上記主成分と添加物とからなる組成物を1100
°C以上で焼成したバリスタの製造方法、さらにはその
焼成後、還元性雰囲気中で1200℃以上で焼成し、そ
の後酸化性雰囲気中で900〜1300℃で焼成したバ
リスタの製造方法を提供しようとするものである。In addition, a composition consisting of the above main ingredients and additives was added to 1100
It is an object of the present invention to provide a method for manufacturing a varistor fired at a temperature of 1,200°C or higher in a reducing atmosphere, and a method for manufacturing a varistor fired at a temperature of 900 to 1,300°C in an oxidizing atmosphere. It is something to do.
作用
上記の発明において第1成分は主たる成分であり、5r
Ti03のSrの一部をM、で置換することにより粒界
に形成される高抵抗層が号−ジに対して強くなる。また
、Sr、 MgなどのAサイトの化学量論比とTiなど
のBサイトの化学量論比をTi過剰にすることにより、
粒子内部の抵抗を低くし粒界に形成される誘電体の誘電
率を太き(することができる、さらに、第2成分は主に
第1成分の半導体化を促進する金属酸化物である。また
、第3成分は誘電率、α、サージ耐量の改善に寄与する
ものであり、第4成分はバリスタ電圧の低下、誘電率の
改善に有効なものである。特に、第4成分は融点が12
30〜1250”Cと比較的低いため、融点前後の温度
で焼成すると液相となり、その他の成分の反応を促進す
ると共に粒子の成長を促進する。そのため粒界部分に第
3成分が偏析しやすくなり、粒界が高抵抗化されやすく
なり、バリスタ機能およびコンデンサ機能が改善される
。また、粒成長が促進されるためバリスタ電圧が低くな
り、粒径の均一性が向上するため特性の安定性が良くな
り、特にサージ耐量が改善される。Effect In the above invention, the first component is the main component, and 5r
By substituting a part of Sr in Ti03 with M, the high resistance layer formed at the grain boundary becomes strong against the number of resistors. In addition, by making the stoichiometric ratio of A sites such as Sr and Mg and the stoichiometric ratio of B sites such as Ti excessive,
It is possible to lower the internal resistance of the grains and increase the dielectric constant of the dielectric material formed at the grain boundaries.Furthermore, the second component is a metal oxide that mainly promotes semiconducting of the first component. In addition, the third component contributes to improving the dielectric constant, α, and surge resistance, and the fourth component is effective in reducing the varistor voltage and improving the dielectric constant.In particular, the fourth component contributes to improving the dielectric constant, α, and surge resistance. 12
Since it is relatively low at 30 to 1250"C, it becomes a liquid phase when fired at a temperature around the melting point, which promotes the reaction of other components and the growth of particles. Therefore, the third component is likely to segregate at grain boundaries. This makes it easier for grain boundaries to become highly resistive, improving varistor and capacitor functions.Also, grain growth is promoted, which lowers varistor voltage, and grain size uniformity improves, resulting in stable characteristics. In particular, surge resistance is improved.
実施例 以下に実施例を挙げて本発明を具体的に説明する。Example The present invention will be specifically described below with reference to Examples.
まず、MgTiOs、 sio!を下記の第1表に示す
ように組成比を種々変えて秤量し、ボールミルなどで2
48r混合する。次に、乾燥した後、下記の第1表に示
すように温度を種々変えて焼成し、再びボールミルなど
で24Hr粉砕した後、乾燥し、第4成分とする0次い
で、第1成分、第2成分、第3成分、第4成分を下記の
第1表に示した組成比になるように秤量し、ボールミル
などで24Rr混合した後、乾燥し、ポリビニルアルコ
ールなどの有機バインダーを10wtχ添加して造粒し
た後、1 (t/ej)のプレス圧力で10φXI’
(m)の円板状に成形し、1100”Cで12Hr焼成
し脱バインダーする0次に、第1表に示したように温度
と時間を種々変えて焼成(第1焼成)し、その後還元性
雰囲気、例えばN、:H,−9: 1のガス中で温度と
時間を種々変えて焼成(第2焼成)する、さらにその後
、酸化性雰囲気中で温度と時間を種々変えて焼成(第3
焼成)する。First, MgTiOs, sio! were weighed with various composition ratios as shown in Table 1 below, and milled using a ball mill etc.
Mix for 48r. Next, after drying, it is baked at various temperatures as shown in Table 1 below, and then ground again for 24 hours using a ball mill, etc., and then dried to form the fourth component. The components, the third component, and the fourth component are weighed so as to have the composition ratio shown in Table 1 below, mixed with 24Rr using a ball mill, etc., dried, and an organic binder such as polyvinyl alcohol is added at 10wtχ to produce the product. After graining, 10φXI' with a press pressure of 1 (t/ej)
(m) and baked at 1100"C for 12 hours to remove the binder. Next, the temperature and time are varied as shown in Table 1 (first baking), followed by reduction. The product is fired in an oxidizing atmosphere, for example, N, :H, -9:1 gas, at various temperatures and times (second firing), and then fired in an oxidizing atmosphere at various temperatures and times (second firing). 3
firing).
(以下余白)
こうして得られた第1図および第2図に示す焼結体1の
両平面に外周を残すようにして八gなどの導電性ペース
トをスクリーン印刷などにより塗布し、630”C、3
winで焼成し、電極2.3を形成する0次に、半田な
どによりリード線(図示せず)を取り付け、エポキシな
どの樹脂を塗装する。このようにして得られた素子の特
性を下記の第2表に示す。(Margin below) A conductive paste such as 8g is applied by screen printing or the like, leaving the outer periphery on both planes of the sintered body 1 shown in FIGS. 1 and 2 obtained in this way, and 3
The electrode 2.3 is baked with Win to form the electrode 2.3, a lead wire (not shown) is attached with solder or the like, and a resin such as epoxy is applied. The characteristics of the device thus obtained are shown in Table 2 below.
なお、第2表において誘電率はIKHzでの静電容量か
ら計算したものであり、αは
α−1/log(V+o−a/ VIIIA)(ただし
、Vl、A、V、。、Aは1謹A、10−へのi流を流
した時に素子の両端にかかる電圧である。)で評価した
。また、サージ耐量はパルス性のit流を印加した後の
V、、Aの変化率が±10%以内である時の最大のパル
ス性電流値により評価している。In Table 2, the dielectric constant is calculated from the capacitance at IKHz, and α is α-1/log (V+o-a/VIIIA) (where Vl, A, V, ., A is 1 This is the voltage applied to both ends of the element when an i current is applied to A, 10-.). Further, the surge resistance is evaluated based on the maximum pulse current value when the rate of change of V, A after applying the pulse IT current is within ±10%.
(以下余白)
本発明において、第1成分の(Sri−MMgx)dl
Osのχの範囲を規定したのは、Xが0.001よりも
小さいと効果を示さず、0.300を趙えると格子欠陥
が発生しにくくなるため半導体化が促進されず、粒界に
Mgが単一相として析出するため組織が不均一になり、
V、、、が高くなりすぎて特性が劣化するためである。(Left below) In the present invention, (Sri-MMgx)dl of the first component
The reason for specifying the range of χ for Os is that if X is smaller than 0.001, there will be no effect, and if Since Mg precipitates as a single phase, the structure becomes non-uniform,
This is because V becomes too high and the characteristics deteriorate.
また、aの範囲を規定したのは、0.950よりも小さ
いとTi単体の結晶が析出し組織が不均一になるため特
性が劣化し、1.000を趙えると粒界に形成される誘
電体の誘電率が小さくなるためである。さらに、第2成
分は0.001molχ未満では効果を示さず、5.O
OOmolχを超えると粒界に偏析して粒界の高抵抗化
を抑制し、粒界に第2相を形成することから特性が劣化
するものである。そして、第3成分は0.001wol
χ未満では効果を示さず、5 、 OOO+mo lχ
を超えると粒界に偏析して第2相を形成することから特
性が劣化するものである。また、第4成分はMgTio
zとStowの2成分系の相図のなかで最も融点の低い
領域の物質であり、その範囲外では融点が高くなるもの
である。In addition, the range of a was specified because if it is smaller than 0.950, crystals of Ti alone will precipitate and the structure will become non-uniform, resulting in deterioration of properties, and if it exceeds 1.000, it will be formed at grain boundaries. This is because the dielectric constant of the dielectric becomes smaller. Furthermore, the second component has no effect at less than 0.001 molχ; O
If it exceeds OOmolχ, it segregates at the grain boundaries, suppresses the increase in resistance of the grain boundaries, and forms a second phase at the grain boundaries, resulting in deterioration of properties. And the third component is 0.001wol
No effect is shown below χ, 5, OOO+molχ
If it exceeds this amount, it will segregate at grain boundaries and form a second phase, resulting in deterioration of properties. Moreover, the fourth component is MgTio
It is a substance with the lowest melting point in the phase diagram of the two-component system of z and Stow, and the melting point becomes high outside this range.
さらに、第4成分の添加量は、0.001重量部未満で
は効果を示さず、10.000重量部を超えると粒界の
抵抗は高くなるが粒界の幅が厚くなるため、静電容量が
小さくなると共にVlmAが高くなり、サージに対して
弱くなるものである。そして、第4成分の焼成温度を規
定1〜だのは、低融点の第4成分が合成される温度が1
200℃以上であるためである。また、第1焼成の温度
を規定したのは、第4成分の融点が1230〜4250
°Cであるため、1100°C以上の温度で焼成すると
第4成分が液相に近い状態になって焼結が促進されるた
めであり、1100℃未満では第4成分の液相焼結効果
がないためである。さらに、第2焼成の温度を規定した
のは、1200°C未満では第1焼成後の焼結体が十分
に還元されず、バリスタ特性、コンデンサ特性が共に劣
化するためである。そして、第3焼成の温度を規定した
のは、900’C未満では粒界の高抵抗化が十分に進ま
ないため、VIIIAが低くなりすぎバリスタ特性が劣
化するためであり、1300°Cを趙えると静電容量が
小さくなりすぎコンデンジ特性が劣化するためである。Furthermore, if the amount of the fourth component added is less than 0.001 parts by weight, no effect will be shown, and if it exceeds 10.000 parts by weight, the resistance of the grain boundaries will increase, but the width of the grain boundaries will become thicker, so the capacitance will increase. As VlmA becomes smaller, VlmA becomes higher and becomes weaker against surges. The reason why the firing temperature of the fourth component is specified as 1 or higher is that the temperature at which the fourth component with a low melting point is synthesized is 1.
This is because the temperature is 200°C or higher. In addition, the temperature of the first firing was specified because the melting point of the fourth component was 1230 to 4250.
°C, therefore, if fired at a temperature of 1100°C or higher, the fourth component will be in a state close to a liquid phase and sintering will be accelerated; if it is lower than 1100°C, the liquid phase sintering effect of the fourth component This is because there is no Furthermore, the temperature of the second firing is specified because if it is less than 1200°C, the sintered body after the first firing will not be sufficiently reduced, and both the varistor characteristics and the capacitor characteristics will deteriorate. The reason why the temperature for the third firing was specified was that if it was less than 900'C, the resistance of the grain boundaries would not increase sufficiently, and VIIIA would become too low, deteriorating the varistor characteristics. This is because if the capacitance is increased too much, the capacitance becomes too small and the capacitance characteristics deteriorate.
また、第1焼成の雰囲気は酸化性雰囲気でも還元性雰囲
気でも同様の効果があることを確認した。Furthermore, it was confirmed that the same effect can be obtained whether the atmosphere for the first firing is an oxidizing atmosphere or a reducing atmosphere.
また、本寞施例では添加物の組み合わせについては、第
1成分とし2て(Sri−Jgx)aTiOs (0,
001≦X≦0.300.0.950≦a <1.00
0)、第2成分としてNb、O,、TatOs、WOs
、DytOi+YxOs、LatOs、Ce0z 、第
3成分としてAlzOi+ PbO,Cr2O2,Cd
O,KJ、 Cot’s、 Cu0Cute、門nO1
,MoO3,NiO,AgtO,SiC,Tlt03.
ZnO,ZrO2゜第4成分としてMgTiOx、 S
towについてのみ示したが、その他の組み合わせとし
て第2成分として5az03.Pr1O+++N’zO
x、第3成分としてSb、O,、[1aOBeO,BJ
s、FezO!、CaO,LizO,LiF、MgO,
NatO,NaFRhzO)、Se0g、5iOz、S
rO,T11J、Ti0z、VzOs、BlzOiSn
o!を用いた組成の組み合わせでも同様の効果が得られ
ることを確認し7た。In addition, in this practical example, regarding the combination of additives, the first component is (Sri-Jgx)aTiOs (0,
001≦X≦0.300.0.950≦a <1.00
0), Nb, O,, TatOs, WOs as the second component
, DytOi+YxOs, LatOs, Ce0z, AlzOi+ PbO, Cr2O2, Cd as the third component
O, KJ, Cot's, Cu0Cute, gate nO1
, MoO3, NiO, AgtO, SiC, Tlt03.
ZnO, ZrO2゜ MgTiOx, S as the fourth component
Although only tow is shown, other combinations include 5az03. Pr1O+++N'zO
x, as the third component Sb, O, , [1aOBeO,BJ
s, FezO! , CaO, LizO, LiF, MgO,
NatO, NaFRhzO), Se0g, 5iOz, S
rO, T11J, Ti0z, VzOs, BlzOiSn
o! It was confirmed that similar effects could be obtained by combining compositions using 7.
また、第2成分および第4成分については、それぞれ2
種類以上を所定の範囲で組み合わせて用いても差支えな
いことを併せて確認した。Also, for the second component and the fourth component, 2
It was also confirmed that there is no problem even if more than one type is used in combination within a predetermined range.
分を1100℃以上で焼成するだけでも第4成分が液相
となり、その他の成分の反応を促進すると共に粒子の成
長を促進するため、粒界部分に第3成分が偏析しやすく
なり、粒界が高抵抗化さねやすくなり、バリスタ機能お
よびコンデンサ機能が改善されるという効果がある。Even if the fourth component is fired at a temperature of 1100°C or higher, the fourth component becomes a liquid phase, which promotes the reaction of other components and the growth of particles, making it easier for the third component to segregate at the grain boundaries. This has the effect of making it easier for the resistance to increase, and improving the varistor function and capacitor function.
発明の効果
以上に示(、またように本発明によれば、第4成分によ
る液相焼結効果により、粒子径が大きいためバリスタ電
圧が低く、誘電率りおよびαが大きく、粒子径のばらつ
きが小さいためサージ電流が素子に均一に流れ、また、
Mgによって粒界が効果的に高抵抗化されるため、サー
ジ耐蓋が大きくなるという効果が得られる。According to the present invention, due to the liquid phase sintering effect of the fourth component, the varistor voltage is low due to the large particle size, the dielectric constant and α are large, and the variation in particle size is reduced. Since the current is small, the surge current flows uniformly through the element, and
Since Mg effectively increases the resistance of the grain boundaries, it is possible to obtain the effect of increasing surge resistance.
第1図は本発明による素子を示す上面図、第2図は本発
明による素子を示す断面図である。
l・・・・・・焼結体、2.3・・・・・電極。
代理人の氏名 弁理士 粟野重孝 はか1名なお、第1
成分、第2成分、第3成分、第4成萬
図
第
図
\3FIG. 1 is a top view showing an element according to the invention, and FIG. 2 is a sectional view showing the element according to the invention. l... Sintered body, 2.3... Electrode. Name of agent: Patent attorney Shigetaka Awano (1 person)
Component, 2nd component, 3rd component, 4th composition diagram\3
Claims (3)
0.001≦x≦0.300,0.950≦a<1.0
00)を90.000〜99.998mol%、Nb_
2O_5,Ta_2O_5,WO_3,Dy_2O_3
,Y_2O_3,La_2O_3,CeO_2,Sm_
2O_3,Pr_6O_1_1,Nd_2O_3のうち
少なくとも1種類以上を0.001〜5.000mol
%、Al_2O_3,Sb_2O_3,BaO,BeO
,PbO,B_2O_3,Cr_2O_3,Fe_2O
_3,CdO,K_2O,CaO,Co_2O_3,C
uO,Cu_2O,Li_2O,LiF,MgO,Mn
O_2,MoO_3,Na_2O,NaF,NiO,R
h_2O_3,SeO_2,Ag_2O,SiO_2,
SiC,SrO,Tl_2O_3,ThO_2,TiO
_2,V_2O_5,Bi_2O_3,ZnO,ZrO
_2,SnO_2のうち少なくとも1種類以上を0.0
01〜5.000mol%含有してなる主成分100重
量部と、MgTiO_3 60.000〜32.500
mol%,SiO_2 40.000〜67.5mol
%からなる混合物を1200℃以上で焼成してなる添加
物0.001〜10.000重量部とからなることを特
徴とする電圧依存性非直線抵抗体磁器組成物。(1) (Sr_1_-_xMg_x)_aTiO_3(
0.001≦x≦0.300, 0.950≦a<1.0
00) to 90.000 to 99.998 mol%, Nb_
2O_5, Ta_2O_5, WO_3, Dy_2O_3
, Y_2O_3, La_2O_3, CeO_2, Sm_
0.001 to 5.000 mol of at least one of 2O_3, Pr_6O_1_1, Nd_2O_3
%, Al_2O_3, Sb_2O_3, BaO, BeO
, PbO, B_2O_3, Cr_2O_3, Fe_2O
_3, CdO, K_2O, CaO, Co_2O_3, C
uO, Cu_2O, Li_2O, LiF, MgO, Mn
O_2, MoO_3, Na_2O, NaF, NiO, R
h_2O_3, SeO_2, Ag_2O, SiO_2,
SiC, SrO, Tl_2O_3, ThO_2, TiO
_2, V_2O_5, Bi_2O_3, ZnO, ZrO
_2, at least one type of SnO_2 0.0
100 parts by weight of the main component containing 01 to 5.000 mol% and MgTiO_3 60.000 to 32.500
mol%, SiO_2 40.000-67.5 mol
% and 0.001 to 10.000 parts by weight of an additive obtained by firing a mixture consisting of
0.001≦x≦0.300,0.950≦a<1.0
00)を90.000〜99.998mol%、Nb_
2O_5,Ta_2O_5,WO_3,Dy_2O_3
,Y_2O_3,La_2O_3,CeO_2,Sm_
2O_3,Pr_6O_1_1,Nd_2O_3のうち
少なくとも1種類以上を0.001〜5.000mol
%、Al_2O_3,Sb_2O_3,BaO,BeO
,PbO,B_2O_3,Cr_2O_3,Fe_2O
_3,CdO,K_2O,CaO,Co_2O_3,C
uO,Cu_2O,Li_2O,LiF,MgO,Mn
O_2,MoO_3,Na_2O,NaF,NiO,R
h_2O_3,SeO_2,Ag_2O,SiO_2,
SiC,SrO,Tl_2O_3,ThO_2,TiO
_2,V_2O_5,Bi_2O_3,ZnO,Zr_
2,SnO_2のうち少なくとも1種類以上を0.00
1〜5.000mol%含有してなる主成分100重量
部と、MgTiO_3 60.000〜32.500m
ol%,SiO_2 40.000〜67.5mol%
からなる混合物を1200℃以上で焼成してなる添加物
0.001〜10.000重量部とからなる組成物を、
1100℃以上で焼成したことを特徴とするバリスタの
製造方法。(2) (Sr_1_-_xMg_x)_aTiO_3(
0.001≦x≦0.300, 0.950≦a<1.0
00) to 90.000 to 99.998 mol%, Nb_
2O_5, Ta_2O_5, WO_3, Dy_2O_3
, Y_2O_3, La_2O_3, CeO_2, Sm_
0.001 to 5.000 mol of at least one of 2O_3, Pr_6O_1_1, Nd_2O_3
%, Al_2O_3, Sb_2O_3, BaO, BeO
, PbO, B_2O_3, Cr_2O_3, Fe_2O
_3, CdO, K_2O, CaO, Co_2O_3, C
uO, Cu_2O, Li_2O, LiF, MgO, Mn
O_2, MoO_3, Na_2O, NaF, NiO, R
h_2O_3, SeO_2, Ag_2O, SiO_2,
SiC, SrO, Tl_2O_3, ThO_2, TiO
_2, V_2O_5, Bi_2O_3, ZnO, Zr_
2.0.00 of at least one type of SnO_2
100 parts by weight of the main component containing 1 to 5.000 mol%, and 60.000 to 32.500 m of MgTiO_3
ol%, SiO_2 40.000-67.5 mol%
A composition consisting of 0.001 to 10.000 parts by weight of an additive obtained by baking a mixture consisting of
A method for manufacturing a varistor, characterized in that the varistor is fired at a temperature of 1100°C or higher.
0.001≦x≦0.300,0.950≦a<1.0
00)を90.000〜99.998mol%、Nb_
2O_5,Ta_2O_5,WO_3,Dy_2O_3
,Y_2O_3,La_2O_3,CeO_2,Sm_
2O_3,Pr_6O_1_1,Nd_2O_3のうち
少なくとも1種類以上を0.001〜5.000mol
%、Al_2O_3,Sb_2O_3,BaO,BeO
,PbO,B_2O_3,Cr_2O_3,Fe_2O
_3,CdO,K_2O,CaO,Co_2O_3,C
uO,Cu_2O,Li_2O,LiF,MgO,Mn
O_2,MoO_2,Na_2O,NaF,NiO,R
h_2O_3,SeO_2,Ag_2O,SiO_2,
SiC,SrO,Tl_2O_3,ThO_2,V_2
O_5,Bi_2O_3,ZnO,ZrO_2,SnO
_2のうち少なくとも1種類以上を0.001〜5.0
00mol%含有してなる主成分100重量部と、Mg
TiO_3 60.000〜32.500mol%,S
iO_2 40.000〜67.5mol%からなる混
合物を1200℃以上で焼成してなる添加物0.001
〜10.000重量部とからなる組成物を、1100℃
以上で焼成した後、還元性雰囲気中で1200℃以上で
焼成し、その後酸化性雰囲気中で900〜1300℃で
焼成したことを特徴とするバリスタの製造方法。(3) (Sr_1_-_xMg_x)_aTiO_3(
0.001≦x≦0.300, 0.950≦a<1.0
00) to 90.000 to 99.998 mol%, Nb_
2O_5, Ta_2O_5, WO_3, Dy_2O_3
, Y_2O_3, La_2O_3, CeO_2, Sm_
0.001 to 5.000 mol of at least one of 2O_3, Pr_6O_1_1, Nd_2O_3
%, Al_2O_3, Sb_2O_3, BaO, BeO
, PbO, B_2O_3, Cr_2O_3, Fe_2O
_3, CdO, K_2O, CaO, Co_2O_3, C
uO, Cu_2O, Li_2O, LiF, MgO, Mn
O_2, MoO_2, Na_2O, NaF, NiO, R
h_2O_3, SeO_2, Ag_2O, SiO_2,
SiC, SrO, Tl_2O_3, ThO_2, V_2
O_5, Bi_2O_3, ZnO, ZrO_2, SnO
At least one type of _2 from 0.001 to 5.0
100 parts by weight of the main component containing 00 mol% and Mg
TiO_3 60.000-32.500mol%, S
Additive 0.001 obtained by firing a mixture consisting of iO_2 40.000 to 67.5 mol% at 1200°C or higher
~10.000 parts by weight was heated at 1100°C.
A method for manufacturing a varistor, which comprises firing in the above manner, followed by firing at 1200°C or higher in a reducing atmosphere, and then firing at 900 to 1300°C in an oxidizing atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2151993A JPH0443608A (en) | 1990-06-11 | 1990-06-11 | Manufacture of voltage-dependent nonlinear resistor ceramic composition and varistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2151993A JPH0443608A (en) | 1990-06-11 | 1990-06-11 | Manufacture of voltage-dependent nonlinear resistor ceramic composition and varistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0443608A true JPH0443608A (en) | 1992-02-13 |
Family
ID=15530718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2151993A Pending JPH0443608A (en) | 1990-06-11 | 1990-06-11 | Manufacture of voltage-dependent nonlinear resistor ceramic composition and varistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0443608A (en) |
-
1990
- 1990-06-11 JP JP2151993A patent/JPH0443608A/en active Pending
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