JPH0444295A - Manufacturing of multi-layer printed circuit board - Google Patents

Manufacturing of multi-layer printed circuit board

Info

Publication number
JPH0444295A
JPH0444295A JP14849990A JP14849990A JPH0444295A JP H0444295 A JPH0444295 A JP H0444295A JP 14849990 A JP14849990 A JP 14849990A JP 14849990 A JP14849990 A JP 14849990A JP H0444295 A JPH0444295 A JP H0444295A
Authority
JP
Japan
Prior art keywords
copper
treatment
inner layer
plating
electroless
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14849990A
Other languages
Japanese (ja)
Inventor
Takao Kobayashi
隆雄 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14849990A priority Critical patent/JPH0444295A/en
Publication of JPH0444295A publication Critical patent/JPH0444295A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To improve the adhesion between a copper-clad laminate for interior materials and a resin layer by means of surface treatment process of interior copper pattern part, which consists of oxidation treatment of a copper pattern part, prior treatment for electroless plating, and electroless copper plating treatment. CONSTITUTION:Oxidation treatment 1 is applied to a copper pattern of a copper- clad laminate, and a rugged film of copper oxide is formed. Then, after the application of hot water bath treatment 2, deposition treatment of catalyzer for electroless plating (prior treatment) 3 is applied. Successively, chemical copper plated film is formed, by electroless copper plating treatment 4, on the surface of the recessed or projected part of copper oxide. Next, water bath treatment 5 is applied, and then dry treatment 6 is applied. In this way, the surface treatment process is completed.

Description

【発明の詳細な説明】 〔概 要〕 多層プリント配線板の製造方法、より詳しくは、銅箔な
いし外層用銅張積層板と、プリプレグと、内層用銅張積
層板とを積層加熱プレスする前に行なう内層用銅張板の
内層銅パターン部の表面処理に関し、 スルーホールめっき前処理での酸性処理液によっては溶
解しない凹凸表面を内層銅パターン部に付与することで
あり、上述した欠点の発生を防止することを目的とし、 多層プリント配線板の製造工程における内層材用銅張積
層板の内層回路形成後に内層銅パターン部表面処理を施
こす工程が、前記銅パターン部を酸化処理し、次に、無
電解めっき用前処理を施こし、そして無電解銅めっき処
理を施こすことからなるように構成する。
[Detailed Description of the Invention] [Summary] A method for manufacturing a multilayer printed wiring board, more specifically, a method for manufacturing a multilayer printed wiring board, more specifically, a method for manufacturing a multilayer printed wiring board, in which a copper foil or a copper clad laminate for an outer layer, a prepreg, and a copper clad laminate for an inner layer are laminated and hot pressed before being hot pressed. Regarding the surface treatment of the inner layer copper pattern part of the inner layer copper clad board performed in With the aim of preventing The method is configured such that a pretreatment for electroless plating is performed, and an electroless copper plating treatment is performed.

〔産業上の利用分野〕[Industrial application field]

本発明は、多層プリント配線板の製造方法、より詳しく
は、銅箔ないし外層用銅張積層板と、プリプレグと、内
層用銅張積層板とを積層加熱プレスする前に行なう内層
用銅張板の内層銅パターン部の表面処理に関する。
The present invention relates to a method for manufacturing a multilayer printed wiring board, more specifically, a method for producing a copper clad laminate for an inner layer, which is performed before laminating and hot pressing a copper foil or a copper clad laminate for an outer layer, a prepreg, and a copper clad laminate for an inner layer. This invention relates to surface treatment of an inner layer copper pattern portion.

多層プリント配線板では、内層板の銅パターン部とプリ
プレグの接着樹脂との密着性(接着性)を改善し、特に
、半導体装置などの部品の半田づけを行なった(260
℃の半田づけ温度)ときにも剥離しない必要がある。
In multilayer printed wiring boards, we improved the adhesion between the copper pattern part of the inner layer board and the adhesive resin of the prepreg, especially for soldering of parts such as semiconductor devices (260
It is necessary to not peel off even when soldering temperature (℃).

〔従来の技術〕[Conventional technology]

従来の内層銅パターン部の表面処理においては、銅を化
学(酸化)処理して酸化銅(CaO2黒色)ないし亜酸
化銅(Cu20、茶色)の凹凸表面酸化物皮膜を形成し
ている。これら酸化処理は、いわゆる、ブラックオキサ
イド処理およびブラウンオキサイド処理として知られて
いる。
In the conventional surface treatment of the inner layer copper pattern portion, copper is chemically (oxidized) treated to form an uneven surface oxide film of copper oxide (CaO2 black) or cuprous oxide (Cu20, brown). These oxidation treatments are known as black oxide treatment and brown oxide treatment.

このような表面処理を施こした内層用銅張積層板の上に
プリプレグを載せ、さらにその上に外層材用銅張積層板
を載せて加熱プレスして積層体とする。該積層体を外形
加工し、スルーホール穴あけし、スルーホールめっきを
施こす。そして、外層銅板を利用した回路パターン配線
を形成することで多層プリント配線板が製造される。
A prepreg is placed on the copper-clad laminate for the inner layer that has been subjected to such surface treatment, and then the copper-clad laminate for the outer layer is placed on top of the prepreg and heated and pressed to form a laminate. The outer shape of the laminate is processed, through-holes are drilled, and through-hole plating is applied. Then, a multilayer printed wiring board is manufactured by forming circuit pattern wiring using the outer layer copper plate.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

加熱プレスで造った積層体では、内層銅パターン部はそ
の酸化銅表面がプリプレグ樹脂で覆われているが、スル
ーホール作成時のドリル穴あけの際に、加工負荷(衝撃
)で酸化物表面とプリプレグ樹脂との間に隙間が発生し
てしまうことがある。
In a laminate made by hot pressing, the copper oxide surface of the inner layer copper pattern part is covered with prepreg resin, but when drilling holes to create through holes, the processing load (impact) causes the oxide surface to bond with the prepreg resin. A gap may occur between the resin and the resin.

すると、スルーホールめっきの前処理としての酸性処理
液浸漬、流漬(酸洗)を行なったときに、酸性液(塩酸
など)が隙間に浸入して酸化銅を溶解する。この酸化銅
溶解で下地の銅が表出してしまう部分(銅平滑表面部分
)では密着力(接着力)不足となり、最悪の場合には、
加熱冷却(熱衝撃)にて積層した樹脂層が剥れることが
ある。
Then, when immersion or flowing (pickling) in an acidic treatment liquid is performed as a pretreatment for through-hole plating, the acidic liquid (hydrochloric acid, etc.) penetrates into the gap and dissolves the copper oxide. In the areas where the underlying copper is exposed due to this copper oxide dissolution (copper smooth surface areas), adhesion (adhesive force) will be insufficient, and in the worst case,
Laminated resin layers may peel off due to heating and cooling (thermal shock).

本発明の目的は、スルーホールめつき前処理での酸性処
理液によっては溶解しない凹凸表面を内層銅パターン部
に付与することであり、上述した欠点の発生を防止する
ことである。
An object of the present invention is to provide an inner layer copper pattern with an uneven surface that is not dissolved by an acidic treatment solution used in through-hole plating pretreatment, and to prevent the above-mentioned defects from occurring.

〔課題を解決するための手段〕[Means to solve the problem]

上述の目的が、多層プリント配線板の製造工程における
内層材用銅張積層板の内層回路形成後に内層銅パターン
部表面処理を施こす工程が、前8己銅パターン部を酸化
処理し、次に、無電解めっき用前処理を施こし、そして
無電解銅めつき処理を施こすことからなることを特徴と
する多層プリント配線板の製造方法によって達成される
The above-mentioned purpose is that in the manufacturing process of a multilayer printed wiring board, the step of surface-treating the inner layer copper pattern part after forming the inner layer circuit of the copper-clad laminate for inner layer material is to oxidize the copper pattern part beforehand, and then This is achieved by a method for producing a multilayer printed wiring board, characterized in that it comprises performing a pretreatment for electroless plating, and performing an electroless copper plating treatment.

〔作 用〕[For production]

本発明によれば、従来の内層銅パターン部の酸化処理に
よって形成した酸化銅凹凸表面の上に、化学銅を無電解
めっきで析出させて凹凸銅表面を付加するわけである。
According to the present invention, the uneven copper surface is added by depositing chemical copper by electroless plating on the uneven copper oxide surface formed by the conventional oxidation treatment of the inner layer copper pattern portion.

この表面の化学銅は酸性処理液に溶解しないし、かつ先
に形成した凹凸面をそのまま反映するので密着力の低下
はない。
The chemical copper on this surface does not dissolve in the acidic treatment solution and reflects the previously formed uneven surface as it is, so there is no reduction in adhesion.

〔実施例〕〔Example〕

以下、添付図面を参照して、本発明の実施態様例および
比較例によって本発明の詳細な説明する。
Hereinafter, the present invention will be described in detail by embodiments and comparative examples with reference to the accompanying drawings.

第1図は、本発明の製造方法にしたがった内層銅パター
ン部表面処理工程図(フローチャート)であり、この後
工程が積層加熱プレスとなる。
FIG. 1 is a process diagram (flowchart) for surface treatment of the inner layer copper pattern portion according to the manufacturing method of the present invention, and the subsequent process is lamination hot pressing.

公知のやり方で製作されたエポキシ樹脂ガラス基板から
なる両面銅張積層板を用意し、銅M(内層銅板)をフォ
トエツチングによって所定の回路パターン部とする。な
お、密着法(力)を調べるためには、引き剥し強さで比
較することになるので、市販の電解銅箔(厚さ35μ)
を用いて下言己と同じ表面処理を施こす。
A double-sided copper-clad laminate made of an epoxy resin glass substrate manufactured by a known method is prepared, and copper M (inner layer copper plate) is formed into a predetermined circuit pattern portion by photoetching. In addition, in order to examine the adhesion method (force), we will compare the peel strength, so we used commercially available electrolytic copper foil (thickness 35μ).
Apply the same surface treatment as the lower surface using.

まず、銅張積層板の銅パターン部に従来通りの酸化処理
1を施こして、酸化銅凹凸被膜を形成する。例えば、5
hipley社のプロボンド(プロセス商品名)を用い
た酸化処理液(80℃×5分)でCuO系のブラックオ
キサイド(あるいは、Cu2O系のブラウンオキサイド
)の凹凸皮膜を形成する。湯洗処理(60℃×2分)2
を施こしてから、無電解めっき用触媒沈着処理(前処理
)3を施こす。例えば、日本Schering社のりデ
ューサ・ネオガント賀^(1)  [25℃×5分〕お
よびリデューサ・ネオガント碑^(2)  〔25℃×
2分〕 (プロセス商品名)を用いた触媒付着処理を施
こす。続いて、無電解銅めっき処理4によって酸化銅凹
凸表面上に化学銅めっき膜を形成する。このめっき膜は
下地の凹凸をそのまま有する。例えば、日本5cher
 ing社のノビガン)HC液(商品名)を用いた25
℃×10分の無電解銅めっき処理によって厚さ約0.2
−の化学銅めっき膜を形成する。そして、水洗処理(常
温×2分)5を施こし、乾燥処理(60〜70℃XIO
分)6を施こして表面処理工程が完了する。
First, a conventional oxidation treatment 1 is performed on a copper pattern portion of a copper-clad laminate to form a copper oxide uneven coating. For example, 5
A concavo-convex film of CuO-based black oxide (or Cu2O-based brown oxide) is formed using an oxidation treatment solution (80° C. x 5 minutes) using Probond (process product name) manufactured by Hipley. Hot water washing treatment (60℃ x 2 minutes) 2
After that, electroless plating catalyst deposition treatment (pretreatment) 3 is performed. For example, Japan Schering's glue Reducer Neo Gant Ka^ (1) [25°C x 5 minutes] and Reducer Neo Gant Monument^ (2) [25°C x
2 minutes] Perform catalyst adhesion treatment using (process product name). Subsequently, a chemical copper plating film is formed on the uneven surface of the copper oxide by electroless copper plating process 4. This plating film has the underlying irregularities as they are. For example, Japan 5cher
25 using Novigan HC liquid (trade name) from ing Co., Ltd.
Approximately 0.2 mm thick by electroless copper plating treatment for 10 minutes at ℃
- forms a chemical copper plating film. Then, wash with water (room temperature x 2 minutes) 5 and dry (60-70℃
Step 6) is performed to complete the surface treatment process.

このような表面処理した内層材用銅張積層板(又は電解
銅箔)にプリプレグ(エポキシ樹脂)を載せてから、加
圧加熱プレスしてプリプレグ樹脂を完全に硬化させて積
層板とする(なお、表面処理した内層銅パターン部と樹
脂層との密着性を検討しているので、外層材用銅張積層
板の積層は省略する)。この工程で得た電解銅箔積層板
において銅箔の引き剥し試験を行なった結果、引き剥し
強さは、例えば、第1表中のサンプル1 (本発明)で
は1.2〜1.5 kg/ cmである。
Prepreg (epoxy resin) is placed on such a surface-treated copper-clad laminate (or electrolytic copper foil) for inner layer material, and then pressurized and heated to completely cure the prepreg resin to form a laminate (note: (Since we are examining the adhesion between the surface-treated inner layer copper pattern and the resin layer, the lamination of the copper-clad laminate for the outer layer material is omitted.) As a result of conducting a copper foil peeling test on the electrolytic copper foil laminate obtained in this process, the peeling strength was, for example, 1.2 to 1.5 kg for Sample 1 (invention) in Table 1. / cm.

造った積層板を外形加工し、所定のスルーホール穴あけ
を行なう。この穴あけした積層板にスルーホールめっき
を公知のやり方で施こすために、穴内壁洗浄を酸性処理
液(例えば、塩酸)中に浸漬する。このときに、酸化銅
皮膜は化学銅で覆われているので、酸性処理液に溶解し
ない。続いて無電解めっき触媒付着処理および無電解銅
めっき処理(上述した処理と同様な条件でよい)を施こ
す。このようにしてスルーホールめっきした積層板に2
60℃X30秒×5サイクルの熱衝撃を与えて、硬化樹
脂層が内層材用銅張積層板から剥離するかどうかを調べ
た結果、上述の条件にて造った積層板(サンプル1)で
は剥離しなかった。
The manufactured laminate is processed into an external shape and the specified through holes are drilled. In order to apply through-hole plating to the perforated laminate in a known manner, the inner walls of the holes are immersed in an acidic treatment solution (for example, hydrochloric acid). At this time, since the copper oxide film is covered with chemical copper, it does not dissolve in the acidic treatment solution. Subsequently, an electroless plating catalyst adhesion treatment and an electroless copper plating treatment (the same conditions as the above-mentioned treatment may be used) are performed. In this way, the through-hole plated laminate is
We investigated whether the cured resin layer would peel off from the copper-clad laminate for inner layer material by applying thermal shock at 60℃ x 30 seconds x 5 cycles.As a result, the laminate made under the above conditions (Sample 1) did not peel off. I didn't.

比較例(サンプル2)として上述した本発明にかかる表
面処理における無電解めっき処理およびその前処理(触
媒付着処理)を省いた従来どおりの酸化処理のみでの場
合では、引き剥し強さは1.2〜1.5kg/cmとほ
ぼ同じであったが、スルーホールの内層銅パターン部に
ピンクリング(下地銅の表出)が生じ、スルーホールめ
っき後での熱衝撃試験で剥離した。
As a comparative example (Sample 2), in the case where only the conventional oxidation treatment was performed, omitting the electroless plating treatment and its pretreatment (catalyst attachment treatment) in the surface treatment according to the present invention, the peel strength was 1. Although it was almost the same as 2 to 1.5 kg/cm, a pink ring (exposure of the underlying copper) was generated in the inner layer copper pattern part of the through hole, and it peeled off in the thermal shock test after through hole plating.

第1表 上述のように、本発明の表面処理によれば、従来と比べ
て引き剥し強さの低下はなく、熱衝撃試験での剥れがな
いように密着力が改善できる。
As shown in Table 1 above, according to the surface treatment of the present invention, there is no decrease in peel strength compared to the conventional method, and adhesion can be improved so that peeling does not occur in a thermal shock test.

これらのことから、本発明での内層銅パターン部表面処
理が優れていることがわかり、当然に外層材用銅張積層
板を含めて製造する多層プリント配線板にも適用できる
From these facts, it is clear that the surface treatment of the inner layer copper pattern portion in the present invention is excellent, and can naturally be applied to multilayer printed wiring boards manufactured including copper clad laminates for outer layer materials.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、本発明によれば、内層銅パターン部
での従来の酸化銅凹凸面を利用してその上に化学銅を析
出させることで、内層材用銅張積層板と樹脂層との密着
性を向上させそして信頼性を高めた多層プリント配線板
を製造することができる。
As described above, according to the present invention, by depositing chemical copper on the conventional copper oxide uneven surface in the inner layer copper pattern part, the copper-clad laminate for inner layer material and the resin layer can be separated. It is possible to manufacture a multilayer printed wiring board with improved adhesion and reliability.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の多層プリント配線板の製造方法にし
たがった内層銅パターン部の表面処理工程図である。 1・・・酸化処理、 3・・・無電解めっき用触媒付着処理、4・・・無電解
銅めっき処理。
FIG. 1 is a process diagram of surface treatment of an inner layer copper pattern portion according to the method of manufacturing a multilayer printed wiring board of the present invention. 1... Oxidation treatment, 3... Catalyst adhesion treatment for electroless plating, 4... Electroless copper plating treatment.

Claims (1)

【特許請求の範囲】[Claims] 1.多層プリント配線板の製造工程における内層材用銅
張積層板の内層回路形成後に内層銅パターン部表面処理
を施こす工程が、前記銅パターン部を酸化処理(1)し
、次に、無電解めっき用前処理(3)を施こし、そして
無電解銅めっき処理(4)を施こすことからなることを
特徴とする多層プリント配線板の製造方法。
1. In the manufacturing process of a multilayer printed wiring board, the step of surface-treating the inner layer copper pattern portion after forming the inner layer circuit of the copper-clad laminate for inner layer material includes oxidizing the copper pattern portion (1), and then electroless plating. 1. A method for manufacturing a multilayer printed wiring board, which comprises performing a pretreatment (3) and an electroless copper plating treatment (4).
JP14849990A 1990-06-08 1990-06-08 Manufacturing of multi-layer printed circuit board Pending JPH0444295A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14849990A JPH0444295A (en) 1990-06-08 1990-06-08 Manufacturing of multi-layer printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14849990A JPH0444295A (en) 1990-06-08 1990-06-08 Manufacturing of multi-layer printed circuit board

Publications (1)

Publication Number Publication Date
JPH0444295A true JPH0444295A (en) 1992-02-14

Family

ID=15454125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14849990A Pending JPH0444295A (en) 1990-06-08 1990-06-08 Manufacturing of multi-layer printed circuit board

Country Status (1)

Country Link
JP (1) JPH0444295A (en)

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