JPH0445030Y2 - - Google Patents
Info
- Publication number
- JPH0445030Y2 JPH0445030Y2 JP11237888U JP11237888U JPH0445030Y2 JP H0445030 Y2 JPH0445030 Y2 JP H0445030Y2 JP 11237888 U JP11237888 U JP 11237888U JP 11237888 U JP11237888 U JP 11237888U JP H0445030 Y2 JPH0445030 Y2 JP H0445030Y2
- Authority
- JP
- Japan
- Prior art keywords
- base
- heater
- support
- heating device
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 39
- 239000012212 insulator Substances 0.000 claims description 7
- 238000001513 hot isostatic pressing Methods 0.000 claims description 5
- 238000005452 bending Methods 0.000 claims description 3
- 238000002844 melting Methods 0.000 description 12
- 230000008018 melting Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B30—PRESSES
- B30B—PRESSES IN GENERAL
- B30B11/00—Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses
- B30B11/001—Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses using a flexible element, e.g. diaphragm, urged by fluid pressure; Isostatic presses
- B30B11/002—Isostatic press chambers; Press stands therefor
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Powder Metallurgy (AREA)
Description
【考案の詳細な説明】
(産業上の利用分野)
本発明は、熱間等方加圧装置の加熱装置に係
り、より具体的には加熱装置のうち、とくに、ベ
ースヒータを改良したものに関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a heating device for a hot isostatic pressurizing device, and more specifically relates to a heating device that is an improved base heater. .
(従来の技術)
1000〜2000Kg f/cm2にも達するガス圧力下
で、被処理体を数百〜2000℃もの高温にして圧縮
処理する技術は、熱間等方加圧法(Hot
Isostatic pressing、以下HIPと略す)と呼ばれ、
ガス圧をもちいるために被処理体が大形あるいは
異形であるとを問わず、内部まで均一に圧縮さ
れ、高温であることとあいまつて、真密度化にき
わめて有効なものとして、1960年代に工業化され
ている。(Prior technology) The hot isostatic pressing method (Hot
Isostatic pressing (hereinafter abbreviated as HIP)
Since gas pressure is used, the object to be processed can be compressed evenly to the inside, regardless of whether it is large or irregularly shaped.Coupled with the high temperature, it was developed in the 1960s as an extremely effective method for achieving true densification. It is industrialized.
この装置の要部を第5図を参照して概説する
と、高圧容器1の上下開口部1A,1Bにはそれ
ぞれ該高圧容器1を密封すると共にその内部圧力
による軸力を担持するための上蓋2と下蓋3とが
装着されている。上下蓋の外端面にはプレスフレ
ーム4に開設された方形開口部4Aが着脱自在に
装着され、前記軸力が上下蓋を介して担持され
る。 To outline the main parts of this device with reference to FIG. 5, upper and lower openings 1A and 1B of the high-pressure container 1 each have upper lids 2 for sealing the high-pressure container 1 and supporting the axial force due to its internal pressure. and a lower cover 3 are attached. A rectangular opening 4A formed in the press frame 4 is removably attached to the outer end surfaces of the upper and lower lids, and the axial force is carried through the upper and lower lids.
被処理材9を下開口部1Bより高圧容器1内に
装入取出を行なうため、下蓋3はリング形状とさ
れた外蓋3Aとこの外蓋3Aのリング開口部に挿
嵌される挿脱自在な内蓋3Bとからなる組合形と
されている。 In order to load and unload the material 9 into the high-pressure container 1 through the lower opening 1B, the lower lid 3 has a ring-shaped outer lid 3A and an insertion/removal mechanism that is inserted into the ring opening of the outer lid 3A. It is a combination type consisting of a freely movable inner lid 3B.
高圧容器1内には倒立コツプ形状の断熱層5が
配置されており、この断熱層5で画成される処理
室6には正の抵抗温度係数を有する加熱要素7が
配置されている。 An inverted cup-shaped heat insulating layer 5 is disposed within the high-pressure vessel 1, and a heating element 7 having a positive temperature coefficient of resistance is disposed in a processing chamber 6 defined by this insulating layer 5.
下蓋3の外蓋3Aには、被処理材9を載置する
と共に前記加熱要素7と共に被処理材9を下方よ
り加熱するためのベース加熱装置8が備えられて
いる。 The outer lid 3A of the lower lid 3 is provided with a base heating device 8 on which the material to be processed 9 is placed and which, together with the heating element 7, heats the material to be processed 9 from below.
そして、前記加熱装置8に載置された被処理材
9は、上蓋2側から供給される高圧のガス媒体と
加熱要素7及び加熱装置8による高温加熱とによ
つて、高温下で等方的に加圧成形される。尚、加
熱要素7は設けられない場合もある。 The material to be treated 9 placed on the heating device 8 is isotropically heated at high temperature by the high-pressure gas medium supplied from the upper lid 2 side and high-temperature heating by the heating element 7 and heating device 8. Pressure molded. Note that the heating element 7 may not be provided.
前記加熱装置8の一例を第6図に示す。該加熱
装置8は、基台12に断熱体13および支持板1
4を介して立設された筒状支持体15の上端に載
板16を備えた支持台11と、前記筒状支持体1
5の外周に備えられた円筒状ヒータ10とで構成
されている。前記ヒータ10は、帯板状金属発熱
体が上下方向に繰り返し屈曲して円筒状に形成さ
れたものである。 An example of the heating device 8 is shown in FIG. The heating device 8 includes a heat insulator 13 and a support plate 1 on a base 12.
a support stand 11 having a mounting plate 16 on the upper end of a cylindrical support 15 erected through the cylindrical support 1;
5 and a cylindrical heater 10 provided on the outer periphery of the heater. The heater 10 is formed into a cylindrical shape by repeatedly bending a band-shaped metal heating element in the vertical direction.
その展開図を第7図に示すが、上下方向に配置
された鉛直部17が上部屈曲部18Aおよび下部
屈曲部18Bを介して周方向に並設され、両端に
端子部19,19が設けられている。 A developed view of the structure is shown in FIG. 7, and vertical parts 17 arranged in the vertical direction are arranged in parallel in the circumferential direction via an upper bent part 18A and a lower bent part 18B, and terminal parts 19 are provided at both ends. ing.
前記ヒータ10は、支持板14に載置され、そ
の上下端が載板16の下面および支持板14上面
に形成された周溝20,20に絶縁体21を介し
て位置決め保持されている。22,23は、高圧
ガス媒体流通用の貫通孔である。尚、このベース
加熱装置は特開昭61−168781号に開示されたもの
である。 The heater 10 is mounted on a support plate 14, and its upper and lower ends are positioned and held in circumferential grooves 20, 20 formed on the lower surface of the mounting plate 16 and the upper surface of the support plate 14 via an insulator 21. 22 and 23 are through holes for high pressure gas medium circulation. This base heating device is disclosed in Japanese Patent Application Laid-Open No. 168781/1983.
(考案が解決しようとする課題)
前記円筒状ヒータ10を形成する発熱体は、
Mo(融点2620℃)、Ta(同2996℃)、W(同3410
℃)、Nb(同2497℃)等の超高融点金属で形成さ
れており、従来、融点より1000℃程度低い温度で
使用されていた。(Problem to be solved by the invention) The heating element forming the cylindrical heater 10 is:
Mo (melting point 2620℃), Ta (melting point 2996℃), W (melting point 3410℃)
It is made of ultra-high melting point metals such as Nb (2497°C) and Nb (2497°C), and has traditionally been used at temperatures about 1000°C lower than its melting point.
しかし、近年、より高温でのHIP処理が要望さ
れており、融点より、200℃程度低い温度で使用
されるに及んでいる。 However, in recent years, there has been a demand for HIP treatment at higher temperatures, and it has come to be used at temperatures about 200°C lower than the melting point.
ところが、かかる高温で使用すると、前記ヒー
タ10がその鉛直部17で自重により座屈的に変
形屈曲し、著しい場合は保持溝20から外れると
いう問題がある。酸素を含有するガス媒体を使用
してHIPを行う場合、高温で耐酸化性の良好な金
属発熱材であるPt合金(融点約1800〜1950℃)
が使用されるが、融点下200℃程度で使用すると
自重によるクリープ変形が著しく、特に大きな問
題となつている。 However, when used at such high temperatures, there is a problem that the heater 10 may buckle and bend at its vertical portion 17 due to its own weight, and in severe cases may come off the holding groove 20. When performing HIP using a gas medium containing oxygen, Pt alloy is a metal heat generating material with good oxidation resistance at high temperatures (melting point approximately 1800-1950℃)
However, when used at temperatures below the melting point of about 200°C, creep deformation due to its own weight is significant, which is a particularly serious problem.
本考案はかかる問題に鑑みなされたもので、円
筒状ヒータを融点下200℃程度で発熱させても、
自重による変形がほとんど生じない熱間等方加圧
装置のベース加熱装置を提供することを目的とす
る。 The present invention was developed in view of this problem, and even if the cylindrical heater generates heat at about 200℃ below the melting point,
It is an object of the present invention to provide a base heating device for a hot isostatic pressing device that hardly undergoes deformation due to its own weight.
(課題を解決するための手段)
上記目的を達成するためになされた本考案のベ
ース加熱装置は、高圧容器の上下開口部に、該容
器を密封すると共にその内部圧力による軸力を担
持するための上蓋と下蓋とが装着され、下蓋には
被処理体を載置すると共に加熱するためのベース
加熱装置が備えられ、該加熱装置に載置される被
処理体を高圧ガス媒体により高温下で等方的に加
圧成形するための熱間等方加圧装置のベース加熱
装置において、前記加熱装置8Aは、基台32に
立設された筒状支持体33の上端に載板34が備
えられた支持台31と、前記筒状支持体33の外
周に発熱条体が上下方向に繰り返し屈曲して形成
された円筒状ヒータ10を備え、該ヒータ10は
基台32に立設されかつ耐熱絶縁物で形成された
ヒータ支持体37により懸垂状態で吊持されてい
ることを考案の構成とするものである。(Means for Solving the Problems) The base heating device of the present invention, which has been made to achieve the above object, is designed to seal the container at the upper and lower openings of a high-pressure container and to carry an axial force due to the internal pressure of the container. An upper lid and a lower lid are attached, and the lower lid is equipped with a base heating device for placing and heating the object to be processed, and the object to be processed placed on the heating device is heated to a high temperature by a high-pressure gas medium. In the base heating device of the hot isostatic pressing device for isotropically pressurizing the bottom, the heating device 8A has a mounting plate 34 on the upper end of the cylindrical support 33 erected on the base 32. A cylindrical heater 10 is provided, which is formed by repeatedly bending a heating strip in the vertical direction on the outer periphery of the cylindrical support 33, and the heater 10 is erected on the base 32. The device is also designed to be suspended in a suspended state by a heater support 37 made of a heat-resistant insulator.
(作用)
円筒状ヒータ10は、ヒータ支持体37により
懸垂状態で吊持されているので、該ヒータ10の
上下方向に形成された鉛直部17は自重を支える
必要がない。(Function) Since the cylindrical heater 10 is suspended by the heater support 37, the vertical portion 17 formed in the vertical direction of the heater 10 does not need to support its own weight.
従つて、該ヒータ10をその発熱体金属の融点
以下200℃程度で使用しても、前記鉛直部17に
座屈的変形は生じない。 Therefore, even if the heater 10 is used at a temperature of about 200° C. below the melting point of the heating element metal, no buckling deformation occurs in the vertical portion 17.
(実施例)
第1図および第2図は、第1実施例に係るベー
ス加熱装置8Aを示しており、被処理材を載置す
るための支持台31と、高温加熱するための既述
の円筒状ヒータ10とで構成されている。(Example) Fig. 1 and Fig. 2 show a base heating device 8A according to the first embodiment, which includes a support base 31 for placing the material to be treated, and a support base 31 for placing the material to be treated, and a base heating device 8A for heating at high temperature. It is composed of a cylindrical heater 10.
前記支持台31は、基台32と、基台32の中
心線に同心状に立設された筒状支持体33と、そ
の上端に装着された載板34とで構成されてい
る。前記基台32の上板32Aにはその中央部に
凹部が形成され、該凹部に前記筒状支持体33の
下端部が挿着されている。前記筒状支持体33は
アルミナ等の高融点酸化物セラミツクスで形成さ
れ、その内部には断熱材35が装入されている。 The support stand 31 is composed of a base 32, a cylindrical support 33 that stands concentrically on the center line of the base 32, and a mounting plate 34 attached to the upper end of the cylindrical support 33. A recess is formed in the center of the upper plate 32A of the base 32, and the lower end of the cylindrical support 33 is inserted into the recess. The cylindrical support 33 is made of a high melting point oxide ceramic such as alumina, and a heat insulating material 35 is placed inside the cylindrical support 33.
基台32には、リング状断熱体36を介して、
前記円筒状ヒータ10を筒状支持体33の回りに
懸垂状態で配設するためのヒータ支持体37が前
記筒状支持体33を内挿した状態で載置されてい
る。 The base 32 is provided with a ring-shaped heat insulator 36 .
A heater support 37 for disposing the cylindrical heater 10 in a suspended state around the cylindrical support 33 is placed with the cylindrical support 33 inserted therein.
該ヒータ支持体37は、筒状支持体33の挿通
孔を有するリング状基部38に、幅方向が放射方
向とされた状態で多数の支持板39が放射状に立
設されている。該支持板39の上面の外側縁近傍
位置にはヒータ10の上部屈曲部18Aを支持す
るためのスリツト40が形成されている。前記リ
ング状基部38と支持板39とはアルミナ等の高
融点電気絶縁材料で一体的に成形されたものであ
る。 The heater support 37 has a ring-shaped base 38 having an insertion hole in the cylindrical support 33, and a large number of support plates 39 radially arranged upright thereon with the width direction being the radial direction. A slit 40 for supporting the upper bent portion 18A of the heater 10 is formed near the outer edge of the upper surface of the support plate 39. The ring-shaped base 38 and the support plate 39 are integrally molded from a high melting point electrical insulating material such as alumina.
円筒状ヒータ10は、一対の鉛直部17の間に
前記支持板39が挿入される共に上部屈曲部18
Aがスリツト40に係合することによつて、ヒー
タ支持体37に懸垂状態で吊持されている。ま
た、下部屈曲部18Bが前記リング状基部38上
面に設けられた保持溝41に嵌装され、ヒータの
形状や姿勢が保持されている。 The cylindrical heater 10 has the support plate 39 inserted between a pair of vertical parts 17 and an upper bent part 18.
By engaging with the slit 40, A is suspended from the heater support 37. Further, the lower bent portion 18B is fitted into a holding groove 41 provided on the upper surface of the ring-shaped base 38, so that the shape and posture of the heater are maintained.
第3図および第4図は、本考案の第2実施例8
Bであり、第1実施例と同様の構成部分について
は同符号で示している。但し、円筒状ヒータ10
については、図示省略してある。第2実施例にお
いては、棒状のヒータ支持体37Aが2段積され
たリング状断熱体36A,36Bを上下方向に貫
通して基台32の上板32Aに挿着されており、
その上端にはヒータ10の上部屈曲部18Aを係
合支持するためのスリツト40Aが形成されてい
る。該ヒータ支持体37Aは、ヒータ10の上部
屈曲部18Aの数だけ上板32Aの外周部に挿着
されて立設され、上部屈曲部18Aを懸垂状態で
支持する。円筒状ヒータ10の下部屈曲部18B
は前記上段側の断熱体36Aの上面周方向に凹設
された保持溝41Aに嵌装される。 3 and 4 show the second embodiment 8 of the present invention.
B, and the same components as in the first embodiment are designated by the same reference numerals. However, the cylindrical heater 10
are omitted from the illustration. In the second embodiment, a rod-shaped heater support 37A vertically penetrates ring-shaped heat insulators 36A and 36B stacked in two stages and is inserted into the upper plate 32A of the base 32.
A slit 40A for engaging and supporting the upper bent portion 18A of the heater 10 is formed at its upper end. The heater supports 37A are inserted into and erected on the outer circumference of the upper plate 32A in the same number as the upper bent portions 18A of the heater 10, and support the upper bent portions 18A in a suspended state. Lower bent portion 18B of cylindrical heater 10
is fitted into a holding groove 41A recessed in the upper surface circumferential direction of the upper heat insulator 36A.
本考案に係るベース加熱装置8A,8Bが使用
される熱間等方加圧装置については従来通りであ
る。また、筒状支持体33、載板34について
は、従来と同様、高圧ガス媒体の連通用貫通孔を
適宜設けることができる。 The hot isostatic press device in which the base heating devices 8A and 8B according to the present invention are used is the same as the conventional one. Furthermore, the cylindrical support body 33 and the mounting plate 34 can be provided with appropriate through holes for communication of a high-pressure gas medium, as in the conventional case.
(考案の効果)
以上説明した通り、本考案のベール加熱装置
は、円筒状ヒータ10が基台32に立設されたヒ
ータ支持体37,37Aにより吊持され懸垂状態
で筒状支持体33の外周に配設されているので、
ヒータ10を高温状態で発熱使用しても、円筒状
ヒータ10の鉛直部17は自重を支えることな
く、この部分に座屈的変形による屈曲が生じず、
良好な使用状態を確保することができる。(Effects of the Invention) As explained above, in the bale heating device of the present invention, the cylindrical heater 10 is suspended by the heater supports 37, 37A erected on the base 32, and the cylindrical heater 10 is suspended from the cylindrical support 33. Since it is located on the outer periphery,
Even when the heater 10 is used to generate heat in a high temperature state, the vertical portion 17 of the cylindrical heater 10 does not support its own weight, and this portion does not bend due to buckling deformation.
Good usage conditions can be ensured.
第1図は第1実施例に係るベース加熱装置の部
分断面正面図、第2図は第1図A−A線断面図、
第3図は第2実施例に係る同装置の断面図、第4
図は第3図A−A線断面図、第5図はHIP装置の
断面説明図、第6図は従来のベース加熱装置の部
分断面図、第7図は円筒状ヒータの展開図を示
す。
8A,8B……ベース加熱装置、10……円筒
状ヒータ、31……支持台、32……基台、33
……筒状支持体、34……載板、37,37A…
…ヒータ支持体。
FIG. 1 is a partially sectional front view of the base heating device according to the first embodiment, FIG. 2 is a sectional view taken along line A-A in FIG. 1,
Figure 3 is a sectional view of the same device according to the second embodiment;
The figures are a sectional view taken along the line A--A in FIG. 3, FIG. 5 is a sectional explanatory view of the HIP device, FIG. 6 is a partial sectional view of a conventional base heating device, and FIG. 7 is a developed view of a cylindrical heater. 8A, 8B... Base heating device, 10... Cylindrical heater, 31... Support stand, 32... Base, 33
... Cylindrical support body, 34 ... Mounting plate, 37, 37A...
...Heater support.
Claims (1)
共にその内部圧力による軸力を担持するための上
蓋と下蓋とが装着され、下蓋には被処理体を載置
すると共に加熱するためのベース加熱装置が備え
られ、該加熱装置に載置される被処理体を高圧ガ
ス媒体により高温下で等方的に加圧成形するため
の熱間等方加圧装置のベース加熱装置において、 前記加熱装置8Aは、基台32に立設された筒
状支持体33の上端に載板34が備えられた支持
台31と、前記筒状支持体33の外周に発熱条体
が上下方向に繰り返し屈曲して形成された円筒状
ヒータ10を備え、該ヒータ10は基台32に立
設されかつ耐熱絶縁物で形成されたヒータ支持体
37により懸垂状態で吊持されていることを特徴
とする熱間等方加圧装置のベース加熱装置。[Claims for Utility Model Registration] Upper and lower lids are attached to the upper and lower openings of the high-pressure container to seal the container and to bear the axial force due to the internal pressure, and the lower lid holds the object to be processed. A base heating device is provided for placing and heating the base, and hot isostatic pressing is used to isotropically press and mold the workpiece placed on the heating device at high temperature using a high-pressure gas medium. In the base heating device of the device, the heating device 8A includes a support base 31 provided with a mounting plate 34 at the upper end of a cylindrical support 33 erected on a base 32, and a support base 31 provided with a mounting plate 34 on the upper end of a cylindrical support 33 set up on a base 32; It is equipped with a cylindrical heater 10 formed by repeatedly bending a heating strip in the vertical direction, and the heater 10 is suspended in a suspended state by a heater support 37 that is erected on a base 32 and made of a heat-resistant insulator. A base heating device for a hot isostatic press device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11237888U JPH0445030Y2 (en) | 1988-08-26 | 1988-08-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11237888U JPH0445030Y2 (en) | 1988-08-26 | 1988-08-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0234993U JPH0234993U (en) | 1990-03-06 |
| JPH0445030Y2 true JPH0445030Y2 (en) | 1992-10-22 |
Family
ID=31351262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11237888U Expired JPH0445030Y2 (en) | 1988-08-26 | 1988-08-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0445030Y2 (en) |
-
1988
- 1988-08-26 JP JP11237888U patent/JPH0445030Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0234993U (en) | 1990-03-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH079036Y2 (en) | Vertical heat treatment furnace | |
| KR100526276B1 (en) | Backup structure for a pipe for feeding a molten substance of high temperature and a supporting device for a thermal insulation material for surrounding the circumference of the pipe | |
| JPH0445030Y2 (en) | ||
| JPS6224237Y2 (en) | ||
| JPS6338885A (en) | High-pressure sintering furnace | |
| JPH0514158Y2 (en) | ||
| JPS61168781A (en) | High-temperature hydrostatic pressing device | |
| US1046887A (en) | Electric heating device. | |
| JPH06326081A (en) | Heating device for dry thin film processing equipment | |
| JPH0548077Y2 (en) | ||
| JPH0517599Y2 (en) | ||
| CN218495825U (en) | Tungsten-molybdenum high-temperature sintering furnace top heat shield | |
| JPH0526480Y2 (en) | ||
| CN2438724Y (en) | Vacuum coating film medium resistance heating evaporation boat active electrode | |
| JPS6323732A (en) | Oxidizing atmosphere oven | |
| JPH0123113Y2 (en) | ||
| JPH047180Y2 (en) | ||
| JPH09229561A (en) | Lateral pressurizing sintering furnace | |
| JPS6348789A (en) | Ceramic heater | |
| EP0434839B1 (en) | Oxidizing atmosphere hot isotropic press | |
| JPH0440158Y2 (en) | ||
| JP2003113405A (en) | Sintering device with electrification and pressurization | |
| JPH018955Y2 (en) | ||
| JPS6328192Y2 (en) | ||
| JPS6337739Y2 (en) |