JPH0447422B2 - - Google Patents

Description

Detailed Description of the Invention The present invention relates to beam processing in which processing such as drilling, welding, etching, plating, and heat treatment is performed by irradiating a processing part with a beam such as an ion beam, electron beam, plasma beam, or laser beam. Concerning improvements to equipment.

Conventionally, a constant DC high voltage is used as the main power source for generating a beam, such as an acceleration power source for accelerating electrons and ions, but in this case, the machining energy cannot be controlled with sufficient precision. It is also known that in a laser, energy stored in a capacitor is discharged into a discharge tube to cause laser oscillation. However, it is not possible to arbitrarily control the discharge of this condenser depending on the purpose. In beam machining, beam control is extremely important for machining performance, especially for precise machining, but until now, it has not been possible to adequately control either of these things.

The present invention provides a pulse power source comprising a pulse generating circuit that generates a unit pulse train having a constant pulse width and a pause width, and a circuit that arbitrarily sets and controls the number of output pulses and the number of pause pulses of the unit pulse. It is characterized by having the following.

The present invention will be described below with reference to an embodiment of the drawings. In FIG. 1, 1 is a filament constituting a cathode, 2 is a heating power source, 3 is a Wehnelt electrode for controlling electron emission, and 4 and 5 are filaments that constitute a cathode. An electrostatic lens electrode 6 is provided between the electrodes for electron acceleration. Reference numeral 7 denotes a beam focusing electromagnetic lens, which applies a focused beam spot to the workpiece 13 for processing.
8 is a pulse transformer, and the transformer output is rectified by a rectifier 9 and applied to the accelerating electrode. 10 is a DC power supply, 11
1 is a switch element that generates pulses by switching direct current, and 12 is a pulse generation circuit that generates control pulses.

The electron beam emitted from the cathode by heating the cathode filament 1 passes through the slit of the Wehnelt 3 and is accelerated and focused by the electrodes 4, 5, 6, focusing on the processing part of the workpiece 13. Of course, the atmosphere of this beam irradiation is evacuated to high vacuum by a vacuum pump. The object to be processed 13 is processed by melting, vaporizing, etc. with an accelerated electron beam, and in fine precision processing, energy control of the irradiation beam becomes important. Energy control is performed by controlling the number of pulses of the pulsed power source.

The details of the pulse generation circuit 12 are as shown in the embodiment shown in FIG. 2, where 121 is a pulse generation circuit that generates a unit pulse train, and 122 is the output pulse that sets and controls the number of output pulses and the number of pause pulses of the unit pulses. This is a control pulse generation circuit that generates a control pulse having a pulse width corresponding to the number of pulses and a pause width corresponding to the number of pause pulses.
3, a predetermined number of unit pulses are output with a pause width corresponding to the predetermined number of pulses, amplified by the amplifier 124, and the switch 1
Control 1. Since the pulse generating circuit 121 continues to generate pulses having a constant pulse width and rest width, energy control can be precisely controlled digitally by the number of pulses. That is, the pulse generation circuit 12
Since the output pulse of No. 1 and the output pulse of the control pulse generation circuit 122 are AND-combined by the AND circuit 123, a unit pulse is output for the on-pulse time of the output of the control pulse generation circuit 122, and the on-pulse width can be controlled. Therefore, the number of output pulses per unit pulse can be easily controlled.

Furthermore, the time width during which the unit pulse train is interrupted can be easily and precisely controlled by the output off-pulse time of the control pulse generation circuit 122. Since the number of output pulses of a unit pulse and the number of pause pulses are digitally controlled in this way, pulse control can be performed extremely easily and accurately, and can be controlled to any value.
Switch 11 is activated by the unit pulse output from 23.
The energy applied to the accelerating electrode by turning it on and off and boosted by the transformer 8 can be easily and precisely controlled by integral multiples of the unit pulse, and the beam energy can be controlled.
This allows precise control of irradiation processing.

Therefore, according to the device of the present invention, the irradiation energy of the processing part can be precisely controlled as desired, so that processing such as drilling, welding, etching, plating, heat treatment, etc. can always be finished accurately for the purpose. I can do it.

The pulse generation circuit 12 can arbitrarily control the number of pulses output by the unit pulse generation circuit 121 by counting the generation circuit pulses of the unit pulse generation circuit 121 with a counter and interrupting the unit pulse train every time a predetermined number is reached. Precise control possible. Further, the oscillation operation of the pulse generation circuit 121 that generates unit pulses may be controlled to be interrupted every predetermined number of output pulses, and the number of pause pulses of the unit pulses may also be controlled to a predetermined value by counting the unit pulses. can.

Furthermore, by providing the pulse power source, the present invention can easily control not only electron beams and ion beams but also plasma, laser, and other beams, and has the effect that beam processing using these beams can be performed accurately and with high performance.

[Brief explanation of the drawing]

FIG. 1 is a configuration diagram of an embodiment of the apparatus of the present invention, and FIG. 2 is a detailed diagram of a portion thereof. 1... Filament, 2... Wehnelt,
4, 5, 6...electrode, 8...transformer, 9...rectifier, 10...DC power supply, 11...switch, 12
... Pulse generation circuit, 13 ... Workpiece.

Claims (1)

[Claims] 1. In a beam processing device that processes a processing part by irradiating it with a high-energy beam, a pulse generation circuit that generates a unit pulse train having a constant pulse width and a pause width in a main power source that generates the high-energy beam; A beam device comprising a pulse power source including a circuit for arbitrarily setting and controlling the number of output pulses and the number of pause pulses of the unit pulses.