JPS58188043A - Beam processing device - Google Patents

Abstract

PURPOSE:To enable those beams of such as plasma and a laser as well as an electron beam and an ion beam to be controlled easily, thus making it possible to perform beam processing thereby with accuracy and a high performance, by providing a pulse power source. CONSTITUTION:An electron beam emitted from a cathode by heating a cathode filament 1 passes through a slit of a Wehnelt cylinder 3 to be focussed on the work part of an object to be processed 13. A pulse having a continuous specified pulse number is output by combining the output of an oscillation circuit 121 with that of the oscillation circuit 122 for pulse generation through an AND circuit 123 in order to control a switch 11 after amplifying it by an amplifier 124. The oscillation circuit 121 continues to generate the pulse having the prescribed width and half width so that the energy controll may be carried out digitally and accurately by means of said pulse number. That is to say the output pulse of the oscillation circuit 121 is bound with the output pulse of the oscillation circuit 122 through the AND circuit 123 so as to output a unit pulse so long as an on-pulse time of the output of the oscillation circuit 122 thus making it possible to easily control the unit pulse number through the control of impulse width.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to beam processing in which a processing part is irradiated with a beam such as an ion beam, an electron beam, a plasma beam, a laser beam, etc. to perform processing such as drilling, welding, etching, brating, heat treatment, etc. Concerning improvements to equipment.

Conventionally, a constant DC high voltage is used for the acceleration power source that generates the beam, such as electrons and ions.
In this case, processing energy cannot be controlled with sufficient precision. It is also known that in a laser, the energy stored in a capacitor is discharged into a discharge tube to cause laser oscillation.However, it is not possible to arbitrarily control the discharge of this condenser to suit the purpose.Beam Beam control is extremely important for machining performance, especially for precision machining, but in the past it has not been possible to adequately control either of these.

The present invention is characterized in that the power source is provided with a pulse power source that controls the number of unit pulses.

The present invention will now be described with reference to an embodiment of the drawings. In FIG. 1, 1 is a filament constituting a cathode, 2 is a heating power source, 3 is a Wehnelt electrode for controlling electron emission,
4 and 5 are electrodes for electron acceleration, and an electrode 6 for an electrostatic lens is provided between these electrodes.

Reference numeral 7 denotes a beam focusing electromagnetic lens, which applies a focused beam spot to the workpiece 13 for processing. 8 is a pulse transformer, and the transformer output is rectified by a rectifier 9 and applied to the accelerating electrode. 10 is a DC power supply, and 11 is a switching element that switches DC to generate pulses.

12 is a pulse generation circuit that generates control pulses.

The electron beam emitted from the cathode by heating the cathode filament 1 passes through the slits of Wehnelt 3 and passes through the electrodes 4.5.
The atmosphere of this beam irradiation is, of course, evacuated to a high vacuum by a vacuum pump. The workpiece 13 is processed by melting, evaporating, etc. with an accelerated electron beam, and controlling the energy of the irradiation beam becomes important in fine precision processing.

Energy control is performed by controlling the number of pulses of the pulsed power source.

The details of the pulse generation circuit 12 are shown in FIG. 2. 121 is an oscillation circuit that generates a unit pulse train, 122 is an oscillation circuit for pulse generation that controls the number of continuous pulses, and the outputs of both are combined by an AND circuit 123. By doing so, a pulse that continues for a predetermined number of pulses is outputted, amplified by the amplifier 124, and the switch 11 is controlled. Since the oscillation circuit 121 continues to generate pulses with a constant pulse width and pauses, the energy can be precisely controlled digitally depending on the number of pulses. The output horn pulse is A N l') circuit 123, which connects the note a4, so the oscillation circuit 1
The A pulse time j of the output of 22 is output, and the number of unit pulses can be easily controlled by the control during the A pulse.

The time +i+ during which the pulse train is interrupted can be easily and precisely controlled by the output pulse time of the oscillation circuit 122, thereby turning on the switch 11'A.

A] The energy 1 that is boosted and applied to the accelerating electrode can be easily and precisely controlled by the If device 8, and the energy 1 for B can be controlled (
This allows precise control of irradiation I.

According to the present invention! 4 N G;, the control of the irradiated J-flange J-1" can be arbitrarily and precisely controlled, so that fine cutting 1. Welding, [touching, braking] J ink.

Additions such as heat treatment, etc., to the target are always 11 - exactly 1 tithe.

The pulse generator 9 circuit 12 counts the 9 pulses generated by the oscillator circuit 121 with a /J counter, and each time it reaches a predetermined number, it counts the 9 pulses generated by the oscillation circuit 121 and outputs a single a).
Even if the pulse train is interrupted, the number of unit pulses can be controlled arbitrarily and precise control can be achieved. Further, the oscillation operation of the oscillation circuit 121 that generates a unit pulse may be controlled to be interrupted at a predetermined time or every time a pulse is generated, and any other arbitrary circuit can be used as the pulse generation circuit 12.

Furthermore, by providing the pulse power source, the present invention can be used not only for electron beams and ion beams, but also for plasma, Rayleigh, etc.
It is easy to control beams such as

[Brief explanation of drawings]

FIG. 1 is a block diagram of one embodiment of the apparatus of the present invention, and FIG. 2 is a detailed diagram of a portion thereof. ]......Filament 2...1-Nelt 4.5.6...Electrode 8... Transformer 9...... Rectifier 10... DC power supply 11... Switch 12... Pulse generating circuit 13・・・・・・
...liquid-addition-one-unit patent filed by Kiyoshi I1, representative of Citopax Research Institute, I1 Co., Ltd.

Claims (1)

[Claims] A beam processing device for processing a workpiece by irradiating a high-energy beam thereon, characterized in that the main power supply for generating the Hatake energy beam is provided with a pulse power supply for controlling the number of pulses per unit pulse. Device.