JPH0447955A - Thermal head manufacturing method - Google Patents

Thermal head manufacturing method

Info

Publication number
JPH0447955A
JPH0447955A JP2157963A JP15796390A JPH0447955A JP H0447955 A JPH0447955 A JP H0447955A JP 2157963 A JP2157963 A JP 2157963A JP 15796390 A JP15796390 A JP 15796390A JP H0447955 A JPH0447955 A JP H0447955A
Authority
JP
Japan
Prior art keywords
printing
electrode
thermal head
film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2157963A
Other languages
Japanese (ja)
Other versions
JP2507145B2 (en
Inventor
Yoshihiro Watanabe
善博 渡辺
Akiyoshi Hattori
章良 服部
Akihiko Yoshida
昭彦 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP15796390A priority Critical patent/JP2507145B2/en
Publication of JPH0447955A publication Critical patent/JPH0447955A/en
Application granted granted Critical
Publication of JP2507145B2 publication Critical patent/JP2507145B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To form a minute film, make the wiring resistance of an electrode small, the heating distribution uniform, make the heating efficiency, a constant at printing and non-printing, the printing quality excellent, and improve sticking characteristic of a full size facility MBB by using a paste containing organic gold compound and colloidal gold particles. CONSTITUTION:On an insulating substrate 1 consisting of an alumina substrate coated with a glaze layer, a paste containing organic gold compound and colloidal gold particles is printed and baked. A common gold electrode 2 and individual electrode 3 are formed by photolityography and a heat generating resistor 4 made of glass frit and RuO2 powder is formed thereon. Lastly, a glass paste is printed and baked so as to form an abrasion resistance layer 5. An electrode layer having a film of 0.5-1.0mum thick can be formed by printing and baking once. As a minute film is formed, the wiring resistance of the electrode becomes small and the heating distribution will be uniform. Also, the heating efficiency, a constant at printing and non-printing, and the print quality become excellent. Further, the degree of the surface roughness of the electrode layer is about 5 times the degree of a roughness which does not contain the colloidal gold particles. Furthermore, as the minute film can be formed, the sticking characteristic of the full size facility MBB will be improved.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はファクシミリ フルカラープリン久ワープロな
どの印字装置に用いるサーマルヘッドに関するものであ
り、特に印字品質の優れたサーマルヘッドに関すも 従来の技術 プリンタやファクシミリなどの感熱記録装置ζより−マ
ルヘッドを用しく g熱延あるいはインクシートと重ね
合わせた普通紙に対して感熱記録を行っていも 従来の
サーマルヘッド&友 アルミナ基板上番ζ ガラスグレ
ーズ層を形成し この基板上に共通電極 個別電極を交
互に配列されるように形成し この電極上に発熱抵抗体
を形成し 更に耐摩耗層を形成すも この成膜形成方法
に薄膜型および厚膜型がある力(電極 抵抗恢 耐摩耗
層の材料に違いはあるものへ 基板材料および構成はほ
ぼ同じであも 発明が解決しようとする課題 従来の厚膜型サーマルヘッド(友 グレーズ層を施した
絶縁基板へ 有機金化合物をペースト化したものを印刷
し焼成後フォトリソによりパターンを形成し その後抵
抗恢 耐摩耗層を形成すもこの電極に&よ 抵抗体を形
成する部分と、 IC実装を装着するためのものとして
も用いられも したがって、この両方を満足するような
電極層でなければならな(〜 しかし 従来の有機金化合物のペーストでは1回の印刷
の膜厚が約0.2μmと薄く配線抵抗が大きくなるの六
 数回重ね塗りを行っているのが現状であも この工程
3表  印刷−乾燥−焼成を1サイクルとしてこれを数
回繰り返さなければならな(〜したがってこの工数削減
が望まれているのが現状であム またIC実装はそれぞれの実装方法によって要求される
膜は違ってくるパ 特にMBB(マイクロバンプボンデ
ィング)実装を行う場合ζよ この電極の表面性では電
極とICとの密着性に問題があム 課題を解決するための手段 本発明ζ友 電極の形成において、 1回の形成で得る
電極の配線抵抗を小さくL  IC実装でも特にMBB
実装(マイクロバンプボンディング)に適した電極層を
提供するものであも また 本発明は絶縁基板上べ 少なくとも有機金化合物
と金のコロイド粒子を含むペーストを用いて形成された
電極層と、該電極と電気的に接続して形成された厚膜抵
抗体と、これを被覆した耐摩耗層からなることを特徴と
するサーマルヘッドであム さらに有機金化合物力丈 メルカプチド、スルホ樹脂酸
塩 アミン系の少なくとも1種からなり、有機金化合物
に対する金コロイド粒子の比が0゜1〜1であることを
特徴とするサーマルヘッドであム 作用 本発明によれは 1回の印刷焼成で膜厚が0.5〜1.
0μmの電極層を形成することかでま またち密な膜が
形成されるので電極の配線抵抗が小さくなり、発熱分布
が均一で、熱効取 印字ON、 OFF時定改 印字品
質の優れたものとなも さらにこの電極層の表面粗度ζよ 金のコロイド粒子を
入れないものよりも約5倍の表面粗度を有し しかもち
密な膜を形成できるのでMBB実装をしたときの密着性
の問題が解決できも実施例 第1図に本発明のサーマルヘッドの構成断面図を示す。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thermal head used in a printing device such as a facsimile, full-color print, word processor, etc., and particularly relates to a thermal head with excellent print quality. Compared to thermal recording devices such as ζ, a multi-head is used to form a glass glaze layer, even when thermal recording is performed on plain paper overlaid with a hot-rolled or ink sheet. On this substrate, common electrodes and individual electrodes are formed so as to be arranged alternately, a heating resistor is formed on these electrodes, and a wear-resistant layer is further formed.This film formation method has two types: thin film type and thick film type. The problem that the invention aims to solve even though the substrate material and structure are almost the same is that there are differences in the material of the wear-resistant layer (electrode resistance). A paste of organic gold compound is printed, and after firing, a pattern is formed by photolithography.Then, a resistance layer is formed on the electrode. Therefore, the electrode layer must satisfy both of these requirements (~ However, with conventional organic gold compound paste, the thickness of one printing is as thin as about 0.2 μm, and the wiring resistance is high. Naru no 6 Even though the current situation is to apply several coats of paint, this process must be repeated several times, with printing, drying, and firing as one cycle. The current situation is that the film required for IC mounting differs depending on the mounting method.Especially when performing MBB (micro bump bonding) mounting Means for Solving the Problems The present invention has the following advantages: In the formation of electrodes, the wiring resistance of the electrodes obtained in one formation can be reduced.
In addition to providing an electrode layer suitable for mounting (microbump bonding), the present invention also provides an electrode layer formed on an insulating substrate using a paste containing at least an organic gold compound and colloidal gold particles, and The thermal head is characterized by consisting of a thick film resistor electrically connected to the resistor, and a wear-resistant layer covering the resistor. According to the present invention, a thermal head consisting of at least one type of colloidal gold particles and characterized in that the ratio of colloidal gold particles to an organic gold compound is 0.1 to 1.0.degree. 5-1.
Forming a 0 μm electrode layer also forms a dense film, which reduces electrode wiring resistance, uniform heat generation distribution, and improves heat efficiency. Furthermore, the surface roughness of this electrode layer, ζ, is about 5 times that of a layer without gold colloid particles, and a dense film can be formed, which improves the adhesion during MBB mounting. Embodiment FIG. 1 shows a sectional view of the structure of the thermal head of the present invention.

アルミナ基板にグレーズ層を被覆した絶縁基板1 (A
4サイズ)凶 金の有機金化合物と金のコロイド粒子を
含むペーストを印肌 焼成しフォトリソにより金の共通
電極2、個別電極3を形成し その電極上にガラスフリ
ットとRuO2粉末の発熱抵抗体4を形成すも 最後に
ガラスペーストを印駄 焼成して耐摩耗層5を形成すも
本発明i1  第1図に示した構成の中で電極層材料に
特徴があるもので、構成およびその他の材料は本発明で
規制するものではなし 以下に本発明の具体的な実施例を示も (実施例−1) 上記電極層で、メルカプチットの有機金化合物(金含有
量20%)と金のコロイド粒子(金含有量80%)に樹
脂と溶剤を混合しペースト化したものを用いた 抵抗恢
 耐摩耗層を形成したのち64 bitのIC(27個
)をMBB実装し九(実施例−2) 実施例−1のメルカプチットの有機金化合物の代わりへ
 金のスルホ樹脂酸塩(金含有量18%)を用t、X、
その他実施例−1と同様にしてサーマルヘッドを作製し
九 (実施例−3) 実施例−1のメルカプチットの有機金化合物の代わりへ
 金のアミン系樹脂(金含有量18%)を用しX、その
他実施例−1と同様にしてサーマルヘッドを作製し九 (実施例−4) 実施例=1のメルカプチットの有機金化合物(金含有量
20%)と金のコロイド粒子(金含有量80%)の比を
代 0.2.0.4.0.6.0.8.1.0.1.2
.1.4と変えたものでそれぞれサーマルヘッドを作製
し九表に本発明の実施例によるサーマルヘッドの特性を
示も 本発明の実施例でζよ 有機金化合物に金のコロイド粒
子に混合させることにより、 1回の印!lL焼成で配
線抵抗の小さい電極層が形成することができ、金コロイ
ド粒子を0.2〜1.0の範囲で混合させることにより
IC実装の不良率を0にすることが出来た 発明の効果 以上記載のように 本発明は 有機金化合物と金のコロ
イド粒子を含むペーストを用いることにより、 1回の
印刷焼成で膜厚が0.5〜1.0μmに形成することが
でき、またち密な膜が形成されるので電極の配線抵抗が
小さくなり、発熱分布が均一で、熱効取 印字ON、 
OFF時定跣 印字品質の優れたものとなム さらにこの電極層の表面粗度は 金のコロイド粒子を入
れないものよりも約5倍の表面粗度を有するのでMBB
実装の密着性も向上できも
Insulating substrate 1 (A
A paste containing a gold organo-gold compound and gold colloidal particles is applied to the stamp, fired, and photolithographically formed to form gold common electrodes 2 and individual electrodes 3. On top of these electrodes, a heating resistor 4 made of glass frit and RuO2 powder is formed. Finally, the glass paste is stamped and fired to form the wear-resistant layer 5. This invention i1 Among the configurations shown in FIG. is not regulated by the present invention, and a specific example of the present invention is shown below (Example-1). After forming a wear-resistant layer using a paste made by mixing particles (gold content 80%) with resin and solvent, 64-bit ICs (27 pieces) were mounted using MBB (Example 2). Gold sulforesinate (gold content 18%) was used instead of the organic gold compound of mercaptite in Example-1.
In addition, a thermal head was prepared in the same manner as in Example-1 (Example-3). Gold amine resin (gold content 18%) was used instead of the organic gold compound of mercaptite in Example-1. X, otherwise a thermal head was prepared in the same manner as in Example 1 (Example 4). 0.2.0.4.0.6.0.8.1.0.1.2
.. Table 9 shows the characteristics of the thermal heads according to the embodiments of the present invention. By 1 mark! The effect of the invention was that an electrode layer with low wiring resistance could be formed by 1L firing, and that the defect rate of IC mounting could be reduced to 0 by mixing gold colloid particles in the range of 0.2 to 1.0. As described above, by using a paste containing an organic gold compound and colloidal gold particles, the present invention can form a film with a thickness of 0.5 to 1.0 μm in one printing and firing process, and can also form a dense film. Since a film is formed, the wiring resistance of the electrode is reduced, the heat generation distribution is uniform, and the heat effect is reduced.
OFF time setting The print quality is excellent.Furthermore, the surface roughness of this electrode layer is about 5 times that of a layer without gold colloid particles, so MBB
The adhesion of mounting can also be improved.

【図面の簡単な説明】[Brief explanation of drawings]

図は本発明の一実施例のサーマルヘッドの構成断面図で
あム ト・絶縁基板 2・・共通電板 3・・個別電極4・・
発熱抵抗体5・・耐摩耗凰
The figure is a cross-sectional view of the configuration of a thermal head according to an embodiment of the present invention.Insulating substrate 2...Common electric plate 3...Individual electrodes 4...
Heat generating resistor 5... wear-resistant 凰

Claims (3)

【特許請求の範囲】[Claims] (1)絶縁基板上に、少なくとも有機金化合物と金のコ
ロイド粒子を含むペーストを用いて形成された電極層と
、該電極と電気的に接続して形成された厚膜抵抗体と、
これを被覆した耐摩耗層からなることを特徴とするサー
マルヘッドの製造法。
(1) An electrode layer formed on an insulating substrate using a paste containing at least an organic gold compound and gold colloid particles, and a thick film resistor formed electrically connected to the electrode;
A method for manufacturing a thermal head characterized by comprising a wear-resistant layer covering the thermal head.
(2)有機金化合物が、メルカプチド、スルホ樹脂酸塩
、アミン系の少なくとも1種からなることを特徴とする
特許請求の範囲第1項記載のサーマルヘッドの製造法。
(2) The method for producing a thermal head according to claim 1, wherein the organic gold compound comprises at least one of mercaptide, sulforesinate, and amine.
(3)有機金化合物に対する金コロイド粒子の比が0.
2〜1であることを特徴とする特許請求の範囲第1項記
載のサーマルヘッドの製造法。
(3) The ratio of gold colloid particles to organic gold compound is 0.
2 to 1. The method for manufacturing a thermal head according to claim 1, wherein
JP15796390A 1990-06-15 1990-06-15 Thermal head manufacturing method Expired - Fee Related JP2507145B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15796390A JP2507145B2 (en) 1990-06-15 1990-06-15 Thermal head manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15796390A JP2507145B2 (en) 1990-06-15 1990-06-15 Thermal head manufacturing method

Publications (2)

Publication Number Publication Date
JPH0447955A true JPH0447955A (en) 1992-02-18
JP2507145B2 JP2507145B2 (en) 1996-06-12

Family

ID=15661276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15796390A Expired - Fee Related JP2507145B2 (en) 1990-06-15 1990-06-15 Thermal head manufacturing method

Country Status (1)

Country Link
JP (1) JP2507145B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7697020B2 (en) * 2004-11-04 2010-04-13 Rohm Co., Ltd. Thermal print head and method for manufacturing same
CN115315356A (en) * 2020-03-31 2022-11-08 京瓷株式会社 Thermal head and thermal printer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7697020B2 (en) * 2004-11-04 2010-04-13 Rohm Co., Ltd. Thermal print head and method for manufacturing same
CN115315356A (en) * 2020-03-31 2022-11-08 京瓷株式会社 Thermal head and thermal printer
CN115315356B (en) * 2020-03-31 2023-11-21 京瓷株式会社 Thermal head and thermal printer

Also Published As

Publication number Publication date
JP2507145B2 (en) 1996-06-12

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