JPH0448622U - - Google Patents
Info
- Publication number
- JPH0448622U JPH0448622U JP10538490U JP10538490U JPH0448622U JP H0448622 U JPH0448622 U JP H0448622U JP 10538490 U JP10538490 U JP 10538490U JP 10538490 U JP10538490 U JP 10538490U JP H0448622 U JPH0448622 U JP H0448622U
- Authority
- JP
- Japan
- Prior art keywords
- rotor
- chamber
- substrate
- peripheral wall
- centrifugal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 230000002209 hydrophobic effect Effects 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- 239000000463 material Substances 0.000 claims 1
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
第1図は請求項1に係る実施例装置の縦断正面
図、第2図はその変形実施例を示す要部縦断正面
図、第3図〜第5図は請求項2に係る実施例装置
を示し、第3図はその横断平面図、第4図はその
縦断正面図、第5図はその装置のチヤンバーを破
断して示す斜視図、第6図は従来例を示す縦断正
面図である。
1……遠心式チヤンバー、2……チヤンバー周
壁、2A……疎水性部材、3……吸気口、4,4
a……排気口、5……ロータ、7……回転駆動手
段、9……強制排気ブロア、10……クランプ装
置、W……基板。
FIG. 1 is a longitudinal sectional front view of the embodiment device according to claim 1, FIG. 2 is a longitudinal sectional front view of the main part showing a modified embodiment thereof, and FIGS. 3 to 5 are the embodiment device according to claim 2. 3 is a cross-sectional plan view thereof, FIG. 4 is a longitudinal sectional front view thereof, FIG. 5 is a perspective view showing a broken chamber of the device, and FIG. 6 is a vertical sectional front view showing a conventional example. 1...Centrifugal chamber, 2...Chamber peripheral wall, 2A...Hydrophobic member, 3...Intake port, 4,4
a...exhaust port, 5...rotor, 7...rotation drive means, 9...forced exhaust blower, 10...clamp device, W...substrate.
Claims (1)
タを回転自在に設け、ロータに付設したクランプ
装置でロータ内に収容した被処理基板を保持し、
当該ロータを回転駆動手段で回転させて、基板に
付着した水滴を液切りするように構成した横軸遠
心式乾燥装置において、 ロータを囲うようにチヤンバーの周壁を略円形
に形成し、チンヤンバー周壁の一側部に吸気口を
、他側部に排気口を開口し、 ロータの回転中心からチヤンバー周壁までの距
離を吸気口から排気口に亙り漸次大きく設定し、
ロータの回転方向に沿わせて強制排気するように
構成したことを特徴とする横軸遠心式基板乾燥装
置。 2 遠心式チヤンバーの上壁に吸気口を、チヤン
バーの下壁に排気口を開口して排気口より排水及
び強制排気するように構成し、チヤンバー内に両
軸受式横軸型のロータを回転自在に設け、ロータ
に付設したクランプ装置でロータ内に収容した被
処理基板を保持し、当該ロータを回転駆動手段で
回転させて、基板に付着した水滴を液切りするよ
うに構成した横軸遠心式乾燥装置において、 ロータを囲うようにチヤンバーの周壁を略円形
に形成し、チヤンバー周壁の内面を少なくともロ
ータの軸線方向長さに対応させて疎水性部材で構
成したことを特徴とする横軸遠心式基板乾燥装置
。[Scope of Claim for Utility Model Registration] 1. A double-bearing horizontal shaft type rotor is rotatably provided in a centrifugal chamber, and a substrate to be processed housed in the rotor is held by a clamping device attached to the rotor,
In a horizontal axis centrifugal drying device configured to rotate the rotor by a rotation drive means to remove water droplets attached to the substrate, the peripheral wall of the chamber is formed in a substantially circular shape to surround the rotor, and the peripheral wall of the chamber is formed in a substantially circular shape so as to surround the rotor. An intake port is opened on one side and an exhaust port is opened on the other side, and the distance from the rotation center of the rotor to the chamber peripheral wall is set to gradually increase from the intake port to the exhaust port,
A horizontal axis centrifugal substrate drying device characterized by being configured to perform forced exhaust along the rotational direction of a rotor. 2 The centrifugal chamber has an intake port on the upper wall, an exhaust port on the lower wall of the chamber, and is configured to drain water and force exhaust air from the exhaust port, and a double-bearing horizontal shaft type rotor is rotatable inside the chamber. A horizontal axis centrifugal type, which is equipped with a clamping device attached to the rotor to hold the substrate to be processed inside the rotor, and the rotor is rotated by a rotational drive means to remove water droplets adhering to the substrate. A horizontal axis centrifugal type drying device, characterized in that the peripheral wall of the chamber is formed into a substantially circular shape so as to surround the rotor, and the inner surface of the peripheral wall of the chamber is made of a hydrophobic material so as to correspond at least to the length in the axial direction of the rotor. Substrate drying equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990105384U JP2507468Y2 (en) | 1990-06-26 | 1990-10-05 | Horizontal axis centrifugal substrate dryer |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2-68249 | 1990-06-26 | ||
| JP6824990 | 1990-06-26 | ||
| JP1990105384U JP2507468Y2 (en) | 1990-06-26 | 1990-10-05 | Horizontal axis centrifugal substrate dryer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0448622U true JPH0448622U (en) | 1992-04-24 |
| JP2507468Y2 JP2507468Y2 (en) | 1996-08-14 |
Family
ID=31948658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990105384U Expired - Lifetime JP2507468Y2 (en) | 1990-06-26 | 1990-10-05 | Horizontal axis centrifugal substrate dryer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2507468Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06112186A (en) * | 1992-09-25 | 1994-04-22 | Dainippon Screen Mfg Co Ltd | Horizontal shaft rotating type substrate dryer |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101190U (en) * | 1982-12-23 | 1984-07-07 | 黒谷 信子 | Top lid of drain dryer |
| JPS59185590U (en) * | 1983-05-14 | 1984-12-10 | 黒谷 巌 | Top lid of drain dryer |
| JPH01255227A (en) * | 1988-04-04 | 1989-10-12 | Dainippon Screen Mfg Co Ltd | Rotary surface-treating apparatus for wafer |
| JPH0239531A (en) * | 1988-07-29 | 1990-02-08 | Tokyo Electron Ltd | Rotary processing equipment |
-
1990
- 1990-10-05 JP JP1990105384U patent/JP2507468Y2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101190U (en) * | 1982-12-23 | 1984-07-07 | 黒谷 信子 | Top lid of drain dryer |
| JPS59185590U (en) * | 1983-05-14 | 1984-12-10 | 黒谷 巌 | Top lid of drain dryer |
| JPH01255227A (en) * | 1988-04-04 | 1989-10-12 | Dainippon Screen Mfg Co Ltd | Rotary surface-treating apparatus for wafer |
| JPH0239531A (en) * | 1988-07-29 | 1990-02-08 | Tokyo Electron Ltd | Rotary processing equipment |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06112186A (en) * | 1992-09-25 | 1994-04-22 | Dainippon Screen Mfg Co Ltd | Horizontal shaft rotating type substrate dryer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2507468Y2 (en) | 1996-08-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |