JPH0366673U - - Google Patents
Info
- Publication number
- JPH0366673U JPH0366673U JP12653089U JP12653089U JPH0366673U JP H0366673 U JPH0366673 U JP H0366673U JP 12653089 U JP12653089 U JP 12653089U JP 12653089 U JP12653089 U JP 12653089U JP H0366673 U JPH0366673 U JP H0366673U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processed
- spin chuck
- substrate holder
- blowing means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図は本考案に係るスピンチヤツクの一実施
例を示すもので、正方形の基板に適用した場合の
平面図、第２図は要部の断面図、第３図は送風ダ
クトの斜視図、第４図は本考案の効果を説明する
ための基板の要部側面図、第５図は従来のスピン
チヤツクの平面図、第６図は同チヤツクの正面図
である。
２……基板保持具、３……基板、４……回転軸
、７……回転方向、８ａ〜８ｄ……基板の側面、
１３……送風ダクト、１４……吸気孔、１５……
排気孔、２０……空気流、２１……レジスト液。
Fig. 1 shows an embodiment of the spin chuck according to the present invention, which is a plan view when applied to a square substrate, Fig. 2 is a sectional view of the main part, Fig. 3 is a perspective view of the air duct, and Fig. 3 is a perspective view of the air duct. FIG. 4 is a side view of a main part of a substrate for explaining the effects of the present invention, FIG. 5 is a plan view of a conventional spin chuck, and FIG. 6 is a front view of the same chuck. 2...Substrate holder, 3...Substrate, 4...Rotation shaft, 7...Rotation direction, 8a to 8d...Side surface of substrate,
13...Blower duct, 14...Intake hole, 15...
Exhaust hole, 20...Air flow, 21...Resist liquid.
Claims (1)
して回転させ、その回転中に処理液を遠心力を利
用して前記被処理基板上に略均一に塗布するスピ
ンチヤツクにおいて、前記被処理基板の側面に上
向きの空気流を送風する送風手段を前記基板保持
具に設けたことを特徴とするスピンチヤツク。 (2) 請求項１記載のスピンチヤツクにおいて、
前記送風手段の吸気孔は前記基板保持具の回転方
向に開口していることを特徴とするスピンチヤツ
ク。[Claims for Utility Model Registration] (1) A substrate to be processed is placed approximately horizontally on a substrate holder and rotated, and during the rotation, a processing liquid is applied almost uniformly onto the substrate to be processed using centrifugal force. 1. A spin chuck for coating a substrate, characterized in that the substrate holder is provided with an air blowing means for blowing an upward air flow to a side surface of the substrate to be processed. (2) In the spin chuck according to claim 1,
A spin chuck characterized in that the air intake hole of the air blowing means is opened in the rotational direction of the substrate holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12653089U JPH0366673U (en) | 1989-10-31 | 1989-10-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12653089U JPH0366673U (en) | 1989-10-31 | 1989-10-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0366673U true JPH0366673U (en) | 1991-06-28 |
Family
ID=31674336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12653089U Pending JPH0366673U (en) | 1989-10-31 | 1989-10-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0366673U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011014588A (en) * | 2009-06-30 | 2011-01-20 | Ulvac Seimaku Kk | Coating device and air flow control plate |
-
1989
- 1989-10-31 JP JP12653089U patent/JPH0366673U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011014588A (en) * | 2009-06-30 | 2011-01-20 | Ulvac Seimaku Kk | Coating device and air flow control plate |
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