JPH0448627U - - Google Patents
Info
- Publication number
- JPH0448627U JPH0448627U JP1990067043U JP6704390U JPH0448627U JP H0448627 U JPH0448627 U JP H0448627U JP 1990067043 U JP1990067043 U JP 1990067043U JP 6704390 U JP6704390 U JP 6704390U JP H0448627 U JPH0448627 U JP H0448627U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- electrode structure
- semiconductor device
- film material
- mutual diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/29—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/59—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
- H10W72/942—Dispositions of bond pads relative to underlying supporting features, e.g. bond pads, RDLs or vias
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
- H10W72/953—Materials of bond pads not comprising solid metals or solid metalloids, e.g. polymers, ceramics or liquids
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/981—Auxiliary members, e.g. spacers
- H10W72/983—Reinforcing structures, e.g. collars
Landscapes
- Wire Bonding (AREA)
Description
第1図は本考案の一実施例を示すパツド電極構
造の構成図、第2図はパツド電極と一体の配線に
実施した場合の構成図、第3図は本考案の他の実
施例を示すバンプ電極構造の構成図、第4図は従
来のバンプ電極構造の構成図である。 1,11……Si基板、2,12……酸化膜、
3……A1膜、13……A1パツド、14……接
着層、15……バリヤメタル、5……Cu膜、6
……酸化防止用薄膜、13……A1パツド、16
……Cuバンプ、17……酸化防止用薄膜。
造の構成図、第2図はパツド電極と一体の配線に
実施した場合の構成図、第3図は本考案の他の実
施例を示すバンプ電極構造の構成図、第4図は従
来のバンプ電極構造の構成図である。 1,11……Si基板、2,12……酸化膜、
3……A1膜、13……A1パツド、14……接
着層、15……バリヤメタル、5……Cu膜、6
……酸化防止用薄膜、13……A1パツド、16
……Cuバンプ、17……酸化防止用薄膜。
Claims (1)
- 【実用新案登録請求の範囲】 (1) Cu薄膜を用いた電極構造において、前記
Cu薄膜上に耐酸化性、極薄膜性およびCuとの
相互耐拡散性を備えた薄膜材が形成されているこ
とを特徴とする半導体装置の電極構造。 (2) Cuを用いたバンプ電極構造において、前
記Cu表面に耐酸化性、極薄膜性およびCuとの
相互耐拡散性を備えた薄膜材が形成されているこ
とを特徴とする半導体装置の電極構造。 (3) 前記薄膜材が高融点金属材で形成されてい
る第1請求項または第2請求項記載の半導体装置
の電極構造。 (4) 前記薄膜材がA12O3,TiN、または
TiSi2,WSi2の化合物で形成されている
第1請求項または第2請求項記載の半導体装置の
電極構造。
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990067043U JPH0448627U (ja) | 1990-06-01 | 1990-06-25 | |
| US07/914,049 US5272376A (en) | 1990-06-01 | 1992-07-14 | Electrode structure for a semiconductor device |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5819990 | 1990-06-01 | ||
| JP1990067043U JPH0448627U (ja) | 1990-06-01 | 1990-06-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0448627U true JPH0448627U (ja) | 1992-04-24 |
Family
ID=31948589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990067043U Pending JPH0448627U (ja) | 1990-06-01 | 1990-06-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0448627U (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0878410A (ja) * | 1994-09-05 | 1996-03-22 | Mitsubishi Electric Corp | 配線接続部及びその製造方法 |
| JP2003503852A (ja) * | 1999-06-28 | 2003-01-28 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | 構造部材およびその製造方法 |
| WO2018015156A1 (en) * | 2016-07-19 | 2018-01-25 | Danfoss Silicon Power Gmbh | Electrical assembly comprising a metal body arranged on a semiconductor chip and a connecting material arranged between the semiconductor chip and the metal body and connecting them |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6020522A (ja) * | 1983-07-15 | 1985-02-01 | Hitachi Ltd | 半導体装置 |
| JPS62145758A (ja) * | 1985-12-16 | 1987-06-29 | ナシヨナル・セミコンダクタ−・コ−ポレ−シヨン | パラジウムを用いる銅製ボンデイングパツドの酸化防止法 |
-
1990
- 1990-06-25 JP JP1990067043U patent/JPH0448627U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6020522A (ja) * | 1983-07-15 | 1985-02-01 | Hitachi Ltd | 半導体装置 |
| JPS62145758A (ja) * | 1985-12-16 | 1987-06-29 | ナシヨナル・セミコンダクタ−・コ−ポレ−シヨン | パラジウムを用いる銅製ボンデイングパツドの酸化防止法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0878410A (ja) * | 1994-09-05 | 1996-03-22 | Mitsubishi Electric Corp | 配線接続部及びその製造方法 |
| JP2003503852A (ja) * | 1999-06-28 | 2003-01-28 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | 構造部材およびその製造方法 |
| WO2018015156A1 (en) * | 2016-07-19 | 2018-01-25 | Danfoss Silicon Power Gmbh | Electrical assembly comprising a metal body arranged on a semiconductor chip and a connecting material arranged between the semiconductor chip and the metal body and connecting them |
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