JPH0453548U - - Google Patents
Info
- Publication number
- JPH0453548U JPH0453548U JP9514990U JP9514990U JPH0453548U JP H0453548 U JPH0453548 U JP H0453548U JP 9514990 U JP9514990 U JP 9514990U JP 9514990 U JP9514990 U JP 9514990U JP H0453548 U JPH0453548 U JP H0453548U
- Authority
- JP
- Japan
- Prior art keywords
- ray
- crystal
- rowland circle
- radius
- curvature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 claims description 5
- 238000002441 X-ray diffraction Methods 0.000 claims 2
- 230000003595 spectral effect Effects 0.000 claims 1
- 238000000441 X-ray spectroscopy Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
第１図ないし第４図は本考案のＸ線分析装置の
実施例を示すもので、第１図はＸ線分光のための
Ｘ線源、分光結晶および焦点の位置関係を示す説
明図、第２図はＸ線源の平面図、第３図は第２図
の−図に沿う断面図、第４図はＸ線源の他の
変形例を示す平面図である。また、第５図はＸ線
分光の説明図、第６図はＸ線光電子分光装置（Ｘ
ＰＳ）で使用する解放形のＸ線源を示し、同図ａ
はその側面図、同図ｂはその平面図である。
Ｇ……分光結晶、Ｓ……ローランド円、Ｒ……
ローランド円の曲率半径、Ｏ……ローランド円の
中心、Ａ……球面、Ｂ……円錐、ｒ……円錐の底
面半径、Ｍ……円錐の底面の半径、ｆ……フイラ
メント、ｔ……ターゲツト、ｐ０〜ｐ１……Ｘ線
発生箇所、ｑ０〜ｑ２……焦点位置。
1 to 4 show an embodiment of the X-ray analyzer of the present invention. 2 is a plan view of the X-ray source, FIG. 3 is a sectional view taken along the line - in FIG. 2, and FIG. 4 is a plan view showing another modification of the X-ray source. Figure 5 is an explanatory diagram of X-ray spectroscopy, and Figure 6 is an X-ray photoelectron spectrometer (X
Figure a shows an open-type X-ray source used in PS).
is its side view, and figure b is its plan view. G...Spectroscopic crystal, S...Rowland circle, R...
Radius of curvature of Rowland circle, O...center of Rowland circle, A...sphere, B...cone, r...radius of the base of the cone, M...radius of the base of the cone, f...filament, t...target , p0 to p1 ...X-ray generation location, q0 to q2 ...focal point position.
Claims (1)
上に、Ｘ線源と、湾曲形の分光結晶とがそれぞれ
配置されてなるＸ線分析装置において、 前記分光結晶は、その結晶格子面がローランド
円に沿う方向とこれに直交する方向とにそれぞれ
同じ２Ｒの曲率半径をもつて湾曲形成され、かつ
、前記Ｘ線源を構成するターゲツトは、前記ロー
ランド円の中心と分光結晶とを結ぶ軸を回転中心
とした球面に内接する円錐の底面位置において、
該底面の半径ｒに一致するように円弧状に形成さ
れていることを特徴とするＸ線分析装置。[Claims for Utility Model Registration] An X-ray analyzer in which an X-ray source and a curved spectroscopic crystal are respectively arranged on one Rowland circle having a predetermined radius of curvature R, the spectroscopic crystal comprising: The crystal lattice plane is curved with the same radius of curvature of 2R in the direction along and perpendicular to the Rowland circle, and the target constituting the X-ray source is located at the center of the Rowland circle and the spectral At the bottom of a cone inscribed in a spherical surface whose rotation center is the axis connecting the crystal,
An X-ray analysis device characterized in that the X-ray analysis device is formed in an arc shape to match the radius r of the bottom surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9514990U JPH0453548U (en) | 1990-09-10 | 1990-09-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9514990U JPH0453548U (en) | 1990-09-10 | 1990-09-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0453548U true JPH0453548U (en) | 1992-05-07 |
Family
ID=31833650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9514990U Pending JPH0453548U (en) | 1990-09-10 | 1990-09-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0453548U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011122020A1 (en) * | 2010-03-31 | 2011-10-06 | 独立行政法人物質・材料研究機構 | X-ray irradiation device and analysis device |
-
1990
- 1990-09-10 JP JP9514990U patent/JPH0453548U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011122020A1 (en) * | 2010-03-31 | 2011-10-06 | 独立行政法人物質・材料研究機構 | X-ray irradiation device and analysis device |
| JP5550082B2 (en) * | 2010-03-31 | 2014-07-16 | 独立行政法人物質・材料研究機構 | X-ray irradiation apparatus and analysis apparatus |
| US9080947B2 (en) | 2010-03-31 | 2015-07-14 | National Institute For Materials Science | X-ray irradiation device and analysis device |