JPH0454221Y2 - - Google Patents

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Publication number
JPH0454221Y2
JPH0454221Y2 JP399990U JP399990U JPH0454221Y2 JP H0454221 Y2 JPH0454221 Y2 JP H0454221Y2 JP 399990 U JP399990 U JP 399990U JP 399990 U JP399990 U JP 399990U JP H0454221 Y2 JPH0454221 Y2 JP H0454221Y2
Authority
JP
Japan
Prior art keywords
strip
edge
running
anodes
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP399990U
Other languages
Japanese (ja)
Other versions
JPH0396353U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP399990U priority Critical patent/JPH0454221Y2/ja
Publication of JPH0396353U publication Critical patent/JPH0396353U/ja
Application granted granted Critical
Publication of JPH0454221Y2 publication Critical patent/JPH0454221Y2/ja
Expired legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Description

【考案の詳細な説明】 「産業上の利用分野」 本案は走行ストリツプのメツキ装置におけるエ
ツジマスクに関するものである。
[Detailed Description of the Invention] "Industrial Application Field" The present invention relates to an edge mask in a running strip plating device.

「従来の技術」 メツキ設備においてはストリツプ幅方向の両端
部に大きな電流が流れ、両端部にメツキ量が集中
する。この現象は、極間が狭くなればなるほど顕
著になるため、極間の狭いアノードにおいて、
益々エツジマスクは必要不可欠となる。反面、極
間が狭くなるにつれてエツジマスクの挿入は困難
となると共に、形状の悪いストリツプやストリツ
プの蛇行によつて接触し破損する率は高くなる。
この問題については各種の研究がなされている
が、アノードとストリツプの間が15mm以下では困
難とされていた。
``Prior Art'' In plating equipment, a large current flows through both ends of the strip in the width direction, and the amount of plating is concentrated at both ends. This phenomenon becomes more pronounced as the electrode spacing becomes narrower, so for an anode with a narrow electrode spacing,
Edge masks are becoming more and more essential. On the other hand, as the spacing between the electrodes becomes narrower, it becomes more difficult to insert the edge mask, and the probability of contact and damage due to poorly shaped strips or meandering strips increases.
Various studies have been conducted on this problem, but it has been difficult to do so when the distance between the anode and the strip is less than 15 mm.

「考案が解決しようとする課題」 本願の考案はアノードの内面に極間を狭めるた
めの複数の絶縁突起(スタビライザー)を設けて
なる極間の狭い(5〜15mm位)ストリツプメツキ
装置において、ストリツプのエツジ部へのメツキ
量の集中を防止することを目的とするものであ
る。
``Problem to be solved by the invention'' The invention of the present application is a strip plating device with a narrow electrode gap (approximately 5 to 15 mm) in which a plurality of insulating protrusions (stabilizers) are provided on the inner surface of the anode to narrow the electrode gap. The purpose is to prevent the amount of plating from concentrating on the edges.

「課題を解決するための手段」 上記の目的を解決するため本案は 液槽内にアノードを対向配置し、対向アノード
間にストリツプを走行させ、該対向アノードの内
面にアノード側から走行方向に向かってストリツ
プ側に近接する傾斜面を有する複数の絶縁性突起
を設け、上記アノードとストリツプの間に電圧を
印加してストリツプの両面にメツキを行う設備
と、上記対向アノードの中間に1対の絶縁性ホー
ルダーを垂設し、該ホールダーにストリツプのエ
ツジ走行溝を有する複数の絶縁性エツジマスクを
備え、該マスクを上記突起の間隔部に配設してな
るエツジマスク エツジ走行溝の幅が絶縁性突起間の幅よりも広
い上記考案記載のエツジマスク によつて構成される。
``Means for Solving the Problems'' In order to solve the above-mentioned purpose, the present invention consists of arranging anodes facing each other in a liquid tank, running a strip between the facing anodes, and running a strip from the anode side to the inner surface of the facing anodes in the running direction. equipment for plating both sides of the strip by applying a voltage between the anode and the strip, and a pair of insulating protrusions located between the opposing anodes. An edge mask comprising a vertically disposed holder, a plurality of insulating edge masks having strip edge running grooves on the holder, and the masks being arranged between the protrusions; It is constructed by the edge mask described in the above invention whose width is wider than the width of the edge mask.

「作用」 従つてアノード2,2の間にストリツプ3を走
行させ、アノード2,2とストリツプ3との間に
電圧を印加して電流を導通させることによつてス
トリツプ3の両面にメツキを施すことができる。
走行するストリツプ3は対向する絶縁突起4,4
の間を走行する際上記傾斜面4′とストリツプ3
との間のメツキ液の作用によつて該ストリツプ3
は該突起4,4に接触することなく該突起4,4
間を通過するため対向アノード2,2間の間隔を
狭めることができる。そして上記突起4,4間の
ストリツプ走行方向aの間隔部tではストリツプ
3のエツジ部(耳部)3′,3′はエツジマスク
6,6のエツジ走行溝6′内を通過し、該溝6′は
絶縁体であるためエツジ部3′,3′へのメツキ量
集中が阻止され、ストリツプ3の幅方向の均等析
出が計られる。
``Operation'' Therefore, by running the strip 3 between the anodes 2, 2 and applying a voltage between the anodes 2, 2 and the strip 3 to conduct current, plating is applied to both sides of the strip 3. be able to.
The running strip 3 has opposing insulating projections 4, 4.
When running between the inclined surface 4' and the strip 3
The strip 3 is removed by the action of the plating liquid between
The projections 4, 4 without contacting the projections 4, 4
The space between the opposing anodes 2, 2 can be narrowed. At the interval t between the protrusions 4, 4 in the strip running direction a, the edge parts (ear parts) 3', 3' of the strip 3 pass through the edge running grooves 6' of the edge masks 6, 6, and the grooves 6 Since ' is an insulator, the amount of plating is prevented from concentrating on the edge portions 3', 3', and uniform deposition in the width direction of the strip 3 is achieved.

そしてアノード2,2間を走行するストリツプ
3のエツジ部3′は対向する上記突起4,4間の
幅よりも広いエツジ走行溝6′を通過することに
なる。
The edge portion 3' of the strip 3 running between the anodes 2, 2 passes through an edge running groove 6' which is wider than the width between the opposing projections 4, 4.

「実施例」 メツキ液槽1の上部に機枠7が設けられ、該機
枠7にアノード2,2と平行方向の水平案内杆8
を架設し、該案内杆8に上部を摺動自在に嵌合し
た雌螺子9,9に1組の正逆方向螺杆10,10
を回動自在に螺合し、該雌螺子9,9にそれぞれ
絶縁性板状ホールダー5,5の上端部を支持し、
該ホールダー5,5を上記アノード2,2の中間
部に垂設し、上記螺杆10,10の正逆回動によ
つて雌螺子9,9及びホールダー5,5を近接離
反させて横幅を調節することができる。上記アノ
ード2,2には対向内面に横方向に長い複数の絶
縁性突起4,4を縦方向に等間隔tに設けてスト
リツプ3の走行スタビライザーを形成する。この
突起4は上記アノード2の内面側からアノード
2,2間を走行するストリツプ3の走行方向aに
向つてストリツプ3側に近接する傾斜面4′を有
し、この傾斜面4′に沿つて連行されるメツキ液
が走行ストリツプ3を対向突起4,4間の中心部
に押圧案内し、そのためストリツプ3はほぼ正確
にアノード2,2間の中心線に沿つて走行するこ
ととなり、それによつて対向アノード2,2の極
間を5〜15mm位に保持することが可能である。上
記突起4,4は対向アノード2,2の内面に千鳥
位置に設けても差支えない。この狭い極間に上記
ホールダー5,5は垂設されるものであつて、該
ホールダー5,5に複数の絶縁性エツジマスク
6,6が等間隔tに設けられる。このエツジマス
ク6にが走行ストリツプ3のエツジ走行溝6′を
有するものであつて上記突起4,4の間隔部t即
ち突起4の無い部分に配設される。そしてこのエ
ツジマスク6のエツジ走行溝6′の幅sは上記対
向突起4,4間の幅sより広く形成することによ
つて形状の悪い部分やC形反りのあるストリツプ
3が走行しても上記エツジマスク6,6が破損す
ることはなく、又上記溝6′を深くすることによ
つてストリツプ3の蛇行や急激な板幅変化が起つ
てもエツジマスク6の破損は無い。上記溝6′の
深さ(ふところ)は100〜150mm、エツジ部3′の
走行深さを5mm前後に自動制御される。尚図中1
1で示すものは螺杆10,10の正逆回動用サー
ボモーター、12は中央部軸受、13はホールダ
ー支持台、14はエツジ部3′のセンサー、15
はストリツプ3の蛇行及び板幅コントローラであ
る。
``Example'' A machine frame 7 is provided on the upper part of the liquid tank 1, and a horizontal guide rod 8 is provided in the machine frame 7 in a direction parallel to the anodes 2, 2.
A pair of forward and reverse screw rods 10, 10 are attached to the female screws 9, 9 whose upper portions are slidably fitted to the guide rods 8.
are rotatably screwed together, and the upper ends of insulating plate-like holders 5, 5 are supported on the female screws 9, 9, respectively,
The holders 5, 5 are vertically disposed between the anodes 2, 2, and the female screws 9, 9 and the holders 5, 5 are moved toward and away from each other by forward and reverse rotation of the screw rods 10, 10 to adjust the width. can do. The anodes 2, 2 are provided with a plurality of horizontally elongated insulating protrusions 4, 4 at equal intervals t in the vertical direction on the opposing inner surfaces to form running stabilizers for the strip 3. This protrusion 4 has an inclined surface 4' which approaches the strip 3 side from the inner surface side of the anode 2 in the running direction a of the strip 3 running between the anodes 2, 2, and along this inclined surface 4'. The entrained plating liquid presses and guides the running strip 3 centrally between the opposing projections 4, 4, so that the strip 3 runs almost exactly along the center line between the anodes 2, 2, thereby It is possible to maintain the distance between the opposing anodes 2, 2 at about 5 to 15 mm. The protrusions 4, 4 may be provided in staggered positions on the inner surfaces of the opposing anodes 2, 2. The holders 5, 5 are vertically arranged between these narrow poles, and a plurality of insulating edge masks 6, 6 are provided on the holders 5, 5 at equal intervals t. This edge mask 6 has an edge running groove 6' of the running strip 3, and is disposed at the interval t between the projections 4, 4, that is, the part where the projection 4 is not present. By making the width s of the edge running groove 6' of this edge mask 6 wider than the width s between the opposing protrusions 4, 4, even if a poorly shaped portion or a strip 3 with a C-shaped curvature runs, The edge masks 6, 6 will not be damaged, and by making the grooves 6' deep, the edge mask 6 will not be damaged even if the strip 3 meanders or the strip width changes suddenly. The depth of the groove 6' is automatically controlled to be 100 to 150 mm, and the running depth of the edge portion 3' is approximately 5 mm. In addition, 1 in the figure
1 is a servo motor for forward and reverse rotation of the screw rods 10, 10, 12 is a center bearing, 13 is a holder support, 14 is a sensor on edge portion 3', 15
is the meandering and plate width controller of the strip 3.

「考案の効果」 本案は上述のように構成したので、上記スタビ
ライザーによつて極間を狭くした場合でも、エツ
ジマスク6,6を利用し得てストリツプ3のエツ
ジ部3′,3′のメツキ量集中を抑制し得る効果が
ある。
``Effect of the invention'' Since the present invention is constructed as described above, even if the gap between the poles is narrowed by the stabilizer, the edge masks 6, 6 can be used and the amount of plating on the edge portions 3', 3' of the strip 3 can be reduced. It has the effect of suppressing concentration.

又エツジ走行溝sの幅を対向突起4,4間の幅
より広く形成することによつて形状の悪いストリ
ツプやストリツプの蛇行によるエツジマスク6の
破損のおそれがない。
Furthermore, by forming the width of the edge running groove s wider than the width between the opposed projections 4, there is no risk of damage to the edge mask 6 due to poorly shaped strips or meandering strips.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本案のエツジマスクを示す正面図、第
2図は第1図A−A線による側面図、第3図は第
1図B−B線による平面図、第4図はエツジマス
クの斜視図、第5図は対向突起及びエツジ走行溝
の関係拡大平面図、第6図はエツジマスクを設け
ない状態のメツキ装置の斜視図である。 1……液槽、2……アノード、3……ストリツ
プ、a……走行方向、4……絶縁突起、4′……
傾斜面、5……ホールダー、6……エツジマス
ク、6′……エツジ走行溝、t……間隔部、s,
s……幅。
Fig. 1 is a front view showing the edge mask of the present invention, Fig. 2 is a side view taken along line A-A in Fig. 1, Fig. 3 is a plan view taken along line B-B in Fig. 1, and Fig. 4 is a perspective view of the edge mask. , FIG. 5 is an enlarged plan view of the relationship between the facing protrusion and the edge running groove, and FIG. 6 is a perspective view of the plating device without an edge mask. 1... Liquid tank, 2... Anode, 3... Strip, a... Running direction, 4... Insulating protrusion, 4'...
Inclined surface, 5... Holder, 6... Edge mask, 6'... Edge running groove, t... Spacing part, s,
s...Width.

Claims (1)

【実用新案登録請求の範囲】 (1) 液槽内にアノードを対向配置し、対向アノー
ド間にストリツプを走行させ該対向アノードの
内面にアノード側から走行方向に向かってスト
リツプ側に近接する傾斜面を有する複数の絶縁
性突起を設け、上記アノードとストリツプの間
に電圧を印加してストリツプの両面にメツキを
行う設備と、上記対向アノードの中間に1対の
絶縁性ホールダーを垂設し、該ホールダーにス
トリツプのエツジ走行溝を有する複数の絶縁性
エツジマスクを備え、該マスクを上記突起の間
隔部に配設してなるエツジマスク。 (2) エツジ走行溝の幅が絶縁性突起間の幅よりも
広い請求項(1)記載のエツジマスク。
[Claims for Utility Model Registration] (1) Anodes are disposed facing each other in a liquid tank, a strip is run between the facing anodes, and an inclined surface is provided on the inner surface of the facing anode, which approaches the strip side in the running direction from the anode side. equipment for plating both sides of the strip by applying a voltage between the anode and the strip; a pair of insulating holders vertically disposed between the opposing anodes; An edge mask comprising a holder including a plurality of insulating edge masks having strip edge running grooves, the masks being disposed at intervals between the protrusions. (2) The edge mask according to claim (1), wherein the width of the edge running groove is wider than the width between the insulating protrusions.
JP399990U 1990-01-20 1990-01-20 Expired JPH0454221Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP399990U JPH0454221Y2 (en) 1990-01-20 1990-01-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP399990U JPH0454221Y2 (en) 1990-01-20 1990-01-20

Publications (2)

Publication Number Publication Date
JPH0396353U JPH0396353U (en) 1991-10-02
JPH0454221Y2 true JPH0454221Y2 (en) 1992-12-18

Family

ID=31507773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP399990U Expired JPH0454221Y2 (en) 1990-01-20 1990-01-20

Country Status (1)

Country Link
JP (1) JPH0454221Y2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
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JP4537593B2 (en) * 2001-02-05 2010-09-01 新藤電子工業株式会社 TAB tape carrier warpage correction method
JP4663004B2 (en) * 2008-06-09 2011-03-30 不二熱学工業株式会社 Furnace rising type barley stone sauna equipment
JP4633823B2 (en) * 2008-06-09 2011-02-16 不二熱学工業株式会社 Heating furnace descending type barley stone sauna equipment

Also Published As

Publication number Publication date
JPH0396353U (en) 1991-10-02

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