JPH0457746B2 - - Google Patents

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Publication number
JPH0457746B2
JPH0457746B2 JP290884A JP290884A JPH0457746B2 JP H0457746 B2 JPH0457746 B2 JP H0457746B2 JP 290884 A JP290884 A JP 290884A JP 290884 A JP290884 A JP 290884A JP H0457746 B2 JPH0457746 B2 JP H0457746B2
Authority
JP
Japan
Prior art keywords
bath
magnetic
plating bath
mol
4πms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP290884A
Other languages
Japanese (ja)
Other versions
JPS60149785A (en
Inventor
Fumio Goto
Tetsuya Aisaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP290884A priority Critical patent/JPS60149785A/en
Publication of JPS60149785A publication Critical patent/JPS60149785A/en
Publication of JPH0457746B2 publication Critical patent/JPH0457746B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys
    • C23C18/50Coating with alloys with alloys based on iron, cobalt or nickel

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

産業䞊の利甚分野 本発明は、磁気蚘録媒䜓の膜厚方向の磁化によ
぀お蚘録を行う、いわゆる垂盎蚘録に甚いる磁気
蚘録媒䜓磁性膜を䜜補するめ぀き济に関する
ものである。 埓来技術 埓来、䞀般の磁気デむスク装眮、磁気テヌプ装
眮などの磁気蚘録装眮においおは、基板䞊に圢成
された磁気蚘録媒䜓にリング型磁気ヘツドによ぀
お氎平方向に磁化するこずにより蚘録を行な぀お
いる。 しかし、氎平磁化による蚘録には蚘録信号が短
波長になるに埓い、即ち蚘録密床の増加に埓぀
お、媒䜓内の反磁界が増倧しお残留磁化の枛衰ず
回転を生じ、再生出力が著しく枛少するずいう欠
点が存圚する。そこで、この問題解決のため短波
長になる皋反磁界が小さくなる性質をも぀垂盎蚘
録方匏が提案され、この垂盎蚘録に適した磁気蚘
録媒䜓ずしおは、膜厚に垂盎な方向に磁化容易軞
をも぀Co−Crスパツタ膜が提案されおいる。そ
しお、この垂盎磁化蚘録方匏は埓来の氎平方向の
磁化による蚘録方匏に比べお高密床蚘録に優れお
いるこずが報告されおいる。特開昭52−134706
号公報参照。ずころでCo−Cr膜をスパツタ法に
より䜜補する堎合、真空系内で行うため量産性に
問題がある。 このためこの様な補造䞊の問題点を改善しお量
産性に優れた無電解め぀き法により、膜面に垂盎
な方向に磁化容易軞をも぀磁気蚘録媒䜓を補造す
る無電解Co−Mn−め぀き济が芋い出されおい
る特願昭56−025833、特公昭63−38432号、
“無電解め぀き济”。䞀般に膜面に垂盎な方向に
磁化容易ずなる条件は、媒䜓の垂盎異方性磁界
Hkず枛磁界の最倧倀4πMsMsは飜和磁化の間
にHk4πMsの関係たたはHk4πMsの関係
があるこである。垂盎蚘録媒䜓においおは必ずし
もこの条件を満たす必芁はないが、Hk4πMs
であ぀おも倧きな倀をも぀皋垂盎磁化容易の条
件に近づいおいるため媒䜓特性ずしお奜たしいず
いえる。実際に蚘録媒䜓を甚いお蚘録密床特性を
枬定した結果によ぀おもこの傟向が瀺されおい
る。䟋えば、電子通信孊䌚技術研究報告、MR82
−221982幎10月15日では皮々の特性のCo−
スパツタ媒䜓にリングヘツドを甚いお垂盎蚘録を
行ない、Hk4πMs倀が倧きくなる皋限界蚘録密
床D50孀立波再生出力が1/2ずなる蚘録密床で、
媒䜓の蚘録密床の性胜を衚わす倀が増加するこ
ず、たたHk4πMs倀が0.5を䞋回るずD50が急激
に枛少するこずを瀺しおいる。この傟向は媒䜓の
皮類、蚘録再生条件が異なる堎合も同様の関係に
ある。しかし、前蚘無電解め぀き济においおは
−Co六方晶磁化容易軞が基板に察しお垂盎
配向した磁性膜が埗られるが、飜和磁化Msの䜎
䞋が少なく4πMsの倀が非垞に倧きくなるため垂
盎磁化蚘録の障碍ずなる。このためニツケルを共
析するこずにより特願昭56−155706、特公平
−62794号、“無電解め぀き济”、たたニツケ
ルに加えおレニりムを共析するこずにより1982
幎、金属衚面技術協䌚、第66回孊術講挔倧䌚講挔
芁旚集〜に掲茉されため぀き济、以䞋
AT济ずよぶMsの䜎䞋がはかられおいる。 ずころが、Co−Ni−Mn−磁性膜にレニりム
を共析するために無電解め぀き济にレニりムむオ
ンを添加した堎合、酒石酞ナトリりムを錯化剀ず
しお甚いたAT济においおはめ぀き济が著しく䞍
安定ずなり、磁気特性の䞍均䞀、䞋地基板による
䟝存、再珟性の劣化等を生じるずいう問題があ぀
た。AT济を甚いお磁気蚘録䜓䟋えば磁気デむス
クを䜜補する堎合、磁気特性の䞍均䞀のために䞀
呚の再生出力波圢゚ンベロヌプの䞀様性の䜎
䞋を招き、磁気特性の再珟性が劣り济寿呜が短い
ため䞀定力め぀き济から極く限られた少ない数量
しか埗られない等の欠点があ぀た。たた磁気特性
の基板䟝存性が倧きくPd觊媒を付䞎したポリむ
ミド基板䞊にくらべお金属基板を甚いた堎合
Hk4πMsは倧幅に枛少するずいう問題があ぀
た。 発明の目的 本発明の目的は、このような埓来の問題を改善
しお膜面に垂盎な方向に磁気蚘録するのに奜たし
い特性を均䞀に有する磁気蚘録媒䜓を安定に補造
できる無電解め぀き济を提䟛するこずにある。 発明の構成 本発明による無電解め぀き济は、金属むオンず
しお少なくずもコバルトむオン、ニツケルむオ
ン、マンガンむオン、レニりムむオン、添加剀ず
しお少なくずもこれら金属むオンの還元剀、PHç·©
衝剀、PH調節剀を含む氎溶液に、前蚘金属むオン
の錯化剀ずしお少なくずもマロン酞基、酒石酞基
およびタルトロン酞基が同時に加えられおいるこ
ずを特城ずしおいる。 発明の構成に関する説明 本発明者らは前述の問題を改善するためめ぀き
济組成に぀いお詳现に怜蚎した結果、次のこずが
明らかずな぀た。酒石酞ナトリりムを単独に錯化
剀ずしおいるAT济においおは、レニりム共析量
の増加が容易であるが、め぀き膜䞭にレニりムお
よびニツケルを安定に適切量を共析するこずが困
難であり、均䞀な特性の膜を再珟性よく埗るこず
ができない。Msが著しく枛少するがHkの枛少も
倧きい。基板によ぀おはHk4πMsが倧幅に枛少
する。他の錯化剀ずしおマロン酞ナトリりムを単
独に錯化剀ずしお甚いた堎合レニりムを増加しお
もHkは倧きな倀をも぀が、Msはそれ皋枛少しな
い。このためHk4πMsは小さな倀をずる。そこ
で酒石酞、マロン酞䞡方を同時に含む济を怜蚎し
たが、䞡者の特城を生かし奜たしい磁気特性を埗
るこずが困難であ぀た。しかし、これに曎にタル
トロン酞を加えた堎合、マロン酞ず酒石酞に有効
に䜜甚し、適圓な倧きさのHkの倀を保ち぀぀Ms
の倀を適床に枛少させお奜たしい磁気特性が埗ら
れる。たため぀き济䞭にマロン酞、酒石酞、タル
トロン酞を同時に含むこずにより、これら錯化剀
の盞互䜜甚により济䞭金属むオン濃床が適切に調
節される結果、め぀き济の安定性に寄䞎するこず
を芋い出した。 本発明はかかる知芋をもずになされたものであ
る。本発明によりめ぀き济の金属むオンが適切に
調節され、め぀き膜の組成が䞀定に保たれるこず
により、济の安定化ず膜特性の改善ず均䞀化がは
かれる。 本発明においお金属むオンずしお甚いられるコ
バルトむオン、ニツケルむオン、マンガンむオン
ずしおは、コバルト、ニツケルあるいはマンガン
の硫酞塩、塩化塩、酢酞塩などの可溶性塩を無電
解め぀き济䞭に溶解するこずによ぀お䟛絊され
る。コバルトむオンの濃床は、0.005〜1mol
の範囲が甚いられるが、奜たしくは0.01〜
0.15molの範囲である。ニツケルむオンの濃
床は、0.001〜0.5molの範囲が甚いられるが
奜たしくは0.005〜0.20molの範囲である。マ
ンガンむオンの濃床は、0.003〜2molの範囲
が甚いられるが奜たしくは0.02〜0.2molの範
囲である。レニりムむオンは過レニりム酞カリ、
過レニりム酞アンモニりムなどの可溶性塩により
䟛絊され、レニりムむオン濃床ずしお0.0001〜
0.1mol、奜たしくは0.001〜0.05molの範
囲が甚いられる。還元剀ずしおは次亜リン酞塩が
普通に甚いられるが、ヒドラゞン塩類、ホり氎玠
化物、ゞメチルアミンボランたたはその誘導䜓等
も甚いるこずができる。 PH緩衝剀ずしおはアンモニりム塩、炭酞塩、有
機酞塩などが䜿甚され、0.01〜2molの範囲
の濃床が甚いられる。 PH調節剀ずしおは、PHの䞊昇にはアンモニり
ム、氎酞化ナトリりムなどのアルカリが甚いら
れ、PHの降䞋には硫酞、塩酞などの酞が甚いられ
る。錯化剀ずしおのマロン酞基は、マロン酞たた
はマロン酞の可溶性塩によ぀お䟛絊され、0.05〜
2.5molの範囲の濃床が甚いられる。酒石酞
基は酒石酞たたは酒石酞の可溶性塩によ぀お䟛絊
され、0.02〜1.5molの範囲の濃床が甚いられ
る。タルトロン酞基はタルトロン酞たたはタルト
ロン酞の可溶性塩によ぀お䟛絊され、0.005〜
1.0molの範囲の濃床が甚いられるが、奜た
しくは0.01〜0.3molの範囲である。特にタル
トロン酞は各金属むオンの安定した析出に顕著な
効果を有するため他の錯化剀にくらべお小量の添
加で十分な効果が埗られるこずが特城である。 たた本発明の無電解め぀き济は、基板䟝存性が
少ないため金属たたは非金属の各皮基板に適甚で
きる。 以䞋、本発明による無電解め぀き济の特長を比
范䟋および実斜䟋により説明する。 比范䟋 アルミ合金基板内埄100mm、倖埄210mm䞊に非磁
性Ni−局をめ぀きし、その䞊に䞋蚘のめ぀き
济およびめ぀き条件にお膜厚0.5ÎŒmのCo−Ni−
Mn−Re−合金磁性膜を圢成した。 め぀き济 (1) 硫酞コバルト 0.06mol 硫酞ニツケル 0.04mol 硫酞マンガン 0.03mol 過レニりム酞アンモニりム 0.003mol 次亜リン酞ナトリりム 0.2mol 硫酞アンモニりム 0.5mol 酒石酞ナトリりム 0.5mol め぀き条件 め぀き济のPH9.2宀枩におNH4OHでPH調
節 め぀き济の枩床80℃ 次にこの䞊に珪酞モノマヌを回転塗垃し、190
℃で数時間焌成しお膜厚0.02ÎŒmの珪酞重合䜓を
䞻成分ずする保護膜を圢成した。 こうしお埗られた磁気デむスクを䞋蚘の条件で
蚘録再生特性の枬定を行぀たずころ、D50
30KFRPIの倀を埗た。 枬定条件 䜿甚ヘツド Mn−Znプラむト・リングヘツド ヘツドギダツプ長 0.3ÎŒm ヘツド浮䞊量 0.2ÎŒm しかし、䞀呚の再生出力に぀いおは最倧倀の1/
以䞋になる郚分が䞀呚党䜓の25以䞊もあり、
゚ンベロヌプの䞀様性においお実甚䞊問題があ぀
た。゚ンベロヌプにおいお出力が最倧ずなる郚分
の媒䜓特性はHk4πMs倀ずしお0.6であ぀たが、
出力が1/2ずなる箇所では0.5以䞋であり特性の䞍
均䞀が認められた。 め぀き济の寿呜に関しおは次の様にしお怜蚎を
行぀た。䞀定のめ぀き液容量100においお、
本比范䟋の前蚘手順ず同様にしお日に20枚づ぀
磁気デむスクのめ぀きを行ない、め぀き枚数ず磁
気特性の関係を調べた。金属塩および還元剀は、
各め぀き日に各成分の消費量盞圓分を補充した。
め぀き枚数20枚ごずのHk4πMsの倉化を第図
に瀺す。め぀き開始時のHk4πMsの倀は0.6で
あるが、め぀き枚数が増加するに埓぀お枛少し60
枚め぀きが終了した時点でのHk4πMsの倀は
0.5ずなり、曎にめ぀き枚数が増加するずHk
4πMsの倀は曎に枛少した。蚘憶媒䜓ずしお実甚
䞊蚱容されるHk4πMsの倀を0.5以䞊ずすれば、
前蚘め぀き济(1)から埗られる磁気デむスクの数量
以䞋济寿呜ずいうはめ぀き枚数60枚皋床でし
かないこずがわかる。 なおめ぀き济(1)は、济の安定性の点で最も奜た
しい組成を遞択した。−济においおは過レニ
りム酞アンモニりムおよび酒石酞ナトリりムの濃
床が、济の安定性および磁気特性に最も圱響す
る。過レニりム酞アンモニりムは、0.001mol
以䞋ではMsが倧きすぎ、0.008mol以䞊で
はめ぀き速床が䜎䞋し均䞀な析出が極めお困難で
あり、0.003molが最も奜たしか぀た。酒石
酞ナトリりム濃床は0.25mol以䞋では济分解
を生じやすく、0.75mol以䞊では均䞀な析出
が困難で济寿呜も短かくなり、安定性の点で
0.5molが最も奜たしか぀た。め぀き济(1)は
−济の䞭で奜適組成であるにもかかわらず、
本比范䟋で瀺された様に安定性、磁気特性の点で
問題があ぀た。 実斜䟋  比范䟋ず同様の手順で磁気デむスクを䜜補した
が、本実斜䟋では䞋蚘のめ぀き济を甚いた。 め぀き济 (2) 硫酞コバルト 0.06mol 硫酞ニツケル 0.08mol 硫酞マンガン 0.03mol 過レニりム酞アンモニりム 0.003mol 次亜リン酞ナトリりム 0.2mol 硫酞アンモニりム 0.5mol マロン酞ナトリりム 0.3mol 酒石酞ナトリりム 0.2mol タルトロン酞 0.05mol こうしお埗られた磁気デむスクを比范䟋ず同様
の条件で蚘録再生特性の枬定を行぀たずころ、
D5052KFRPIの倀を倀た。䞀呚の再生出力に぀
いおは、最倧倀の90以䞋になる郚分はなく、実
甚䞊十分良奜な゚ンベロヌプを瀺した。デむスク
䞀面内の媒䜓特性も均䞀であり、平均倀のHk
4πMs1.75に察し±0.05内のバラツキであ぀た。 め぀き济の寿呜を比范䟋ず同様にしお怜蚎した
結果、め぀き枚数によるHk4πMsの倉化ずしお
第図が埗られた。め぀き開始時のHk4πMsの
倀は1.75であり、め぀き枚数が増加するに埓぀お
枛少するが、220枚め぀きが終了した時点でも1.5
であり枛少床合は少ない。その埌は枛少床合が増
すがHk4πMsが0.5ずなるのはめ぀き枚数340枚
である。本実斜䟋では錯化剀ずしおマロン酞ナト
リりム、酒石酞ナトリりムおよびタルトロン酞を
甚いため぀き济を䜿甚するこずにより、比范䟋に
くらべお媒䜓特性、蚘録密床特性が著しく良奜か
぀均䞀な磁気デむスクを倚数枚埗るこずができ
た。 実斜䟋  比范䟋ず同様の手順で磁気デむスクを䜜補した
が、本実斜䟋では䞋蚘のめ぀き济を甚いた。 め぀き济 (3) 硫酞コバルト 0.06mol 硫酞ニツケル 0.10mol 硫酞マンガン 0.01mol 過レニりム酞アンモニりム 0.004mol 次亜リン酞ナトリりム 0.2mol 硫酞アンモニりム 0.4mol マロン酞ナトリりム
0.10.20.30.40.50.07mol 酒石酞ナトリりム 0.2mol タルトロン酞 0.10mol こうしお埗られた磁気デむスクのめ぀き開始時
のHk4πMsの倀ず济寿呜Hk4πMsが0.5以
䞋ずなるめ぀き枚数を第衚に瀺す。
(Field of Industrial Application) The present invention relates to a plating bath for producing a magnetic recording medium (magnetic film) used for so-called perpendicular recording, in which recording is performed by magnetization in the film thickness direction of the magnetic recording medium. (Prior Art) Conventionally, in magnetic recording devices such as general magnetic disk devices and magnetic tape devices, recording is performed by horizontally magnetizing a magnetic recording medium formed on a substrate using a ring-shaped magnetic head. It's summery. However, in recording using horizontal magnetization, as the wavelength of the recording signal becomes shorter, that is, as the recording density increases, the demagnetizing field within the medium increases, causing attenuation and rotation of the residual magnetization, resulting in a significant decrease in the reproduction output. There is a drawback. To solve this problem, a perpendicular recording method was proposed in which the demagnetizing field becomes smaller as the wavelength becomes shorter.A magnetic recording medium suitable for this perpendicular recording has an axis of easy magnetization perpendicular to the film thickness. A sputtered Co-Cr film has been proposed. It has been reported that this perpendicular magnetization recording method is superior to the conventional recording method using horizontal magnetization in high-density recording. (Unexamined Japanese Patent Publication No. 52-134706
(see publication). By the way, when a Co--Cr film is produced by sputtering, there is a problem in mass production because it is carried out in a vacuum system. For this reason, electroless Co-Mn- which manufactures a magnetic recording medium with an axis of easy magnetization perpendicular to the film surface by an electroless plating method that improves these manufacturing problems and is excellent in mass production. P-metal baths have been discovered (Patent Application No. 1983-025833, (Special Publication No. 38432-1981)),
“Electroless plating bath”). Generally, the condition for easy magnetization in the direction perpendicular to the film surface is the perpendicular anisotropic magnetic field of the medium.
There is a relationship between Hk and the maximum value 4πMs of the demagnetizing field (Ms is saturation magnetization) of Hk>4πMs or Hk/4πMs>1. Although it is not necessary to satisfy this condition for perpendicular recording media, Hk/4πMs
Even if it is 1, the larger the value, the closer it is to the conditions for easy perpendicular magnetization, so it can be said that it is preferable as a medium characteristic. This tendency is also shown by the results of measuring recording density characteristics using actual recording media. For example, IEICE technical research report, MR82
-22, October 15, 1982, Co-V with various characteristics
Perpendicular recording is performed on a sputtering medium using a ring head.
This shows that the value representing the recording density performance of the medium) increases, and that D 50 decreases rapidly when the Hk/4πMs value falls below 0.5. This tendency holds true even when the types of media and recording/reproducing conditions are different. However, in the electroless plating bath, a
Although a magnetic film in which -Co hexagonal crystals (easy axis of magnetization) are oriented perpendicular to the substrate can be obtained, the saturation magnetization Ms decreases little and the value of 4πMs becomes extremely large, which becomes an obstacle to perpendicular magnetization recording. For this purpose, by eutectoiding nickel (Japanese Patent Application 1982-155706, (Patent Publication No. 3-62794), "Electroless Plating Bath"), and by eutectoiding rhenium in addition to nickel (1982
The following is a bath published in Abstracts of the 66th Academic Conference of the Metal Surface Technology Association, P. 8-9 in 2013.
(called AT bath) is designed to reduce Ms. However, when rhenium ions are added to the electroless plating bath in order to eutectoid rhenium on the Co-Ni-Mn-P magnetic film, the plating bath becomes significantly unstable in the AT bath using sodium tartrate as a complexing agent. However, there were problems such as non-uniformity of magnetic properties, dependence on the underlying substrate, and deterioration of reproducibility. When producing a magnetic recording medium such as a magnetic disk using an AT bath, the uniformity of the reproduction output waveform (envelope) for one round decreases due to the non-uniformity of the magnetic properties, resulting in poor reproducibility of the magnetic properties and the lifespan of the bath. Because of the short length, there were drawbacks such as the fact that only a very limited amount could be obtained from a constant force plating bath. Also, the magnetic properties are more dependent on the substrate when using a metal substrate than on a polyimide substrate coated with a Pd catalyst.
There was a problem that Hk/4πMs decreased significantly. (Objective of the Invention) The object of the present invention is to improve the above conventional problems and to provide an electroless medium that can stably produce a magnetic recording medium having uniform properties suitable for magnetic recording in a direction perpendicular to the film surface. The purpose is to provide a soaking bath. (Structure of the Invention) The electroless plating bath according to the present invention contains at least cobalt ions, nickel ions, manganese ions, and rhenium ions as metal ions, and at least a reducing agent for these metal ions, a PH buffer, and a PH regulator as additives. It is characterized in that at least a malonic acid group, a tartaric acid group, and a tartronic acid group are simultaneously added to the aqueous solution containing the metal ion as a complexing agent. (Description of the Structure of the Invention) The present inventors conducted a detailed study on the plating bath composition in order to improve the above-mentioned problems, and as a result, the following became clear. In an AT bath that uses sodium tartrate as the sole complexing agent, it is easy to increase the amount of rhenium eutectoid, but it is difficult to stably eutectoid the appropriate amount of rhenium and nickel into the plated film. It is not possible to obtain a film with uniform characteristics with good reproducibility. Although Ms decreases significantly, Hk also decreases significantly. Depending on the substrate, Hk/4πMs decreases significantly. When sodium malonate is used alone as another complexing agent, Hk has a large value even if rhenium is increased, but Ms does not decrease much. Therefore, Hk/4πMs takes a small value. Therefore, a bath containing both tartaric acid and malonic acid was considered, but it was difficult to take advantage of the characteristics of both to obtain desirable magnetic properties. However, when tartronic acid is further added to this, it acts effectively on malonic acid and tartaric acid, and Ms.
Preferred magnetic properties can be obtained by appropriately reducing the value of . In addition, by simultaneously containing malonic acid, tartaric acid, and tartronic acid in the plating bath, the metal ion concentration in the bath is appropriately adjusted through the interaction of these complexing agents, which contributes to the stability of the plating bath. I found out. The present invention has been made based on this knowledge. According to the present invention, the metal ions in the plating bath are appropriately adjusted and the composition of the plating film is kept constant, thereby stabilizing the bath and improving and making the film properties uniform. Cobalt ions, nickel ions, and manganese ions used as metal ions in the present invention can be obtained by dissolving soluble salts of cobalt, nickel, or manganese such as sulfates, chlorides, and acetates in an electroless plating bath. supplied. The concentration of cobalt ion is 0.005 to 1 mol/
is used, preferably 0.01 to
It is in the range of 0.15 mol/. The concentration of nickel ions used is in the range of 0.001 to 0.5 mol/, preferably in the range of 0.005 to 0.20 mol/. The concentration of manganese ions is preferably in the range of 0.003 to 2 mol/, but preferably in the range of 0.02 to 0.2 mol/. Rhenium ion is potassium perrhenate,
Provided by soluble salts such as ammonium perrhenate, rhenium ion concentrations range from 0.0001 to
A range of 0.1 mol/, preferably 0.001 to 0.05 mol/ is used. Hypophosphites are commonly used as reducing agents, but hydrazine salts, borohydrides, dimethylamine borane or derivatives thereof, etc. can also be used. Ammonium salts, carbonates, organic acid salts, etc. are used as the PH buffer, and the concentration ranges from 0.01 to 2 mol/. As a pH regulator, an alkali such as ammonium or sodium hydroxide is used to increase the pH, and an acid such as sulfuric acid or hydrochloric acid is used to decrease the pH. The malonic acid group as a complexing agent is supplied by malonic acid or a soluble salt of malonic acid, with a range of 0.05 to
Concentrations in the range 2.5 mol/are used. The tartaric acid groups are provided by tartaric acid or soluble salts of tartaric acid, and concentrations in the range of 0.02 to 1.5 mol/l are used. The tartronic acid group is supplied by tartronic acid or a soluble salt of tartronic acid, and
Concentrations in the range 1.0 mol/are used, preferably in the range 0.01-0.3 mol/. In particular, tartronic acid has a remarkable effect on the stable precipitation of each metal ion, and is therefore characterized in that a sufficient effect can be obtained by adding a small amount compared to other complexing agents. Further, the electroless plating bath of the present invention has little dependence on the substrate, so it can be applied to various metal or non-metal substrates. Hereinafter, the features of the electroless plating bath according to the present invention will be explained using comparative examples and examples. (Comparative example) A non-magnetic Ni-P layer was plated on an aluminum alloy substrate with an inner diameter of 100 mm and an outer diameter of 210 mm, and a Co-Ni layer with a thickness of 0.5 ÎŒm was applied on top of the non-magnetic Ni-P layer using the following plating bath and plating conditions.
A Mn-Re-P alloy magnetic film was formed. Plating bath (1) Cobalt sulfate 0.06mol/ Nickel sulfate 0.04mol/ Manganese sulfate 0.03mol/ Ammonium perrhenate 0.003mol/ Sodium hypophosphite 0.2mol/ Ammonium sulfate 0.5mol/ Sodium tartrate 0.5mol/ Plating conditions Plating Bath PH9.2 (PH adjusted with NH 4 OH at room temperature) Plating bath temperature 80℃ Next, spin-coat silicic acid monomer on top of this,
C. for several hours to form a protective film with a thickness of 0.02 ÎŒm mainly composed of a silicic acid polymer. When the recording and reproducing characteristics of the thus obtained magnetic disk were measured under the following conditions, D 50 =
Obtained a value of 30KFRPI. Measurement conditions Head used Mn-Zn ferrite ring head Head gap length 0.3ÎŒm Head flying height 0.2ÎŒm However, the playback output for one revolution is 1/1 of the maximum value.
There are more than 25% of the entire cycle where the value is 2 or less.
There was a practical problem with the uniformity of the envelope. The medium characteristic of the part of the envelope where the output is maximum was Hk/4πMs value of 0.6,
At the point where the output was 1/2, it was less than 0.5, indicating non-uniformity of characteristics. The life of the plating bath was investigated as follows. At a constant plating solution (volume 100),
Twenty magnetic disks were plated per day in the same manner as in the procedure described above for this comparative example, and the relationship between the number of plated disks and the magnetic properties was investigated. Metal salts and reducing agents are
Each ingredient was replenished in an amount equivalent to the consumed amount on each plating day.
Figure 1 shows the change in Hk/4πMs for every 20 plated sheets. The value of Hk/4πMs at the start of plating is 0.6, but decreases as the number of sheets plated increases to 60
The value of Hk/4πMs at the end of plating is
0.5, and as the number of plated sheets increases further, Hk/
The value of 4πMs decreased further. If the value of Hk/4πMs that is practically acceptable as a storage medium is 0.5 or more,
It can be seen that the number of magnetic disks obtained from the plating bath (1) (hereinafter referred to as bath life) is only about 60 plated disks. The composition of the makeup bath (1) was selected to be the most preferable in terms of bath stability. In AT baths, the concentrations of ammonium perrhenate and sodium tartrate most affect the stability and magnetic properties of the bath. Ammonium perrhenate is 0.001mol/
If it is below, Ms is too large, and if it is 0.008 mol/ or more, the plating rate decreases and uniform precipitation is extremely difficult, so 0.003 mol/ is most preferred. If the concentration of sodium tartrate is less than 0.25 mol/, bath decomposition will easily occur, and if it is more than 0.75 mol/, uniform precipitation will be difficult and the bath life will be shortened, resulting in poor stability.
0.5 mol/was most preferred. Although the plating bath (1) has a preferable composition among the A-T baths,
As shown in this comparative example, there were problems with stability and magnetic properties. (Example 1) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (2) Cobalt sulfate 0.06mol / Nickel sulfate 0.08mol / Manganese sulfate 0.03mol / Ammonium perrhenate 0.003mol / Sodium hypophosphite 0.2mol / Ammonium sulfate 0.5mol / Sodium malonate 0.3mol / Sodium tartrate 0.2mol / Tartronic acid 0.05 mol / The recording and reproducing characteristics of the thus obtained magnetic disk were measured under the same conditions as in the comparative example.
The value of D 50 = 52KFRPI was calculated. Regarding the playback output for one round, there was no part where the playback output was less than 90% of the maximum value, indicating a sufficiently good envelope for practical use. The media characteristics within one surface of the disk are also uniform, and the average value Hk/
The variation was within ±0.05 for 4πMs=1.75. As a result of examining the life of the plating bath in the same manner as in the comparative example, Figure 2 was obtained as the change in Hk/4πMs depending on the number of plated sheets. The value of Hk/4πMs at the start of plating is 1.75, and decreases as the number of sheets plated increases, but it is still 1.5 at the end of plating 220 sheets.
Therefore, the degree of decrease is small. After that, the degree of decrease increases, but Hk/4πMs becomes 0.5 when the number of sheets plated is 340. In this example, by using a aging bath using sodium malonate, sodium tartrate, and tartronic acid as complexing agents, a large number of magnetic disks with significantly better and more uniform medium characteristics and recording density characteristics than in the comparative example were produced. I was able to get it. (Example 2) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (3) Cobalt sulfate 0.06mol / Nickel sulfate 0.10mol / Manganese sulfate 0.01mol / Ammonium perrhenate 0.004mol / Sodium hypophosphite 0.2mol / Ammonium sulfate 0.4mol / Sodium malonate
0.1, 0.2, 0.3, 0.4, 0.5, 0.07 mol / Sodium tartrate 0.2 mol / Tartronic acid 0.10 mol / Value of Hk/4πMs at the start of plating of the thus obtained magnetic disk and bath life (Hk/4πMs is 0.5 or less) Table 1 shows the number of plated sheets.

【衚】 比范䟋にくらべお本実斜䟋では、媒䜓特性およ
び济寿呜が著しく改善され、たた埗られた磁気デ
むスクの蚘録密床特性も良奜か぀均䞀であ぀た。 実斜䟋  比范䟋ず同様の手順で磁気デむスクを䜜補した
が、本実斜䟋では䞋蚘のめ぀き济を甚いた。 め぀き济 (4) 硫酞コバルト 0.07mol 硫酞ニツケル 0.12mol 硫酞マンガン 0.04mol 過レニりム酞アンモニりム 0.005mol 次亜リン酞ナトリりム 0.25mol 硫酞アンモニりム 0.5mol マロン酞ナトリりム 0.3mol 酒石酞ナトリりム
0.10.20.30.40.50.6mol タルトロン酞 0.04mol こうしお埗られた磁気デむスクのめ぀き開始時
のHk4πMsの倀ず济寿呜を第衚に瀺す。
[Table] Compared to the comparative example, in this example, the medium characteristics and bath life were significantly improved, and the recording density characteristics of the obtained magnetic disk were also good and uniform. (Example 3) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (4) Cobalt sulfate 0.07mol / Nickel sulfate 0.12mol / Manganese sulfate 0.04mol / Ammonium perrhenate 0.005mol / Sodium hypophosphite 0.25mol / Ammonium sulfate 0.5mol / Sodium malonate 0.3mol / Sodium tartrate
0.1, 0.2, 0.3, 0.4, 0.5, 0.6 mol/ tartronic acid 0.04 mol/ Table 2 shows the value of Hk/4πMs at the start of plating and the bath life of the magnetic disk thus obtained.

【衚】 比范䟋にくらべお本実斜䟋では、媒䜓特性およ
び济寿呜が著しく改善され、たた埗られた磁気デ
むスクの蚘録密床特性も良奜か぀均䞀であ぀た。 実斜䟋  比范䟋ず同様の手順で磁気デむスクを䜜補した
が、本実斜䟋では䞋蚘のめ぀き济を甚いた。 め぀き济 (5) 硫酞コバルト 0.07mol 硫酞ニツケル 0.09mol 硫酞マンガン 0.02mol 過レニりム酞アンモニりム 0.004mol 次亜リン酞ナトリりム 0.20mol 硫酞アンモニりム 0.5mol マロン酞ナトリりム 0.3mol 酒石酞ナトリりム 0.2mol タルトロン酞
0.010.020.030.050.070.09
0.15mol こうしお埗られた磁気デむスクのめ぀き開始時
のHk4πMsの倀ず济寿呜を第衚に瀺す。
[Table] Compared to the comparative example, in this example, the medium characteristics and bath life were significantly improved, and the recording density characteristics of the obtained magnetic disk were also good and uniform. (Example 4) A magnetic disk was produced in the same manner as in the comparative example, but the following plating bath was used in this example. Plating bath (5) Cobalt sulfate 0.07mol / Nickel sulfate 0.09mol / Manganese sulfate 0.02mol / Ammonium perrhenate 0.004mol / Sodium hypophosphite 0.20mol / Ammonium sulfate 0.5mol / Sodium malonate 0.3mol / Sodium tartrate 0.2mol / Tartronic acid 0, 0.01, 0.02, 0.03, 0.05, 0.07, 0.09,
0.15 mol/ Table 3 shows the value of Hk/4πMs at the start of plating and the bath life of the magnetic disk thus obtained.

【衚】 比范䟋にくらべお本実斜䟋では、媒䜓特性およ
び济寿呜が著しく改善され、たた埗られた磁気デ
むスクの蚘録密床特性も良奜か぀均䞀であ぀た。
タルトロン酞を添加するこずにより特性が著しく
改善され、タルトロン酞の顕著な効果が瀺され
た。 発明の効果 以䞊、比范䟋および実斜䟋で瀺された様に本発
明によれば、磁性膜を䜜補するめ぀き济におい
お、金属むオンずしお少なくずもコバルトむオ
ン、ニツケルむオン、マンガンむオン、レニりム
むオン、添加剀ずしお少なくずもこれら金属むオ
ンの還元剀、PH緩衝剀、PH調節剀を含む氎溶液に
前蚘金属むオンの錯化剀ずしお少なくずもマロン
酞基、酒石酞基およびコハク酞基を同時に含むこ
ずにより、垂盎蚘録媒䜓ずしお優れた特性を均䞀
に有する磁気蚘録䜓を安定に倚数埗るこずができ
る。 なお実斜䟋では金属むオンずしおコバルトむオ
ン、ニツケルむオン、マンガンむオン、レニりム
むオンのみを、添加剀ずしお還元剀、PH緩衝剀、
PH調節剀のみを、錯化剀ずしおマロン酞基、酒石
酞基、タルトロン酞基のみを含むめ぀き济に぀い
お述べたが、本発明の目的効果を損わない範囲に
おいお、光沢剀、励起剀、平滑剀、応力緩和剀、
ピンホヌル防止剀等ずしお前蚘以倖の金属むオ
ン、添加剀および錯化剀を加えるこずも可胜であ
る。
[Table] Compared to the comparative example, in this example, the medium characteristics and bath life were significantly improved, and the recording density characteristics of the obtained magnetic disk were also good and uniform.
The properties were significantly improved by adding tartronic acid, demonstrating the remarkable effect of tartronic acid. (Effects of the Invention) As shown above in the comparative examples and examples, according to the present invention, at least cobalt ions, nickel ions, manganese ions, and rhenium ions are added as metal ions in the plating bath for producing magnetic films. By simultaneously containing at least a malonic acid group, a tartaric acid group, and a succinic acid group as a complexing agent for the metal ions in an aqueous solution containing at least a reducing agent for these metal ions, a PH buffer, and a PH regulator as agents, it is possible to use a perpendicular recording medium. A large number of magnetic recording bodies having uniformly excellent properties can be stably obtained. In the examples, only cobalt ions, nickel ions, manganese ions, and rhenium ions were used as metal ions, and reducing agents, PH buffers, and additives were used as additives.
Although a plating bath containing only a PH regulator, a malonic acid group, a tartaric acid group, and a tartronic acid group as a complexing agent has been described, brighteners, stimulants, smoothing agents, etc. agent, stress reliever,
It is also possible to add metal ions, additives, and complexing agents other than those mentioned above as pinhole inhibitors and the like.

【図面の簡単な説明】[Brief explanation of the drawing]

第図は、比范䟋のめ぀き济を甚いお磁気デむ
スクを䜜補した堎合のめ぀き枚数によるHk
4πMsの倉化を瀺す図であり、第図は、実斜䟋
のめ぀き济を甚いた堎合の同様の図である。
Figure 1 shows Hk/ by the number of plated disks when magnetic disks were manufactured using the plating bath of the comparative example.
FIG. 2 is a diagram showing changes in 4πMs, and FIG. 2 is a similar diagram when the plating bath of Example 1 is used.

【特蚱請求の範囲】[Claims]

 耇数本の結束した鋌管を耇数の凊理槜に順次
浞挬しお所望の衚面凊理を行うに際し、 (a) 前蚘耇数の凊理槜を集玄か぀近接しお配眮
し、結束した鋌管はこれら凊理槜間を所定の経
路に沿぀お移動するこず、 (b) 結束した鋌管は各槜䜍眮で所定時間浞挬され
おから匕き䞊げられ液切りのため傟動されるこ
ず、 (c) 䞊蚘鋌管の移動、䞊䞋動及び傟動は、旋回か
぀昇降可胜で少なくずも぀のフツクに滑萜防
止抌えを有する耇数の鋌管保持甚圢フツクを
自動操䜜するこずによ぀お行われるこず、 からなるこずを特城ずする鋌管の衚面凊理方法。
1. When a plurality of bundled steel pipes are sequentially immersed in a plurality of treatment tanks to perform the desired surface treatment, (a) the plurality of treatment tanks are placed together and close together, and the bundled steel pipes are placed between these treatment tanks. (b) The bundled steel pipes are immersed for a predetermined time in each tank position, then lifted and tilted to drain the liquid; (c) The steel pipes are moved, vertically moved and A method for surface treatment of steel pipes, characterized in that the tilting is performed by automatically operating a plurality of L-shaped steel pipe holding hooks that can be rotated and raised and lowered, and at least one of the hooks has a slip-preventing foot. .

JP290884A 1984-01-11 1984-01-11 Electroless plating bath Granted JPS60149785A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP290884A JPS60149785A (en) 1984-01-11 1984-01-11 Electroless plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP290884A JPS60149785A (en) 1984-01-11 1984-01-11 Electroless plating bath

Publications (2)

Publication Number Publication Date
JPS60149785A JPS60149785A (en) 1985-08-07
JPH0457746B2 true JPH0457746B2 (en) 1992-09-14

Family

ID=11542452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP290884A Granted JPS60149785A (en) 1984-01-11 1984-01-11 Electroless plating bath

Country Status (1)

Country Link
JP (1) JPS60149785A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10784045B2 (en) 2015-09-15 2020-09-22 International Business Machines Corporation Laminated magnetic materials for on-chip magnetic inductors/transformers
ES2826441T3 (en) * 2017-06-02 2021-05-18 Atotech Deutschland Gmbh Nickel alloy electroless plating baths, a method of deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits

Also Published As

Publication number Publication date
JPS60149785A (en) 1985-08-07

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