JPH0458890B2 - - Google Patents
Info
- Publication number
- JPH0458890B2 JPH0458890B2 JP25288485A JP25288485A JPH0458890B2 JP H0458890 B2 JPH0458890 B2 JP H0458890B2 JP 25288485 A JP25288485 A JP 25288485A JP 25288485 A JP25288485 A JP 25288485A JP H0458890 B2 JPH0458890 B2 JP H0458890B2
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- measured
- semiconductor substrate
- measurement control
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 27
- 238000005259 measurement Methods 0.000 claims description 25
- 239000004065 semiconductor Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 239000003574 free electron Substances 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、レーザパワーを測定するレーザパワ
ー測定方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a laser power measuring method for measuring laser power.
(従来の技術)
従来のレーザパワーを測定するレーザパワーメ
ータは、第3図に示すように熱伝導性基板1の被
測定レーザ光2の照射側の面に黒化吸収面3を設
け、この黒化吸収面3に対して同心状に基板1に
熱電対4と冷却ジヤケツト5を設けた構造であつ
た。かかるレーザパワーメータでは、被測定レー
ザ光2を黒化吸収面3で熱エネルギーに変換し、
基板1の温度上昇を熱電対4で電気的に検出する
ことにより被測定レーザ光2のパワーの測定を行
つていた。(Prior art) As shown in FIG. 3, a conventional laser power meter for measuring laser power has a blackened absorption surface 3 provided on the surface of a thermally conductive substrate 1 on the side irradiated with the laser beam 2 to be measured. The structure was such that a thermocouple 4 and a cooling jacket 5 were provided on the substrate 1 concentrically with respect to the blackened absorption surface 3. In such a laser power meter, the laser beam 2 to be measured is converted into thermal energy by the blackened absorption surface 3,
The power of the laser beam 2 to be measured was measured by electrically detecting the temperature rise of the substrate 1 with a thermocouple 4.
(発明が解決しようとする問題点)
しかしながら、このようなレーザパワーの測定
の仕方では、パワーレベルが高くなると、大熱量
を扱うことになり、構造上の制約、冷却上の制
約、黒化吸収面3の耐久性等により設計が困難に
なり、安定な測定ができにくい問題点があつた。
例えば、銅製の厚さ10mmの基板1に69mmの内径で
冷却ジヤケツト5を設け、黒化吸収面3にビーム
径が40mmで5kwの被測定レーザ光2を入射させた
場合、基板1の中心の温度上昇は280℃になり、
黒化吸収面3が損傷される問題点があつた。基板
1の厚さを厚くすれば、温度上昇は少なくなる
が、誤差が発生し、また冷却ジヤケツト5の設計
上の点からも余り厚くはできない。(Problem to be solved by the invention) However, with this method of measuring laser power, as the power level increases, a large amount of heat is handled, and there are structural constraints, cooling constraints, and blackening absorption. The design was difficult due to the durability of surface 3, and there were problems in that it was difficult to perform stable measurements.
For example, when a cooling jacket 5 with an inner diameter of 69 mm is provided on a substrate 1 made of copper with a thickness of 10 mm, and a laser beam 2 to be measured with a beam diameter of 40 mm and a power of 5 kW is incident on the blackened absorption surface 3, the center of the substrate 1 The temperature rise will be 280℃,
There was a problem that the blackened absorbing surface 3 was damaged. If the thickness of the substrate 1 is increased, the temperature rise will be reduced, but errors will occur, and the cooling jacket 5 cannot be made too thick due to the design considerations.
本発明の目的は、黒化吸収面等の問題点を回避
して高出力のレーザパワーも容易に測定すること
ができるレーザパワー測定方法を提供することに
ある。 An object of the present invention is to provide a laser power measuring method that can easily measure even high-output laser power while avoiding problems such as a blackened absorption surface.
(問題点を解決するための手段)
上記の目的を達成するための本発明の手段を、
実施例に対応する第1図及び第2図を参照して説
明すると、本発明は被測定レーザ光2は透過させ
測定制御レーザ光7は吸収してその部分では前記
被測定レーザ光2を反射させる特性を有する半導
体基板6を用い、前記被測定レーザ光2が照射さ
れる位置に前記測定制御レーザ光7を照射し、前
記被測定レーザ光2が前記半導体基板6を経てセ
ンサ8に入射される時間を、前記測定制御レーザ
光7の照射時間を制御することにより制御するこ
とを特徴とする。(Means for solving the problems) The means of the present invention for achieving the above object are as follows:
The present invention will be explained with reference to FIGS. 1 and 2, which correspond to embodiments. The present invention transmits the laser beam 2 to be measured, absorbs the measurement control laser beam 7, and reflects the laser beam 2 to be measured at that portion. Using a semiconductor substrate 6 having a characteristic of The measurement control laser beam 7 is characterized in that the time for which the measurement control laser beam 7 is applied is controlled by controlling the irradiation time of the measurement control laser beam 7.
(作用)
このようにして測定を行うと、センサ8に入射
される被測定レーザ光2は、そのエネルギーに応
じて照射時間が短時間に制限され、従つてセンサ
8の温度上昇が抑制される。このため、高出力で
も支障なく測定できる。(Function) When measurement is performed in this way, the irradiation time of the laser beam 2 to be measured that is incident on the sensor 8 is limited to a short time according to its energy, and therefore the temperature rise of the sensor 8 is suppressed. . Therefore, even high output power can be measured without any problem.
(実施例)
以下本発明の実施例を図面を参照して詳細に説
明する。第1図は本発明の第1実施例を示したも
のである。本実施例では被測定レーザ光2の光路
に斜視させて半導体基板6を設置する。この半導
体基板6は、被測定レーザ光2は透過させ、測定
制御レーザ光7は吸収してその部分では自由電子
が発生し被測定レーザ光2を反射させる特性を有
する。このような半導体基板6としては、例えば
ゲルマニウム板を用いる。ゲルマニウムは、波長
が0.5〜1.5umでは吸収特性をもち、自由電子の発
生が大であり、波長が3〜15umでは透過特性を
もつているので、被測定レーザ光2としてはCO,
CO2レーザ光、測定制御レーザ光7としてはレビ
ーレーザ光やYAGレーザ光が適当である。測定
制御レーザ光7は、被測定レーザ光2が当たる半
導体基板路6の位置と同じ位置に、被測定レーザ
光2のビームスポツトと同じか或いはそれより大
きいビームスポツトで当たるようにする。被測定
レーザ光2が半導体基板6で反射し反射光が通る
光路上の位置にはセンサを配置して受光し、パワ
ーを電気的に検出し、これを増幅・表示器9で増
幅して表示させるようになつている。半導体基板
6を透過した被測定レーザ光2が通る光路上に
は、黒化吸収・冷却器10を配置し、不要レーザ
光を吸収させるようになつている。(Example) Examples of the present invention will be described in detail below with reference to the drawings. FIG. 1 shows a first embodiment of the present invention. In this embodiment, the semiconductor substrate 6 is placed obliquely in the optical path of the laser beam 2 to be measured. This semiconductor substrate 6 has a property of transmitting the laser beam 2 to be measured, absorbing the measurement control laser beam 7, and generating free electrons in that portion to reflect the laser beam 2 to be measured. As such a semiconductor substrate 6, for example, a germanium plate is used. Germanium has absorption characteristics at a wavelength of 0.5 to 1.5 um, and generates a large amount of free electrons, and has transmission characteristics at a wavelength of 3 to 15 um. Therefore, as the laser beam 2 to be measured, CO,
As the CO 2 laser light and the measurement control laser light 7, Lewy laser light and YAG laser light are suitable. The measurement control laser beam 7 is made to strike the same position of the semiconductor substrate path 6 where the laser beam 2 to be measured hits, with a beam spot that is the same as or larger than the beam spot of the laser beam 2 to be measured. The laser beam 2 to be measured is reflected by the semiconductor substrate 6, and a sensor is placed at a position on the optical path through which the reflected light passes to receive the light, electrically detect the power, and amplify and display it on the amplification/display unit 9. I'm starting to let them do it. A blackening absorber/cooler 10 is disposed on the optical path along which the laser beam 2 to be measured passes through the semiconductor substrate 6 to absorb unnecessary laser beams.
かかる状態で、測定制御レーザ光7はパルス状
として繰り返し半導体基板6に照射する。その同
じ半導体基板6上の位置に被測定レーザ光2を連
続的に照射する。かくすると、測定制御レーザ光
7が照射されている時は、その部分が半導体基板
6に自由電子が発生し、反射特性をもつようにな
つて被測定レーザ光2の一部を反射させる。この
反射された被測定レーザ光2をセンサ8で平均値
として検出し、その値を増幅・表示器9に表示さ
せる。測定制御レーザ光7が照射されていない時
は、被測定レーザ光2は半導体基板6を透過し、
黒化吸収・冷却器10で吸収され冷却される。測
定制御レーザ光7の照射時間を短かくすることに
より、センサ8に入射する被測定レーザ光2の平
均パワーを小さくすることができるので、小電力
用のセンサ8で安定して大電力の測定ができるよ
うになる。測定制御レーザ光7による半導体基板
6の反射率を予め測定しておくことにより、セン
サ8には被測定レーザ光2のパワーに比例したパ
ワーが照射されているので、増幅・表示器9で比
例定数等を掛けることにより被測定レーザ光2の
正しい測定が行える。 In this state, the measurement control laser beam 7 is repeatedly irradiated onto the semiconductor substrate 6 in a pulsed manner. The same position on the semiconductor substrate 6 is continuously irradiated with the laser beam 2 to be measured. Thus, when the measurement control laser beam 7 is irradiated, free electrons are generated in the semiconductor substrate 6 at that portion, and the semiconductor substrate 6 has a reflective property and reflects a part of the laser beam 2 to be measured. This reflected laser beam 2 to be measured is detected as an average value by a sensor 8, and the value is displayed on an amplification/display device 9. When the measurement control laser beam 7 is not irradiated, the laser beam 2 to be measured passes through the semiconductor substrate 6,
It is absorbed and cooled by the blackening absorption/cooler 10. By shortening the irradiation time of the measurement control laser beam 7, the average power of the laser beam 2 to be measured that enters the sensor 8 can be reduced, so that the sensor 8 for low power can stably measure high power. You will be able to do this. By measuring the reflectance of the semiconductor substrate 6 by the measurement control laser beam 7 in advance, the sensor 8 is irradiated with a power proportional to the power of the laser beam 2 to be measured. Correct measurement of the laser beam 2 to be measured can be performed by multiplying by a constant or the like.
第2図は本発明の他の実施例を示したものであ
る。この実施例では、被測定レーザ光2が半導体
基板6を通過して通る光路上にセンサ8を配置
し、被測定レーザ光2が反射して通る光路上に黒
化吸収・冷却器10を配置している。 FIG. 2 shows another embodiment of the invention. In this embodiment, a sensor 8 is placed on the optical path through which the laser beam 2 to be measured passes through the semiconductor substrate 6, and a blackening absorber/cooler 10 is placed on the optical path through which the laser beam 2 to be measured is reflected. are doing.
かかる状態で半導体基板6に被測定レーザ光2
を連続的に印加し、その印加箇所に測定制御レー
ザ光7をパルス状に繰り返し印加する。かくする
と、測定制御レーザ光7が照射されている時は、
被測定レーザ光2は反射され、黒化吸収・冷却器
10で吸収・冷却される。測定制御レーザ光2が
照射されていない時には、被測定レーザ光2は半
導体基板6を透過してセンサ8に繰り返し入射さ
れ、平均値として検出され、これが増幅・表示器
9で表示される。 In this state, the laser beam 2 to be measured is applied to the semiconductor substrate 6.
is applied continuously, and the measurement control laser beam 7 is repeatedly applied in a pulsed manner to the application point. Thus, when the measurement control laser beam 7 is irradiated,
The laser beam 2 to be measured is reflected, absorbed and cooled by a blackening absorption/cooler 10 . When the measurement control laser beam 2 is not irradiated, the laser beam 2 to be measured passes through the semiconductor substrate 6 and is repeatedly incident on the sensor 8 and is detected as an average value, which is displayed on the amplification/display unit 9.
(発明の効果)
以上説明したように本発明に係るレーザパワー
測定方法では、半導体基板を介してセンサに入射
される被測定レーザ光の入射時間を、この半導体
基板に照射する測定制御レーザ光により制御して
いるので、センサの温度上昇を抑制して測定を行
うことができる。従つて、高出力でも小電力用の
センサで安定して測定することができる。(Effects of the Invention) As explained above, in the laser power measurement method according to the present invention, the incident time of the laser beam to be measured that is incident on the sensor via the semiconductor substrate is determined by the measurement control laser beam that irradiates the semiconductor substrate. Since it is controlled, it is possible to perform measurements while suppressing the temperature rise of the sensor. Therefore, even at high output, stable measurements can be made with a low power sensor.
第1図乃び第2図は本発明に係るレーザパワー
測定方法を実施する装置の第1、第2の実施例の
概略構成図、第3図は従来のレーザパワー測定方
法の要部縦断面図である。
2……被測定レーザ光、6……半導体基板、7
……測定制御レーザ光、8……センサ。
1 and 2 are schematic configuration diagrams of the first and second embodiments of the apparatus for implementing the laser power measurement method according to the present invention, and FIG. 3 is a longitudinal section of the main part of the conventional laser power measurement method. It is a diagram. 2... Laser light to be measured, 6... Semiconductor substrate, 7
...Measurement control laser light, 8...sensor.
Claims (1)
は吸収してその部分では前記被測定レーザ光を反
射させる特性を有する半導体基板を用い、前記被
測定レーザ光が照射される位置に前記測定制御レ
ーザ光を照射し、前記被測定レーザ光が前記半導
体基板を経てセンサに入射される時間を、前記測
定制御レーザ光の照射時間を制御することにより
制御することを特徴とするレーザパワー測定方
法。1 Using a semiconductor substrate that has a property of transmitting the laser beam to be measured, absorbing the measurement control laser beam, and reflecting the laser beam to be measured, and placing the measurement control laser at the position where the laser beam to be measured is irradiated. A method for measuring laser power, comprising: irradiating light, and controlling the time during which the measured laser beam passes through the semiconductor substrate and enters the sensor by controlling the irradiation time of the measurement control laser beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25288485A JPS62113031A (en) | 1985-11-13 | 1985-11-13 | Laser power measurement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25288485A JPS62113031A (en) | 1985-11-13 | 1985-11-13 | Laser power measurement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62113031A JPS62113031A (en) | 1987-05-23 |
| JPH0458890B2 true JPH0458890B2 (en) | 1992-09-18 |
Family
ID=17243499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25288485A Granted JPS62113031A (en) | 1985-11-13 | 1985-11-13 | Laser power measurement |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62113031A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0610827U (en) * | 1992-07-09 | 1994-02-10 | 株式会社自由電子レーザ研究所 | Laser and electron beam detectors |
| BE1007005A3 (en) * | 1993-04-16 | 1995-02-14 | Vito | Device for the determination of the power of an energy flux |
-
1985
- 1985-11-13 JP JP25288485A patent/JPS62113031A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62113031A (en) | 1987-05-23 |
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