JPH0459624A - Silica glass manufacturing method - Google Patents
Silica glass manufacturing methodInfo
- Publication number
- JPH0459624A JPH0459624A JP16737490A JP16737490A JPH0459624A JP H0459624 A JPH0459624 A JP H0459624A JP 16737490 A JP16737490 A JP 16737490A JP 16737490 A JP16737490 A JP 16737490A JP H0459624 A JPH0459624 A JP H0459624A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- drying
- silica glass
- sol
- degrees celsius
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、シリカ微粒子を用いたゾルゲル法による石英
ガラスの製造工程における、乾燥時の乾燥方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a drying method during drying in a quartz glass manufacturing process by a sol-gel method using silica fine particles.
[従来の技術1
ゾルゲル法によるガラスの製造の中で乾燥工程は重要な
工程のひとつである。従来この乾燥方法は、種々の方法
がとられてきたが、こと厚肉ガラス(15mm以上)に
関しては、余り技術的に進んでいないのが現状である。[Prior Art 1 Drying process is one of the important processes in the production of glass by the sol-gel method. Various drying methods have been used in the past, but the current state of the art is that there is not much progress in the technology for thick glass (15 mm or more).
従って、間顕点としては乾燥中にクラックの発生が多く
、まともな物がほとんど出来ていないのが現状であり問
題となっている。Therefore, cracks often occur during drying, and the current situation is that only a few decent products are produced, which is a problem.
そこで、クラックレスでガラス化できるゲルの乾燥方法
が要望されている。Therefore, there is a need for a gel drying method that can be vitrified without cracks.
[発明が解決しようとする課題]
前述の従来技術では、ゾルゲル法による石英ガラスの製
造方法の中で、乾燥中にクラックの発生のため、歩留ま
りも上がらないことが問題であった。そこで本発明にお
いては、
l)乾燥中にクラックの発生しない乾燥方法を可能可さ
せ、
2)クラックのない石英ガラスを造り
3)必然的にコストダウンを計る。[Problems to be Solved by the Invention] In the above-mentioned conventional technology, there was a problem in that the yield was not increased due to the generation of cracks during drying in the silica glass manufacturing method using the sol-gel method. Therefore, the present invention aims to: 1) enable a drying method that does not generate cracks during drying; 2) produce crack-free quartz glass; and 3) necessarily reduce costs.
・・・・・等の課題を設定し、新規なゾルゲル法の製造
方法を模索して、新しいガラス製品を提供する事を目的
とする。The purpose is to provide new glass products by setting issues such as... and exploring new sol-gel manufacturing methods.
[課題を解決するための手段]
本発明によるガラスの製造方法は、乾燥時の乾燥温度を
20度から30度の範囲にする事を特徴とする。[Means for Solving the Problems] The method for producing glass according to the present invention is characterized in that the drying temperature during drying is in the range of 20 degrees to 30 degrees.
〔作 用]
本発明の上記の方法によれば、乾燥時のウェットゲルの
内外部の温度差を少なくして乾燥できるので、ゲル内外
部の密度差が小さくなり従ってクラックの発生がなくな
る。[Function] According to the above-described method of the present invention, the wet gel can be dried by reducing the temperature difference between the inside and outside of the wet gel, so that the difference in density between the inside and outside of the gel is reduced, thereby eliminating the occurrence of cracks.
C実 施 例〕
第1図は、本発明による実施例のグラフである。(a)
はゲルの正面図で、(b)は平面図である。A点はゲル
の中心部で、B点はゲルの外周部である。乾燥温度が高
いと、高い乾燥温度に達するまでにA点とB点に温度差
が生じ、反応速度の変化を生み内外部に密度の差が生じ
て、その結果ゲルの内部歪みとなりクラックが発生する
。実験的には乾燥の温度範囲は、20度から30度位が
クラックが発生せずi&通である。又、図にはないが低
温熟成(10度Cから15度C)で熟成したゲルを、低
温乾燥すると内外部の歪みがかなり少なくなり、クラッ
ク防止にかなりの効果を期待出来る。これは、低温熟成
と低温乾燥の相乗効果をもたらすため実験的には相当の
効果を上げている。C Example] FIG. 1 is a graph of an example according to the present invention. (a)
is a front view of the gel, and (b) is a plan view. Point A is the center of the gel, and point B is the outer periphery of the gel. If the drying temperature is high, a temperature difference will occur between points A and B before the high drying temperature is reached, causing a change in reaction rate and a difference in density between the inside and outside, resulting in internal distortion of the gel and cracks. do. Experimentally, the drying temperature range is approximately 20 to 30 degrees without cracking. Furthermore, although not shown in the figure, if a gel that has been aged at a low temperature (10 degrees Celsius to 15 degrees Celsius) is dried at a low temperature, internal and external distortions will be considerably reduced, and a considerable effect in preventing cracks can be expected. This has been shown to be quite effective experimentally, as it brings about a synergistic effect between low-temperature aging and low-temperature drying.
以上述べたように、シリカ微粒子を用いたゾルゲル法で
、乾燥温度を20度Cか630度Cにした事により、
l)乾燥中のクラックの発生を防止した対策となり、
2)従って、乾燥歩留まりを上げ。As mentioned above, by using the sol-gel method using silica fine particles and setting the drying temperature to 20 degrees Celsius or 630 degrees Celsius, 1) the occurrence of cracks during drying is prevented, and 2) the drying yield is improved. Raise it.
3)そして、コストダウンとなった6 ・・・・等の効果をもたらした。3) And the cost was reduced6 It brought about effects such as...
第1図は、本発明の実施例の図である。 A゛ゲル中心部 B・ゲルの外周部 以上 比願人 セイコーエプソン株式会社 代理人 弁理士 鈴 木 喜三部(他1名)(b) (a) 第1図 FIG. 1 is a diagram of an embodiment of the invention. Center of Agel B. Gel outer periphery that's all Higanjin Seiko Epson Corporation Agent: Patent attorney Kisanbe Suzuki (1 other person) (b) (a) Figure 1
Claims (2)
の製造方法において、乾燥温度を20度Cから30度C
の範囲にする事を特徴とする石英ガラスの製造方法。(1) In a glass manufacturing method using sol-gel method using silica fine particles, the drying temperature is 20 degrees Celsius to 30 degrees Celsius.
A method for producing quartz glass characterized by making the quartz glass within the range of .
る事を特徴とする請求項1記載の石英ガラスの製造方法
。(2) The method for producing quartz glass according to claim 1, characterized in that the aging temperature is in the range of 10 degrees Celsius to 15 degrees Celsius.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16737490A JPH0459624A (en) | 1990-06-26 | 1990-06-26 | Silica glass manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16737490A JPH0459624A (en) | 1990-06-26 | 1990-06-26 | Silica glass manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0459624A true JPH0459624A (en) | 1992-02-26 |
Family
ID=15848532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16737490A Pending JPH0459624A (en) | 1990-06-26 | 1990-06-26 | Silica glass manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0459624A (en) |
-
1990
- 1990-06-26 JP JP16737490A patent/JPH0459624A/en active Pending
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