JPH0468978B2 - - Google Patents
Info
- Publication number
- JPH0468978B2 JPH0468978B2 JP60289273A JP28927385A JPH0468978B2 JP H0468978 B2 JPH0468978 B2 JP H0468978B2 JP 60289273 A JP60289273 A JP 60289273A JP 28927385 A JP28927385 A JP 28927385A JP H0468978 B2 JPH0468978 B2 JP H0468978B2
- Authority
- JP
- Japan
- Prior art keywords
- rhodium
- catalyst
- carrier
- silica
- pore
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 46
- 239000003054 catalyst Substances 0.000 claims description 25
- 239000010948 rhodium Substances 0.000 claims description 24
- 239000000377 silicon dioxide Substances 0.000 claims description 23
- 239000011148 porous material Substances 0.000 claims description 19
- 229910052703 rhodium Inorganic materials 0.000 claims description 19
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 13
- 230000000704 physical effect Effects 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000006722 reduction reaction Methods 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 6
- -1 etc. Inorganic materials 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 239000003426 co-catalyst Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000005984 hydrogenation reaction Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 1
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 229910052768 actinide Inorganic materials 0.000 description 1
- 150000001255 actinides Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000006315 carbonylation Effects 0.000 description 1
- 238000005810 carbonylation reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 150000004674 formic acids Chemical class 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000002737 fuel gas Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011356 non-aqueous organic solvent Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 150000003284 rhodium compounds Chemical class 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- HSSMNYDDDSNUKH-UHFFFAOYSA-K trichlororhodium;hydrate Chemical compound O.Cl[Rh](Cl)Cl HSSMNYDDDSNUKH-UHFFFAOYSA-K 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
(発明の技術的分野)
本発明はシリカにロジウムを主に含有する成分
を担持した触媒に関するものである。
現今、化学工業において貴金属担持不均一触媒
の有用に着目し、族金属を中心にMo,Wなど
酸化、還元反応が幅広く研究開発されている。シ
リカ担体は他無機多孔質担体特にアルミナ、チタ
ニアなどと異なり、担体としてはイナートで、
SMSI効果など観測されない異質な担体として知
られており、貴金属の性能を充分に引き出す担体
として、広く用いられている。オレフインの水素
化、カルボニルの水素化、芳香族の核水添、脱水
系反応、高圧条件下では含酸素化合物合成の1ス
テツプとしてカルボニル化又、排ガス分野におい
てもNOX,SOX、炭化水素の酸化・還元にも用い
られ、触媒としての重要な位置を占めている。
本発明は、工業的に有用なロジウム担持シリカ
触媒に関するもので、限られた天然自然としての
ロジウムを高分散状態にし、無駄なく有効に担持
使用するもので、各種水素化反応には極めて有効
な触媒になることが期待される。
(先行する技術の説明)
担持金属触媒のうち、特定の担体を用いて、生
成物に有利になるように改良された触媒は数多く
見られ、代表的な反応としては、アルミナにMo
などを添加して、炭化水素を水素化改質する反応
がある。(最近の特許としては、特開昭60−
112888、特開昭60−105636、特開昭60−54735、
特開昭60−27646など)シリカ担体を用いた触媒
としてはPdを主成分とした酸化触媒(特開昭60
−87857)がある。更に、Rhを主成分としたシリ
カ触媒としては、燃料ガス製造用触媒(特開昭59
−112840)、低温燃料用触媒(特開昭58−14948)
が開示されている。また合成ガスより含酸素化合
物を合成する気相反応ではシリカ担体が多く用い
られている。
これらの特定の細孔径にピークを持つような極
めて特種な担体を用いることにより目的を達成し
ようとするものである。
また、特開昭57−194044に見られるようにアセ
チルアセトナート塩の酸化状態での熱分解による
高分散化や、特開昭52−142689の非水系有機溶媒
を用いた高分散化など、調製法での工夫が見られ
る。
しかしながら、これらは本発明におけるロジウ
ムを含有するシリカ担体においては必ずしも良い
結果が得られず、高分散化するのに一般的手法を
確立するには致つていない。
更に金属アルコキシド法は、高分散化の手法の
一つであり、有用であるが、工程数が多く、本発
明の簡便さとは、格段の差がある。またイオン交
換法も高分散型触媒調製法として広く用いられる
が、原料塩のアンミン錯体のコンタミ、シリカ担
体への吸着が極めて弱いなど、実質的に多くの問
題がある。
(発明の略解)
ここにおいて、本発明は、ロジウムを主成分と
するシリカ触媒において、用いるシリカ担体が、
(i) N2ガスを用いて測定した比表面積が20m2/
g以上で800m2/g以下の範囲であり、かつ
(ii) Hg圧入法(接触角140゜、表面張力
480dynes/cm)で測定した細孔容積が、
0.110cc/g以上、1.8cc/g以下の範囲であり
(iii) 36Å〜75Åの細孔直径の細孔容積が
0.110cc/g以上の物性を有する、物性を備え
たシリカ担体を使い、含浸するロジウム6.0重
量%以下で担体することにより、上記諸物性を
有しない担体では達成しえなかつた高分散型ロ
ジウム触媒を製造することが可能となつた。
これは、小さい細孔径を多く保有するシリカ担
体を最も簡便な含浸法と組み合せることにより目
的を達成することが可能となつた。
(発明の説明)
先づ、ロジウムを含有する触媒としては、ロジ
ウム以外の助触媒を添加した触媒も有効である
が、一般にはRhを6.0重量%以下を含有し、Rhを
金属形、又は3価以下の原子価ロジウム塩又は錯
体として用い得る。
助触媒としては、Mn,Mg,Sc,Ir,Zr,Hf,
Mo,W,U,Th等、又アルカリ金属又はアルカ
リ土類金属としてNa,K,Li,Cs,Rb,Ca,
St,Ba等を含んでもよい。また稀土類元素とし
てランタニド、アクチニド系列の何れの元素をも
用い得る。
助触媒として使用される化合物としては、ハロ
ゲン酸塩・硫酸塩・硝酸塩・炭酸塩等の無機酸
塩、酸化物、水酸化物、酢酸塩、ギ酢酸、蓚酸塩
等の有機酸塩を問わず使用することができる。し
かし、これらの触媒成分の担体上への担持を容易
ならしめるため、水又は他の適当な触媒に可溶性
の化合物が好ましく用いられる。添加する助触媒
の量は、ロジウムとの原子比が一般には(助触
媒)/Rh≦1.0の方が好ましい。
担体としては、
(i) N2ガスを用いて測定した比表面積が、20
m2/g以上800m2/g以下の範囲であり、かつ
(ii) Hg圧入法(接触角140゜、表面張力
480dynes/cm)で測定した細孔容積が、
0.110cc/g以上、1.8cc/g以下の範囲であ
り、かつ
(iii) 36Å〜75Åの細孔直径の細孔容積が
0.110cc/g以上の物性を有するシリカ担体を
使用する。
調製法としては、上記ロジウム、場合によつて
は助触媒を水又はn−ヘキサン、アルコール、ア
セトン等の有機溶媒に溶解し、この溶液に担体を
加え、含浸法の常法により担持させた後、還元又
は熱処理することにより担持固定された目的物を
得ることができる。特に低温乾燥することによ
り、更に充分含浸溶媒を飛ばすことによつてより
よいロジウム粒径を形成することが可能となる。
担体上への触媒成分の担持はすべての触媒成分
を同時に行なつてもよいし、又、各成分ごとに逐
次的に担体に担持する方法、あるいは各成分を必
要に応じて還元、熱処理等の処理を行いながら、
逐次的、段階的に担持する方法などの各手法を用
いることができる。上述の手法によつて調製され
た触媒は通常還元処理を行うことによりロジウム
を実質的金属状態に活性化し、ついで反応に供せ
られる。還元処理を行うには水素ガス下又は水素
及び一酸化炭素の混合ガス下、場合によつては窒
素、ヘリウム、アルゴン等の不活性ガスで一部希
釈された水素ガスまたは上記混合ガス下で行うこ
とができる。
還元処理温度としては100〜600℃、好ましくは
250〜550℃の温度において行う。この際、触媒の
各成分の活性状態を最適な状態に保つ目的で、低
温より徐々に、あるいは段階的に昇温しながら還
元処理を行つてもよい。
又、ロジウム化合物の還元はメタノール、ヒド
ラジン、ホルマリン等の還元剤で処理することに
よつて行なつてもよい。
以下、本発明について、実施例をもつて、更に
詳細に説明するが、これらの例は本発明について
の理解を容易にするため、あえて条件を統一して
示すもので本発明はこれらの例によつて何ら制限
されないことは勿論である。
実施例 1
比表面積196m2/g、平均細孔直径(4v/s)
103Å、最大ピーク95Å、104Å以下の細孔容積
0.726cc/gの物性を有するシリカ担体で、細孔
直径38Å〜75Åまでの細孔容積か0.218cc/gで
あつた。
上記諸物性を持つシリカ担体「A−1」の細孔
分布を第1図に、また表1に物性及びRhと吸着
した一酸化炭素の比(分散率)を示した。XRD
(Cu−Kd)にて、Rh粒子を測定したが検出され
なかつた。以下触媒調製法を示す。
上記シリカ担体23.4g(50ml)を塩化ロジウム
含水塩(RhCl3・3H2O)2.55g、塩化イリジウム
(IrCl4・H2O)0.427g塩化マンガン(MnCl4・
4H2O)0.040g、塩化リチウム(LiCl)0.026g
を均一に溶解した水溶液16mlに加え、均一に含浸
し、室温下2時間風乾した。30℃で、4時間、60
℃で2時間ロータリーエバポレーターにて減圧乾
燥し、450℃で2時間水素還元した。
実施例 2
表1のA−2に示した様な諸物性を有するシリ
カ担体「A−2」を用いて、実施例1と同様の調
製を行つた。用いた担体は22.3g(50ml)で、水
溶液は19mlとして。第2図、表1にシリカ担体の
物性及び、Rhの分散率を示した。
比較例 1
表1、第3図に示したようなシリカ
(Davison#57シリカ)を用いた。担体20.0g(50
ml)で、水溶液23.0mlとした以外実施例1と同様
とした。
比較例 2
表1、第4図に示したようシリカ(日揮化学
E56C1シリカ)を用いた。担体25.9g(50ml)
で、水溶液17.0mlとした以外、実施例1と同様と
した。
【表】DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a catalyst in which a component mainly containing rhodium is supported on silica. Currently, in the chemical industry, attention is paid to the usefulness of heterogeneous catalysts supported on noble metals, and a wide range of research and development is being conducted on oxidation and reduction reactions of group metals such as Mo and W. Silica carrier is different from other inorganic porous carriers, especially alumina, titania, etc., and is an inert carrier.
It is known as a heterogeneous carrier that does not exhibit SMSI effects, and is widely used as a carrier that fully brings out the performance of noble metals. Hydrogenation of olefins, hydrogenation of carbonyls, nuclear hydrogenation of aromatics , dehydration reactions , carbonylation as a step in the synthesis of oxygen-containing compounds under high pressure conditions. It is also used for oxidation and reduction, and occupies an important position as a catalyst. The present invention relates to an industrially useful rhodium-supported silica catalyst, which makes rhodium, which is limited in nature, highly dispersed and supports it effectively without waste, making it extremely effective for various hydrogenation reactions. It is expected that it will become a catalyst. (Description of prior art) Among supported metal catalysts, there are many catalysts that have been improved using specific supports to produce better products.
There is a reaction in which hydrocarbons are hydrogenated and reformed by adding such substances. (Recent patents include JP-A-60-
112888, JP-A-60-105636, JP-A-60-54735,
As a catalyst using a silica carrier (Japanese Patent Application Laid-open No. 60-27646, etc.), an oxidation catalyst containing Pd as the main component (Japanese Patent Application Laid-open No. 60-27646, etc.)
-87857). Furthermore, as a silica catalyst containing Rh as a main component, there is a catalyst for fuel gas production (Unexamined Japanese Patent Publication No.
-112840), low-temperature fuel catalyst (Japanese Patent Application Laid-open No. 58-14948)
is disclosed. Furthermore, silica carriers are often used in gas phase reactions to synthesize oxygen-containing compounds from synthesis gas. The objective is to be achieved by using a very specific carrier that has a peak at a specific pore size. In addition, as seen in JP-A-57-194044, high dispersion was achieved by thermal decomposition of acetylacetonate salt in an oxidized state, and JP-A-52-142689 was developed to achieve high dispersion using a non-aqueous organic solvent. We can see some ingenuity in the law. However, these methods do not necessarily give good results with the rhodium-containing silica carrier of the present invention, and it has not yet been possible to establish a general method for achieving high dispersion. Further, the metal alkoxide method is one of the methods for achieving high dispersion and is useful, but it requires a large number of steps and is far different from the simplicity of the present invention. The ion exchange method is also widely used as a highly dispersed catalyst preparation method, but it has many practical problems, such as contamination of the raw material salt with ammine complexes and extremely weak adsorption onto the silica carrier. (Simplified explanation of the invention) Here, the present invention provides a silica catalyst containing rhodium as a main component, in which the silica support used has (i) a specific surface area of 20 m 2 /
(ii) Hg intrusion method (contact angle 140°, surface tension
The pore volume measured at 480dynes/cm) is
(iii) The pore volume with a pore diameter of 36 Å to 75 Å is in the range of 0.110 cc/g or more and 1.8 cc/g or less.
By using a silica carrier with physical properties of 0.110cc/g or more and impregnating it with 6.0% by weight or less of rhodium, a highly dispersed rhodium catalyst that could not be achieved with a carrier that does not have the above physical properties can be achieved. It became possible to manufacture This goal was made possible by combining a silica carrier with many small pores with the simplest impregnation method. (Description of the invention) First, as a catalyst containing rhodium, catalysts to which co-catalysts other than rhodium are added are also effective, but generally they contain 6.0% by weight or less of Rh, and Rh is in the form of metal or 3% by weight. It can be used as a subvalent rhodium salt or complex. As promoters, Mn, Mg, Sc, Ir, Zr, Hf,
Mo, W, U, Th, etc., and alkali metals or alkaline earth metals such as Na, K, Li, Cs, Rb, Ca,
It may also contain St, Ba, etc. Furthermore, any of the lanthanide and actinide series elements can be used as the rare earth element. Compounds used as cocatalysts include inorganic acid salts such as halogenates, sulfates, nitrates, and carbonates, and organic acid salts such as oxides, hydroxides, acetates, formic acids, and oxalates. can be used. However, compounds soluble in water or other suitable catalysts are preferably used to facilitate the loading of these catalyst components onto the carrier. The amount of co-catalyst added is preferably such that the atomic ratio with rhodium is generally (co-catalyst)/Rh≦1.0. As a support, (i) the specific surface area measured using N 2 gas is 20
m 2 /g or more and 800m 2 /g or less, and (ii) Hg press-in method (contact angle 140°, surface tension
The pore volume measured at 480dynes/cm) is
(iii) a pore volume with a pore diameter of 36 Å to 75 Å;
A silica carrier having physical properties of 0.110 cc/g or more is used. The preparation method is to dissolve the rhodium and, in some cases, a co-catalyst in water or an organic solvent such as n-hexane, alcohol, or acetone, add a carrier to this solution, and support the rhodium by a conventional impregnation method. , reduction or heat treatment, it is possible to obtain a supported and fixed target object. In particular, by drying at a low temperature, it becomes possible to form better rhodium particle sizes by further sufficiently evaporating the impregnating solvent. The catalyst components may be supported on the carrier at the same time, or each component may be supported on the carrier sequentially, or each component may be supported by reduction, heat treatment, etc. as necessary. While processing,
Techniques such as sequential and stepwise loading methods can be used. The catalyst prepared by the above method is usually subjected to a reduction treatment to activate rhodium to a substantially metallic state, and then subjected to a reaction. The reduction treatment is performed under hydrogen gas or under a mixed gas of hydrogen and carbon monoxide, or in some cases under hydrogen gas partially diluted with an inert gas such as nitrogen, helium, argon, etc., or under the above mixed gas. be able to. The reduction treatment temperature is 100 to 600℃, preferably
Carry out at a temperature of 250-550°C. At this time, in order to maintain the activation state of each component of the catalyst in an optimal state, the reduction treatment may be performed while raising the temperature gradually or stepwise from a low temperature. Further, the rhodium compound may be reduced by treatment with a reducing agent such as methanol, hydrazine or formalin. Hereinafter, the present invention will be explained in more detail with reference to Examples.However, in order to make it easier to understand the present invention, these examples are purposely shown under unified conditions, and the present invention is not limited to these examples. Therefore, it goes without saying that there are no restrictions whatsoever. Example 1 Specific surface area 196m 2 /g, average pore diameter (4v/s)
103 Å, maximum peak 95 Å, pore volume below 10 4 Å
The silica support had physical properties of 0.726 cc/g, and the pore volume with pore diameters ranging from 38 Å to 75 Å was 0.218 cc/g. Figure 1 shows the pore distribution of silica carrier "A-1" having the above-mentioned physical properties, and Table 1 shows the physical properties and the ratio of Rh to adsorbed carbon monoxide (dispersion rate). XRD
(Cu-Kd), Rh particles were measured but were not detected. The catalyst preparation method is shown below. 23.4 g (50 ml) of the above silica carrier, 2.55 g of rhodium chloride hydrate (RhCl 3.3H 2 O), 0.427 g of iridium chloride (IrCl 4.H 2 O), manganese chloride (MnCl 4 .
4H 2 O) 0.040g, lithium chloride (LiCl) 0.026g
was added to 16 ml of a uniformly dissolved aqueous solution, uniformly impregnated, and air-dried at room temperature for 2 hours. At 30℃, 4 hours, 60
It was dried under reduced pressure in a rotary evaporator at ℃ for 2 hours, and then reduced with hydrogen at 450℃ for 2 hours. Example 2 The same preparation as in Example 1 was carried out using silica carrier "A-2" having the physical properties shown in A-2 in Table 1. The carrier used was 22.3 g (50 ml), and the aqueous solution was 19 ml. FIG. 2 and Table 1 show the physical properties of the silica carrier and the Rh dispersion rate. Comparative Example 1 Silica (Davison # 57 silica) as shown in Table 1 and FIG. 3 was used. Carrier 20.0g (50
ml), and the procedure was the same as in Example 1 except that the aqueous solution was 23.0 ml. Comparative Example 2 As shown in Table 1 and Figure 4, silica (JGC Chemical)
E56C1 silica) was used. Carrier 25.9g (50ml)
The procedure was the same as in Example 1 except that the aqueous solution was 17.0 ml. 【table】
第1図、第2図は本発明担体(実施例1、2)
の細孔分布、第3図、第4図は比較例1,2の担
体の細孔分布を示す。尚、図面の縦軸は細孔密積
(積分値cc/gA.U.)、横軸は細孔径(A.U.)を
表わす。
Figures 1 and 2 are carriers of the present invention (Examples 1 and 2)
3 and 4 show the pore distribution of the carriers of Comparative Examples 1 and 2. In addition, the vertical axis of the drawing represents the pore density product (integral value cc/gA.U.), and the horizontal axis represents the pore diameter (AU).
Claims (1)
20m2/g以上800m2/g以下の範囲であり、か
つ (ii) Hg圧入法(接触角140゜、表面張力
480dynes/cm)で測定した細孔容積が、
0.110cc/g以上、1.8cc/g以下の範囲であ
り、かつ (iii) 36Å〜75Åの細孔直径の細孔容積が
0.110cc/g以上の物性を有するシリカ担体上
にロジウムを含有する触媒成分をロジウムが
6.0重量%以下となるように含浸担持すること
を特徴とするロジウム含有触媒の製造方法。[Claims] 1 (i) The specific surface area measured using N 2 gas is
20 m 2 /g or more and 800 m 2 /g or less, and (ii) Hg intrusion method (contact angle 140°, surface tension
The pore volume measured at 480dynes/cm) is
(iii) a pore volume with a pore diameter of 36 Å to 75 Å;
Rhodium is a catalyst component containing rhodium on a silica carrier having physical properties of 0.110cc/g or more.
A method for producing a rhodium-containing catalyst, which comprises impregnating and supporting the rhodium-containing catalyst to a content of 6.0% by weight or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60289273A JPS62149342A (en) | 1985-12-24 | 1985-12-24 | Production of high dispersion type rhodium-containing catalyst |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60289273A JPS62149342A (en) | 1985-12-24 | 1985-12-24 | Production of high dispersion type rhodium-containing catalyst |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62149342A JPS62149342A (en) | 1987-07-03 |
| JPH0468978B2 true JPH0468978B2 (en) | 1992-11-04 |
Family
ID=17741027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60289273A Granted JPS62149342A (en) | 1985-12-24 | 1985-12-24 | Production of high dispersion type rhodium-containing catalyst |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62149342A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021065837A (en) * | 2019-10-23 | 2021-04-30 | 国立大学法人秋田大学 | Catalyst for cleaning exhaust gas |
-
1985
- 1985-12-24 JP JP60289273A patent/JPS62149342A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62149342A (en) | 1987-07-03 |
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