JPS62149342A - Production of high dispersion type rhodium-containing catalyst - Google Patents
Production of high dispersion type rhodium-containing catalystInfo
- Publication number
- JPS62149342A JPS62149342A JP60289273A JP28927385A JPS62149342A JP S62149342 A JPS62149342 A JP S62149342A JP 60289273 A JP60289273 A JP 60289273A JP 28927385 A JP28927385 A JP 28927385A JP S62149342 A JPS62149342 A JP S62149342A
- Authority
- JP
- Japan
- Prior art keywords
- rhodium
- carrier
- catalyst
- pore volume
- specific
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の技術的分野)
本発明は7リカにロジウムを主に含有する成分を担持し
た触媒に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a catalyst in which a component mainly containing rhodium is supported on 7 Lika.
現今、化学工業において貴金属担持不均一融媒の有用に
着目し、■族金属を中心にMo 、 Wなど酸化、還元
反応が幅広く研究開発されている。ソリ力担体は他無機
多孔質担木特にアルミナ、チタニアなどと異なり、担体
としてはイナートで、5M5I効果などg側されない異
質な担体として知られており、貴金属の性能を充分引き
出す担体として、広く用いられている。オレフィンの水
素化、カルボニルの水素化、芳香族の核水添、脱水系反
応、高圧条件下では含酸素化合物合成の1ステツプとし
てカルボニル化又、排ガス分野においてもNO。Currently, in the chemical industry, attention is paid to the usefulness of heterogeneous fluxes supporting noble metals, and a wide range of research and development is being carried out on oxidation and reduction reactions of Mo, W, etc., centering on Group II metals. Unlike other inorganic porous supports such as alumina and titania, the warp support is an inert support and is known as a unique support that does not exhibit the 5M5I effect, and is widely used as a support that fully brings out the performance of precious metals. It is being No. 1 in the hydrogenation of olefins, hydrogenation of carbonyls, nuclear hydrogenation of aromatics, dehydration reactions, carbonylation as a step in the synthesis of oxygenated compounds under high pressure conditions, and also in the exhaust gas field.
SOx、炭化水素の酸化・還元にも用いられ、触媒とし
ての重要な位置を占めている。It is also used for the oxidation and reduction of SOx and hydrocarbons, and occupies an important position as a catalyst.
使用するもので、各種水素化反応には極めて有効な触媒
になることが期待される。It is expected that it will be an extremely effective catalyst for various hydrogenation reactions.
(先行する技術の説明)
担持金属触媒のうち、特定の担体を用いて、生−などを
添加して、炭化水素を水素比改質する反応がある。(最
近の特許としては、特開昭60−112888、特開昭
60−105636.特開昭60−54735 、特開
昭60−27646など)シリカ担体を用いた触媒とし
てはPdを主成分とした酸化触媒(特開昭6O−878
57)がある。更に、Rhを主成分としたシリカ触媒と
しては、燃F)ガス製造用触媒(特開昭59−1128
40)、低温燃料用触媒(特開昭58−14948)が
開示されている。また合成ガスより含酸素化合物を合成
する気相反応ではシリカ担体が多く用いられている。(Description of Prior Art) Among supported metal catalysts, there is a reaction in which a specific carrier is used and raw materials are added to reform the hydrogen ratio of hydrocarbons. (Recent patents include JP-A-60-112888, JP-A-60-105636, JP-A-60-54735, JP-A-60-27646, etc.) Catalysts using silica carriers include Pd as the main component. Oxidation catalyst (JP-A-6O-878
57). Furthermore, as a silica catalyst containing Rh as a main component, a catalyst for producing fuel gas (Japanese Patent Application Laid-Open No. 59-1128
40), a low-temperature fuel catalyst (Japanese Unexamined Patent Publication No. 58-14948) is disclosed. Furthermore, silica carriers are often used in gas phase reactions to synthesize oxygen-containing compounds from synthesis gas.
これらは特定の細孔径にピークを持つような極めて特種
な担体を用いることにより目的を達成しようとするもの
である。These aims are achieved by using very specific carriers that have a peak at a specific pore size.
また、特開昭57−194044に見られるようにアセ
チルアセトナート塩の酸化状態での熱分解(でよる高分
散化や、特開昭52−142689の井水系有機溶媒を
用いた高分散化など、調製法での工夫が見られる。In addition, as seen in JP-A-57-194044, high dispersion is achieved by thermal decomposition of acetylacetonate salt in an oxidized state, and JP-A-52-142689 is used to achieve high dispersion using a well water-based organic solvent. , the ingenuity in the preparation method can be seen.
更に金属アルコキシド法は、高分散化の手法の一つであ
り、有用であるが、工程数が多く、本発明の簡便さとは
、格段の差がある。またイオン交換法も高分散型触媒調
製法として広く用いられるが、原料塩のアンミン錯体の
コンタミ、シリカ担体への吸着が饅めて弱いなど、実質
的に多くの問題がある。Further, the metal alkoxide method is one of the methods for achieving high dispersion and is useful, but it requires a large number of steps and is far different from the simplicity of the present invention. The ion exchange method is also widely used as a highly dispersed catalyst preparation method, but it has many practical problems, such as contamination of raw material salts with ammine complexes and insufficient adsorption onto the silica carrier.
(発明の略解)
ここにおいて、本発明は、ロジウムを主成分とするシリ
カ触媒において、用いるシリカ担体が、(1)N2ガス
を用いて測定した比表面積が20m 27f1以上で8
00 m2/jl以下の範囲であり、かつ
(ii) Hg圧入法(接触角1400、表面張力4
80d y n e s/cm )で測定した細孔容積
が0.110 ccyJ以上、1.8 cc/!17以
下の範囲でありG!り36X〜75Xの側孔直径の細孔
容積が0、110 cc/f1以上の物性を有する、物
性を備えたシリカ担体を使い、含浸するロジウムが6.
0重量%以下で担持することにより、上記諸物性を有し
体を最も簡便な含浸法と組み合せることにより目的を達
成することが可能となった。(Simplified explanation of the invention) Here, the present invention provides a silica catalyst containing rhodium as a main component, in which the silica support used has (1) a specific surface area of 20 m27f1 or more and 8
00 m2/jl or less, and (ii) Hg intrusion method (contact angle 1400, surface tension 4
The pore volume measured at 80 dynes/cm ) is 0.110 ccyJ or more, 1.8 cc/! It is in the range of 17 or less and G! Using a silica carrier with physical properties such that the pore volume of the side pore diameter of 36X to 75X is 0.110 cc/f1 or more, the rhodium to be impregnated is 6.
By supporting 0% by weight or less, it has become possible to achieve the objective by combining a body with the above physical properties with the simplest impregnation method.
(発明の説明)
先づ、ロジウムを含有する触媒としては、ロジウム以外
の助触媒を添加した触媒も有効であるが、一般にはRh
を6.0重量%以下を含有し、Rhを金属形、又は3価
以下の原子価ロジウム塩又は錯体として用い得る。(Description of the invention) First, as catalysts containing rhodium, catalysts to which co-catalysts other than rhodium are added are also effective, but in general Rh
6.0% by weight or less, and Rh can be used in metallic form or as a trivalent or less valent rhodium salt or complex.
助触媒としては、Mn、Mg、Sc、Ir、Zr+Hf
+Mo 、 W 、 U 、 Th等、又アルカリ金属
又はアルカリ土類危、寓としてNa 、 K 、 Li
、 Cs 、 Rb 、 Ca 、 St +13a
等を含んでもよい。1だ稀土類元素としてランタニド、
アクチニド系列の何れの元素をも用い?!する。As a promoter, Mn, Mg, Sc, Ir, Zr+Hf
+Mo, W, U, Th, etc., and alkali metals or alkaline earths, such as Na, K, Li
, Cs, Rb, Ca, St +13a
etc. may also be included. Lanthanides as rare earth elements,
Can any element in the actinide series be used? ! do.
助触媒として使用される化合物としては、ハロゲン酸塩
・硫酸塩・硝酸塩・炭酸塩等の無機酸塩。Compounds used as promoters include inorganic acid salts such as halogenates, sulfates, nitrates, and carbonates.
酸化物、水酸化物、酢酸塩、ギ酢酸、蓚酸塩等の有機酸
塩を問わず使用することができる。しかし、これらの触
媒成分の担体上への担持を容易ならしめるため、水又は
他の適当な触媒に可溶性の化合(り N2ガスを用い
て測定した比表面積が、20m 2/!1以上800
m27fl以下の範囲であり、かつ(!り Hg圧入
法(接触角140’、表面張力480dyne s/l
yn )に測定した細孔容積が、0.110 cc/、
’)以上、1.8 cc/’l以下の範囲であり、かつ
(iii)36X〜75Xの1細孔直径の細孔容積が0
、110 cc/g以上の物性を有するシリカ担体を使
〆機…体MJソを加え、含浸法の常法により担持させた
後、還元又は熱処理することにより担持固定された目的
物を得ることができる。特に低温乾燥することにより、
更に充分含浸溶媒を飛ばすことによってよりよいロジウ
ム粒径を形成することが可能となる。Any organic acid salt such as oxide, hydroxide, acetate, formate, oxalate, etc. can be used. However, in order to facilitate the support of these catalyst components on the carrier, compounds soluble in water or other suitable catalysts (with a specific surface area measured using N2 gas of 20 m2/!1 or more, 800 m2/!
Hg intrusion method (contact angle 140', surface tension 480 dyne s/l)
yn ) is 0.110 cc/,
') or more and 1.8 cc/'l or less, and (iii) the pore volume of 1 pore diameter of 36X to 75X is 0.
Using a silica carrier having physical properties of 110 cc/g or more, it is possible to obtain a supported and fixed target object by adding MJ solubilizer and supporting it by a conventional method of impregnation, and then reducing or heat treating it. can. Especially by drying at low temperature,
Furthermore, by sufficiently removing the impregnating solvent, it becomes possible to form rhodium particles with a better diameter.
担体上への触媒成分の担持はすべての触媒成分を同時に
行なってもよいし、又、各成分ごとに逐次的に担体に担
持する方法、あるいは各成分を必要に応じて還元、熱処
理等の処理を行いながら、を実質的金属状態に活性化し
、ついで反応に供せられる。還元処理を行うには水素ガ
ス下又は水素及び−酸化炭素の混合ガス下、場合によっ
ては窒素、ヘリウム、アルゴン等の不活性ガスで一部希
釈された水素ガスまたは上記混合ガス下で行うことがで
きる。The catalyst components may be supported on the carrier at the same time, or each component may be supported on the carrier sequentially, or each component may be subjected to reduction, heat treatment, etc. as necessary. is activated to a substantially metallic state and then subjected to reaction. The reduction treatment can be carried out under hydrogen gas or under a mixed gas of hydrogen and carbon oxide, or in some cases under hydrogen gas partially diluted with an inert gas such as nitrogen, helium, or argon, or under the above mixed gas. can.
還元処理温度としては100〜600℃、好ましくは2
50〜550℃の温度において行う。この際、触媒の各
成分の活性状態を最適な状態に保つ目的で、低温より徐
々に、あるいは段階的に昇温しながら還元処理を行って
もよい。The reduction treatment temperature is 100 to 600°C, preferably 2
It is carried out at a temperature of 50-550°C. At this time, in order to maintain the activation state of each component of the catalyst in an optimal state, the reduction treatment may be performed while raising the temperature gradually or stepwise from a low temperature.
又、ロジウム化合物の還元はメタノール、ヒドラジン、
ホルマリン等の還元剤で処理することによって行なって
もよい。Also, rhodium compounds can be reduced using methanol, hydrazine,
This may be carried out by treatment with a reducing agent such as formalin.
以下、本発明について、実施例をもって、更に詳細に説
明するが、これらの例は本発明てついての理解を容易に
するため、あえて条件を統一しそ示すもので本発明はこ
れらの列によって何ら制限されないことは勿論である。Hereinafter, the present invention will be explained in more detail with reference to examples, but these examples intentionally unify the conditions in order to facilitate understanding of the present invention, and the present invention is not limited in any way by these examples. Of course not.
実施例1
比表面積196 m2/jl 、平均細孔直径(4v/
s )上記諸物性を持つシリカ担体rA−IJの細孔分
布を第1図に、また表1に物性及びRhと吸着した一酸
化炭素の比(分散率)を示した。XRD(Cu−Kd)
にて、Rh粒子を測定したが検出されなかった。Example 1 Specific surface area 196 m2/jl, average pore diameter (4v/jl)
s) The pore distribution of the silica carrier rA-IJ having the above physical properties is shown in Figure 1, and Table 1 shows the physical properties and the ratio of Rh to adsorbed carbon monoxide (dispersion rate). XRD (Cu-Kd)
Rh particles were measured, but were not detected.
以下触媒調製法を示す。The catalyst preparation method is shown below.
上記シリカ担体23.4 g (50m1)を塩化ロジ
ウム含水塩(RhC1,・3H20) 2.551 、
塩化イリジウム(IrCl4−H2O) 0.427
、!7塩化マンガン(MnCl2・4H20) 0.0
40 F、塩化リチウム(Lict) 0.0269を
均一に溶解した水溶液16m1に加え、均一に含浸し、
室温下2時間風乾した。30℃で、4時間、60℃で2
時間ロータリーエバポレーターにて減圧乾燥し、450
℃で2時間水素還元した。23.4 g (50 ml) of the above silica carrier was mixed with 2.551 g of rhodium chloride hydrate (RhC1,.3H20),
Iridium chloride (IrCl4-H2O) 0.427
,! 7 Manganese chloride (MnCl2・4H20) 0.0
40 F, lithium chloride (Lict) 0.0269 was added to 16 ml of an aqueous solution uniformly dissolved, and uniformly impregnated.
It was air-dried at room temperature for 2 hours. 4 hours at 30℃, 2 hours at 60℃
Dry under reduced pressure in a rotary evaporator for 450 hours.
Hydrogen reduction was performed at ℃ for 2 hours.
実施例2
表1のA−2に示しだ様な諸物性を有するシリカ担Kr
A−2Jを用いて、実施例1と同様の調製を行った。用
いた担体は22.3.9(50ml)で、水溶液は19
m(!とじた。第2図、表1にシリカ担体の物性及び、
Rhの分散率を示しだ。Example 2 Silica-supported Kr having various physical properties as shown in A-2 of Table 1
The same preparation as in Example 1 was carried out using A-2J. The carrier used was 22.3.9 (50ml), and the aqueous solution was 19.
m(! Closed. Figure 2 and Table 1 show the physical properties of the silica carrier and
Show the dispersion rate of Rh.
原溶液23.0 mlとした以外実施例1と同様とした
。The procedure was the same as in Example 1 except that the stock solution was 23.0 ml.
比較例2
表1、第4図に示したようシリカ(8揮化学E56C1
シリカ)を用いた。担体25.9 、!i’(50ml
)で、水溶液17.0 mlとした以外、実施例1と同
様とした。Comparative Example 2 As shown in Table 1 and Figure 4, silica (8 volatile chemical E56C1
Silica) was used. Carrier 25.9,! i'(50ml
) The procedure was the same as in Example 1 except that the aqueous solution was 17.0 ml.
第1図、第2図は本発明担体(実施例1.2)の1細孔
分布、第3図、第4図は比軟例1.2の担体の、細孔分
布を示す。尚、図面の縦・軸は細孔密偵(積分値cc/
’l A−U−) 、横軸は細孔径(A、U、)を表わ
す。FIGS. 1 and 2 show the pore distribution of the carrier of the present invention (Example 1.2), and FIGS. 3 and 4 show the pore distribution of the carrier of soft ratio Example 1.2. The vertical axis of the drawing is the pore spy (integral value cc/
'l A-U-), the horizontal axis represents the pore diameter (A, U,).
Claims (1)
^2/g以上800m^2/g以下の範囲であり、かつ
(ii)Hg圧入法(接触角140°、表面張力480
dynes/cm)で測定した細孔容積が0.110c
c/g以上1.8cc/g以下の範囲であり、かつ (iii)36Å〜75Åの細孔直径の細孔容積が0.
110cc/g以上の物性を有するシリカ担体上にロジ
ウムを含有する触媒成分をロジウムが6.0重量%以下
となるように含浸担持することを特徴とするロジウム含
有触媒の製造方法。[Claims] (i) The specific surface area measured using N_2 gas is 20 m
The range is ^2/g or more and 800m^2/g or less, and (ii) Hg intrusion method (contact angle 140°, surface tension 480
Pore volume measured in dynes/cm) is 0.110c
c/g or more and 1.8 cc/g or less, and (iii) the pore volume with a pore diameter of 36 Å to 75 Å is 0.
A method for producing a rhodium-containing catalyst, which comprises impregnating and supporting a rhodium-containing catalyst component on a silica carrier having physical properties of 110 cc/g or more so that the rhodium content is 6.0% by weight or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60289273A JPS62149342A (en) | 1985-12-24 | 1985-12-24 | Production of high dispersion type rhodium-containing catalyst |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60289273A JPS62149342A (en) | 1985-12-24 | 1985-12-24 | Production of high dispersion type rhodium-containing catalyst |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62149342A true JPS62149342A (en) | 1987-07-03 |
| JPH0468978B2 JPH0468978B2 (en) | 1992-11-04 |
Family
ID=17741027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60289273A Granted JPS62149342A (en) | 1985-12-24 | 1985-12-24 | Production of high dispersion type rhodium-containing catalyst |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62149342A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021065837A (en) * | 2019-10-23 | 2021-04-30 | 国立大学法人秋田大学 | Catalyst for cleaning exhaust gas |
-
1985
- 1985-12-24 JP JP60289273A patent/JPS62149342A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021065837A (en) * | 2019-10-23 | 2021-04-30 | 国立大学法人秋田大学 | Catalyst for cleaning exhaust gas |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0468978B2 (en) | 1992-11-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |