JPH04694B2 - - Google Patents

Info

Publication number
JPH04694B2
JPH04694B2 JP22505587A JP22505587A JPH04694B2 JP H04694 B2 JPH04694 B2 JP H04694B2 JP 22505587 A JP22505587 A JP 22505587A JP 22505587 A JP22505587 A JP 22505587A JP H04694 B2 JPH04694 B2 JP H04694B2
Authority
JP
Japan
Prior art keywords
heat
pipe
tube
inner tube
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP22505587A
Other languages
Japanese (ja)
Other versions
JPS6467247A (en
Inventor
Kenji Kataoka
Toshihiko Hirabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP22505587A priority Critical patent/JPS6467247A/en
Publication of JPS6467247A publication Critical patent/JPS6467247A/en
Publication of JPH04694B2 publication Critical patent/JPH04694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • B01J8/067Heating or cooling the reactor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は外管と内管とから成る二重管構造を
有し、上記外管と内管との間に形成される環状空
間部に触媒が充填された触媒層を有し、上記外管
のガス流と内管のガス流とは一方の端部で連通し
ている反応管を備えた反応装置に関するものであ
る。
[Detailed Description of the Invention] [Industrial Application Field] This invention has a double pipe structure consisting of an outer pipe and an inner pipe, and an annular space formed between the outer pipe and the inner pipe is The present invention relates to a reactor equipped with a reaction tube having a catalyst bed filled with a catalyst, and in which the gas flow in the outer tube and the gas flow in the inner tube communicate with each other at one end.

〔従来の技術〕[Conventional technology]

第3図は従来装置、例えば特開昭58−151438号
公報に示されたものであり、図において、1は反
応管、2は外管であり、一端面に触媒3を取り入
れる取入口2aを有しており、他端側にエンドキ
ヤツプ4が接続されている。5は原料ガスを外管
2内に導入する導入管、6は外管2内に外管2と
同芯円状に配置された内管であり、内管6のガス
流と外管2のガス流とは一方の端部で連通してい
る。即ちエンドキヤツプ4部で連通している。7
は外管2と内管6との間に形成される環状空間部
に触媒3が充填されて形成された触媒層、8は触
媒3を支持する受け皿、9は内管6の他方の端部
に接続され、内管6内を流れる反応ガスを反応管
1外に導出する導出管であり、これら2〜9によ
り二重管構造の反応管1が構成されている。
FIG. 3 shows a conventional device, for example, the one shown in Japanese Patent Application Laid-Open No. 151438/1982. In the figure, 1 is a reaction tube, 2 is an outer tube, and one end face has an intake port 2a for taking in the catalyst 3. The end cap 4 is connected to the other end. Reference numeral 5 indicates an introduction pipe for introducing raw material gas into the outer pipe 2, and reference numeral 6 indicates an inner pipe arranged concentrically with the outer pipe 2 within the outer pipe 2. It communicates with the gas stream at one end. That is, they communicate through four end caps. 7
8 is a catalyst layer formed by filling the annular space formed between the outer tube 2 and the inner tube 6 with the catalyst 3; 8 is a receiving plate that supports the catalyst 3; 9 is the other end of the inner tube 6. This is a lead-out pipe that is connected to the inner pipe 6 and leads out the reaction gas flowing inside the inner pipe 6 to the outside of the reaction tube 1. These 2 to 9 constitute the reaction tube 1 having a double-tube structure.

次に動作について説明する。説明の便宜上、例
えば水蒸気改質反応装置を例に説明する。原料ガ
スである炭化水素とスチームは、例えば450℃程
度に予熱された後、導入管5より外管2内に導入
され、外管2と内管6との間に形成された触媒層
7内の触媒3と接触する。ここで、原料ガスは水
蒸気改質反応を生じ、H2,CO,CO2等の混合ガ
ス(改質ガス)となる。水蒸気改質反応は吸熱反
応であり、この熱量を補償するため、燃焼ガスに
よつて外管2の外部を約1000℃に加熱する。又、
水蒸気改質反応は高温程水素ガス成分が多くなる
ため、通常の水素製造プラントでは、触媒層7出
口の改質ガス温度(反応温度)として、例えば
800℃程度が採用されている。燃焼ガスの加熱は、
この改質ガス温度の上昇にも使用されている。反
応の終了した高温の改質ガスは、受け皿8の複数
個の小孔(図示せず)を通過し、エンドキヤツプ
4にて流れを反転し、内管6を通つて高温のまま
導出管9から反応管1の外に、即ち、系外に導出
される。
Next, the operation will be explained. For convenience of explanation, a steam reforming reaction apparatus will be explained as an example. Hydrocarbons and steam, which are raw material gases, are preheated to about 450°C, for example, and then introduced into the outer tube 2 through the introduction tube 5, and are then introduced into the catalyst layer 7 formed between the outer tube 2 and the inner tube 6. contact with the catalyst 3 of. Here, the raw material gas undergoes a steam reforming reaction and becomes a mixed gas (reformed gas) of H 2 , CO, CO 2 and the like. The steam reforming reaction is an endothermic reaction, and in order to compensate for this amount of heat, the outside of the outer tube 2 is heated to about 1000° C. by combustion gas. or,
In the steam reforming reaction, the hydrogen gas component increases as the temperature increases, so in a normal hydrogen production plant, the temperature of the reformed gas (reaction temperature) at the outlet of the catalyst layer 7 is, for example,
A temperature of about 800℃ is used. The heating of combustion gas is
It is also used to increase the temperature of this reformed gas. After the reaction, the high-temperature reformed gas passes through a plurality of small holes (not shown) in the receiving tray 8, reverses its flow at the end cap 4, passes through the inner tube 6, and exits at the outlet tube 9 while remaining at a high temperature. From there, it is led out of the reaction tube 1, that is, out of the system.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来の反応装置は以上のように構成されてお
り、内管6内の改質ガスと内管6の管壁との熱伝
達率を向上させるため、内管6を小口径として改
質ガスの流速を上げると伝熱面積が少なくなり、
逆に、伝熱面積を大きくすると内管6内の改質ガ
スの流速が低下し熱伝導率が低下する。従つて、
エンドキヤツプ4部での800℃程度の改質ガスが、
高温のまま系外に排出されるという熱的な無駄が
ある。また、触媒層7の外管側、中央部、内管側
との温度に差が生じ、中央部に特に温度が低い状
態となり改質反応の特性が低下するという問題点
があつた。
The conventional reactor is configured as described above, and in order to improve the heat transfer coefficient between the reformed gas in the inner tube 6 and the wall of the inner tube 6, the inner tube 6 is made with a small diameter and the reformed gas is Increasing the flow rate reduces the heat transfer area,
Conversely, when the heat transfer area is increased, the flow rate of the reformed gas in the inner tube 6 is reduced, and the thermal conductivity is reduced. Therefore,
The reformed gas at about 800℃ in the 4th part of the end cap is
There is a thermal waste in that it is discharged out of the system while still being at a high temperature. In addition, there was a problem in that there was a difference in temperature between the outer tube side, the center portion, and the inner tube side of the catalyst layer 7, and the temperature was particularly low in the center portion, deteriorating the characteristics of the reforming reaction.

この発明における反応装置は内管内を通る高温
ガスの顕熱を無駄に捨てることなく、有効に利用
する反応装置を得ることを目的とする。
The purpose of the reactor of the present invention is to provide a reactor that effectively utilizes the sensible heat of the high-temperature gas passing through the inner tube without wasting it.

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係る反応装置は、吸熱部が内管内を
通るガス流中に配設され、放熱部が触媒層の原料
ガス導入側且つ外管と内管との略中央に配設さ
れ、内部に作動液体が封入され放射状に複数配設
されたヒートパイプを設けたものである。
In the reactor according to the present invention, the heat absorbing part is disposed in the gas flow passing through the inner tube, the heat dissipating part is disposed on the raw material gas introduction side of the catalyst layer and approximately at the center of the outer tube and the inner tube, and It is equipped with a plurality of heat pipes filled with working fluid and arranged radially.

〔作用〕[Effect]

この発明における反応装置は、内管内を通る高
温のガス顕熱がヒートパイプの吸熱部に吸収さ
れ、その熱はヒートパイプの放熱部に輸送され、
放熱部を通して触媒層の原料ガス導入側且つ略中
央部に放熱される。
In the reactor according to the present invention, the sensible heat of the high-temperature gas passing through the inner tube is absorbed by the heat absorption part of the heat pipe, and the heat is transported to the heat radiation part of the heat pipe,
Heat is radiated through the heat radiating portion to the raw material gas introduction side and substantially central portion of the catalyst layer.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の一実施例を図について説明す
る。第1図,第2図において、1〜3,5〜7,
9は上述した従来装置の構成と同様である。10
は吸熱部10aが内管6を通り導出管9に流入す
る高温のガス流中に配設され、放熱部10bが触
媒層7の原料ガス導入側且つ外管2と内管6との
略中央に配設され、内部にセシウム、カリウム、
ナトリウム等の作動液体が封入されたヒートパイ
プであり、第2図に示すように放射状に複数設け
ている。
An embodiment of the present invention will be described below with reference to the drawings. In Figures 1 and 2, 1 to 3, 5 to 7,
9 has the same structure as the conventional device described above. 10
The heat absorption part 10a is arranged in the high temperature gas flow passing through the inner pipe 6 and flowing into the outlet pipe 9, and the heat radiation part 10b is arranged on the raw material gas introduction side of the catalyst layer 7 and approximately in the center between the outer pipe 2 and the inner pipe 6. inside, cesium, potassium,
These are heat pipes in which a working liquid such as sodium is sealed, and a plurality of heat pipes are provided radially as shown in FIG.

次に動作について説明する。原料ガスである炭
化水素とスチームは、例えば450℃程度に予熱さ
れた後、従来と同様に導入管5より外管2内に導
入され、触媒層7内で触媒3と接触し、水蒸気改
質反応を生じる。反応の終了した高温の改質ガス
は、受け皿8の複数個の小孔(図示せず)を通過
し、エンドキヤツプ4にて流れを反転し、内管6
を通つて導出管9から系外に排出される。ところ
で、内管6を通り導出管9に流入する高温の改質
ガスはヒートパイプ10の吸熱部10bと熱接触
し、その高温の改質ガスの顕熱はヒートパイプ1
0の吸熱部10aに吸収される。即ち、ヒートパ
イプ10の吸熱部10aを加熱し、この加熱によ
りヒートパイプ10内部に封入された作動液体も
加熱され、高温の改質ガスの顕熱を蒸発潜熱とし
て奪い蒸気化し、ヒートパイプ10の放熱部10
bへその内部で移動する。ヒートパイプ10の放
熱部10bへ移動した作動液体の蒸気は触媒層7
に導入した原料ガス中に放熱され、原料ガス若し
くは改質ガスの昇温ないしは反応熱を補償する。
このとき作動液体11の蒸気は凝縮して液化す
る。凝縮して液化した作動液体はヒートパイプ1
0の吸熱部10aへその内部で移動して戻る。こ
のようにして、ヒートパイプ10内の作動液体の
蒸気化、液化の繰り返しにより、触媒層7を通つ
た高温の改質ガスの顕熱をヒートパイプ10の吸
熱部10aによつて有効に吸収し、この熱をヒー
トパイプ10の放熱部10bに輸送し、特に反応
が大きく吸熱量の大きい触媒層7の原料ガス導入
部且つ外管2と内管6との略中央に放熱して熱伝
達することができ、中央部の温度を上昇させるこ
とができ触媒層7の外管側、中央部、内管側との
温度差を著しく低減でき有効な反応特性を得るこ
とができる。有効に利用された後の改質ガスは導
出管9を通して系外に排出される。これに伴い装
置の小形化や補助燃料量の削減が可能となる。
Next, the operation will be explained. Hydrocarbons and steam, which are raw material gases, are preheated to about 450°C, for example, and then introduced into the outer tube 2 from the introduction tube 5 as in the conventional case, and come into contact with the catalyst 3 in the catalyst layer 7, where they undergo steam reforming. produce a reaction. After the reaction, the high temperature reformed gas passes through a plurality of small holes (not shown) in the receiving tray 8, reverses its flow at the end cap 4, and flows into the inner tube 6.
It is discharged to the outside of the system through the outlet pipe 9. By the way, the high temperature reformed gas flowing into the outlet pipe 9 through the inner pipe 6 comes into thermal contact with the heat absorption part 10b of the heat pipe 10, and the sensible heat of the high temperature reformed gas is transferred to the heat pipe 1.
0 is absorbed by the heat absorption part 10a. That is, the heat absorption part 10a of the heat pipe 10 is heated, and this heating also heats the working liquid sealed inside the heat pipe 10, which absorbs the sensible heat of the high-temperature reformed gas as latent heat of vaporization and vaporizes the heat pipe 10. Heat radiation part 10
Move inside to b. The vapor of the working liquid that has moved to the heat radiation part 10b of the heat pipe 10 is transferred to the catalyst layer 7.
Heat is radiated into the raw material gas introduced into the reactor to compensate for the temperature increase or reaction heat of the raw material gas or reformed gas.
At this time, the vapor of the working liquid 11 is condensed and liquefied. The condensed and liquefied working fluid is transferred to heat pipe 1.
0 and returns to the heat absorption section 10a. In this way, by repeatedly vaporizing and liquefying the working liquid in the heat pipe 10, the sensible heat of the high temperature reformed gas that has passed through the catalyst layer 7 is effectively absorbed by the heat absorbing portion 10a of the heat pipe 10. This heat is transported to the heat dissipation section 10b of the heat pipe 10, and is radiated and transferred to the raw material gas introduction section of the catalyst layer 7 where the reaction is particularly strong and the amount of heat absorbed is large, and approximately at the center between the outer tube 2 and the inner tube 6. This makes it possible to increase the temperature of the central portion, significantly reduce the temperature difference between the outer tube side, the central portion, and the inner tube side of the catalyst layer 7, and obtain effective reaction characteristics. After being effectively utilized, the reformed gas is discharged to the outside of the system through the outlet pipe 9. Accordingly, it becomes possible to downsize the device and reduce the amount of auxiliary fuel.

又、ヒートパイプ10の吸熱部10a、放熱部
10bに伝熱フイン(図示せず)を設け、吸熱効
果、放熱効果を高めるようにしてもよい。
Further, heat transfer fins (not shown) may be provided in the heat absorption part 10a and the heat radiation part 10b of the heat pipe 10 to enhance the heat absorption effect and the heat radiation effect.

〔発明の効果〕〔Effect of the invention〕

この発明は以上説明した通り、吸熱部が内管内
を通るガス流中に配設され、放熱部が触媒層の原
料ガス導入側且つ外管と内管との略中央に配設さ
れ、内部に作動液体が封入され放射状に複数配置
されたヒートパイプを設け、内管内を通る高温ガ
スの顕熱をヒートパイプの吸熱部で吸収してヒー
トパイプの放熱部に熱輸送し、ヒートパイプの放
熱部を通して触媒層の原料ガス導入側且つ略中央
に放熱するようにしたので、内管内を通る高温ガ
スの顕熱を無駄に捨てることなく有効に利用する
ことができると共に有効な反応特性を得ることが
できる。
As explained above, in this invention, the heat absorbing part is disposed in the gas flow passing through the inner tube, the heat radiating part is disposed on the raw material gas introduction side of the catalyst layer and approximately in the center between the outer tube and the inner tube, and A plurality of heat pipes filled with a working liquid and arranged radially are provided, and the sensible heat of the high-temperature gas passing through the inner pipe is absorbed by the heat absorption part of the heat pipe, and the heat is transferred to the heat radiation part of the heat pipe. Since the heat is radiated to the raw material gas introduction side and approximately the center of the catalyst layer through the inner tube, the sensible heat of the high temperature gas passing through the inner tube can be used effectively without wasting it, and effective reaction characteristics can be obtained. can.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例による反応装置を
示す断面図、第2図は第1図−線における断
面図、第3図は従来の反応装置を示す断面図であ
る。 図において、2は外管、3は触媒、6は内管、
7は触媒層、10はヒートパイプ、10aは吸熱
部、10bは放熱部である。尚、図中同一符号は
同一又は相当部分を示す。
FIG. 1 is a sectional view showing a reaction apparatus according to an embodiment of the present invention, FIG. 2 is a sectional view taken along the line - FIG. 1, and FIG. 3 is a sectional view showing a conventional reaction apparatus. In the figure, 2 is an outer tube, 3 is a catalyst, 6 is an inner tube,
7 is a catalyst layer, 10 is a heat pipe, 10a is a heat absorption part, and 10b is a heat radiation part. Note that the same reference numerals in the figures indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】[Claims] 1 外管と内管とからなる二重管構造を有し、上
記外管と内管との間に形成される環状空間部に触
媒が充填された触媒層を有し、上記外管内に導入
され上記触媒層を通る原料ガスを上記内管内を通
して導出する反応装置において、吸熱部が上記内
管内を通るガス流中に配設され、放熱部が上記触
媒層の原料ガス導入側且つ上記外管と内管との略
中央に配設され、内部に作動液体が封入され放射
状に複数配置されたヒートパイプを備えたことを
特徴とする反応装置。
1 It has a double tube structure consisting of an outer tube and an inner tube, and has a catalyst layer filled with a catalyst in an annular space formed between the outer tube and the inner tube, and the catalyst is introduced into the outer tube. In the reactor, a heat absorption part is disposed in the gas flow passing through the inner pipe, and a heat radiation part is provided on the raw material gas inlet side of the catalyst layer and on the outer pipe. 1. A reaction device comprising a plurality of heat pipes disposed approximately in the center of the inner tube and the inner tube, the heat pipes having a working liquid sealed therein and arranged radially.
JP22505587A 1987-09-08 1987-09-08 Reactor Granted JPS6467247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22505587A JPS6467247A (en) 1987-09-08 1987-09-08 Reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22505587A JPS6467247A (en) 1987-09-08 1987-09-08 Reactor

Publications (2)

Publication Number Publication Date
JPS6467247A JPS6467247A (en) 1989-03-13
JPH04694B2 true JPH04694B2 (en) 1992-01-08

Family

ID=16823332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22505587A Granted JPS6467247A (en) 1987-09-08 1987-09-08 Reactor

Country Status (1)

Country Link
JP (1) JPS6467247A (en)

Also Published As

Publication number Publication date
JPS6467247A (en) 1989-03-13

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