JPH0478151B2 - - Google Patents

Info

Publication number
JPH0478151B2
JPH0478151B2 JP60199897A JP19989785A JPH0478151B2 JP H0478151 B2 JPH0478151 B2 JP H0478151B2 JP 60199897 A JP60199897 A JP 60199897A JP 19989785 A JP19989785 A JP 19989785A JP H0478151 B2 JPH0478151 B2 JP H0478151B2
Authority
JP
Japan
Prior art keywords
differential waveform
slice level
waveform
differential
value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60199897A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6260222A (ja
Inventor
Hironobu Niijima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Priority to JP60199897A priority Critical patent/JPS6260222A/ja
Publication of JPS6260222A publication Critical patent/JPS6260222A/ja
Publication of JPH0478151B2 publication Critical patent/JPH0478151B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Measurement Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
JP60199897A 1985-09-09 1985-09-09 荷電粒子ビ−ムの寸法測定装置 Granted JPS6260222A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60199897A JPS6260222A (ja) 1985-09-09 1985-09-09 荷電粒子ビ−ムの寸法測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60199897A JPS6260222A (ja) 1985-09-09 1985-09-09 荷電粒子ビ−ムの寸法測定装置

Publications (2)

Publication Number Publication Date
JPS6260222A JPS6260222A (ja) 1987-03-16
JPH0478151B2 true JPH0478151B2 (cs) 1992-12-10

Family

ID=16415421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60199897A Granted JPS6260222A (ja) 1985-09-09 1985-09-09 荷電粒子ビ−ムの寸法測定装置

Country Status (1)

Country Link
JP (1) JPS6260222A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103513265A (zh) * 2012-06-29 2014-01-15 中国科学院大连化学物理研究所 带电粒子束或团可移动时间切片三维成像探测方法及装置
KR102580374B1 (ko) * 2022-05-26 2023-09-18 한국핵융합에너지연구원 Lts 및 hts 관내도체 의 하이브리드 조인트 조립체, 이의 lts 및 hts 관내도체의 하이브리드 조인트 방법 및 이에 의한 lts 관내도체의 연장 방법

Also Published As

Publication number Publication date
JPS6260222A (ja) 1987-03-16

Similar Documents

Publication Publication Date Title
JPH0220921B2 (cs)
JPH0478151B2 (cs)
JPH0628232B2 (ja) 荷電ビーム露光装置
JP3453009B2 (ja) 電子ビーム露光装置及びこの装置に於けるマーク位置検出方法
JPH03257916A (ja) 荷電粒子ビーム描画における実効ショット時間決定方法
JPS6233246Y2 (cs)
JPH063792B2 (ja) 露光パタ−ンデ−タの評価方法
JPH0554605B2 (cs)
JPS6327642B2 (cs)
JPH09166698A (ja) 荷電粒子ビームの測定方法
JPH02126108A (ja) 電子ビーム測長装置
JPH048938B2 (cs)
JPS63269522A (ja) 電子ビ−ム装置
JPS59188916A (ja) 偏向歪補正方法
JPH0212379B2 (cs)
JPS60245133A (ja) 電子ビ−ム露光装置における偏向歪補正方法
JPH03278516A (ja) 荷電粒子ビーム装置におけるマーク位置検出装置
JPS61114116A (ja) 寸法測長装置
JPH06160502A (ja) 透磁率の測定方法
JPS61142741A (ja) マ−ク検出方法
JPS5895204A (ja) 試料位置検出方法
JPS62160721A (ja) 電子線描画装置
JPH0391229A (ja) 露光装置
JPH08162384A (ja) 電子ビーム露光装置
JPH03179208A (ja) 寸法測定処理装置