JPH0479422U - - Google Patents
Info
- Publication number
- JPH0479422U JPH0479422U JP12344890U JP12344890U JPH0479422U JP H0479422 U JPH0479422 U JP H0479422U JP 12344890 U JP12344890 U JP 12344890U JP 12344890 U JP12344890 U JP 12344890U JP H0479422 U JPH0479422 U JP H0479422U
- Authority
- JP
- Japan
- Prior art keywords
- film
- foreign matter
- pure water
- enveloping
- thawing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 230000008014 freezing Effects 0.000 claims 1
- 238000007710 freezing Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010257 thawing Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Description
第１図はこの発明の一実施例による異物除去装
置を示す構成図、第２図ａ，ｂ，ｃは除去原理の
一例を示す図、第３図はその動作を示すシーケン
ス図、第４図及び第５図は従来の異物除去装置の
構成図及び除去原理図である。 図において、３は純水蒸気噴出ノズル、４は気
化ＣＯ２噴射ノズル、５は温水噴出ノズル、６は
付着異物、７は純水皮膜、８は急冷による凍結膜
、９は温水。なお、図中、同一符号は同一、又は
相当部分を示す。
置を示す構成図、第２図ａ，ｂ，ｃは除去原理の
一例を示す図、第３図はその動作を示すシーケン
ス図、第４図及び第５図は従来の異物除去装置の
構成図及び除去原理図である。 図において、３は純水蒸気噴出ノズル、４は気
化ＣＯ２噴射ノズル、５は温水噴出ノズル、６は
付着異物、７は純水皮膜、８は急冷による凍結膜
、９は温水。なお、図中、同一符号は同一、又は
相当部分を示す。
Claims (1)
- ウエハ表面付着異物に対して純水皮膜で包み込
みその皮膜を急冷凍結、昇温解凍の温度サイクル
を与えることで異物を除去する機能を備えた半導
体製造装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12344890U JPH0479422U (ja) | 1990-11-21 | 1990-11-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12344890U JPH0479422U (ja) | 1990-11-21 | 1990-11-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0479422U true JPH0479422U (ja) | 1992-07-10 |
Family
ID=31871156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12344890U Pending JPH0479422U (ja) | 1990-11-21 | 1990-11-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0479422U (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008071875A (ja) * | 2006-09-13 | 2008-03-27 | Dainippon Screen Mfg Co Ltd | 基板処理装置、液膜凍結方法および基板処理方法 |
-
1990
- 1990-11-21 JP JP12344890U patent/JPH0479422U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008071875A (ja) * | 2006-09-13 | 2008-03-27 | Dainippon Screen Mfg Co Ltd | 基板処理装置、液膜凍結方法および基板処理方法 |
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