JPH0480723B2 - - Google Patents

Info

Publication number: JPH0480723B2
Authority: JP; Japan
Prior art keywords: gas; magnetic field; discharge; power source; electrode
Prior art date: 1986-07-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP61173783A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6331523A (ja

Inventor

Ryohei Itaya

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Individual

Original Assignee

Individual

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-07-25

Filing date

1986-07-25

Publication date

1992-12-21

1986-07-25 Application filed by Individual filed Critical Individual

1986-07-25 Priority to JP61173783A priority Critical patent/JPS6331523A/ja

1988-02-10 Publication of JPS6331523A publication Critical patent/JPS6331523A/ja

1992-12-21 Publication of JPH0480723B2 publication Critical patent/JPH0480723B2/ja

Status Granted legal-status Critical Current

Links

239000007789 gas Substances 0.000 claims description 71
239000002912 waste gas Substances 0.000 claims description 30
238000011282 treatment Methods 0.000 claims description 26
238000012545 processing Methods 0.000 claims description 14
230000005684 electric field Effects 0.000 claims description 6
230000004907 flux Effects 0.000 claims description 3
239000004020 conductor Substances 0.000 claims description 2
238000000926 separation method Methods 0.000 claims description 2
239000011343 solid material Substances 0.000 claims description 2
238000006243 chemical reaction Methods 0.000 description 14
238000000034 method Methods 0.000 description 10
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
229910000077 silane Inorganic materials 0.000 description 8
XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 6
239000010408 film Substances 0.000 description 6
239000001257 hydrogen Substances 0.000 description 5
229910052739 hydrogen Inorganic materials 0.000 description 5
229920001296 polysiloxane Polymers 0.000 description 5
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
238000005229 chemical vapour deposition Methods 0.000 description 4
150000002431 hydrogen Chemical class 0.000 description 4
239000001301 oxygen Substances 0.000 description 4
229910052760 oxygen Inorganic materials 0.000 description 4
238000001020 plasma etching Methods 0.000 description 4
239000002994 raw material Substances 0.000 description 4
239000012265 solid product Substances 0.000 description 4
229910021417 amorphous silicon Inorganic materials 0.000 description 3
238000000151 deposition Methods 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
229910000073 phosphorus hydride Inorganic materials 0.000 description 3
238000005268 plasma chemical vapour deposition Methods 0.000 description 3
239000000047 product Substances 0.000 description 3
239000000126 substance Substances 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
229910052796 boron Inorganic materials 0.000 description 2
229910052810 boron oxide Inorganic materials 0.000 description 2
229910002092 carbon dioxide Inorganic materials 0.000 description 2
239000001569 carbon dioxide Substances 0.000 description 2
238000004140 cleaning Methods 0.000 description 2
150000001875 compounds Chemical class 0.000 description 2
JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 2
239000011888 foil Substances 0.000 description 2
239000012212 insulator Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
229910052757 nitrogen Inorganic materials 0.000 description 2
229910001392 phosphorus oxide Inorganic materials 0.000 description 2
238000003672 processing method Methods 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 description 2
231100000167 toxic agent Toxicity 0.000 description 2
239000003440 toxic substance Substances 0.000 description 2
229910001868 water Inorganic materials 0.000 description 2
229910052582 BN Inorganic materials 0.000 description 1
PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
229920006266 Vinyl film Polymers 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
229910000085 borane Inorganic materials 0.000 description 1
WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
229910001634 calcium fluoride Inorganic materials 0.000 description 1
238000012993 chemical processing Methods 0.000 description 1
238000012790 confirmation Methods 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000001784 detoxification Methods 0.000 description 1
206010012601 diabetes mellitus Diseases 0.000 description 1
238000007599 discharging Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
125000002524 organometallic group Chemical group 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
238000009832 plasma treatment Methods 0.000 description 1
239000000843 powder Substances 0.000 description 1
238000011160 research Methods 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
238000012360 testing method Methods 0.000 description 1
239000010409 thin film Substances 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
238000011144 upstream manufacturing Methods 0.000 description 1

Landscapes

Treating Waste Gases (AREA)

JP61173783A 1986-07-25 1986-07-25 廃ガス処理装置 Granted JPS6331523A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP61173783A JPS6331523A (ja)	1986-07-25	1986-07-25	廃ガス処理装置

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP61173783A JPS6331523A (ja)	1986-07-25	1986-07-25	廃ガス処理装置

Publications (2)

Publication Number	Publication Date
JPS6331523A JPS6331523A (ja)	1988-02-10
JPH0480723B2 true JPH0480723B2 (fr)	1992-12-21

Family

ID=15967069

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP61173783A Granted JPS6331523A (ja)	1986-07-25	1986-07-25	廃ガス処理装置

Country Status (1)

Country	Link
JP (1)	JPS6331523A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2585257B2 (ja) *	1987-04-16	1997-02-26	三井東圧化学株式会社	ガス処理方法
US4735633A (en) *	1987-06-23	1988-04-05	Chiu Kin Chung R	Method and system for vapor extraction from gases
US6576202B1 (en)	2000-04-21	2003-06-10	Kin-Chung Ray Chiu	Highly efficient compact capacitance coupled plasma reactor/generator and method
KR100596511B1 (ko)	2004-06-30	2006-07-03	플라즈마에너지자원 주식회사	공기청정기
JP4955027B2 (ja) *	2009-04-02	2012-06-20	クリーン・テクノロジー株式会社	排ガス処理装置における磁場によるプラズマの制御方法
CN111895547A (zh) *	2020-08-27	2020-11-06	长沙京鳞子科技有限公司	一种病毒杀灭型空气循环系统

1986
- 1986-07-25 JP JP61173783A patent/JPS6331523A/ja active Granted

Also Published As

Publication number	Publication date
JPS6331523A (ja)	1988-02-10

Legal Events

Date	Code	Title	Description
2004-08-03	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2005-05-31	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2006-07-25	EXPY	Cancellation because of completion of term

Publication	Publication Date	Title
CN1021886C (zh)	1993-08-25	从气体中提取气化物的装置及其方法
US5951742A (en)	1999-09-14	Processes for the scrubbing of exhaust gas streams
US20160355400A1 (en)	2016-12-08	Method for synthesizing organic matter and submerged plasma device
KR910003110B1 (ko)	1991-05-18	배출가스 처리장치
JPH0480723B2 (fr)	1992-12-21
KR940000553B1 (ko)	1994-01-24	배기가스 처리장치
JP5008622B2 (ja)	2012-08-22	プラズマ発生電極及びプラズマ発生方法
JP2598435B2 (ja)	1997-04-09	排ガスの放電処理装置
Jiao et al.	1997	Ion chemistry in boron trichloride BCl3
US5200043A (en)	1993-04-06	Method for treating waste gas
JP2863854B2 (ja)	1999-03-03	排ガス処理装置
JP2598432B2 (ja)	1997-04-09	排ガス処理装置
JPH02253823A (ja)	1990-10-12	排ガス処理装置
KR20080066927A (ko)	2008-07-17	가스 스트림 처리용 장치 및 가스 스트림 처리 방법
EP0244842A2 (fr)	1987-11-11	Appareil pour la production d'une couche mince
JPH06226032A (ja)	1994-08-16	Ｎｆ３系排ガス処理装置
JP2927804B2 (ja)	1999-07-28	三弗化窒素含有排ガスの処理方法
JP2940961B2 (ja)	1999-08-25	排ガス処理装置
JP2598433B2 (ja)	1997-04-09	排ガス放電処理装置
JPH0919620A (ja)	1997-01-21	有害ガスの除害方法
CN113825294A (zh)	2021-12-21	复合型等离子体放电装置及利用该装置的废气处理方法
JPH04110015A (ja)	1992-04-10	排ガス処理装置
EP0515111A1 (fr)	1992-11-25	Dispositif et procédé d'obtention d'ozone
KR19980036872A (ko)	1998-08-05	가스흐름내의 유해화합물제거장치
JP2585257B2 (ja)	1997-02-26	ガス処理方法