JPH0482035A - Production of optical disk - Google Patents

Production of optical disk

Info

Publication number
JPH0482035A
JPH0482035A JP19835990A JP19835990A JPH0482035A JP H0482035 A JPH0482035 A JP H0482035A JP 19835990 A JP19835990 A JP 19835990A JP 19835990 A JP19835990 A JP 19835990A JP H0482035 A JPH0482035 A JP H0482035A
Authority
JP
Japan
Prior art keywords
film
stamper
substrate
metal film
convex pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19835990A
Other languages
Japanese (ja)
Inventor
Yasuyuki Goto
康之 後藤
Nagaaki Etsuno
越野 長明
Iwao Tsugawa
津川 岩雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP19835990A priority Critical patent/JPH0482035A/en
Publication of JPH0482035A publication Critical patent/JPH0482035A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To easily form a stamper in a short period of time by selectively forming projecting patterns on a metallic film to form the stamper and transferring the projecting patterns of the stamper to a blank substrate, then forming a light reflecting film and protective film on the blank substrate. CONSTITUTION:A photosetting type resin 12 consisting of 2P (photo-Polymer) having pregrooves is formed on the substrate 11 and a metallic film 13 is deposited and formed thereon. The substrate 11 is then irradiated with a laser beam, by which the projecting patterns 14 are formed on the metallic film 13. The stamper consisting of the glass substrate 11 having the metallic film 13 formed with the projecting patterns 14 is installed in a metallic mold and the mold is heated. A polycarbonate resin is installed on the metallic film 13 and is pressurized by a low pressure, by which the metallic patterns are transferred onto the resin surface. A light reflecting film 17 consisting of Al and Au and a resist film consisting of a UV curing resin are applied as a protective film 18 thereon. The optical disk is easily formed in a short period of time in this way.

Description

【発明の詳細な説明】 〔概 要] 光ディスクの製造方法に関し、 レジスト液塗布、および該塗布形成したレジスト膜の露
光、現像工程や、該レジスト膜上に金属膜をメツキする
メツキ工程を不要とし、工程数を短縮して容易に短時間
にスタンパが形成できるようにした光ディスクの製造方
法を目的とし、プリグループを設けた基板上に加熱によ
り相変化が可能な金属膜を被着した後、 該金属膜に光ビームを所定のパターンで選択的に照射し
、該金属膜に凸型パターンを選択的に形成してスタンパ
を形成し、 該スタンパの凸型パターンをブランク基板に転写後、該
ブランク基板をスタンパより剥離し、前記ブランク基板
に光反射膜、および保護膜を形成することで構成する。
[Detailed Description of the Invention] [Summary] A method for manufacturing an optical disk that eliminates the need for applying a resist solution, exposing and developing a resist film formed by the coating, and plating a metal film on the resist film. The purpose of this method is to reduce the number of steps and easily form a stamper in a short period of time.The purpose of this method is to reduce the number of steps and form a stamper easily in a short time.After depositing a metal film that can undergo a phase change by heating on a substrate provided with a pre-group, The metal film is selectively irradiated with a light beam in a predetermined pattern, a convex pattern is selectively formed on the metal film to form a stamper, and the convex pattern of the stamper is transferred to a blank substrate. The blank substrate is peeled off from the stamper, and a light reflecting film and a protective film are formed on the blank substrate.

〔産業上の利用分野〕[Industrial application field]

本発明は光ディスクの製造方法に関する。 The present invention relates to a method of manufacturing an optical disc.

円形状の透明基板の表面に情報を記録した凹凸パターン
を有する透明プラスチック層を形成し、その上に光反射
層を設けてCD、 CD−ROyI等の光ディスクが形
成されている。
An optical disc such as a CD or CD-ROyI is formed by forming a transparent plastic layer having a concavo-convex pattern on which information is recorded on the surface of a circular transparent substrate, and then providing a light-reflecting layer thereon.

〔従来の技術〕[Conventional technology]

従来、このような光ディスクを形成するには、第2図(
a)に示すように透明なガラス円板I上にレジスト膜2
を塗布し、この上にレーザ光を選択的に所定のパターン
で照射して信号を記録した後、露光現像してレジスト膜
の表面に凹凸パターンを形成して記録情報とする。
Conventionally, in order to form such an optical disk, the process shown in FIG. 2 (
As shown in a), a resist film 2 is placed on a transparent glass disk I.
A laser beam is selectively irradiated onto the resist film in a predetermined pattern to record a signal, and then exposed and developed to form a concavo-convex pattern on the surface of the resist film, which is used as recorded information.

次いでこの凹凸状のパターンを有するレジスト膜上にニ
ッケル(Ni)、或いはコバルト(Co)等の金属薄膜
3を蒸着して、この薄膜を電極としてNiの金属電解メ
ツキ層を形成し、このメツキ層を剥がしてスタンパとす
る。そしてこのスタンパを射出成形機の金型に設置する
Next, a metal thin film 3 such as nickel (Ni) or cobalt (Co) is deposited on the resist film having the uneven pattern, and a Ni metal electrolytic plating layer is formed using this thin film as an electrode. Peel it off and use it as a stamper. This stamper is then installed in a mold of an injection molding machine.

そして第2図(b)に示すように、前記した金型に溶融
したポリカーボネイトのようなプラスチック樹脂4を射
出して円板状の形状とすると共に、スタンパの表面の凹
凸情報を転写する。
Then, as shown in FIG. 2(b), molten plastic resin 4 such as polycarbonate is injected into the mold described above to form a disk shape, and the unevenness information on the surface of the stamper is transferred.

そしてこのプラスチック樹脂の表面にアルミニウム(A
f) 、或いは金(Au)等の光反射膜5を蒸着、或い
はスバンタ法で形成する。そしてこの上にレジスト膜の
ような紫外線硬化型樹脂を保護膜6として塗布した後、
硬化して光ディスクを形成している。
Then, the surface of this plastic resin is coated with aluminum (A
f) Alternatively, a light reflecting film 5 made of gold (Au) or the like is formed by vapor deposition or the Svanta method. Then, after applying an ultraviolet curing resin such as a resist film as a protective film 6,
It hardens to form an optical disc.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

然し、上記した従来の方法では、スタンパを形成するの
にレジスト液の塗布、塗布したレジスト膜の露光および
現像工程、またレジスト膜上の金属の蒸着、およびメツ
キ工程等多数の製造工程を必要とし、上記スタンパの製
造に長時間を要し、またレジスト液の管理、或いはメツ
キ液の濃度管理等、煩雑な管理作業を必要とする等の問
題がある。
However, the conventional method described above requires a number of manufacturing steps to form a stamper, such as applying a resist solution, exposing and developing the applied resist film, and depositing metal on the resist film, and plating. However, there are problems in that it takes a long time to manufacture the stamper and requires complicated management work such as managing the resist solution or the concentration of the plating solution.

本発明は上記した問題点を解決し、前記レジスト液の塗
布、露光、現像工程、或いは蒸着、或いはメツキ工程等
の煩雑な工程を除去し、簡単な工程で容易に短時間に光
ディスクが得られるような光ディスクの製造方法を目的
とする。
The present invention solves the above-mentioned problems, eliminates the complicated steps such as resist solution coating, exposure, development, vapor deposition, and plating, and makes it possible to easily obtain an optical disk in a short time through simple steps. The purpose of the present invention is to provide a method for manufacturing such an optical disc.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成する本発明の光ディスクの製造方法は、
プリグループを設けた基板上に加熱により相変化が可能
な金属膜を被着した後、該金属膜に光ビームを所定のパ
ターンで選択的に照射し、該金属膜に凸型パターンを選
択的に形成してスタンパを形成し、 該スタンパの凸型パターンをブランク基板に転写後、該
ブランク基板をスタンパより剥離し、前記ブランク基板
に光反射膜、および保護膜を形成する。または上記ブラ
ンク基板に予め、光反射膜を形成し、該基板を加熱しな
がら前記スタンパの凸型パターンを転写する。また上記
金属膜の厚さを100〜800nmの範囲とする。
The method for manufacturing an optical disc of the present invention that achieves the above object includes:
After depositing a metal film that can undergo a phase change by heating on a substrate provided with pre-groups, a light beam is selectively irradiated onto the metal film in a predetermined pattern to selectively create a convex pattern on the metal film. After transferring the convex pattern of the stamper to a blank substrate, the blank substrate is peeled off from the stamper, and a light reflecting film and a protective film are formed on the blank substrate. Alternatively, a light reflecting film is formed on the blank substrate in advance, and the convex pattern of the stamper is transferred while heating the substrate. Further, the thickness of the metal film is in the range of 100 to 800 nm.

〔作 用〕[For production]

ガラス基板上にプリグループを設けた光硬化型の2P 
(Photo−Polymer)樹脂を形成し、該基板
上にインジウム・アンチモン(InSb)より成り、S
bO劃合側55〜65原子%とした合金薄膜を形成して
、レーザ光を選択的に照射して加熱すると、加熱領域が
閃亜鉛鉱型結晶構造より立方晶系の結晶相に相変化する
と共に、加熱領域に凸型のパターンが形成される。
Photocurable 2P with pre-groups on a glass substrate
(Photo-Polymer) resin is formed on the substrate, made of indium antimony (InSb), and S
When a thin alloy film containing 55 to 65 atomic % of bO on the joint side is formed and heated by selective irradiation with laser light, the heated region undergoes a phase change from a zinc blende crystal structure to a cubic crystal phase. At the same time, a convex pattern is formed in the heated region.

このような加熱領域に凸型の合金薄膜パターンが形成さ
れるのは、合金薄膜を被着した基板が平坦な場合では形
成されず、InとSbが所定の原子%で合金化した薄膜
を11ノグループを設けた基板上に被着した場合に限り
、形成されることを本発明者等は実験的に確認した。
Such a convex alloy thin film pattern is formed in the heating region when the substrate on which the alloy thin film is deposited is flat. The present inventors have experimentally confirmed that the film is formed only when the film is deposited on a substrate provided with a group.

このようにプリグループを備えた基板上にレーザ光を選
択的に照射すると、基板上にレーザ光の加熱による熱の
滞留領域が形成され、それによって照射領域に凸型のパ
ターンが形成される。
When the substrate provided with pre-groups is selectively irradiated with laser light in this manner, a heat retention region is formed on the substrate due to heating by the laser light, thereby forming a convex pattern in the irradiation region.

この凸型パターンが形成された金属膜を有するガラス基
板よりなるスタンパを金型内に設置し、咳金型を加熱し
、該金属膜上にポリカーボネイト樹脂を設置し、該樹脂
を低圧力で加圧すると該樹脂表面には金属パターンが転
写される。そしてその上にiやAuの光反射膜、および
紫外線硬化型樹脂のレジスト膜を保護膜として塗布する
と、煩雑なレジスト液の管理や、レジスト膜上に金属膜
をメツキするような煩雑な工程を採らずに光ディスクが
短時間に容易に形成できる。
A stamper made of a glass substrate having a metal film on which this convex pattern is formed is placed in a mold, the cough mold is heated, a polycarbonate resin is placed on the metal film, and the resin is applied at low pressure. When pressed, a metal pattern is transferred to the resin surface. Then, if a light reflective film such as i or Au and a resist film made of ultraviolet curable resin are applied as a protective film on top of that, the complicated management of resist solution and the complicated process of plating a metal film on the resist film can be avoided. To easily form an optical disk in a short time without having to remove any material.

〔実 施 例〕〔Example〕

以下、図面を用いて本発明の実施例につき詳細に説明す
る。
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図(a)に示すように、外径が130mmで、厚さ
が1.9mmのガラス円板より成る基板11に、プリグ
ループを有する2 P (Photo−PolylIl
er)の光硬化型樹脂12をレジスト液の塗布、および
所定のパターンの露光現像によって螺旋状に形成する。
As shown in FIG. 1(a), a 2P (Photo-PolylIl
er) is formed into a spiral shape by applying a resist solution and exposing and developing a predetermined pattern.

次いで第1図(b)に示すように、Inが37、Sbが
63原子%のInSbの合金薄膜よりなる金属膜13を
、460nmの厚さにスパッタにより被着形成する。
Next, as shown in FIG. 1(b), a metal film 13 made of an InSb alloy thin film containing 37 atomic % In and 63 atomic % Sb is deposited to a thickness of 460 nm by sputtering.

次いでこのガラス円板より成る基板11を、周速1.4
m/secで回転し、図示しないが半導体レーザ光源よ
り波長が780nmのレーザ光をレンズで絞り、かつC
Dフォーマット信号でレーザビームを強度変調し、In
Sbの合金薄膜より成る金属膜13に照射した。この半
導体レーザ光源の照射電力は、ディスクのガラス円板よ
りなる基板表面で81で有る。
Next, the substrate 11 made of this glass disk was moved at a circumferential speed of 1.4
It rotates at m/sec, focuses a laser beam with a wavelength of 780 nm from a semiconductor laser light source with a lens (not shown), and
Intensity modulates the laser beam with a D format signal and
The metal film 13 made of an Sb alloy thin film was irradiated. The irradiation power of this semiconductor laser light source is 81 at the surface of the substrate made of a glass disk.

このようにすると第1図(C)に示すように、上記金属
膜には凸部の高さhが120nmでピッチが1.6μm
の螺旋状の凸型パターン14が前記金属膜の溝15の箇
所に形成される。
In this way, as shown in FIG.
A spiral convex pattern 14 is formed in the groove 15 of the metal film.

次いでこの凸型パターンを有する金属膜とガラス円板と
よりなるスタンパをエンボス成形用の金型(図示せず)
内に設置し、該金型を190°Cに加熱し、この金属膜
上に第1図(d)に示すように、金属膜の凸型パターン
の転写用で、平坦な表面を有するポリカーボイト製のブ
ランク基板16を設置し、このブランク基板より50k
g/ cm”程度の低圧の圧力を加えて30秒間加圧す
る。
Next, the stamper made of the metal film having the convex pattern and the glass disk is placed in an embossing mold (not shown).
The mold is heated to 190°C, and a polycarbonate sheet with a flat surface is placed on the metal film for transferring the convex pattern of the metal film, as shown in FIG. 1(d). Install a blank board 16 made by
Apply a low pressure of about 30 g/cm" and pressurize for 30 seconds.

この圧力は従来に於けるようにプラスチック樹脂を射出
成形する際に用いる射出成形機に比して感かに低圧であ
るのでガラス基板が破損することは無く、装置も大規模
で高価なものを必要としない この圧力を取り去るとポリカーボネイトのブランク基板
上には、金属膜の凸型パターンが忠実に転写される。次
いでこのブランク基板を金型より取り外す。
This pressure is much lower than that of conventional injection molding machines used to injection mold plastic resins, so the glass substrate will not be damaged and the equipment can be large and expensive. When this unnecessary pressure is removed, the convex pattern of the metal film is faithfully transferred onto the blank polycarbonate substrate. Next, this blank substrate is removed from the mold.

次いで第1図(e)に示すようにブランク基板16の表
面にへ!金属を20Or+n+の厚さに被着して光反射
膜17を形成し、その上に紫外線硬化型樹脂を塗布して
保護膜18を形成する。このようにして形成した光ディ
スクをCDプレーヤに設置し、音楽情報を再生したとこ
ろ、通常のCDディスクと全く同様に音声が再生できた
Next, as shown in FIG. 1(e), onto the surface of the blank substrate 16! A light reflecting film 17 is formed by depositing metal to a thickness of 20 Or+n+, and a protective film 18 is formed by applying an ultraviolet curing resin thereon. When the optical disc thus formed was placed in a CD player and music information was played back, the audio could be played back exactly like a normal CD disc.

またこのエンボス成形を500回繰り返してもガラス基
板と凸型パターンを有する金属膜とより成るスタンパが
破損することは無く、また形成されたCDディスクには
何ら欠陥が認められなかった。
Further, even when this embossing was repeated 500 times, the stamper made of the glass substrate and the metal film having a convex pattern was not damaged, and no defects were observed in the formed CD disc.

またその他の実施例として、前記実施例で用いたスタン
パと金型を同一のものを用い、上記ブランク基板として
は予め表面に金(Au)膜を100rvの厚さに蒸着形
成したポリカーボネイト基板を用い、該基板を予め80
°Cに加熱し、前記金膜を蒸着した側のポリカーボネイ
ト基板表面をエンボス成形したところ、前記した実施例
と同様にスタンパの金属膜の凸型パターンを忠実に転写
することができた。
As another example, the same stamper and mold used in the previous example were used, and the blank substrate was a polycarbonate substrate on which a gold (Au) film had been vapor-deposited in advance to a thickness of 100 rv. , the substrate was preheated to 80
When the surface of the polycarbonate substrate on which the gold film was vapor-deposited was heated to 0.degree. C. and embossed, the convex pattern of the metal film of the stamper could be faithfully transferred, as in the above embodiment.

そしてこのようにして形成した光ディスクをCDプレー
ヤに設置した音楽情報を再生したところ、前記実施例と
同様な音楽情報が忠実に再生できた。
When the optical disc thus formed was placed in a CD player and music information was played back, the same music information as in the previous example could be faithfully played back.

またエンボス成形回数も500回以上可能であった。Moreover, the number of embossing moldings was also possible over 500 times.

また音楽情報を記録する代わりに、コンピュータのプロ
グラム情報を記録したいわゆるCD−ROMを形成して
も、忠実に信号が再生できるものが形成できた。
Furthermore, instead of recording music information, it was possible to create a so-called CD-ROM that recorded computer program information and could reproduce signals faithfully.

なお本発明者等は実験の結果、上記凸型パターンの凸型
部の高さは、合金薄膜の厚さによって異なり、上記合金
薄膜の厚さが1100nより800nmの範囲で変化す
ると、凸部の高さは50〜200nmの範囲で変化する
。この中で合金薄膜の厚さが400nmの厚さにすると
凸部の高さは120nmとなって、再生用の半導体レー
ザ光の波長を800nmとした時、上記金属パターンに
形成された凸部パターンの頂上と、該凸部パターンが形
成された金属膜の溝の表面との箇所で上記波長のレーザ
光の干渉が最大となって、最も高信顧度の再生が行い得
ることが判明した。
As a result of experiments, the inventors have found that the height of the convex portions of the convex pattern varies depending on the thickness of the alloy thin film, and that when the thickness of the alloy thin film changes from 1100 nm to 800 nm, the height of the convex portions increases. The height varies between 50 and 200 nm. In this case, when the thickness of the alloy thin film is 400 nm, the height of the convex part becomes 120 nm, and when the wavelength of the semiconductor laser beam for reproduction is 800 nm, the convex part pattern formed on the metal pattern is It has been found that the interference of the laser light of the above wavelength is maximum at the top of the groove and the surface of the groove of the metal film on which the convex pattern is formed, and reproduction can be performed with the highest reliability.

また実施例では金属膜13のInとSbの割合を37と
63原子%としたが、InSbに於けるSbの割合を5
5〜65原子%まで変化させた場合も同様な効果を得た
Furthermore, in the example, the proportions of In and Sb in the metal film 13 were set to 37 and 63 atomic percent, but the proportion of Sb in InSb was set to 5 atomic percent.
A similar effect was obtained when the content was varied from 5 to 65 atom%.

そしてこの範囲より外れると相変化による凸型パターン
が形成されないことが判明した。
It has been found that a convex pattern due to phase change is not formed outside this range.

以上述べたように本発明の方法によれば、スタンパ作成
時に於けるレジスト膜の露光、現像工程、金属膜のメツ
キ工程、メツキ液の濃度管理等の煩雑な工程が省略でき
、短時間で容易に光ディスクを形成することができる。
As described above, according to the method of the present invention, complicated steps such as exposure of a resist film, development process, plating process of a metal film, and concentration control of a plating liquid can be omitted during stamper production, and can be done easily in a short time. can form an optical disc.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように本発明によれば、簡単な
方法で短時間で種々の記録情報を有する光ディスクが容
易に形成できる効果がある。
As is clear from the above description, the present invention has the advantage that optical discs having various recorded information can be easily formed in a short time using a simple method.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)より第1図(e)迄は、本発明の光ディス
クの製造方法の一実施例の断面図、 第2図(a)、および第2図(b)は従来の光ディスク
の製造方法を示す断面図である。 図において、 11は基板、12は光硬化型樹脂、13は金属膜、14
は凸型パターン、15は溝、16はブランク基板、17
は光反射膜、18は保護膜を示す。 第1図(÷色2) (d) 44:萌、l走ヂ、77の製造方法虻r種判4牛面m第
1関いのf〕 4六LA1rlデ’t2h%AaJ5に& 不T@°i
 C2112図
FIG. 1(a) to FIG. 1(e) are cross-sectional views of an embodiment of the optical disk manufacturing method of the present invention, and FIG. 2(a) and FIG. 2(b) are cross-sectional views of a conventional optical disk manufacturing method. It is a sectional view showing a manufacturing method. In the figure, 11 is a substrate, 12 is a photocurable resin, 13 is a metal film, and 14
is a convex pattern, 15 is a groove, 16 is a blank substrate, 17
18 indicates a light reflecting film, and 18 indicates a protective film. Figure 1 (÷ color 2) (d) 44: Production method of Moe, l run, 77 (f) 46 LA1rlde't2h%AaJ5 & non-T @°i
C2112 figure

Claims (1)

【特許請求の範囲】 〔1〕プリグルーブを設けた基板(11)上に加熱によ
り相変化する金属膜(13)を被着した後、該金属膜に
光ビームを所定のパターンで選択的に照射し、該金属膜
に凸型パターン(14)を選択的に形成してスタンパを
形成し、 該スタンパの凸型パターン(14)をブランク基板(1
6)に転写後、該ブランク基板をスタンパより剥離し、 前記金属膜の凸型パターンを転写したブランク基板(1
6)に光反射膜(17)、および保護膜(18)を形成
することを特徴とする光ディスクの製造方法。 〔2〕上記ブランク基板(16)に予め、光反射膜(1
7)を形成し、該基板を加熱しながら上記ブランク基板
の光反射膜形成面に前記スタンパの凸型パターンを転写
することを特徴とする請求項(1)記載の光ディスクの
製造方法。 〔3〕上記金属膜(13)はInSbから成り、Sbの
割合を55〜65原子%の範囲とし、該金属膜(13)
の厚さを100〜800nmの範囲とすることを特徴と
する請求項(1)、或いは(2)に記載の光ディスクの
製造方法。
[Claims] [1] After depositing a metal film (13) that changes phase by heating on a substrate (11) provided with pregrooves, a light beam is selectively applied to the metal film in a predetermined pattern. irradiate to selectively form a convex pattern (14) on the metal film to form a stamper, and place the convex pattern (14) of the stamper on a blank substrate (1).
After transferring to 6), the blank substrate is peeled off from the stamper to obtain a blank substrate (1) to which the convex pattern of the metal film has been transferred.
6) A method for manufacturing an optical disc, comprising forming a light reflecting film (17) and a protective film (18). [2] A light reflective film (1) is coated on the blank substrate (16) in advance.
7), and transferring the convex pattern of the stamper onto the light reflective film forming surface of the blank substrate while heating the substrate. [3] The metal film (13) is made of InSb, and the proportion of Sb is in the range of 55 to 65 at%, and the metal film (13)
2. The method for manufacturing an optical disc according to claim 1, wherein the thickness of the optical disc is in the range of 100 to 800 nm.
JP19835990A 1990-07-24 1990-07-24 Production of optical disk Pending JPH0482035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19835990A JPH0482035A (en) 1990-07-24 1990-07-24 Production of optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19835990A JPH0482035A (en) 1990-07-24 1990-07-24 Production of optical disk

Publications (1)

Publication Number Publication Date
JPH0482035A true JPH0482035A (en) 1992-03-16

Family

ID=16389801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19835990A Pending JPH0482035A (en) 1990-07-24 1990-07-24 Production of optical disk

Country Status (1)

Country Link
JP (1) JPH0482035A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100830872B1 (en) * 2006-10-16 2008-05-21 삼성전기주식회사 Optical discs and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100830872B1 (en) * 2006-10-16 2008-05-21 삼성전기주식회사 Optical discs and manufacturing method thereof

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