JPH0485731U - - Google Patents

Info

Publication number
JPH0485731U
JPH0485731U JP1990126410U JP12641090U JPH0485731U JP H0485731 U JPH0485731 U JP H0485731U JP 1990126410 U JP1990126410 U JP 1990126410U JP 12641090 U JP12641090 U JP 12641090U JP H0485731 U JPH0485731 U JP H0485731U
Authority
JP
Japan
Prior art keywords
flat plate
wafer
semiconductor wafer
processing
suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1990126410U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990126410U priority Critical patent/JPH0485731U/ja
Publication of JPH0485731U publication Critical patent/JPH0485731U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例を示す断面図、第2
図は平面図、第3図は動作説明図、第4図は他の
実施例を示す図、第5図、第6図は従来の技術を
示す図である。 1……平板、2……ウエハー接触面、3……ウ
エハー、4……真空穴。
Fig. 1 is a sectional view showing one embodiment of the present invention;
3 is a plan view, FIG. 3 is an explanatory diagram of the operation, FIG. 4 is a diagram showing another embodiment, and FIGS. 5 and 6 are diagrams showing a conventional technique. 1... Flat plate, 2... Wafer contact surface, 3... Wafer, 4... Vacuum hole.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハーを平板に載せ、真空吸着により
固定させてプロセス処理をおこなう装置において
平板のウエハー吸着面を凸又は凹の球面とし、半
導体ウエハーを平板に全面にわたり密着させるこ
とを特徴とするウエハー処理用平板。
A flat plate for wafer processing, characterized in that the wafer suction surface of the flat plate is a convex or concave spherical surface, and the semiconductor wafer is brought into close contact with the flat plate over the entire surface, in an apparatus for performing processing by placing a semiconductor wafer on a flat plate and fixing it by vacuum suction. .
JP1990126410U 1990-11-30 1990-11-30 Pending JPH0485731U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990126410U JPH0485731U (en) 1990-11-30 1990-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990126410U JPH0485731U (en) 1990-11-30 1990-11-30

Publications (1)

Publication Number Publication Date
JPH0485731U true JPH0485731U (en) 1992-07-24

Family

ID=31873969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990126410U Pending JPH0485731U (en) 1990-11-30 1990-11-30

Country Status (1)

Country Link
JP (1) JPH0485731U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000349050A (en) * 1999-06-09 2000-12-15 Disco Abrasive Syst Ltd Method and apparatus for cutting workpiece
JP2014045144A (en) * 2012-08-28 2014-03-13 Fujitsu Semiconductor Ltd Dicing method and dicing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000349050A (en) * 1999-06-09 2000-12-15 Disco Abrasive Syst Ltd Method and apparatus for cutting workpiece
JP2014045144A (en) * 2012-08-28 2014-03-13 Fujitsu Semiconductor Ltd Dicing method and dicing device

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