JPH0485989A - Manufacture of multilayer printed board - Google Patents
Manufacture of multilayer printed boardInfo
- Publication number
- JPH0485989A JPH0485989A JP2199210A JP19921090A JPH0485989A JP H0485989 A JPH0485989 A JP H0485989A JP 2199210 A JP2199210 A JP 2199210A JP 19921090 A JP19921090 A JP 19921090A JP H0485989 A JPH0485989 A JP H0485989A
- Authority
- JP
- Japan
- Prior art keywords
- printed wiring
- inner layer
- multilayer printed
- copper
- multilayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、中間層(内層)となるプリント配線板の銅箔
面の気相還元処理を特徴とする多層プリント配線板の製
造法であり、好適には、銅箔表面の酸化処理膜の表面形
状を実質的に変えずに金属銅表面とするものであり、酸
化銅から酸性水溶液の作用で酸化銅が溶けることによる
「ハロー」或いは「ピンクリングj現象を実質的に無く
したものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is a method for manufacturing a multilayer printed wiring board, which is characterized by vapor phase reduction treatment of the copper foil surface of the printed wiring board serving as an intermediate layer (inner layer). Preferably, the surface shape of the oxidized film on the surface of the copper foil is not substantially changed to form a metallic copper surface, and a "halo" or " This substantially eliminates the pink ring j phenomenon.
多層プリント板において、中間層とするプリント配線網
の形成された内層板の多層化接着力を向上させる方法と
しては、予め両面が凹凸化された銅箔を用いる方法;内
層用のプリント配線網を形成した後、■、酸化処理水溶
液により銅箔表面に酸化銅膜を形成する方法、■、銅箔
面をシランカツブリング剤や有機チタネートカップリン
グ剤で処理する方法などが知られているが、従来は接着
性と経済性の点から通常、光沢面を有する銅張積層板に
内層用のプリント配線網を形成した後、酸化性のアルカ
リ水溶液で処理して褐色或いは黒色の酸化銅皮膜を形成
したものが用いられている。In a multilayer printed board, a method of improving the multilayer adhesion of an inner layer board on which a printed wiring network is formed as an intermediate layer is to use a copper foil that has been textured on both sides in advance; After forming the copper foil, there are two known methods: (1) forming a copper oxide film on the surface of the copper foil using an oxidation treatment aqueous solution, and (2) treating the copper foil surface with a silane coupling agent or an organic titanate coupling agent. Conventionally, from the viewpoint of adhesion and economy, after forming a printed wiring network for the inner layer on a copper-clad laminate with a glossy surface, it is treated with an oxidizing alkaline aqueous solution to form a brown or black copper oxide film. is used.
ところが、この酸化銅膜、特に酸化第2銅は塩酸、硫酸
などの酸性水溶液に溶は易い。このため、積層成形され
た多層板に小孔をあけ、スルーホールメッキ工程や無電
解メッキ又はその後の電解メッキ工程などを施す際に、
孔壁に露出した酸化銅膜から順次、酸化銅が酸性液によ
り溶かされる、いわゆる「ハロー」或いは「ピンクリン
グ」が発生し、絶縁性などのプリント配線板の信頼性の
低下の原因となる欠点があった。However, this copper oxide film, especially cupric oxide, is easily dissolved in acidic aqueous solutions such as hydrochloric acid and sulfuric acid. For this reason, when making small holes in a laminated multilayer board and performing a through-hole plating process, electroless plating, or subsequent electrolytic plating process,
A so-called "halo" or "pink ring" occurs when copper oxide is sequentially dissolved by acidic liquid from the copper oxide film exposed on the hole wall, which is a defect that causes a decrease in the reliability of printed wiring boards such as insulation. was there.
この褐色或いは黒色の酸化銅皮膜を用いた場合に発生す
るハロー或いはピンクリングを防止する方法として、最
近、■、■で得られた銅箔表面の酸化銅膜を還元剤水溶
液で還元して亜酸化銅膜或いは銅膜に変更する方法(特
開昭56−153797号、など)が開示されるに至っ
ている。これらの方法は、実用化可能なレベルの接着力
とすることが可能であるが、新たな液相還元処理工程を
必要とし、かつ、褐色或いは黒色の酸化銅膜より接着力
が低下するので実用化に耐える接着力とするための還元
条件が極めて厳密とする必要がある。さらに「ハロー」
の発生防止効果にバラツキがあり、また、新たに還元剤
水溶液の廃液処理の問題が発生するものであった。As a method to prevent the halo or pink ring that occurs when this brown or black copper oxide film is used, recently, the copper oxide film on the surface of the copper foil obtained in steps A method of changing to a copper oxide film or a copper film (Japanese Unexamined Patent Publication No. 153797/1983, etc.) has been disclosed. These methods can achieve adhesion strength at a level that can be put to practical use, but they require a new liquid phase reduction treatment process, and the adhesive strength is lower than that of brown or black copper oxide films, so they are not practical. In order to obtain adhesive strength that can withstand corrosion, the reducing conditions must be extremely strict. Furthermore, "Hello"
There were variations in the effectiveness of preventing the occurrence of , and a new problem occurred in the treatment of waste liquid of the aqueous reducing agent solution.
本発明者らは、褐色或いは黒色酸化処理された酸化銅膜
を還元処理してrハロー」の防止効果にバラツキがない
ばかりでなく、接着力の低下がない又は小さく、かつ、
廃液処理の新たな課題の生じない方法について鋭意検討
した。The present inventors have found that by reducing a copper oxide film that has been oxidized to brown or black, not only is there no variation in the prevention effect of "r halo", but also there is no or small decrease in adhesive strength, and
We worked hard to find a method for wastewater treatment that would not create new problems.
その結果、本発明者は気相還元法を研究課題とすること
を提案した。ところが、従来のプリント配線板の製造工
程は全て水或いは有機溶剤溶液を用いる工程により組み
上げられている。そして、プリント配線板の分野におい
て、還元性ガスを用いた例はなく、また、これらのガス
は容易に燃焼し、場合によっては爆発事故を起こすこと
も周知である。従って、このようなガスを取り扱う本課
題を研究開発すること自体の決断が極めて困難であった
。As a result, the present inventor proposed that the gas phase reduction method be a research topic. However, all conventional printed wiring board manufacturing processes involve processes using water or organic solvent solutions. In the field of printed wiring boards, there are no examples of using reducing gases, and it is well known that these gases are easily combustible and may cause explosions in some cases. Therefore, it was extremely difficult to decide to conduct research and development on this subject, which deals with such gases.
しかしながら、幸いにも、小スケールの予備的研究の結
果、この気相還元法は極めて優れた性能を発揮する可能
性か確認され、これに基づいてその実用化のための研究
開発に取り組んだ結果、本発明を完成するに至った。However, fortunately, as a result of small-scale preliminary research, it was confirmed that this gas phase reduction method has the potential to exhibit extremely excellent performance, and based on this, research and development efforts for its practical application were conducted. , we have completed the present invention.
すなわち、本発明は、多層プリント配線板の製造法にお
いて、中間層として用いるプリント配線網を形成した内
層板の銅箔面を化学的に酸化し褐色或いは黒色の酸化銅
面を形成した後、還元性ガス存在雰囲気中で処理してな
る内層板を用いることを特徴とする多層プリント配線板
の製造法であり、該還元性ガスが、水素、一酸化炭素又
はこれらの混合ガスであることを特徴とする多層プリン
ト配線板の製造法である。That is, in the method of manufacturing a multilayer printed wiring board, the present invention involves chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a brown or black copper oxide surface, and then reducing the copper foil surface to form a brown or black copper oxide surface. A method for manufacturing a multilayer printed wiring board characterized by using an inner layer board treated in an atmosphere containing a toxic gas, and characterized in that the reducing gas is hydrogen, carbon monoxide, or a mixed gas thereof. This is a method for manufacturing a multilayer printed wiring board.
また、本発明は、多層プリント配線板の製造法において
、中間層としてプリント配線網を形成した内層板の銅箔
面を化学的に酸化し褐色或いは黒色の酸化銅面を形成し
、多層化積層成形した後、スルーホール孔明は後から無
電解メッキ前に間に、還元性ガス存在雰囲気中で処理す
ることを特徴とする多層プリント配線板の製造法であり
、該還元性ガスが、水素、一酸化炭素又はこれらの混合
ガスであることを特徴とする多層プリント配線板の製造
法である。The present invention also provides a method for manufacturing a multilayer printed wiring board, in which the copper foil surface of an inner layer board on which a printed wiring network is formed as an intermediate layer is chemically oxidized to form a brown or black copper oxide surface, thereby producing a multilayered laminated board. This is a method for producing a multilayer printed wiring board characterized in that after forming, through-hole drilling is performed in an atmosphere containing a reducing gas before electroless plating, and the reducing gas is hydrogen, This is a method for manufacturing a multilayer printed wiring board characterized in that carbon monoxide or a mixed gas thereof is used.
以下、本発明の構成について説明する。The configuration of the present invention will be explained below.
本発明の多層プリント配線板とは、上記した中間層に使
用する内層用プリント配線網を形成した内層板として銅
箔面を化学的に酸化し黒色或いは褐色の酸化銅面を形成
した後、気相下に乾燥並びに還元性ガス存在雰囲気で処
理したものを使用すること、又は多層化積層成形して得
た多層板を穴明けしたものを気相で還元処理することの
他は、多層化積層成形に使用する内層板、多層化接着に
使用するプリプレグ、外層を形成するためのプリプレグ
および銅箔或いは片面銅張積層板などの積層材料並びに
積層成形の方法など従来公知の概念にはいるものであれ
ばいずれも使用できるもきであり、特に限定されないも
のである。The multilayer printed wiring board of the present invention is an inner layer board on which an inner layer printed wiring network used for the above-mentioned intermediate layer is formed, and after chemically oxidizing the copper foil surface to form a black or brown copper oxide surface, In addition to using a plate that has been dried and treated in a reducing gas atmosphere under the phase, or using a multilayer plate obtained by multilayer lamination molding with holes and then reducing it in the gas phase, Inner laminates used for molding, prepregs used for multilayer adhesion, prepregs for forming outer layers, laminated materials such as copper foil or single-sided copper-clad laminates, and methods of laminated molding are based on conventionally known concepts. Any of these can be used, and is not particularly limited.
このような積層材料はEガラス、Sガラス、Dガラス、
石英ガラスなどの種々のガラス織布、アルミナペーパー
などの無機質の織布機材;全芳香酸ポリアミド、ポリイ
ミド、フッ素樹脂、ポリフェニレンサルファイド、ポリ
エーテルエーテルケトン、ポリエーテルイミド、液晶ポ
リエステル樹脂、その他の超耐熱性樹脂製の織布;ポリ
イミド、フッ素樹脂、ポリフェニレンサルファイド、ポ
リエーテルエーテルケトン、ポリエーテルイミド、液晶
ポリエステル樹脂、その他の超耐熱性樹脂製のフィルム
或いはシート;上記の無機質の繊維と超耐熱製樹脂製の
繊維とを用いた複合糸を使用した織布;上記を適宜組み
合わせたものなどの織布を補強基材とし、ビスフェノー
ルA型、ノホラック型、ハロゲン化ビスフェノールA型
、ノへロゲン化ノボラック型、その他の3官能以上の多
官能性エポキシ化合物などのエポキシ樹脂;シアナト樹
脂、シアン酸エステル−エポキシ樹脂、シアン酸エステ
ル−マレイミド−エポキシ樹脂などを典型とするシアン
酸エステル系樹脂:ビスマレイミドなどの多官能性マレ
イミド類とビス(4−アミノフェニル)メタンなどの多
官能性アミンを主成分とするマレイミド系樹脂;さらに
は耐熱性の熱可塑性樹脂や熱可塑性樹脂と熱硬化性樹脂
との組成物からなる樹脂などを使用してなるプリプレグ
、電解銅箔や圧延銅箔などの銅箔、銅箔とプリプレグと
を積層成形してなる両面或いは片面銅張積層板、銅張積
層板の片面或いは両面に内層用のプリント配線網を形成
した内層用プリント配線板(内層板)が例示される。ま
た積層成形方法としては、従来の熱盤プレス、熱盤真空
プレス、オートクレーブ成形、連続プレスなどが例示さ
れる。Such laminated materials include E glass, S glass, D glass,
Various glass woven fabrics such as quartz glass, inorganic woven materials such as alumina paper; fully aromatic acid polyamide, polyimide, fluororesin, polyphenylene sulfide, polyether ether ketone, polyether imide, liquid crystal polyester resin, and other super heat-resistant materials woven fabrics made of polyimide, fluororesin, polyphenylene sulfide, polyetheretherketone, polyetherimide, liquid crystal polyester resin, and other super heat-resistant resins; films or sheets made of the above inorganic fibers and super heat-resistant resins A woven fabric using a composite yarn using fibers produced by the manufacturer; using a woven fabric such as an appropriate combination of the above as a reinforcing base material, it can be used as a reinforcing base material to produce bisphenol A type, noholac type, halogenated bisphenol A type, or halogenated novolac type. , and other trifunctional or higher polyfunctional epoxy compounds; cyanate resins such as cyanate resins, cyanate ester-epoxy resins, cyanate ester-maleimide-epoxy resins; cyanate ester resins such as bismaleimide; Maleimide resins whose main components are polyfunctional maleimides and polyfunctional amines such as bis(4-aminophenyl)methane; furthermore, heat-resistant thermoplastic resins and compositions of thermoplastic resins and thermosetting resins. prepreg made of resin, etc., copper foil such as electrolytic copper foil or rolled copper foil, double-sided or single-sided copper-clad laminate made by laminating and molding copper foil and prepreg, and one-sided or double-sided copper-clad laminate. An example of this is an inner layer printed wiring board (inner layer board) in which an inner layer printed wiring network is formed. Examples of the lamination molding method include conventional hot plate press, hot plate vacuum press, autoclave molding, and continuous press.
本発明の内層板に褐色或いは黒色の酸化銅皮膜を形成す
る方法は公知であり、通常、内層板の銅箔面を研磨、洗
浄した後、塩化銅又は過硫酸アンモニウムなどの水溶液
によりプレエツチング(ソフトエツチング、化学研磨)
した後、アルカリ性の酸化性水溶液で処理する方法で行
う。ここに、アルカリ性の酸化性水溶液並びに処理条件
としては具体的には下記の如きものが例示されるが、こ
れらに限定されるものではなく、公知方法が使用できる
。The method of forming a brown or black copper oxide film on the inner layer plate of the present invention is known. Usually, after polishing and cleaning the copper foil surface of the inner layer plate, pre-etching (softening) is performed with an aqueous solution such as copper chloride or ammonium persulfate. etching, chemical polishing)
After that, it is treated with an alkaline oxidizing aqueous solution. Here, the alkaline oxidizing aqueous solution and treatment conditions are specifically exemplified below, but are not limited thereto, and known methods can be used.
■、水酸化ナトリウム(NaOH(15g/ 1 )
)/次亜塩素酸ナトリウム(NaC1(L(31g#
))/リン酸ナトリウム(15g#’ ) 、70〜1
00℃、0.5〜lO分間。■, Sodium hydroxide (NaOH (15g/1)
) / Sodium hypochlorite (NaC1 (L (31g #
))/sodium phosphate (15g#'), 70-1
00°C, 0.5-10 minutes.
■、硫酸銅(50g、Q’ )/塩化ナトリウム(20
0g#! )、40〜80°C13〜15分間。■, Copper sulfate (50g, Q')/sodium chloride (20
0g#! ), 40-80°C for 13-15 minutes.
■、酢酸(20g#’ )/塩化アンモニウム(20g
#’)/酢酸銅(10g# ) 、30〜80°C11
〜10分間。■, Acetic acid (20g#') / Ammonium chloride (20g
#') / Copper acetate (10g #), 30-80°C11
~10 minutes.
■、酢酸銅(10g# )/硫酸銅(24g/l )/
硫化バリウム(24g#t! )/塩化アンモニウム(
24g#! )、40〜50°C,1〜10分間。■, Copper acetate (10g#)/Copper sulfate (24g/l)/
Barium sulfide (24g#t!)/Ammonium chloride (
24g#! ), 40-50°C, 1-10 minutes.
■、硫酸銅(25g#! )/硫酸ニッケル(25g#
’ )/塩素酸カリウム(25g#’ ) 、70〜9
0℃、 1〜10分間。■, Copper sulfate (25g#!) / Nickel sulfate (25g#!)
')/Potassium chlorate (25g#'), 70-9
0℃, 1-10 minutes.
■、過硫酸カリウム(20g/V )、/水酸化ナトリ
ウム50g# ) 、50〜80°C11〜3分間。■ Potassium persulfate (20g/V)/sodium hydroxide 50g#) at 50-80°C for 11-3 minutes.
上記の褐色或いは黒色の酸化銅皮膜を形成する方法の内
、実用化されている具体的な方法は得られた酸化処理膜
自体を多層化積層成形した場合に好適な、又はこれらを
液相で還元処理した場合に好適な条件である。しかしな
がら、本発明は、これらを気相還元処理して用いるもの
であることから、酸化処理膜又はそれを液相で還元処理
したものとしての接着強度が最良のものが還元処理後最
良と必ずなるものではない。Among the above-mentioned methods for forming brown or black copper oxide films, the specific methods that have been put into practical use are those that are suitable for forming the obtained oxidized film itself in a multilayered layered manner, or those that are suitable for forming these into a liquid phase. These conditions are suitable for reduction treatment. However, since the present invention uses these after being subjected to gas phase reduction treatment, the one with the best adhesive strength as an oxidized film or a product obtained by reducing it in a liquid phase is necessarily the best after reduction treatment. It's not a thing.
すなわち、本発明の還元処理前後の銅表面は、顕微鏡写
真やSEM写真ではややその凹凸模様が細身と成ってい
るように見えないことはないが、見した範囲内では実質
的にその区別がつかないものであり、酸化銅から酸素が
抜けることによる収縮以外の変化は実質的に起こってい
ない。従って、酸化処理膜の持っている外形は実質的に
保たれるものの、結晶自体は収縮し、凹凸度も縮小した
ものとなると共に、凹凸を形成している銅は酸化銅に比
較して強度が大幅に向上したものと成っている。故に、
酸化処理膜としては、従来に比較して凹凸度の大きい、
やや弱いものであり、汚染の原因などに成りやすい場合
であっても、本発明ではより接着力が向上した処理法と
して適用可能なものである。In other words, although the copper surface before and after the reduction treatment of the present invention appears to have a slightly narrow uneven pattern in micrographs and SEM photographs, it is virtually impossible to distinguish between them within the range of observation. There is no substantial change other than shrinkage caused by the loss of oxygen from copper oxide. Therefore, although the external shape of the oxidized film is substantially maintained, the crystal itself shrinks and the degree of unevenness is reduced, and the copper forming the unevenness is stronger than copper oxide. has been significantly improved. Therefore,
As an oxidized film, it has a higher degree of unevenness than conventional films.
Even in cases where the adhesive is somewhat weak and easily causes contamination, the present invention can be applied as a treatment method that further improves the adhesive strength.
上記で褐色或いは黒色処理した内層板を洗浄・清浄化し
た後、本発明の気相還元処理を行った内層板を使用する
か、又は、多層化積層成形後、穴明けして少なくとも孔
近傍の酸化銅膜を還元してrハローJが極めて減少した
或いは実質的に発生しないものとする。After washing and cleaning the inner layer plate treated with brown or black as described above, use the inner layer plate subjected to the gas phase reduction treatment of the present invention, or after multilayer lamination molding, holes are made to remove at least the vicinity of the holes. The copper oxide film is reduced so that the r halo J is extremely reduced or substantially absent.
本発明の内層板又は孔明は多層板を還元処理する還元性
ガス存在雰囲気とは、水素、−酸化炭素などの還元性ガ
ス、その他のガス化可能な還元性の化合物が挙げられ、
適宜、非酸化性のガスで希釈してなる気相雰囲気である
。In the inner layer plate or the multilayer plate of the present invention, the reducing gas presence atmosphere in which the multilayer plate is reduced includes reducing gases such as hydrogen and carbon oxide, and other reducing compounds that can be gasified.
This is a gas phase atmosphere diluted with a non-oxidizing gas as appropriate.
まず、これら還元性ガスを供給する方法は、特に限定さ
れるものではなく、例えば、上記■のガスをボンベにて
供給する方法、電気分解や触媒熱分解することによりガ
スを供給する方法、その他が挙げられる。First, the method of supplying these reducing gases is not particularly limited; for example, the method of supplying the gas described in (1) above in a cylinder, the method of supplying gas by electrolysis or catalytic pyrolysis, and other methods. can be mentioned.
特に、本発明の実施の現場は、上記に記載したようにガ
スを取り扱うことに不慣れな分野であり、安全性などを
考慮した場合、燃焼性或いは爆発性のガスは少ない程よ
く、電気分解、触媒熱分解法などにより必要量を製造し
、供給する方法が特に好ましい。また、本発明で必要と
する還元性ガスの必要十分な量は、例えば、酸化銅処理
膜の平均厚さ2Amで処理面積が5.000rrl’と
した場合、約18Nrrf’であり、通常のガス量とし
ては極めて小規模で小型の還元性ガス発生装置で十二分
に対応できるものである。In particular, the field in which the present invention is implemented is a field that is unfamiliar with handling gases, as described above, and when safety is taken into account, the less combustible or explosive gas is used, the better. Particularly preferred is a method in which the required amount is produced and supplied by a thermal decomposition method or the like. Further, the necessary and sufficient amount of reducing gas required in the present invention is, for example, about 18 Nrrf' when the average thickness of the copper oxide treated film is 2 Am and the treated area is 5.000 rrl'. The amount can be more than adequately handled by a very small-scale reducing gas generator.
ここに、水素や一酸化炭素などの還元性ガスを触媒熱分
解により発生させるために使用しうる化合物としては、
メタノール、エタノール、プロノ々ノール、ブタノール
などの低級アルコール類;ホルムアルデヒド、パラホル
ムアルデヒド、トリオキサンなどのアルデヒド或いはそ
の誘導体;蟻酸、蟻酸エステル、酢酸などの低級カルボ
ン酸或いはそのエステル;アンモニア、ヒドラジン;メ
チルアミン、エチルアミン、ジエチルアミン、メチルヒ
ドラジン、その他の窒素含有の低級のアミン類やヒドラ
ジン誘導体、カルシウムハイドライド、ボロンハイドラ
イド、メチルボロンなどの金属の水素化物や有機金属化
合物などが例示され、本発明の用途においては特に限定
されないものである。これらの中で、取り扱いの容易さ
、安全性、廃棄物の有無、価格などから低級アルコール
類、低級カルボン酸、アンモニアなどが好適である。Here, compounds that can be used to generate reducing gases such as hydrogen and carbon monoxide through catalytic thermal decomposition include:
Lower alcohols such as methanol, ethanol, prononol and butanol; Aldehydes and their derivatives such as formaldehyde, paraformaldehyde and trioxane; Lower carboxylic acids and their esters such as formic acid, formic acid esters and acetic acid; Ammonia, hydrazine; Methylamine, Examples include ethylamine, diethylamine, methylhydrazine, other nitrogen-containing lower amines, hydrazine derivatives, metal hydrides and organometallic compounds such as calcium hydride, boron hydride, and methylboron, and these are particularly limited in the use of the present invention. It is something that cannot be done. Among these, lower alcohols, lower carboxylic acids, ammonia and the like are preferred from the viewpoint of ease of handling, safety, presence or absence of waste, price, etc.
また、還元性化合物のガスを供給することも当然にでき
るものである。Naturally, it is also possible to supply a gas of a reducing compound.
次に、還元処理温度は通常130℃〜300℃、好まし
くは140℃〜240°Cの範囲、特に150〜190
℃で、特に上限温度は処理すべき内層板又は穴明は多層
板の寸法安定性を考慮した温度の範囲から選択され、処
理時間1分間〜24分間、好ましくは10分間〜12時
間の範囲から、適宜選択される。Next, the reduction treatment temperature is usually in the range of 130°C to 300°C, preferably 140°C to 240°C, especially 150 to 190°C.
℃, especially the upper limit temperature is selected from a temperature range that takes into consideration the dimensional stability of the inner layer plate or multilayer plate to be treated, and the treatment time is from 1 minute to 24 minutes, preferably from 10 minutes to 12 hours. , is selected as appropriate.
還元処理温度と時間とは、酸化処理銅箔面の銅の所望の
還元状態から選択され、完全に還元された状態(艶消し
された銅箔色=薄茶色)から還元の中間状態である大部
分の酸化第2銅が酸化第1銅(=亜酸化銅、褐色〜灰色
状態)に還元された状態の間で選択することが可能なも
のである。この還元状態の選択は、現在実用化されてい
るブラックオキサイド処理などの処理法をそのままもち
いる場合に、接着力を重視し、110−或いはピンクリ
ング現象が多少発生してもよい場合には、亜酸化銅の状
態で還元を停止する条件を選択することが好ましい傾向
にあり、110−或いはピンクリング現象を回避する場
合には銅まで還元された状態とする。なお、これらは現
在実用化されている酸化処理法を前提としたものであり
、上記したように、より凹凸度の大きい酸化銅膜を用い
た場合には、完全に銅まで還元してより改良された接着
力を発現させることができることには根拠のあるもので
ある。The reduction treatment temperature and time are selected based on the desired reduction state of the copper on the oxidized copper foil surface, ranging from a completely reduced state (matte copper foil color = light brown) to a large, intermediate state of reduction. It is possible to select between the states in which the cupric oxide of the portion is reduced to cuprous oxide (=cuprous oxide, brown to gray state). This reduction state is selected when using a treatment method such as black oxide treatment that is currently in practical use, with emphasis on adhesive strength, and when 110- or pink ring phenomenon may occur to some extent. It tends to be preferable to select conditions that stop the reduction in the state of cuprous oxide, and in order to avoid the 110- or pink ring phenomenon, the state is reduced to copper. Note that these are based on the oxidation treatment method that is currently in practical use, and as mentioned above, when using a copper oxide film with a higher degree of unevenness, it is necessary to completely reduce it to copper and improve it. There is a basis for the fact that it is possible to develop a certain adhesive force.
以上、本発明の気相還元処理を行った内層板は、そのま
ま多層化積層成形に使用して両面が銅箔である多層シー
ルド板とされ、ついで、穴明け、研磨、デスミア処理、
無電解メッキ、電解メ・ツキなどされた後、両表面のプ
リント配線パターンを形成するなどの方法により多層プ
リント配線板とされる。また、本発明の気相還元処理を
穴明は後に行ったものも、同様にその後のプリント配線
パターン形成工程を経て多層プリント配線板とされる。As described above, the inner layer plate subjected to the vapor phase reduction treatment of the present invention is used as it is in multilayer lamination molding to form a multilayer shield plate with copper foil on both sides, and then subjected to drilling, polishing, desmear treatment,
After electroless plating, electrolytic plating, etc., a multilayer printed wiring board is formed by forming printed wiring patterns on both surfaces. In addition, a multilayer printed wiring board in which the gas phase reduction treatment of the present invention is performed after the hole forming process is similarly carried out through the subsequent printed wiring pattern forming process.
ここに、本発明の還元処理を内層板に適用する場合は、
還元性ガス雰囲気であることを除き、実質的に乾燥条件
と同様である。このことから、本発明において、内層板
の銅箔面を酸化処理した後、引き続いて還元処理を行う
場合には、この酸化処理工程の後に必須の工程としであ
る乾燥工程を兼ねたものとなるものであり、その点から
極めて合理的なプロセスとなる。Here, when applying the reduction treatment of the present invention to the inner layer plate,
The conditions are substantially the same as the drying conditions except that the atmosphere is a reducing gas atmosphere. From this, in the present invention, when the copper foil surface of the inner layer plate is oxidized and then subsequently subjected to reduction treatment, the oxidation treatment step is followed by an essential step that also serves as a drying step. From that point of view, it is an extremely rational process.
また、本発明の気相還元処理においては、液相還元処理
の如き廃液処理問題が全く発生しないものであり、例え
ば、−酸化炭素のような毒性を有するガスを用いる場合
、還元処理装置からの廃棄ガスを触媒燃焼装置に導き、
その原料ガスに応じて未反応の還元性ガスを炭酸ガスや
水に変換するのみでよい。In addition, in the gas phase reduction treatment of the present invention, there are no problems with waste liquid treatment as in liquid phase reduction treatment, and for example, when using a toxic gas such as -carbon oxide, there is no problem with the waste liquid treatment from the reduction treatment equipment. Guide the waste gas to the catalytic combustion device,
It is only necessary to convert unreacted reducing gas into carbon dioxide or water depending on the raw material gas.
なお、本発明の製造方法の一つである内層板の還元処理
法は、通常は、・・・−多層化接着用の液相酸化処理−
本工程−多層化積層成形−・・・の工程となる。また、
本工程を実施する還元処理装置の主要な機器は、還元処
理室と還元性ガス供給装置とを主要機器としてなり、そ
の補助装置として廃棄ガス処理装置、還元処理室への内
層板の供給並びにからの取り出し装置、これらをコント
ロールする制御装置などからなるものとなる。Note that the reduction treatment method for the inner layer plate, which is one of the manufacturing methods of the present invention, is usually... -Liquid phase oxidation treatment for multilayer adhesive-
This step is the step of multilayer lamination molding. Also,
The main equipment of the reduction treatment equipment that implements this process is the reduction treatment chamber and the reducing gas supply device, and its auxiliary equipment includes the waste gas treatment device, the supply of the inner layer plate to the reduction treatment chamber, and the It consists of a take-out device, a control device to control these, etc.
特に、本発明を実施する部門は、従来還元性ガスの取扱
に不慣れな部門であることから、還元性ガスの漏れ、還
元ガス雰囲気中への酸素の混入などによる火災や爆発な
どの発生のない装置とすることが必須となるものであり
、外気との分離を真空吸引と不活性ガス置換とを併用し
て行うこと、その他の手段を用いることが望ましい。In particular, since the department that implements the present invention is a department that is not used to handling reducing gases, there is no risk of fire or explosion due to leakage of reducing gas or mixing of oxygen into the reducing gas atmosphere. It is essential to use a device for this purpose, and it is desirable to use a combination of vacuum suction and inert gas replacement to separate the air from the outside air, or to use other means.
以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.
実施例1
厚み0.8mm、銅箔厚み70.の両面銅張ガラスエポ
キシ積層板の両面の約半分を公知エツチング法で除去し
た後、銅箔面の黒色酸化処理を従来公知であるNa0H
(15g/ f! )/次亜塩素酸ナトリウム(31g
/l)/リン酸ナトリウム(15g/f)の水溶液で9
0℃、5分間処理しにて行い、水洗して黒色酸化処理内
層板を得た。Example 1 Thickness: 0.8 mm, copper foil thickness: 70. After removing about half of both sides of the double-sided copper-clad glass epoxy laminate using a known etching method, the copper foil surface was subjected to black oxidation treatment using a conventionally known NaOH method.
(15g/f!)/Sodium hypochlorite (31g
/l)/9 with an aqueous solution of sodium phosphate (15g/f)
The treatment was carried out at 0° C. for 5 minutes and washed with water to obtain a black oxidized inner layer plate.
黒色酸化処理内層板を、真空吸引可能な乾燥機中に投入
し、常圧で温度130℃、10分間乾燥した後、第1表
に記載の還元処理温度に上げながら乾燥機内を減圧吸引
し、窒素ガスを投入し、再び、真空吸引した後、水素ガ
スを導入して還元処理を行った。この後、乾燥機内を真
空吸引し、窒素ガスを導入した後、乾燥機から還元処理
された内層板を取り出した。The black oxidized inner layer plate was placed in a dryer capable of vacuum suction, and after drying at normal pressure at a temperature of 130 ° C. for 10 minutes, the inside of the dryer was vacuumed and suctioned while increasing the reduction treatment temperature listed in Table 1. After nitrogen gas was introduced and vacuum suction was performed again, hydrogen gas was introduced to perform reduction treatment. Thereafter, the inside of the dryer was vacuumed and nitrogen gas was introduced, and then the reduced inner layer plate was taken out from the dryer.
この還元処理温度、時間、黒色酸化処理膜の色相変化、
並びに、その時の還元状態について試験分析した。これ
らの結果を第1表に記載した。This reduction treatment temperature, time, hue change of the black oxidation treatment film,
In addition, the reduction state at that time was tested and analyzed. These results are listed in Table 1.
また、上記で得た種々の還元状態の内層板を用い、その
両面にガラスエポキシプリプレグ(樹脂量52%、厚み
0.1mm) 3枚、さらに厚み18−の電解銅箔を
重ねて温度175℃、圧力40kg/carで2時間積
層成形して4層板とした後、冷却した。In addition, using the inner layer plates in various reduction states obtained above, three sheets of glass epoxy prepreg (resin content 52%, thickness 0.1 mm) were layered on both sides, and then electrolytic copper foil with a thickness of 18 mm was layered at a temperature of 175°C. After lamination molding was carried out for 2 hours at a pressure of 40 kg/car to form a 4-layer board, it was cooled.
これらの一部について、銅箔の接着強度を測定した。The adhesion strength of copper foil was measured for some of these.
また、残りについて、孔径0.4mmφ、8万r、 p
。In addition, for the rest, hole diameter 0.4 mmφ, 80,000 r, p
.
m2.20p/回転の条件で1.000個、 2.54
mmの間隔のドリル孔あけし、この孔あけした4層板を
4NのHCI水溶液に5分間浸漬して内層のある孔周囲
のハローを全孔の任意の1/4(125個)について観
察するとともにその最大のものの長さを測定した。1.000 pieces under m2.20p/rotation condition, 2.54
Drill holes at intervals of mm, immerse the drilled 4-layer board in a 4N HCI aqueous solution for 5 minutes, and observe the halo around the hole where the inner layer is located for an arbitrary 1/4 of the holes (125 pieces). The length of the largest one was also measured.
結果を第1表に示した。The results are shown in Table 1.
第1表
実施例2
厚み0.8mm、銅箔厚み70mの両面銅張ガラスエポ
キシ積層板の両面の約半分を公知エツチング法で除去し
た後、銅箔面の黒色酸化処理をNaOH(15g/Iり
/次亜塩素酸ナトリウム(31g#’ )/リン酸ナト
リウム(15g/f )の水溶液で90℃、5分間処理
しにて行い、水洗して黒色酸化処理内層板とし、常圧で
温度130℃、30分間乾燥して、内層板を得た。Table 1 Example 2 After removing about half of both sides of a double-sided copper-clad glass epoxy laminate with a thickness of 0.8 mm and a copper foil thickness of 70 m using a known etching method, the black oxidation treatment of the copper foil surface was performed using NaOH (15 g/I). Treated with an aqueous solution of sodium hypochlorite (31g#')/sodium phosphate (15g/f) at 90°C for 5 minutes, washed with water to form a black oxidized inner layer plate, and heated at 130°C at normal pressure. The inner layer plate was obtained by drying at ℃ for 30 minutes.
また、上記で得た内層板を用い、その両面にガラスエポ
キシプリプレグ(樹脂量52%、厚み0.1mm)3枚
、さらに厚み18虜の電解銅箔を重ねて温度175℃、
圧力40kg/adで2時間積層成形して4層板とした
後、冷却した。In addition, using the inner layer plate obtained above, three sheets of glass epoxy prepreg (resin content 52%, thickness 0.1 mm) and 18 mm thick electrolytic copper foil were layered on both sides of the inner layer plate at a temperature of 175°C.
A four-layer plate was formed by lamination molding at a pressure of 40 kg/ad for 2 hours, and then cooled.
この両面銅張多層板を用い、孔径0.4mmφ、8万r
、 p、 m、、20IA/回転の条件で1.000個
、 2.54mmの間隔のドリル孔あけした。Using this double-sided copper-clad multilayer board, the hole diameter was 0.4 mmφ and 80,000 r.
, p, m, , 1,000 holes were drilled at intervals of 2.54 mm under the conditions of 20 IA/rotation.
この穴明は多層シールド板を用いて、デスミア処理前後
に、実施例1と同様の条件にて気相還元処理を実施した
後、通常の銅スルーホールメッキを実施した後に、ハロ
ーについて測定した。This perforation was measured for the halo using a multilayer shield plate, before and after desmear treatment, after performing vapor phase reduction treatment under the same conditions as in Example 1, and after performing ordinary copper through-hole plating.
その結果、ハローイングは見出されなかった。As a result, no haloing was found.
なお、内層銅箔表面の色相は、長時間高温処理の場合、
やや褐色気味に変化していた。In addition, the hue of the inner layer copper foil surface will change when subjected to long-term high-temperature treatment.
It had turned a slightly brownish color.
以上、詳細な説明および実施例から本発明の製造法によ
る多層プリント板は、多層板のプリント配線間の電気的
導通を行うスルーホールメッキ工程において、メッキ液
に褐色或いは黒色酸化銅が溶解して電気的短絡などの不
良発生の原因となりやすい「ハロー」の発生が大幅に減
少するか、又は全く無くなる。From the above detailed description and examples, the multilayer printed board manufactured by the manufacturing method of the present invention is produced by dissolving brown or black copper oxide in the plating solution during the through-hole plating process for establishing electrical continuity between the printed wiring of the multilayer board. The occurrence of "halos," which tend to cause defects such as electrical short circuits, is significantly reduced or completely eliminated.
また、内層板の場合の処理時間は、従来の乾燥工程を兼
ねたものと出来ることがら工程上の新たな負担を強いる
ものではなく、また、気相であることから、スケールア
ップも極めて容易なものである。In addition, the processing time for the inner layer plate does not impose a new burden on the process because it can be done in conjunction with the conventional drying process, and since it is a gas phase process, it is extremely easy to scale up. It is something.
また、本発明の還元性ガスも、触媒熱分解法によって得
たガスを使用できるものであることから、燃焼性、さら
には爆発性のガスを多量にストックする必要がな(、還
元処理により発生する廃棄もガスであり、未反応分は触
媒燃焼などにより極めて容易に除去できるものであり、
本質的に無公害である。Furthermore, since the reducing gas of the present invention can be obtained by catalytic pyrolysis, there is no need to stock large amounts of combustible or even explosive gas (which is generated by the reduction process). The waste that occurs is also a gas, and unreacted components can be removed extremely easily by catalytic combustion.
Essentially non-polluting.
さらに、最も重要な点であるが、本発明の気相還元処理
においては、接着用の酸化処理面の好ましい表面凹凸形
状を少なくともその顕微鏡或いはSEMによる表面観察
では、X線分析によって完全に金属銅まで還元された表
面であっても、その外観は接着用の酸化処理表面と注意
深く観察した場合にはやや細身となっているように見え
る程度で実質的な同等であることが確認されるものであ
って、接着力等の物性面においても極めて優れたもので
あることが裏付けられたものである。Furthermore, and most importantly, in the gas-phase reduction treatment of the present invention, the preferred surface roughness of the oxidized surface for adhesion can be determined completely by X-ray analysis, at least when the surface is observed using a microscope or SEM. Even if the surface has been reduced to a certain extent, it has been confirmed that its appearance is essentially the same as the oxidized surface used for adhesion, except that it appears to be slightly thinner. This proves that it is extremely excellent in terms of physical properties such as adhesive strength.
以上であり、本発明の多層板の製造法によれば、信頼性
に優れた多層プリント配線板を生産性よ(、無公害で製
造できるもので、工業的な意義は極めて高いものである
。As described above, according to the method for manufacturing a multilayer board of the present invention, a multilayer printed wiring board with excellent reliability can be manufactured with high productivity (and without pollution), and has extremely high industrial significance.
特許出願人 三菱瓦斯化学株式会社Patent applicant: Mitsubishi Gas Chemical Co., Ltd.
Claims (1)
て用いるプリント配線網を形成した内層板の銅箔面を化
学的に酸化し褐色或いは黒色の酸化銅面を形成した後、
還元性ガス存在雰囲気中で処理してなる内層板を用いる
ことを特徴とする多層プリント配線板の製造法。 2 該還元性ガスが、水素、一酸化炭素又はこれらの混
合物である請求項1記載の多層プリント配線板の製造法
。 3 多層プリント配線板の製造法において、中間層とし
てプリント配線網を形成した内層板の銅箔面を化学的に
酸化し褐色或いは黒色の酸化銅面を形成し、多層化積層
成形した後、スルーホール孔明け後から無電解メッキ前
に間に、還元性ガス存在雰囲気中で処理することを特徴
とする多層プリント配線板の製造法。 4 該還元性ガスが、水素、一酸化炭素又はこれらの混
合物である請求項3記載の多層プリント配線板の製造法
。[Claims] 1. In a method for manufacturing a multilayer printed wiring board, after chemically oxidizing the copper foil surface of an inner layer board on which a printed wiring network used as an intermediate layer is formed to form a brown or black copper oxide surface,
A method for manufacturing a multilayer printed wiring board, characterized by using an inner layer board processed in an atmosphere in the presence of a reducing gas. 2. The method for producing a multilayer printed wiring board according to claim 1, wherein the reducing gas is hydrogen, carbon monoxide, or a mixture thereof. 3 In a method for manufacturing a multilayer printed wiring board, the copper foil surface of the inner layer board on which the printed wiring network is formed as an intermediate layer is chemically oxidized to form a brown or black copper oxide surface, and after multilayer lamination molding, a through-layer is formed. A method for producing a multilayer printed wiring board, which comprises processing in an atmosphere in the presence of a reducing gas between after hole drilling and before electroless plating. 4. The method for producing a multilayer printed wiring board according to claim 3, wherein the reducing gas is hydrogen, carbon monoxide, or a mixture thereof.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2199210A JPH0485989A (en) | 1990-07-30 | 1990-07-30 | Manufacture of multilayer printed board |
| EP91112509A EP0469470B1 (en) | 1990-07-30 | 1991-07-25 | Process for producing multilayered printed board |
| DE69122573T DE69122573T2 (en) | 1990-07-30 | 1991-07-25 | Process for the production of multilayer boards |
| KR1019910013125A KR940009177B1 (en) | 1990-07-30 | 1991-07-30 | Manufacturing method of multilayer printing plate |
| US07/738,013 US5252355A (en) | 1990-07-30 | 1991-07-30 | Process for producing multilayered printed board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2199210A JPH0485989A (en) | 1990-07-30 | 1990-07-30 | Manufacture of multilayer printed board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0485989A true JPH0485989A (en) | 1992-03-18 |
Family
ID=16403966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2199210A Pending JPH0485989A (en) | 1990-07-30 | 1990-07-30 | Manufacture of multilayer printed board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0485989A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05275854A (en) * | 1992-03-27 | 1993-10-22 | Toppan Printing Co Ltd | Method for manufacturing multilayer wiring board |
| JPH05275853A (en) * | 1992-03-27 | 1993-10-22 | Toppan Printing Co Ltd | Manufacture of multilayer circuit board |
-
1990
- 1990-07-30 JP JP2199210A patent/JPH0485989A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05275854A (en) * | 1992-03-27 | 1993-10-22 | Toppan Printing Co Ltd | Method for manufacturing multilayer wiring board |
| JPH05275853A (en) * | 1992-03-27 | 1993-10-22 | Toppan Printing Co Ltd | Manufacture of multilayer circuit board |
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