JPH0487638U - - Google Patents

Info

Publication number
JPH0487638U
JPH0487638U JP12972190U JP12972190U JPH0487638U JP H0487638 U JPH0487638 U JP H0487638U JP 12972190 U JP12972190 U JP 12972190U JP 12972190 U JP12972190 U JP 12972190U JP H0487638 U JPH0487638 U JP H0487638U
Authority
JP
Japan
Prior art keywords
injection nozzle
pure water
pressure gas
wafer
gas injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12972190U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12972190U priority Critical patent/JPH0487638U/ja
Publication of JPH0487638U publication Critical patent/JPH0487638U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図は、この考案の実施例１の洗浄装置の概
略図を示す。第２図は、実施例２の洗浄装置の概
略図を示し、第３図および第４図は、実施例２の
洗浄装置の純水・高圧気体併合噴射ノズルの異な
る例の正面図を示す。第５図は、この考案の実施
例１の洗浄シーケンス図である。 １……ウエーハ、２……チヤツク部、３……純
水噴射ノズル、４……高圧気体噴射ノズル、５…
…純水・高圧気体噴射併合ノズル、７……純水噴
射ノズル穴、８……高圧気体噴射ノズル穴、９…
…純水噴射区間、１０……高圧気体噴射区間、１
１……高速回転区間。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) ウエーハを真空吸着して回転するチヤツク
    部と、 前記ウエーハに純水を噴射する純水噴射ノズル
    と、 前記ウエーハに高圧気体を噴射する高圧気体噴
    射ノズルとを具備するウエーハ洗浄装置。 (2) 前記純水噴射ノズルと高圧気体噴射ノズル
    が一体化された純水・高圧気体噴射併合ノズルを
    具備する請求項(1)記載のウエーハ洗浄装置。
JP12972190U 1990-11-30 1990-11-30 Pending JPH0487638U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12972190U JPH0487638U (ja) 1990-11-30 1990-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12972190U JPH0487638U (ja) 1990-11-30 1990-11-30

Publications (1)

Publication Number Publication Date
JPH0487638U true JPH0487638U (ja) 1992-07-30

Family

ID=31877112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12972190U Pending JPH0487638U (ja) 1990-11-30 1990-11-30

Country Status (1)

Country Link
JP (1) JPH0487638U (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07321082A (ja) * 1994-05-27 1995-12-08 Nec Corp 基板の洗浄方法および洗浄装置
JP2015076468A (ja) * 2013-10-08 2015-04-20 株式会社ディスコ スピンナー洗浄装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110639A (ja) * 1986-10-28 1988-05-16 Nec Corp 集積回路装置の製造方法
JPH02288230A (ja) * 1989-04-27 1990-11-28 Nec Kyushu Ltd 半導体基板の洗浄装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110639A (ja) * 1986-10-28 1988-05-16 Nec Corp 集積回路装置の製造方法
JPH02288230A (ja) * 1989-04-27 1990-11-28 Nec Kyushu Ltd 半導体基板の洗浄装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07321082A (ja) * 1994-05-27 1995-12-08 Nec Corp 基板の洗浄方法および洗浄装置
JP2015076468A (ja) * 2013-10-08 2015-04-20 株式会社ディスコ スピンナー洗浄装置

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