JPH0516653B2 - - Google Patents
Info
- Publication number
- JPH0516653B2 JPH0516653B2 JP60278006A JP27800685A JPH0516653B2 JP H0516653 B2 JPH0516653 B2 JP H0516653B2 JP 60278006 A JP60278006 A JP 60278006A JP 27800685 A JP27800685 A JP 27800685A JP H0516653 B2 JPH0516653 B2 JP H0516653B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- oxygen
- silicon thin
- quartz tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60278006A JPS62137820A (ja) | 1985-12-12 | 1985-12-12 | 半導体薄膜の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60278006A JPS62137820A (ja) | 1985-12-12 | 1985-12-12 | 半導体薄膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62137820A JPS62137820A (ja) | 1987-06-20 |
| JPH0516653B2 true JPH0516653B2 (cs) | 1993-03-05 |
Family
ID=17591316
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60278006A Granted JPS62137820A (ja) | 1985-12-12 | 1985-12-12 | 半導体薄膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62137820A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010044998A (ko) * | 1999-11-02 | 2001-06-05 | 박종섭 | 불순물 도핑 장치의 세정방법 |
-
1985
- 1985-12-12 JP JP60278006A patent/JPS62137820A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62137820A (ja) | 1987-06-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |