JPH0529473Y2 - - Google Patents
Info
- Publication number
- JPH0529473Y2 JPH0529473Y2 JP1986036143U JP3614386U JPH0529473Y2 JP H0529473 Y2 JPH0529473 Y2 JP H0529473Y2 JP 1986036143 U JP1986036143 U JP 1986036143U JP 3614386 U JP3614386 U JP 3614386U JP H0529473 Y2 JPH0529473 Y2 JP H0529473Y2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- film
- mask
- pellicle body
- antireflection layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【考案の詳細な説明】
（産業上の利用分野）
この考案は、LSI製造のリソグラフイー工程に
使用されるプリクル体に関する。[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a prickle body used in the lithography process of LSI manufacturing.
さらに詳細には、本考案は第１図に示すような
構造をもち、膜１の上面（フレームが接合された
面と反対の面）に反射防止層３が設置されたもの
であり、反射防止効果により光線透過性に優れる
と同時に、反射防止層の剥れによるマスクへのゴ
ミ付着を防止したことを特徴としたペリクル体に
関する。 More specifically, the present invention has a structure as shown in FIG. The present invention relates to a pellicle body that is characterized by its excellent light transmittance and at the same time prevents dust from adhering to a mask due to peeling of an antireflection layer.
（従来技術とその問題点）
近年のLSIの発展に伴ない、その画線巾も１〜
3μmの非常に微細となつて来ている。このような
LSIを作成する場合、ゴミの管理が極めて重要と
なつて来ている。特にリソグラフイー工程でのゴ
ミの除去が問題となつて来ており、フオトマス
ク・レチクル（以下マスクと略す）に防塵カバー
体であるペリクル体を装着することにより、ゴミ
の結像を防止する方法がとられている。(Prior art and its problems) With the development of LSI in recent years, the line width has also increased from 1 to 1.
They are becoming extremely fine, as small as 3 μm. like this
When creating LSIs, waste management has become extremely important. In particular, the removal of dust in the lithography process has become a problem, and a method to prevent dust from forming an image is to attach a pellicle body, which is a dustproof cover body, to a photomask reticle (hereinafter abbreviated as a mask). It is taken.
かかるペリクル体は通常第２図に示す構造とな
つており、１は膜、２はフレーム、３は反射防止
層、４は接着層、５は粘着層、６は保護フイルム
である。ここで、反射防止層３は膜１の表裏面で
の反射光を消して高い光線透過率を得る為に設け
られる。 Such a pellicle body usually has the structure shown in FIG. 2, where 1 is a membrane, 2 is a frame, 3 is an antireflection layer, 4 is an adhesive layer, 5 is an adhesive layer, and 6 is a protective film. Here, the antireflection layer 3 is provided in order to eliminate reflected light on the front and back surfaces of the film 1 and obtain high light transmittance.
このペリクル体は、保護フイルム６を剥して、
マスクに粘着層５に介して貼られ、使用に供され
る（第３図参照）。 This pellicle body is obtained by peeling off the protective film 6.
It is attached to a mask via the adhesive layer 5 and ready for use (see FIG. 3).
ペリクル体の目的とするところは、万一ゴミが
あつてもペリクル体上のゴミが付着し、マスク上
へはゴミが付着しない様に考案されたものであ
る。ところが、第２図の様に膜の下面（フレーム
が接合された面）に反射防止層がある場合、この
反射防止層は膜に接着されているとは言え、露光
光線による劣化や経時変化、温湿度変化等により
膜から剥離して、マスク上へ落下することがあ
る。 The purpose of the pellicle body is to ensure that even if there is dust, the dust on the pellicle body will stick to the mask, and the dust will not stick to the mask. However, when there is an anti-reflection layer on the bottom surface of the film (the surface to which the frame is bonded) as shown in Figure 2, although this anti-reflection layer is bonded to the film, it may deteriorate due to exposure light or change over time. It may peel off from the film due to changes in temperature and humidity and fall onto the mask.
（問題点解決の手段・効果）
かゝる欠点を解決すべく、本考案者は第１図に
示す構造のペリクル体を考案した。(Means and Effects for Solving Problems) In order to solve these drawbacks, the present inventor devised a pellicle body having the structure shown in FIG. 1.
即ち、反射防止層３を膜１の上面（フレームと
接合された面とは反対の面）にのみ設け、フレー
ムと接合された面には設けない構造とした。かゝ
る構造とすることにより、第３図に示す通り、マ
スクに貼つた場合、反射防止層が露光光線による
劣化や経時変化、温湿度変化等により万一膜から
剥離してもマスク面上には落下することがなく、
ゴミによるトラブルが起ることはなくなる。 That is, the antireflection layer 3 is provided only on the upper surface of the film 1 (the surface opposite to the surface joined to the frame), and is not provided on the surface joined to the frame. With this structure, as shown in Figure 3, when the antireflection layer is attached to a mask, even if it peels off from the film due to deterioration due to exposure light, changes over time, changes in temperature and humidity, etc., it will not remain on the mask surface. will not fall,
No more problems caused by trash.
膜の上面のみに反射防止を設けた本考案のペリ
クル体は両面に反射防止層を有するペリクル体よ
りは光線透過性が若干劣るものの、全く反射防止
層のないペリクル体よりは格段に優れた光線透過
性を有しており、充分に実用性のある性能を有し
ている。 The pellicle body of the present invention, which has anti-reflection coating only on the top surface of the film, has slightly lower light transmittance than a pellicle body that has anti-reflection layers on both sides, but it transmits light rays much better than a pellicle body that has no anti-reflection layer at all. It is transparent and has sufficient practical performance.
以上の通り、本考案によれば、高い光線透過性
を有すると同時に反射防止層の剥れによるゴミ発
生のない利点を備えたペリクル体となる。 As described above, according to the present invention, the pellicle body has the advantage of not only having high light transmittance but also not generating dust due to peeling of the antireflection layer.
第１図は本考案のペリクル体の構造断面図、第
２図は従来のペリクル体の構造断面図、第３図は
マスクにペリクル体を貼つた状態を表わす断面図
である。
１は膜、２はフレーム、３は反射防止層、４は
接着層、５は粘着層、６は保護フイルム、７はマ
スクを表わす。
FIG. 1 is a structural sectional view of the pellicle body of the present invention, FIG. 2 is a structural sectional view of a conventional pellicle body, and FIG. 3 is a sectional view showing the state in which the pellicle body is attached to a mask. 1 is a film, 2 is a frame, 3 is an antireflection layer, 4 is an adhesive layer, 5 is an adhesive layer, 6 is a protective film, and 7 is a mask.
Claims (1)
接合せしめられた面と反対の面のみに反射防止層
３を有することを特徴とする光線透過性に優れて
いるとともにゴミの発生のないペリクル体。 A pellicle that has excellent light transmittance and does not generate dust, characterized in that a film 1 forming a main part of the pellicle body has an antireflection layer 3 only on the surface opposite to the surface joined to the frame 2. body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986036143U JPH0529473Y2 (en) | 1986-03-14 | 1986-03-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986036143U JPH0529473Y2 (en) | 1986-03-14 | 1986-03-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62149043U JPS62149043U (en) | 1987-09-21 |
| JPH0529473Y2 true JPH0529473Y2 (en) | 1993-07-28 |
Family
ID=30846274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986036143U Expired - Lifetime JPH0529473Y2 (en) | 1986-03-14 | 1986-03-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0529473Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE122477T1 (en) * | 1989-09-06 | 1995-05-15 | Du Pont | NON-REFLECTIVE FILM COVERING. |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60237450A (en) * | 1984-05-11 | 1985-11-26 | Asahi Chem Ind Co Ltd | Dust preventing cover for nonreflective photomask-reticle and its manufacture |
-
1986
- 1986-03-14 JP JP1986036143U patent/JPH0529473Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62149043U (en) | 1987-09-21 |
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