JPH0543169B2 - - Google Patents

Info

Publication number
JPH0543169B2
JPH0543169B2 JP59204068A JP20406884A JPH0543169B2 JP H0543169 B2 JPH0543169 B2 JP H0543169B2 JP 59204068 A JP59204068 A JP 59204068A JP 20406884 A JP20406884 A JP 20406884A JP H0543169 B2 JPH0543169 B2 JP H0543169B2
Authority
JP
Japan
Prior art keywords
stage
wafer
stop
target
tolerance value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59204068A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6187327A (ja
Inventor
Seita Tazawa
Naoki Ayada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59204068A priority Critical patent/JPS6187327A/ja
Publication of JPS6187327A publication Critical patent/JPS6187327A/ja
Publication of JPH0543169B2 publication Critical patent/JPH0543169B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59204068A 1984-10-01 1984-10-01 半導体製造装置 Granted JPS6187327A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59204068A JPS6187327A (ja) 1984-10-01 1984-10-01 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59204068A JPS6187327A (ja) 1984-10-01 1984-10-01 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS6187327A JPS6187327A (ja) 1986-05-02
JPH0543169B2 true JPH0543169B2 (fr) 1993-06-30

Family

ID=16484230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59204068A Granted JPS6187327A (ja) 1984-10-01 1984-10-01 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS6187327A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231621A (ja) * 2001-11-19 2002-08-16 Canon Inc 露光装置およびそのユニットの駆動方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53105376A (en) * 1977-02-25 1978-09-13 Hitachi Ltd Positioning unit

Also Published As

Publication number Publication date
JPS6187327A (ja) 1986-05-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term