JPH0548424B2 - - Google Patents

Info

Publication number: JPH0548424B2
Authority: JP; Japan
Prior art keywords: boron; chlorosilane; sample; residue; siloxane
Prior art date: 1982-09-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP58173281A

Other languages

English (en)

Japanese (ja)

Other versions

JPS5990048A (ja

Inventor

Richaado Kaurusu Harorudo

Deibitsudo Kurei Uiriamu

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

General Electric Co

Original Assignee

General Electric Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1982-09-21

Filing date

1983-09-21

Publication date

1993-07-21

1983-09-21 Application filed by General Electric Co filed Critical General Electric Co

1984-05-24 Publication of JPS5990048A publication Critical patent/JPS5990048A/ja

1993-07-21 Publication of JPH0548424B2 publication Critical patent/JPH0548424B2/ja

Status Granted legal-status Critical Current

Links

229910052796 boron Inorganic materials 0.000 claims description 53
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 51
239000005046 Chlorosilane Substances 0.000 claims description 44
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 44
238000000034 method Methods 0.000 claims description 28
-1 allyl halides Chemical group 0.000 claims description 21
239000012535 impurity Substances 0.000 claims description 21
238000002798 spectrophotometry method Methods 0.000 claims description 12
ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical group Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 12
239000005052 trichlorosilane Substances 0.000 claims description 12
239000003153 chemical reaction reagent Substances 0.000 claims description 11
QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 9
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
125000005375 organosiloxane group Chemical group 0.000 claims description 7
JJRDHFIVAPVZJN-UHFFFAOYSA-N cyclotrisiloxane Chemical group O1[SiH2]O[SiH2]O[SiH2]1 JJRDHFIVAPVZJN-UHFFFAOYSA-N 0.000 claims description 6
VBHKTXLEJZIDJF-UHFFFAOYSA-N quinalizarin Chemical compound C1=CC(O)=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1O VBHKTXLEJZIDJF-UHFFFAOYSA-N 0.000 claims description 6
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
239000000460 chlorine Substances 0.000 claims description 5
229910052801 chlorine Inorganic materials 0.000 claims description 5
DDJSWKLBKSLAAZ-UHFFFAOYSA-N cyclotetrasiloxane Chemical group O1[SiH2]O[SiH2]O[SiH2]O[SiH2]1 DDJSWKLBKSLAAZ-UHFFFAOYSA-N 0.000 claims description 4
229910052757 nitrogen Inorganic materials 0.000 claims description 4
125000000217 alkyl group Chemical group 0.000 claims description 3
HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical group C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 claims description 3
239000001257 hydrogen Substances 0.000 claims description 3
229910052739 hydrogen Inorganic materials 0.000 claims description 3
229920001577 copolymer Polymers 0.000 claims description 2
239000004205 dimethyl polysiloxane Chemical group 0.000 claims description 2
239000012530 fluid Substances 0.000 claims description 2
229920000435 poly(dimethylsiloxane) Chemical group 0.000 claims description 2
238000010926 purge Methods 0.000 claims description 2
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
150000001350 alkyl halides Chemical group 0.000 claims 1
KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 13
239000000243 solution Substances 0.000 description 11
238000004458 analytical method Methods 0.000 description 8
VFLDPWHFBUODDF-FCXRPNKRSA-N curcumin Chemical compound C1=C(O)C(OC)=CC(\C=C\C(=O)CC(=O)\C=C\C=2C=C(OC)C(O)=CC=2)=C1 VFLDPWHFBUODDF-FCXRPNKRSA-N 0.000 description 8
229910052710 silicon Inorganic materials 0.000 description 7
239000010703 silicon Substances 0.000 description 7
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
VFLDPWHFBUODDF-UHFFFAOYSA-N diferuloylmethane Natural products C1=C(O)C(OC)=CC(C=CC(=O)CC(=O)C=CC=2C=C(OC)C(O)=CC=2)=C1 VFLDPWHFBUODDF-UHFFFAOYSA-N 0.000 description 5
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
150000001875 compounds Chemical class 0.000 description 4
229940109262 curcumin Drugs 0.000 description 4
235000012754 curcumin Nutrition 0.000 description 4
239000004148 curcumin Substances 0.000 description 4
238000001514 detection method Methods 0.000 description 4
238000010521 absorption reaction Methods 0.000 description 3
238000011088 calibration curve Methods 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
239000012088 reference solution Substances 0.000 description 3
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
125000003118 aryl group Chemical group 0.000 description 2
UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
150000001639 boron compounds Chemical class 0.000 description 2
238000004821 distillation Methods 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
239000000178 monomer Substances 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
238000000926 separation method Methods 0.000 description 2
229910000077 silane Inorganic materials 0.000 description 2
239000005049 silicon tetrachloride Substances 0.000 description 2
BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
229930195725 Mannitol Natural products 0.000 description 1
229910003902 SiCl 4 Inorganic materials 0.000 description 1
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
YTEISYFNYGDBRV-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)oxy-dimethylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)C YTEISYFNYGDBRV-UHFFFAOYSA-N 0.000 description 1
238000002835 absorbance Methods 0.000 description 1
239000002253 acid Substances 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
239000012736 aqueous medium Substances 0.000 description 1
229910010277 boron hydride Inorganic materials 0.000 description 1
SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
239000012141 concentrate Substances 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
239000013078 crystal Substances 0.000 description 1
MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000000605 extraction Methods 0.000 description 1
238000007429 general method Methods 0.000 description 1
230000005484 gravity Effects 0.000 description 1
150000004820 halides Chemical class 0.000 description 1
125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
239000007788 liquid Substances 0.000 description 1
229910052748 manganese Inorganic materials 0.000 description 1
239000011572 manganese Substances 0.000 description 1
239000000594 mannitol Substances 0.000 description 1
235000010355 mannitol Nutrition 0.000 description 1
239000000463 material Substances 0.000 description 1
238000005259 measurement Methods 0.000 description 1
229910052987 metal hydride Inorganic materials 0.000 description 1
150000004681 metal hydrides Chemical class 0.000 description 1
238000002156 mixing Methods 0.000 description 1
239000000203 mixture Substances 0.000 description 1
HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
238000011176 pooling Methods 0.000 description 1
238000004445 quantitative analysis Methods 0.000 description 1
230000005855 radiation Effects 0.000 description 1
238000001953 recrystallisation Methods 0.000 description 1
238000007670 refining Methods 0.000 description 1
238000007086 side reaction Methods 0.000 description 1
239000011734 sodium Substances 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000004677 spark ionization mass spectrometry Methods 0.000 description 1
239000007858 starting material Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
230000008961 swelling Effects 0.000 description 1
238000005979 thermal decomposition reaction Methods 0.000 description 1
FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
238000001429 visible spectrum Methods 0.000 description 1
239000011701 zinc Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1

Classifications

- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/22—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using chemical indicators
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/19—Halogen containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/25—Chemistry: analytical and immunological testing including sample preparation
- Y10T436/25375—Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.]
- Y10T436/255—Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.] including use of a solid sorbent, semipermeable membrane, or liquid extraction

Landscapes

Life Sciences & Earth Sciences (AREA)
Health & Medical Sciences (AREA)
Analytical Chemistry (AREA)
Molecular Biology (AREA)
Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Biophysics (AREA)
Biochemistry (AREA)
General Health & Medical Sciences (AREA)
General Physics & Mathematics (AREA)
Immunology (AREA)
Pathology (AREA)
Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)

JP58173281A 1982-09-21 1983-09-21 クロロシラン中のほう素不純物の検出法 Granted JPS5990048A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US420650		1982-09-21
US06/420,650 US4529707A (en)	1982-09-21	1982-09-21	Detection of boron impurities in chlorosilanes

Publications (2)

Publication Number	Publication Date
JPS5990048A JPS5990048A (ja)	1984-05-24
JPH0548424B2 true JPH0548424B2 (2)	1993-07-21

Family

ID=23667307

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP58173281A Granted JPS5990048A (ja)	1982-09-21	1983-09-21	クロロシラン中のほう素不純物の検出法

Country Status (2)

Country	Link
US (1)	US4529707A (2)
JP (1)	JPS5990048A (2)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5753567A (en) *	1995-08-28	1998-05-19	Memc Electronic Materials, Inc.	Cleaning of metallic contaminants from the surface of polycrystalline silicon with a halogen gas or plasma
US7273588B1 (en) *	2003-07-17	2007-09-25	Air Liquide America L.P.	Methods of sampling halosilanes for metal analytes
FR2915805B1 (fr) *	2007-05-04	2010-02-12	Commissariat Energie Atomique	Procede de detection de composes gazeux halogenes
DE102009056731A1 (de)	2009-12-04	2011-06-09	Rev Renewable Energy Ventures, Inc.	Halogenierte Polysilane und Polygermane
US20130121908A1 (en) *	2010-10-01	2013-05-16	Mitsubishi Materials Corporation	Method for producing trichlorosilane with reduced boron compound impurities
CN117110527B (zh) *	2023-10-25	2023-12-19	是高(北京)智能科技有限公司	氯硅烷杂质元素在线检测分析方法及系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3126248A (en) *		1964-03-24		Process for producing purified
US3403003A (en) *	1966-12-23	1968-09-24	Western Electric Co	Method of removing boron from silicon tetrachloride
DE2558183A1 (de) *	1975-12-23	1977-07-14	Wacker Chemitronic	Verfahren zur bestimmung des borgehaltes von reinen halogensilanen
US4374110A (en) *	1981-06-15	1983-02-15	Motorola, Inc.	Purification of silicon source materials

1982
- 1982-09-21 US US06/420,650 patent/US4529707A/en not_active Expired - Lifetime
1983
- 1983-09-21 JP JP58173281A patent/JPS5990048A/ja active Granted

Also Published As

Publication number	Publication date
US4529707A (en)	1985-07-16
JPS5990048A (ja)	1984-05-24

Publication	Publication Date	Title
Corriu et al.	1974	The siliconium ion question
Hair	1975	Hydroxyl groups on silica surface
US4755370A (en)	1988-07-05	Purification of silicon halides
US5081202A (en)	1992-01-14	High purity phenyl silicone ladder polymer and method for producing the same
JPH0548424B2 (2)	1993-07-21
Campbell-Ferguson et al.	1966	Adducts formed between some halogenosilanes and the organic bases pyridine, trimethylamine, and tetramethylethylenediamine. Part I. Stoichiometry
Smith et al.	1959	Spectroscopic techniques for identification of organosilicon compounds
Trandell et al.	1978	A study of the amine-induced disproportionations of various methylchlorodisilanes
JP3778870B2 (ja)	2006-05-24	揮発性元素の濃縮方法
CA1189286A (en)	1985-06-25	Process for purifying chlorosilanes
US3403003A (en)	1968-09-24	Method of removing boron from silicon tetrachloride
Steudel et al.	1991	Raman, mass, and 77se nmr spectra of sescl2 and its reactions with potassium iodide and titanocene pentasulphide to produce cyclic selenium sulphides
Davidson et al.	1976	Formation of silylenes in the thermolysis of pentamethyldisilane and 1, 1, 2-trimethyldisilane
JPS59500416A (ja)	1984-03-15	ハロゲン化けい素の精製法
JP3346964B2 (ja)	2002-11-18	疎水性シリカ
Bains et al.	1986	Kinetics and mechanism of the gas-phase pyrolysis of hexafluorodisilane in the presence of iodine and some reactions of silicon difluoride
Koe et al.	2002	Heteroatom polysilylenes
Smith	1960	Analysis of organo-silicon compounds, with special reference to silanes and siloxanes. A review
WO1983003244A1 (en)	1983-09-29	Purification of silicon halides
JP6702325B2 (ja)	2020-06-03	炭素分析方法
Parker	1978	Determination of organosilicon compounds in water by atomic absorption spectroscopy
Chojnowski et al.	1976	Spectrophotometric micro-determination of silicon-bonded hydrogen with carbenium-ion reagents
Tertykh et al.	1995	Chemisorption of styrene on the silica hydride surface
Scheim et al.	1988	Synthesis of siloxanes: XII. Cleavage of siloxanes by hydrogen chloride
Thompson et al.	1979	Reactions of silicon fluorides with some non-metal hydrides