JPH0551180B2 - - Google Patents
Info
- Publication number
- JPH0551180B2 JPH0551180B2 JP11186386A JP11186386A JPH0551180B2 JP H0551180 B2 JPH0551180 B2 JP H0551180B2 JP 11186386 A JP11186386 A JP 11186386A JP 11186386 A JP11186386 A JP 11186386A JP H0551180 B2 JPH0551180 B2 JP H0551180B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holder
- light
- ion beam
- detection device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 75
- 238000010884 ion-beam technique Methods 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 21
- 230000000694 effects Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 238000005468 ion implantation Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、例えばイオン注入装置等のよう
な、ホルダ上の基板にイオンビームを照射する装
置に用いられて、ホルダ上の基板の有無を検出す
る基板検出装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention is used in a device, such as an ion implantation device, that irradiates a substrate on a holder with an ion beam, and detects the presence or absence of a substrate on the holder. The present invention relates to a substrate detection device for detecting a substrate.
第3図はイオン注入装置のホルダ回りの一例を
部分的に示す平面図であり、第4図は第3図の線
−に沿う概略断面図である。例えばイオン注
入装置のエンドステーシヨンに設けられた真空容
器(図示省略)内に、回転軸4に取り付けられた
ホルダ(この場合はプラテンとも呼ぶ)6が設け
られており、回転軸4の矢印Aのような回転によ
つて当該ホルダ6は、例えば第4図の実線で示す
ような基板着脱位置(例えば水平位置)と、2点
鎖線で示すような基板処理位置(例えば起立位
置)とに回転させられる。またホルダ6の上面に
は、保持する基板(例えばウエハ)2にほぼ対応
する大きさの開口8aを有していて上下動可能な
押え板(クランパーとも呼ぶ)8が設けられてお
り、これによつて基板2はホルダ6上に押圧保持
される。10は基板2に着脱用の搬送ベルトであ
る。
FIG. 3 is a plan view partially showing an example of the holder and surroundings of the ion implantation device, and FIG. 4 is a schematic sectional view taken along the line - in FIG. 3. For example, a holder (also called a platen in this case) 6 attached to a rotating shaft 4 is provided in a vacuum container (not shown) provided in an end station of an ion implanter. By such rotation, the holder 6 is rotated, for example, to a substrate loading/unloading position (for example, a horizontal position) as shown by the solid line in FIG. It will be done. Further, on the upper surface of the holder 6, there is provided a holding plate (also called a clamper) 8 which has an opening 8a of a size approximately corresponding to the substrate (for example, a wafer) 2 to be held and is movable up and down. Therefore, the substrate 2 is pressed and held on the holder 6. 10 is a conveyor belt for attachment and detachment to the substrate 2.
そして、基板着脱位置においてホルダ6に対す
る基板2の着脱、例えば第3図矢印Bのような基
板2の搬出入が行われ、基板処理位置においてホ
ルダ6上の基板2に対してイオンビーム12が照
射されてイオン注入が行われる。 Then, the substrate 2 is attached to and removed from the holder 6 at the substrate attachment/detachment position, for example, the substrate 2 is carried in and out as shown by arrow B in FIG. 3, and the ion beam 12 is irradiated onto the substrate 2 on the holder 6 at the substrate processing position. Then, ion implantation is performed.
その場合、上記のような制御等を行うに当つて
は、ホルダ6上の基板2の有無を検出するのが好
ましく、そのための基盤検出装置としては図示の
ようなものが考えられる。即ちこの装置は、ホル
ダ6の面に対して垂直に貫通穴16をあけてその
下側に光センサ18の例えば発光器18aを、そ
の上側に例えば受光器18bを互い対向させて配
置したものであり、ホルダ6上に不透明の基板2
が搬入されると、基板2によつて発光器18aか
らの光20が受光器18bに入射するのが遮ら
れ、それによつて基板2の有無が検出される。 In that case, when performing the above-mentioned control etc., it is preferable to detect the presence or absence of the substrate 2 on the holder 6, and a substrate detection device as shown in the figure may be used for this purpose. That is, in this device, a through hole 16 is formed perpendicularly to the surface of the holder 6, and an optical sensor 18, such as a light emitter 18a, is placed below the through hole 16, and a light receiver 18b, for example, is placed above the through hole so as to face each other. Yes, opaque substrate 2 is placed on holder 6
When the substrate 2 is carried in, the substrate 2 blocks the light 20 from the light emitter 18a from entering the light receiver 18b, thereby detecting the presence or absence of the substrate 2.
所が上記のような基板検出装置においては、基
板2による光20の断続を検出しているため、例
えば石英ガラスのような透明の基板2の有無を検
出することはできない。また、ホルダ6に垂直に
貫通穴16があけられているため、基板処理位置
においてホルダ6に対して何等かの原因で基板2
無しでイオンビーム12が照射されたような場合
は、イオンビーム12が貫通穴16を通つてホル
ダ6の裏面側へ通過してしまい、他の機器に悪影
響を及ぼす(第4図のイオンビーム12′参照)。
However, in the substrate detection device as described above, since it detects the interruption of the light 20 due to the substrate 2, it is not possible to detect the presence or absence of a transparent substrate 2 such as quartz glass. In addition, since the through hole 16 is perpendicular to the holder 6, the substrate 2 may for some reason be moved against the holder 6 at the substrate processing position.
If the ion beam 12 is irradiated without the ion beam 12, the ion beam 12 will pass through the through hole 16 to the back side of the holder 6, which will have an adverse effect on other equipment (the ion beam 12 shown in FIG. 'reference).
そこでこの発明は、透明基板の検出が可能であ
り、しかもイオンビームが誤つてホルダの裏面側
へ通過しないように改良した基板検出装置を提供
することを主たる目的とする。 SUMMARY OF THE INVENTION Therefore, the main object of the present invention is to provide an improved substrate detection device that is capable of detecting a transparent substrate and prevents an ion beam from accidentally passing through to the back side of a holder.
この発明の基板検出装置は、ホルダ内にホルダ
を貫通するように設けられた二つの傾斜穴であつ
て、イオンビームが当該傾斜穴を通してホルダの
裏面側へ通過しないように逆V字状に傾斜して設
けられたものと、ホルダの裏面部またはその近傍
に設けられた発光器と受光器の組み合わせから成
る光センサとを備え、発光器からの光が一方の傾
斜穴を通してホルダ上の基板に入射し、基板から
の反射光が他方の傾斜穴を通して受光器に入射す
るよう構成したことを特徴とする。
The substrate detection device of the present invention has two inclined holes provided in a holder so as to pass through the holder, which are inclined in an inverted V shape so that the ion beam does not pass through the inclined holes to the back side of the holder. and an optical sensor consisting of a combination of a light emitting device and a light receiving device provided on or near the back of the holder, and the light from the light emitting device passes through one inclined hole to the substrate on the holder. and reflected light from the substrate enters the light receiver through the other inclined hole.
ホルダ上に基板が搬入されると、発光器からの
光は基板の表面で反射して受光器に入射する。こ
の反射光は、基板が透明、不透明に拘わらず得ら
れる。従つていずれの場合でも基板の検出が可能
である。またホルダには傾斜穴を設けているた
め、イオンビームは傾斜穴の内壁で阻止されてホ
ルダの裏面側へ通過することが防止される。
When the substrate is loaded onto the holder, light from the light emitter is reflected by the surface of the substrate and enters the light receiver. This reflected light can be obtained regardless of whether the substrate is transparent or opaque. Therefore, the substrate can be detected in either case. Further, since the holder is provided with an inclined hole, the ion beam is blocked by the inner wall of the inclined hole and is prevented from passing to the back side of the holder.
第1図は、この発明の一実施例に係る基板検出
装置を示す概略断面図である。この図は第3図の
線−方向に見たものに相当し、ホルダ6は例
えば基板着脱位置にあり、また押え板8の図示を
省略している(第2図も同様)。また第3図およ
び第4図と同一または同等部分には同一符号を付
してその説明を省略する。
FIG. 1 is a schematic cross-sectional view showing a substrate detection device according to an embodiment of the present invention. This figure corresponds to what is seen in the direction of the line in FIG. 3, where the holder 6 is, for example, in the board attachment/detachment position, and the holding plate 8 is not shown (the same applies to FIG. 2). Further, the same or equivalent parts as in FIGS. 3 and 4 are given the same reference numerals, and the explanation thereof will be omitted.
この実施例の基板検出装置は、前述したような
ホルダ6内にホルダ6を貫通するように傾斜して
設けられた二つの傾斜穴22aおよび22bと、
ホルダ6の裏面部であつて各傾斜穴22a,22
bの後方にそれぞれ埋め込まれた発光器18aお
よび受光器18bの組み合わせから成る光センサ
18とを備え、発光器18aからの光20が傾斜
穴22aを通してホルダ6上の基板2に入射し、
基板2からの反射光20′が傾斜穴22bを通し
て受光器18bに入射するように構成している。
両傾斜穴22a,22bは、後述するイオンビー
ム12が当該傾斜穴22a,22bを通してホル
ダ6の裏面側へ通過しないように逆V字状に傾斜
して設けられている。 The substrate detection device of this embodiment includes two inclined holes 22a and 22b provided in the holder 6 at an angle so as to penetrate the holder 6, as described above;
Each inclined hole 22a, 22 on the back side of the holder 6
a light sensor 18 consisting of a combination of a light emitter 18a and a light receiver 18b respectively embedded in the rear of the light emitter 18a, and light 20 from the light emitter 18a enters the substrate 2 on the holder 6 through an inclined hole 22a;
The structure is such that reflected light 20' from the substrate 2 enters the light receiver 18b through the inclined hole 22b.
Both inclined holes 22a and 22b are provided to be inclined in an inverted V shape so that the ion beam 12, which will be described later, does not pass through the inclined holes 22a and 22b to the back side of the holder 6.
このホルダ6上に基板2が搬入されると、発光
器18aからの光20は基板2の表面で反射して
反射光20′として受光器18bに入射する。こ
の反射光20′は、基板2が透明、不透明に拘わ
らず得られ、しかもその反射光20′を基板2の
近くにある受光器18bで受けるので、受光器1
8bにおいて当該反射光20′を十分に検出する
ことができる。そして受光器18bは、例えば、
反射光20′が有りの時は基板有りの信号を、反
射光20′が無しの時は基板無しの信号を出力す
る。 When the substrate 2 is loaded onto the holder 6, light 20 from the light emitter 18a is reflected by the surface of the substrate 2 and enters the light receiver 18b as reflected light 20'. This reflected light 20' is obtained regardless of whether the substrate 2 is transparent or opaque, and since the reflected light 20' is received by the light receiver 18b located near the substrate 2, the light receiver 18b receives the reflected light 20'.
The reflected light 20' can be sufficiently detected at 8b. The light receiver 18b is, for example,
When the reflected light 20' is present, a signal indicating that the substrate is present is output, and when the reflected light 20' is absent, a signal indicating that the substrate is not present is output.
このようにこの基板検出装置においては、発光
器18aからの光20を基板2の裏面で斜めに反
射させ、しかもその反射光20′を基板2の近く
にある受光器18bで受けることになるので、不
透明な基板は勿論のこと、透明あるいは透過率の
高い基板2であつても、それからの反射光20′
を受光器18bにおいて十分に検出して、当該基
板2の有無を検出することができる。 In this way, in this substrate detection device, the light 20 from the light emitter 18a is reflected diagonally from the back surface of the substrate 2, and the reflected light 20' is received by the light receiver 18b located near the substrate 2. , not only opaque substrates but also transparent or highly transmittance substrates 2, the reflected light 20'
can be sufficiently detected by the light receiver 18b to detect the presence or absence of the substrate 2.
しかも、一般的に光センサの発光器からの光は
ある発散角を持つており、また受光器はある視野
角を持つており、このような光センサをそのまま
用いると、検出対象物である基板付近の構造物で
の反射光で誤検出する可能性が高くなるが、この
基板検出装置では、上記二つの傾斜穴22a,2
2bがそれぞれコリメーターのような作用をし
て、発光器18aからの光を絞つて基板2に入射
させ、また受光器18bの視野を基板2の反射領
域に絞ることができるので、誤検出の可能性が低
く、従つて基板検出の信頼性が向上する。特に、
基板2が透明あるい透過率の高いものであつて反
射光20′が弱い場合に、この効果は大きい。 Moreover, the light from the light emitter of an optical sensor generally has a certain divergence angle, and the light receiver has a certain viewing angle. Although there is a high possibility of false detection due to reflected light from nearby structures, in this board detection device, the two inclined holes 22a, 2
2b acts like a collimator, condensing the light from the emitter 18a and making it incident on the substrate 2, and also narrowing the field of view of the photodetector 18b to the reflective area of the substrate 2, thereby preventing false detection. The probability is lower, thus increasing the reliability of substrate detection. especially,
This effect is significant when the substrate 2 is transparent or has high transmittance and the reflected light 20' is weak.
一方、ホルダ6が基板処理位置にある場合は、
図中に破線で示すような関係でイオンビーム12
が照射されることになる(この関係は第3図およ
び第4図を参照すればより明らかとなる)。その
場合、何等かの原因で基板2無しでイオンビーム
12が照射されたとしても、従来とは違つてホル
ダ6には逆V字状に傾斜した傾斜穴22a,22
bを設けてイオンビーム12を傾斜穴22a,2
2bの内壁で阻止するようにしているので、イオ
ンビーム12がホルダ6の裏面側へ通過すること
はない。従つて、他の機器へ悪影響が及ぶのを防
止することができる。尚、発光器18aおよび受
光器18bは、上記のような場合を考慮すると、
図示例のようにイオンビーム12が誤つて照射さ
れないような位置にまで後退させておくのが好ま
しい。 On the other hand, when the holder 6 is in the substrate processing position,
The ion beam 12 is connected as shown by the broken line in the figure.
will be irradiated (this relationship will become clearer with reference to FIGS. 3 and 4). In that case, even if the ion beam 12 is irradiated without the substrate 2 for some reason, the holder 6 has inclined holes 22a, 22 which are inclined in an inverted V shape, unlike the conventional case.
b is provided to direct the ion beam 12 through the inclined holes 22a, 2.
Since the ion beam 12 is blocked by the inner wall of the holder 6, the ion beam 12 does not pass to the back side of the holder 6. Therefore, it is possible to prevent other devices from being adversely affected. In addition, considering the above case, the light emitter 18a and the light receiver 18b are
It is preferable to retreat to a position where the ion beam 12 will not be accidentally irradiated, as shown in the illustrated example.
第2図は、この発明の他の実施例に係る基板検
出装置を示す概略断面図である。第1図の実施例
との相違点を主に説明すれば、この実施例におい
ては、光センサ18の発光器18aおよび受光器
18bを、ホルダ6の裏面部の近傍に設けてい
る。傾斜穴22a,22bについては、それがそ
のままストレートにホルダ6の裏面側まで貫通し
ている点を除けば第1図の場合とほぼ同様であ
る。この実施例においては、イオンビーム12が
誤つて発光器18aや受光器18bに照射される
恐れは全くなくなる。その他の作用効果は第1図
の場合とほぼ同様である。 FIG. 2 is a schematic cross-sectional view showing a substrate detection device according to another embodiment of the invention. Mainly, the difference from the embodiment shown in FIG. 1 will be explained. In this embodiment, a light emitter 18a and a light receiver 18b of the optical sensor 18 are provided near the back surface of the holder 6. The inclined holes 22a and 22b are substantially the same as those shown in FIG. 1, except that they extend straight through to the back side of the holder 6. In this embodiment, there is no possibility that the ion beam 12 will accidentally irradiate the light emitter 18a or the light receiver 18b. Other effects are almost the same as in the case of FIG.
〔発明の効果〕
以上のようにこの発明によれば、発光器からの
光を基板の裏面で斜めに反射させ、しかもその反
射光を基板の近くにある受光器で受けることにな
るので、不透明な基板は勿論のこと、透明あるい
は透過率の高い基板であつても、それからの反射
光を受光器において十分に検出して、当該基板の
有無を検出することができる。[Effects of the Invention] As described above, according to the present invention, the light from the light emitter is reflected diagonally on the back surface of the substrate, and the reflected light is received by the light receiver near the substrate, so that it is not opaque. Not only a transparent substrate but also a substrate with high transmittance, the reflected light from the substrate can be sufficiently detected by the light receiver to detect the presence or absence of the substrate.
しかも、一般的に光センサの発光器からの光は
ある発散角を持つており、また受光器はある視野
角を持つており、このような光センサをそのまま
用いると、検出対象物である基板付近の構造物で
の反射光で誤検出する可能性が高くなるが、この
基板検出装置では、上記二つの傾斜穴がそれぞれ
コリメーターのような作用をして、発光器からの
光を絞つて基板に入射させ、また受光器の視野を
基板の反射領域に絞ることができるので、誤検出
の可能性が低く、従つて基板検出の信頼性が向上
する。特に、基板が透明あるいは透過率の高いの
ものであつて反射光が弱い場合に、この効果は大
きい。 Moreover, the light from the light emitter of an optical sensor generally has a certain divergence angle, and the light receiver has a certain viewing angle. There is a high possibility of false detection due to reflected light from nearby structures, but in this board detection device, each of the two slanted holes acts like a collimator and narrows down the light from the light emitter. Since the light can be incident on the substrate and the field of view of the photoreceiver can be focused on the reflective area of the substrate, the possibility of false detection is low, and therefore the reliability of substrate detection is improved. This effect is particularly significant when the substrate is transparent or has high transmittance and the reflected light is weak.
また、何らかの原因で基板無しでイオンビーム
が照射されても、イオンビームは傾斜穴の内壁で
阻止されてホルダの裏面側へは通過しないので、
他の機器へ悪影響を及ぶのを防止することができ
る。 Also, even if the ion beam is irradiated without the substrate for some reason, the ion beam will be blocked by the inner wall of the inclined hole and will not pass through to the back side of the holder.
It is possible to prevent adverse effects on other devices.
第1図は、この発明の一実施例に係る基板検出
装置を示す概略断面図である。第2図は、この発
明の他の実施例に係る基板検出装置を示す概略断
面図である。第3図は、イオン注入装置のホルダ
回りの一例を部分的に示す平面図である。第4図
は、第3図の線−に沿う概略断面図である。
2……基板、6……ホルダ、12……イオンビ
ーム、18……光センサ、18a……発光器、1
8b……受光器、20……光、20′……反射光、
22a,22b……傾斜穴。
FIG. 1 is a schematic cross-sectional view showing a substrate detection device according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view showing a substrate detection device according to another embodiment of the invention. FIG. 3 is a plan view partially showing an example of the holder and surroundings of the ion implantation device. FIG. 4 is a schematic sectional view taken along the line - in FIG. 3. 2... Substrate, 6... Holder, 12... Ion beam, 18... Optical sensor, 18a... Light emitter, 1
8b... Light receiver, 20... Light, 20'... Reflected light,
22a, 22b...slanted holes.
Claims (1)
ームを照射する装置に用いられる基板検出装置に
おいて、ホルダ内にホルダを貫通するように設け
られた二つの傾斜穴であつて、イオンビームが当
該傾斜穴を通してホルダの裏面側へ通過しないよ
うに逆V字状に傾斜して設けられたものと、ホル
ダの裏面部またはその近傍に設けられた発光器と
受光器の組み合わせから成る光センサとを備え、
発光器からの光が一方の傾斜穴を通してホルダ上
の基板に入射し、基板からの反射光が他方の傾斜
穴を通して受光器に入射するよう構成したことを
特徴とする基板検出装置。1. In a substrate detection device used in a device that irradiates an ion beam onto a substrate held on the front side of a holder, two inclined holes are provided in the holder so as to pass through the holder, and the ion beam is It is provided with an inverted V-shaped incline so as not to pass through the hole to the back side of the holder, and a light sensor consisting of a combination of a light emitter and a light receiver provided on or near the back side of the holder. ,
A substrate detection device characterized in that light from a light emitter is incident on a substrate on a holder through one inclined hole, and reflected light from the substrate is incident on a light receiver through another inclined hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11186386A JPS62268139A (en) | 1986-05-15 | 1986-05-15 | Substrate detecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11186386A JPS62268139A (en) | 1986-05-15 | 1986-05-15 | Substrate detecting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62268139A JPS62268139A (en) | 1987-11-20 |
| JPH0551180B2 true JPH0551180B2 (en) | 1993-07-30 |
Family
ID=14572051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11186386A Granted JPS62268139A (en) | 1986-05-15 | 1986-05-15 | Substrate detecting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62268139A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10108745A (en) * | 1996-10-04 | 1998-04-28 | Touzai Kagaku Sangyo Kk | Sink stand |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4705450B2 (en) * | 2005-03-11 | 2011-06-22 | 株式会社ディスコ | Wafer holding mechanism |
| JP5558673B2 (en) * | 2008-03-25 | 2014-07-23 | 大日本スクリーン製造株式会社 | Heat treatment equipment |
| KR102597414B1 (en) * | 2022-02-21 | 2023-11-02 | (주)디바이스이엔지 | Device for etching the periphery edge of a substrate comprising substrate sensing unit |
-
1986
- 1986-05-15 JP JP11186386A patent/JPS62268139A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10108745A (en) * | 1996-10-04 | 1998-04-28 | Touzai Kagaku Sangyo Kk | Sink stand |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62268139A (en) | 1987-11-20 |
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