JPH0583171B2 - - Google Patents
Info
- Publication number
- JPH0583171B2 JPH0583171B2 JP62322602A JP32260287A JPH0583171B2 JP H0583171 B2 JPH0583171 B2 JP H0583171B2 JP 62322602 A JP62322602 A JP 62322602A JP 32260287 A JP32260287 A JP 32260287A JP H0583171 B2 JPH0583171 B2 JP H0583171B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- membrane
- ray
- silicon
- polycrystalline silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/60—Other road transportation technologies with climate change mitigation effect
- Y02T10/62—Hybrid vehicles
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62322602A JPH01162332A (ja) | 1987-12-18 | 1987-12-18 | X線リソグラフィ用マスクメンブレン |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62322602A JPH01162332A (ja) | 1987-12-18 | 1987-12-18 | X線リソグラフィ用マスクメンブレン |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01162332A JPH01162332A (ja) | 1989-06-26 |
| JPH0583171B2 true JPH0583171B2 (fr) | 1993-11-25 |
Family
ID=18145539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62322602A Granted JPH01162332A (ja) | 1987-12-18 | 1987-12-18 | X線リソグラフィ用マスクメンブレン |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01162332A (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4194948A4 (fr) | 2021-10-20 | 2024-05-01 | NGK Insulators, Ltd. | Film transmettant les euv |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5792830A (en) * | 1980-12-01 | 1982-06-09 | Hitachi Ltd | Manufacture of mask for x-ray exposure |
| JPS585743A (ja) * | 1981-07-03 | 1983-01-13 | Toshiba Corp | X線露光用マスクの製造方法 |
| JPS595628A (ja) * | 1982-07-02 | 1984-01-12 | Seiko Epson Corp | メンブラン・マスク |
| JPS5918635A (ja) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | X線リソグラフイ用マスク |
| DE3245867A1 (de) * | 1982-12-11 | 1984-06-14 | EUROSIL electronic GmbH, 8057 Eching | Spannungsarme, thermisch unempfindliche traegerschicht fuer eine absorberstruktur einer bestrahlungsmaske fuer roentgenlithographie |
| JPS6020514A (ja) * | 1983-07-13 | 1985-02-01 | Matsushita Electronics Corp | X線露光用マスク |
-
1987
- 1987-12-18 JP JP62322602A patent/JPH01162332A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01162332A (ja) | 1989-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |